Patents by Inventor Takuya Kubo

Takuya Kubo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11171286
    Abstract: There is provided a method of processing a workpiece for manufacturing a magnetoresistive effect element, the workpiece including a first multilayer film and a second multilayer film, the first multilayer film including a first magnetic layer, a second magnetic layer and a tunnel barrier layer formed between the first magnetic layer and the second magnetic layer, and the second multilayer film constituting a pinning layer in the magnetoresistive effect element. The method includes etching the first multilayer film and the second multilayer film, and heating the workpiece after the etching or during the etching. The heating includes heating the workpiece while adjusting an ambient condition of the workpiece.
    Type: Grant
    Filed: October 4, 2018
    Date of Patent: November 9, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takuya Kubo, Song yun Kang
  • Patent number: 11152564
    Abstract: The first film forming device is configured to form a film using plasma in a consistent vacuum state. In the forming of the first substrate product, the first substrate product is formed in a consistent vacuum state. The first substrate product has the support base, a first lamination region, and a metal region. The first lamination region is provided on the support base. The metal region is provided on the first lamination region, and has a first metal layer and a second metal layer. The first metal layer is provided on the first lamination region, and the second metal layer is provided on the first metal layer. A material of the first metal layer has TiN or Ta, and a material of the second metal layer has TaN or Ru.
    Type: Grant
    Filed: May 6, 2020
    Date of Patent: October 19, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Takuya Kubo, Song yun Kang
  • Publication number: 20210229753
    Abstract: A vehicle-body structure for suppressing deformation of a lift gate opening is provided. Embodiments include a vehicle having a rear annular framework formed from a cross member, side braces, connecting members, and a rear header; a rear suspension on lower surfaces of side pillars in the same position as the cross member in a vehicle front-rear direction; and wheel well inner portions on the vehicle rear side with respect to the cross member, each having an upper end having a damper supporting portion for mounting a suspension damper. The side braces each connect a place near the cross member and a place near the damper supporting portion to each other in a vehicle up-down direction; and the connecting members each connect a place near each end portion of the rear header in a vehicle width direction and the place near the damper supporting portion to each other.
    Type: Application
    Filed: December 4, 2020
    Publication date: July 29, 2021
    Applicant: MAZDA MOTOR CORPORATION
    Inventors: Hidetaka GOTO, Koutaro TAKADA, Takuya KUBO, Kentaro NOMURA
  • Publication number: 20210229752
    Abstract: A rear vehicle-body structure for suppressing deformation of a corner portion of a lift gate opening is provided, including a pair of left and right inner wheel wells having damper supports; and a framework member on a rear side of the inner wheel wells forming an opening edge of a back door opening. The framework member includes a header extending in a vehicle width direction forming an upper end edge of the back door opening; and pillars extending from the header to a vehicle lower side via corner portions of the back door opening. A pair of gussets connect rear portions of the inner wheel wells and the pillars to each other; a pair of connecting members connect the rear portions of the inner wheel wells and places near the corner portions to each other; and the gussets and the connecting members are joined at places near the damper supports.
    Type: Application
    Filed: December 9, 2020
    Publication date: July 29, 2021
    Applicant: MAZDA MOTOR CORPORATION
    Inventors: Hidetaka GOTO, Koutaro TAKADA, Takuya KUBO, Kentaro NOMURA
  • Publication number: 20210095329
    Abstract: Disclosed is a method for measuring lipoprotein's uptake ability, comprising: preparing lipoprotein incorporating labeled sterol by mixing lipoprotein in a sample with the labeled sterol, in a presence of at least one compound selected from the group consisting of: a compound comprising a hydrocarbon chain having at least one carbon-carbon unsaturated bond (excluding a sterol); and a saturated aliphatic compound having no phosphodiester bond; and measuring an ability to uptake the labeled sterol, based on a label of the labeled sterol incorporated into the lipoprotein.
    Type: Application
    Filed: September 24, 2020
    Publication date: April 1, 2021
    Applicant: SYSMEX CORPORATION
    Inventor: Takuya KUBO
  • Publication number: 20210093227
    Abstract: An image processing system according to the present invention includes at least one memory and at least one processor which function as: an acquiring unit configured to acquire information on a captured moving image: a detecting unit configured to detect, on a basis of the information acquired by the acquiring unit, an edge point of an affected area in a diameter direction thereof from a locus of light moving inside the affected area; and a providing unit configured to provide information on an outer periphery of the affected area on a basis of a plurality of points detected by the detecting unit.
