Patents by Inventor Taku Nakamura
Taku Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 4822717Abstract: An image-forming method which comprises:imagewise exposing a light-sensitive material comprising a light-sensitive layer containing silver halide, a reducing agent and a polymerizable compound having a viscosity of not lower than 100 cP at 25.degree. C. provided on a support, to form a latent image of the silver halide;simultaneously or thereafter developing the light-sensitive material to polymerize the polymerizable compound within the area where the latent image of the silver halide has been formed; andpressing the light-sensitive material on an image-receiving material at a pressure of not lower than 100 kg/cm.sup.2 to transfer the unpolymerized polymerizable compound to the image-receiving material.Type: GrantFiled: July 14, 1987Date of Patent: April 18, 1989Assignee: Fuji Photo Film Co., Ltd.Inventor: Taku Nakamura
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Patent number: 4820610Abstract: A light-sensitive liquid composition in which droplets of a silver halide emulsion are dispersed in a polymerizable compound, characterized in that a polymer having a principal chain consisting essentially of a hydrocarbon chain substituted in part with hydrophilic groups which contain, in their terminal groups, -OH or nitrogen having a lone electron-pair is dissolved in the polymerizable compound. Process for the preparation thereof is also disclosed.Type: GrantFiled: May 25, 1988Date of Patent: April 11, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Tsumoru Hirano, Eiji Funatsu
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Patent number: 4797343Abstract: A light-sensitive material comprising a light-sensitive layer which contains silver halide, a reducing agent and a polymerizable compound and a layer containing a base or base precursor, both of which are provided on the same side of a support. A barrier layer which keeps the base or base precursor from the light-sensitive layer and, when heated, allows transmission of the base or base precursor therethrough can be provided between the light-sensitive layer and the layer containing a base or base precursor.Type: GrantFiled: April 27, 1987Date of Patent: January 10, 1989Assignee: Fuji Photo Film Co., Ltd.Inventor: Taku Nakamura
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Patent number: 4792514Abstract: A light-sensitive material is described, comprising a support having provided thereon a light-sensitive layer containing at least a light-sensitive silver halide, a polymerizable compound, a color image forming substance, and a hydrazine derivative represented by formula (I): ##STR1## wherein R.sub.1 represents a monovalent group derived from a substituted or unsubstituted aromatic ring or aromatic heterocyclic ring; R.sub.2 and R.sub.3 each represents a substituted or unsubstituted aryl group; and R.sub.4 represents a hydrogen atom or a substituted or unsubstituted alkyl, aryl, alkoxycarbonyl, or carbamoyl group,in which the color image forming substance is immobilized by imagewise exposure to light followed by heat development under conditions substantially not containing water. The material exhibits high sensitivity and provides a color image through a simple, easy, and rapid dry processing step, with a reduced exposure time.Type: GrantFiled: October 10, 1986Date of Patent: December 20, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Kozo Sato
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Patent number: 4784932Abstract: An image-forming method which comprises:imagewise exposing a light-sensitive material comprising a light-sensitive layer provided on a support wherein the light-sensitive layer contains silver halide, a reducing agent, a polymerizable compound and a color image forming substance;simultaneously or thereafter developing the light-sensitive material to polymerize the polymerizable compound within the area where the latent image of the silver halide has been formed, and thereby fixing the color image forming substance on the support within the area;pressing the light-sensitive material on an image-receiving material comprising an image-receiving layer provided on a support wherein the image-receiving layer contains a granulated thermoplastic compound, to transfer the unfixed color image forming substance to the image-receiving material; andheating the image-receiving material.Type: GrantFiled: March 11, 1987Date of Patent: November 15, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Keiji Takeda
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Patent number: 4769408Abstract: A medium for electrophoresis in the form of an aqueous gel comprising an acrylamide copolymer having at least one specifically selected constitutional repeating unit. This medium is preferably employable for analysis of bipolymers such as proteins.Type: GrantFiled: March 19, 1984Date of Patent: September 6, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Masashi Ogawa, Taku Nakamura
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Patent number: 4766052Abstract: A photographic element containing a polymer comprising a recurring unit of general formula (I) and at least one recurring unit selected from the group of units of general formulae (II), (III) and IV) ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 each represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; L represents a divalent linking group of 1 to 20 carbon atoms; and m is 0 or 1; ##STR2## wherein R.sub.1a represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R.sub.4 is an alkyl group, an aryl group or an aralkyl group; and n is 0 or 1; ##STR3## wherein R.sub.1a is as defined in general formula (II); R.sub.5 and R.sub.6 each represents a hydrogen atom or an alkyl group, an alkoxy group, an aryl group or an aralkyl group; and p and q each is equal to 0 or 1; and ##STR4## wherein R.sub.1a is as defined in general formula (II); and D is a divalent linking group necessary for the formation of a 5- to 7-membered ring with the nitrogen atom and carbonyl group.Type: GrantFiled: August 17, 1987Date of Patent: August 23, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Koichi Nakamura, Hiroshi Hayashi
