Patents by Inventor Taku Nakamura

Taku Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4533623
    Abstract: A silver halide photographic light-sensitive material for plate making is disclosed. The material is comprised of a support base having thereon a sensitive silver halide emulsion layer and at least one upper insensitive layer having a melting time longer than the melting time of the sensitive silver halide emulsion layer. A method of reduction treatment for such silver halide light-sensitive material is also disclosed. The sensitive materials have excellent aptitude for reduction treatment and do not deteriorate even if the amount of silver per unit area is relatively small.
    Type: Grant
    Filed: September 7, 1984
    Date of Patent: August 6, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yukihide Urata, Shigenori Moriuchi, Taku Nakamura, Masashi Ogawa
  • Patent number: 4508818
    Abstract: A silver halide photographic sensitive material is disclosed. The material is comprised of a support base which has a sensitive silver halide emulsion layer on the surface of the base. On the silver halide emulsion layer is a first and a second insensitive layer. The second insensitive layer has a melting time which is higher than that of the first insensitive layer. The first insensitive layer has a melting time which is equal to or higher than the melting time of the silver halide emulsion layer. The resulting material can be advantageously utilize within an automatic developing apparatus. The material has improved mechanical properties and results in a reduced amount of scum being formed within the developing solution.
    Type: Grant
    Filed: March 26, 1984
    Date of Patent: April 2, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Nobuyuki Iwasaki, Taku Nakamura
  • Patent number: 4497893
    Abstract: A silver halide color reversal photographic material comprising a backing layer containing both gelatin of an isoelectric point of 5.5 or more and a cationic polymer is disclosed. By utilizing the particular backing layer the color reversal photographic material has increased retouchability.
    Type: Grant
    Filed: January 31, 1984
    Date of Patent: February 5, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoyasu Deguchi, Koji Kameyama, Taku Nakamura
  • Patent number: 4481284
    Abstract: A silver halide photographic light-sensitive material is disclosed, comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and a thickness of the light-insensitive uppermost layer is from 0.3 .mu.m to 0.8 .mu.m. The silver halide photographic light-sensitive material causes a remarkably lower degree of reticulation, can reduce the amount of scum formed in the processing solution, and has an improved covering power.
    Type: Grant
    Filed: September 21, 1982
    Date of Patent: November 6, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Nobuyuki Iwasaki, Taku Nakamura
  • Patent number: 4476218
    Abstract: A silver halide photographic light-sensitive material is described, which comprises a support, and at least one light-sensitive silver halide emulsion layer and an uppermost layer provided on at least one surface of the support, wherein the melting time of the uppermost layer is made greater than that of the light-sensitive silver halide emulsion layer. The material has good strength and produces a reduced amount of scum which normally occurs in the processing liquid during development processing.
    Type: Grant
    Filed: June 16, 1982
    Date of Patent: October 9, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Taku Nakamura, Nobuyuki Iwasaki
  • Patent number: 4460680
    Abstract: A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer is disclosed. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and the thickness of the light-insensitive uppermost layer is from 1.3 .mu.m to 5.0 .mu.m. The silver halide photographic light-sensitive material has an improved covering power and results in remarkably low degree of reticulation. Furthermore, when the material is used it results in a reduced amount of scum being formed in the processing solution.
    Type: Grant
    Filed: August 25, 1982
    Date of Patent: July 17, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Nobuyuki Iwasaki, Taku Nakamura
  • Patent number: 4396708
    Abstract: A photographic light-sensitive material having at least one antistatic layer which contains gelatin and an antistatic agent. The antistatic agent being a polymer which is prepared by copolymerization of carboxylic acid group-containing monomers and monomers having such a functional group which reacts with gelatin resulting in the characteristic of greatly improved diffusion resistance.