    Type: Application
    Filed: September 25, 2020
    Publication date: April 1, 2021
    Inventors: Yosato Hitaka, Takuya Kubo
  • Patent number: 10944051
    Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal includes (a) providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and (b) after (a), providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.
    Type: Grant
    Filed: July 30, 2019
    Date of Patent: March 9, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Takuya Kubo, Song yun Kang, Keiichi Shimoda, Tetsuya Ohishi
  • Publication number: 20210018521
    Abstract: The present invention addresses the problem of providing a method and a reagent for measuring the uptake capacity of a lipoprotein with higher accuracy. This problem is solved by preparing a lipoprotein incorporating a labeled sterol, by mixing the lipoprotein in a sample and the labeled sterol in the presence of a surfactant having no cyclic structure, and measuring the uptake capacity of the labeled sterol of the lipoprotein.
    Type: Application
    Filed: September 24, 2020
    Publication date: January 21, 2021
    Applicant: SYSMEX CORPORATION
    Inventors: Amane HARADA, Takuya IINO, Takuya KUBO, Katsuhiro MURAKAMI, Naoya SAIKI, Xiaoling PENG, Maria KIRIYAMA
  • Publication number: 20210003562
    Abstract: The present invention relates to a method for measuring the cholesterol uptake capacity of lipoproteins. The present invention also relates to a reagent kit for measuring the cholesterol uptake capacity of lipoproteins. The present invention further relates to a tagged cholesterol which can be used in the method and the reagent kit.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Applicant: SYSMEX CORPORATION
    Inventors: Keiko YOSHIKAWA, Amane HARADA, Katsuhiro MURAKAMI, Maria KIRIYAMA, Keiko MIWA, Takuya KUBO
  • Publication number: 20200373480
    Abstract: The first film forming device is configured to form a film using plasma in a consistent vacuum state. In the forming of the first substrate product, the first substrate product is formed in a consistent vacuum state. The first substrate product has the support base, a first lamination region, and a metal region. The first lamination region is provided on the support base. The metal region is provided on the first lamination region, and has a first metal layer and a second metal layer. The first metal layer is provided on the first lamination region, and the second metal layer is provided on the first metal layer. A material of the first metal layer has TiN or Ta, and a material of the second metal layer has TaN or Ru.
    Type: Application
    Filed: May 6, 2020
    Publication date: November 26, 2020
    Applicant: Tokyo Electron Limited
    Inventors: Takuya KUBO, Song yun KANG
  • Patent number: 10809249
    Abstract: The present invention relates to a method for measuring the cholesterol uptake capacity of lipoproteins. The present invention also relates to a reagent kit for measuring the cholesterol uptake capacity of lipoproteins. The present invention further relates to a tagged cholesterol which can be used in the method and the reagent kit.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: October 20, 2020
    Assignee: SYSMEX CORPORATION
    Inventors: Keiko Yoshikawa, Amane Harada, Katsuhiro Murakami, Maria Kiriyama, Keiko Miwa, Takuya Kubo
  • Patent number: 10790152
    Abstract: In a method for etching a multilayer film of a target object by using a plasma processing apparatus, the multilayer film of the target object includes a layer made of a metal magnetic material and a mask is provided on the multilayer film. The multilayer film is etched in a state where a pressure in a processing chamber of the plasma processing apparatus is set to a first pressure that is a relatively high pressure. Subsequently, the multilayer film is further etched in a state where the pressure in the processing chamber is set to a second pressure lower than the first pressure.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: September 29, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takuya Kubo, Song yun Kang, Tamotsu Morimoto
  • Publication number: 20200261985
    Abstract: A diamond coating includes a first diamond layer made of minute diamond particles and a second diamond layer made of coarse diamond particles: in a flank-face side diamond coating, a mean coat thickness d2 is not less than 3 ?m and not more than 25 ?m, a first diamond layer is formed on a surface side and a second diamond layer is formed on a tool base side: a rake-face side diamond coating is in a smaller range of 50 ?m or 1/10 of a tool diameter from a tip of a base cutting-edge part; in the rake-face side diamond coating, a mean coat thickness d1 is a smaller one in a range not less than 0 ?m and not more than 5.0 ?m or a range less than d2: and a boundary part between the first diamond layer and the second diamond layer.