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Patent number: 4735884Abstract: A light-sensitive material comprising a light-sensitive layer which contains silver halide, a reducing agent and a polymerizable compound provided on a support, characterized in that the reducing agent is a hydrazine derivative having the following formula (I): ##STR1## in which R.sup.1 is a monovalent group selected from the group consisting of hydrogen, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkynyl group and a heterocyclic group, each of which may have one or more substituent groups; each of R.sup.2 and R.sup.3 independently is an aryl group which may have one or more substituent group, or R.sup.2 and R.sup.3 form, together with the neighboring carbon, a condensed aromatic ring; R.sup.4 is a monovalent group selected from the group consisting of an aryl group, a heterocyclic group, hydrogen, an alkyl group, an alkoxycarbonyl group and carbamoyl, each of which may have one or more substituent groups.Type: GrantFiled: February 24, 1987Date of Patent: April 5, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Jiro Tsukahara, Taku Nakamura
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Patent number: 4663272Abstract: A silver halide photographic material is described comprising at least one layer which contains at least(1) a polymer comprising as constitutional components thereof a repeating unit having a photographically useful group and at least one repeating unit having a sulfinic acid group or a sulfinate group, and(2) a compound having at least one functional group capable of reacting with at least one of a sulfinic acid group and sulfinate group and at least one functional group capable of reacting with at least one of a sulfinic acid group, a sulfinate group and a primary amino group.Said photographic group-containing polymer (1) may be fixed in a photographic layer according to the present photographic material, and does not substantially migrate therefrom during development or other photographic treatment, thus resulting in formation of color images of high density.Type: GrantFiled: August 7, 1985Date of Patent: May 5, 1987Assignee: Fuji Photo Film Co., Ltd.Inventor: Taku Nakamura
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Patent number: 4649104Abstract: A heat developable light-sensitive material is described, comprising a polymer containing as a constituent a repeating unit represented by formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group having from 1 to 6 carbon atoms; L represents a divalent connecting group having from 1 to 20 carbon atoms; M represents a cation and x represents a number which is the same as the charge number of the cation represented by M.The polymer containing the repeating unit represented by formula (I) is a base precursor which is stable at normal temperature, but rapidly decomposes to release a base by heating; therefore, the heat developable light-sensitive material containing the base precursor has excellent preservability and provides images having good image quality, i.e., low fog density and high image density, upon a short period of developing time.Type: GrantFiled: October 30, 1985Date of Patent: March 10, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Hiroyuki Hirai
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Patent number: 4647528Abstract: A silver halide photographic material having on a support at least one silver halide emulsion layer which contains light-sensitive tabular silver halide grains, with a ratio of grain diameter to grain thickness of 5 or more and a polymeric hardener. The silver halide photographic material has both increased covering power and scratching resistance, and is suitable for high-temperature rapid development processing.Type: GrantFiled: September 17, 1984Date of Patent: March 3, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Sumito Yamada, Taku Nakamura, Shuzo Suga, Hiroshi Kawamoto
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Patent number: 4636455Abstract: A novel process for transferring a diffusible dye to a dye fixing material by the steps of (a) applying water to a dye fixing material at least having a mordant and a binder on a support, (b) attaching the dye fixing material to a diffusible dye-containing material, and (c) heating the attached materials to transfer the dye from the dye-containing material to the dye fixing material, wherein the binder contains a cross-linked hydrophilic polymer and a non-cross-linked hydrophilic polymer and the amount of water applied to the dye fixing material is not more than the amount required to maximally swell the layer coated on the dye fixing material.The dye fixing material of the present invention is capable of absorbing a sufficient amount of water in a short period of time, in the process of the present invention, to provide a dye-transferred image of high density in the dye fixing material after heating for a short time, which is substantially free from mottle or color bleeding.Type: GrantFiled: November 22, 1985Date of Patent: January 13, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshiaki Aono, Koichi Nakamura, Takeshi Shibata, Taku Nakamura
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Patent number: 4619883Abstract: A dye fixing material for fixing a mobile hydrophilic dye formed imagewise to a dye fixing layer is disclosed. The mobile hydrophilic dye image is formed by heating a heat-developable silver halide light-sensitive material in a substantially anhydrous condition after or during imagewise exposure. At least one layer of the dye fixing material contains a polymer having monomeric units of the following formula ##STR1## wherein A represents a vinyl monomer unit having no imidazole or imidazolium group, R.sub.1 and R.sub.3 represent a hydrogen atom, an alkyl group, an alkyl group substituted by a group capable of forming a coordinate bond with a metal, or a salt thereof, R.sub.2 and R.sub.5 represent a hydrogen atom or an alkyl, aralkyl, or aryl group, R.sub.4 represents an alkyl or aralkyl group, X.sup..crclbar. represents an acid radical, x is from 0 to 80 mole %, y is from 10 to 100 mole %, z is from 0 to 50 mole %.Type: GrantFiled: December 3, 1984Date of Patent: October 28, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshiaki Aono, Koichi Nakamura, Taku Nakamura