    Type: Grant
    Filed: June 14, 1982
    Date of Patent: August 2, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Taku Nakamura
  • Patent number: 4374924
    Abstract: A silver halide photographic light-sensitive material having at least one antistatic layer, said antistatic layer containing a dispersion of polymer represented by the following formula (I): ##STR1## wherein A represents a monomer unit formed from a copolymerizable monomer having at least two ethylenically unsaturated groups, B represents a monomer unit formed from a copolymerizable and monoethylenically unsaturated monomer, R.sub.1 represents a hydrogen atom or a lower alkyl group having 1 to 6 carbon atoms, Q represents a divalent group containing 1 to 12 carbon atoms, R.sub.2, R.sub.3 and R.sub.4 may be the same or different and each represents an alkyl group containing 1 to 20 carbon atoms, or an aralkyl group containing 7 to 20 carbon atoms, or R.sub.2, R.sub.3 and R.sub.4 may combine to form a ring together with the nitrogen atom, X.sup..crclbar. represents an anion, x is about 0.25 to 10 mol%, y is about 0 to 90 mol%, and z is about 10 to 99 mol%.
    Type: Grant
    Filed: February 24, 1982
    Date of Patent: February 22, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shigeki Yokoyama, Shinzo Kishimoto, Itsuki Toriya, Taku Nakamura
  • Patent number: 4323644
    Abstract: A photographic material having at least one layer containing a polymer having a repeating unit of the formula (I): ##STR1## wherein A is a monomer unit copolymerized with a copolymerizable ethylenically unsaturated monomer; R is a hydrogen atom or a lower alkyl group having 1 to about 6 carbon atoms; L is a bivalent linking group having 1 to about 20 carbon atoms; X is an active ester group; x and y each represents molar percent, x being between 0 and 95 and y being between 5 and 100; m is 0 or 1.
    Type: Grant
    Filed: November 5, 1980
    Date of Patent: April 6, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Taku Nakamura, Masasi Ogawa, Kunio Ishigaki
  • Patent number: 4312940
    Abstract: A photographic light-sensitive material comprising at least one layer containing a polymer dispersion of the following formula (I) or (II) as a mordant ##STR1## wherein A represents a monomer unit obtained from at least one monomer having at least two copolymerizable ethylenically unsaturated groups at least one of which is in the side chain; B represents a monomer unit obtained from at least one copolymerizable monoethylenically unsaturated monomer; D.sup..sym. represents a 5- or 6-membered heterocyclic group containing one or two nitrogen atoms one of which is positively charged and D may contain one or more substituents; R.sub.1 represents a hydrogen atom or a lower alkyl group; R.sub.2 and R.sub.3, which may be the same or different, each represents an alkyl group or an aralkyl group, or R.sub.2 and R.sub.3 may combine together with the nitrogen atom to which they are attached and form a 5- or 6-membered ring; X.sup..crclbar.
    Type: Grant
    Filed: July 7, 1980
    Date of Patent: January 26, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Taku Nakamura, Shigeru Nagatomo
  • Patent number: 4229522
    Abstract: A method for forming color images comprising processing a photographic element containing imagewise distributed silver in the presence of a polymer containing at least 30 mol % vinyl pyridines, a dye and an oxidizing agent to thereby oxidation-bleach the dye. Color images having excellent light fastness, heat resistance and humidity resistance are obtained.
    Type: Grant
    Filed: April 13, 1979
    Date of Patent: October 21, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shigeru Nakamura, Isao Shimamura, Taku Nakamura, Shinji Sakaguchi, Takushi Miyazako, Masatoshi Sugiysma, Akio Mitsui
  • Patent number: 4147548
    Abstract: A photographic element comprising a support having thereon at least one layer containing a polymeric mordant containing a repeating unit represented by the general formula (I): ##STR1## wherein R.sub.1 and R.sub.2, which may be the same or different, each represents a hydrogen atom or a lower alkyl group having 1 to 6 carbon atoms; R.sub.3 and R.sub.4, which may be the same or different, each represents a methyl group or an ethyl group; Y represents a halogen atom, a nitro group, a cyano group, a methoxy group, a methoxycarbonyl group or an ethylthio group; and X.crclbar. represents an anion.
    Type: Grant
    Filed: April 18, 1978
    Date of Patent: April 3, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yukio Karino, Taku Nakamura