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Patent number: 4606996Abstract: A silver halide photographic light-sensitive material for photomechanical process is described, comprising a support, at least one photosensitive silver halide emulsion layer thereon, and at least one light-insensitive upper layer on the emulsion layer. At least one of the light-insensitive upper layers contains a compound having an electric charge and being substantially insoluble in water but soluble in a water-miscible organic solvent; a method for a reducing treatment is also described, which comprises bringing a silver image formed on the light-sensitive material into contact with a reducer through the light-insensitive upper layer containing the aforesaid compound.Type: GrantFiled: December 3, 1985Date of Patent: August 19, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Yasuo Kasama, Yasuo Mukunoki
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Patent number: 4600687Abstract: A photographic light-sensitive material having at least one layer containing a polymer having a repeating unit of the formula (I): ##STR1## wherein A is a monomer unit prepared by copolymerizing copolymerizable ethylenically unsaturated monomers; R.sub.1 is hydrogen or a lower alkyl group having 1 to 6 carbon atoms; Q is ##STR2## (wherein R.sub.1 is the same as defined above) or an arylene group having 6 to 10 carbon atoms; L is a divalent group having 3 to 15 carbon atoms and containing at least one linking group selected from the members consisting of ##STR3## (wherein R.sub.1 is the same as defined above) or a divalent group having 1 to 12 carbon atoms and containing at least one linking group selected from the members consisting of ##STR4## (wherein R.sub.1 is the same as defined above); R.sub.2 is --CH.dbd.CH.sub.2 or --CH.sub.2 CH.sub.Type: GrantFiled: April 22, 1985Date of Patent: July 15, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Mitsunori Hirano, Masasi Ogawa, Kunio Ishigaki
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Patent number: 4595652Abstract: A heat-developable light-sensitive material is described, characterized by containing a polymer having a functional group releasing a basic component upon thermal decomposition in the side chain thereof. This polymer is a new base precursor which when added to heat-developable light-sensitive materials increases their storage stability and permits them to form an image of high density and decreased in fog even after storage. Preferred examples of such polymers are polymers having a repeating unit represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a univalent group, L is a divalent connecting group having from 1 to 20 carbon atoms, M is a cation and x is a number equivalent with the valence of M.Type: GrantFiled: July 30, 1985Date of Patent: June 17, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Akira Hibino, Hiroyuki Hirai
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Patent number: 4594308Abstract: A photographic element containing, as a mordant, a polymer comprising a monomer unit having at least an imidazole ring and a monomer unit having at least a sulfinic acid group. The mordant provides dye images of high transfer density and improves fastness of the dye images to light or high temperature and humidity.Type: GrantFiled: November 30, 1984Date of Patent: June 10, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Akira Hibino, Takeshi Shibata, Koichi Nakamura
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Patent number: 4582868Abstract: A medium for electrophoresis in the form of an aqueous gel comprising an acrylamide copolymer having at least one specifically selected repeating unit; and a compound containing at least one carbamoyl group such as urea or formamide which serves as modifier.Type: GrantFiled: March 19, 1984Date of Patent: April 15, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Masashi Ogawa, Taku Nakamura
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Patent number: 4552835Abstract: A silver halide photographic light-sensitive material for photomechanical process and a method for the reduction treatment of said light-sensitive material are described. The light-sensitive material comprises a support, at least one light-sensitive silver halide emulsion layer, and at least one light-insensitive upper layer, characterized in that at least one light-insensitive upper layer contains a polymer comprising: (a) a monomer unit containing at least one group having an electric charge; and (b) a monomer unit having a functional group capable of crosslinking through a gelatin hardening agent with a like functional group of another polymer chain of the same type or with gelatin. The light-sensitive material is very advantageous; for example, it has greatly improved reduction treatment suitability, and the reduction treatment suitability is not deteriorated even if the amount of silver coated per unit area is reduced.Type: GrantFiled: June 14, 1984Date of Patent: November 12, 1985Assignee: Fuji Photo Film Co., Ltd.Inventors: Taku Nakamura, Yasuo Kasama
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Patent number: 4551412Abstract: A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and the light-insensitive upper layer contains a polymer latex.The silver halide photographic light-sensitive material has excellent aptitude for reduction treatment without increasing the amount of silver per unit area. The occurrence of reticulation is prevented with the silver halide photographic light-sensitive material.Type: GrantFiled: August 17, 1983Date of Patent: November 5, 1985Assignee: Fuji Photo Film Co., Ltd.Inventors: Masashi Ogawa, Taku Nakamura, Yukihide Urata, Shingo Yamauchi