    Type: Application
    Filed: September 28, 2018
    Publication date: August 20, 2020
    Inventors: Takuya Kubo, Kazuhisa Murata, Akimitsu Tominaga
  • Publication number: 20200243759
    Abstract: In a method of etching according to one embodiment, a multilayer film having a magnetic tunnel junction layer is etched. In the method of etching, a plasma processing apparatus is used. A chamber body of the plasma processing apparatus provides an internal space. In the method of etching, a workpiece is accommodated in the internal space. Next, the multilayer film is etched by plasma of a first gas generated in the internal space. The first gas includes carbon and a rare gas and does not include hydrogen. Next, the multilayer film is further etched by plasma of a second gas generated in the internal space. The second gas includes oxygen and a rare gas and does not include carbon and hydrogen.
    Type: Application
    Filed: October 15, 2018
    Publication date: July 30, 2020
    Applicant: Tokyo Electron Limited
    Inventors: Takuya KUBO, Song yun KANG
  • Patent number: 10676784
    Abstract: A sample analyzing method includes: denaturing DNA by heating a measurement specimen; bleaching the measurement specimen to inhibit autofluorescence from the measurement specimen; binding a fluorescent dye to a test substance in the measurement specimen; and capturing an image of fluorescence originated from the fluorescent dye by irradiating the measurement specimen with light. The DNA denaturation treatment is performed before the bleaching.
    Type: Grant
    Filed: March 21, 2016
    Date of Patent: June 9, 2020
    Assignee: SYSMEX CORPORATION
    Inventors: Takuya Kubo, Shigeki Iwanaga
  • Patent number: 10604731
    Abstract: Provided is a cell analyzer including: a light source unit configured to apply light to test cells each containing first substances which are bound to first fluorescent dyes and which serve as an index for therapeutic strategy judgement; an image capturing unit configured to capture an image of fluorescence caused by the light; a processing unit configured to process the image obtained by the image capturing unit; and a display unit configured to display a process result obtained by the processing unit, wherein the processing unit obtains a first image by performing an inactivation process of quenching the first fluorescent dyes, an activation process of activating a part of the first fluorescent dyes that have been quenched, and an image capturing process of capturing, by means of the image capturing unit, an image of the fluorescence by applying light from the light source unit to each test cell; extracts bright points based on the first fluorescent dyes on the basis of the first image; classifies the extra
    Type: Grant
    Filed: September 5, 2017
    Date of Patent: March 31, 2020
    Assignee: SYSMEX CORPORATION
    Inventors: Kanako Masumoto, Takuya Kubo, Shigeki Iwanaga, Masaya Okada
  • Publication number: 20200095631
    Abstract: A sample analyzing method includes: denaturing DNA by heating a measurement specimen; bleaching the measurement specimen to inhibit autofluorescence from the measurement specimen; binding a fluorescent dye to a test substance in the measurement specimen; and capturing an image of fluorescence originated from the fluorescent dye by irradiating the measurement specimen with light. The DNA denaturation treatment is performed before the bleaching.
    Type: Application
    Filed: October 21, 2019
    Publication date: March 26, 2020
    Applicant: SYSMEX CORPORATION
    Inventors: Takuya KUBO, Shigeki IWANAGA
  • Patent number: 10533217
    Abstract: A sample analyzing method includes: denaturing DNA by heating a measurement specimen; bleaching the measurement specimen to inhibit autofluorescence from the measurement specimen; binding a fluorescent dye to a test substance in the measurement specimen; and capturing an image of fluorescence originated from the fluorescent dye by irradiating the measurement specimen with light. The DNA denaturation treatment is performed before the bleaching.
    Type: Grant
    Filed: March 21, 2016
    Date of Patent: January 14, 2020
    Assignee: SYSMEX CORPORATION
    Inventors: Takuya Kubo, Shigeki Iwanaga
  • Publication number: 20190355901
    Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal includes (a) providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and (b) after (a), providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.
    Type: Application
    Filed: July 30, 2019
    Publication date: November 21, 2019
    Inventors: Takuya KUBO, Song yun KANG, Keiichi SHIMODA, Tetsuya OHISHI
  • Patent number: 10403814
    Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal, the method include a first cleaning step of providing a gas containing a hydrogen-containing gas, and removing a carbon-containing deposition by plasma generated from the gas containing the hydrogen-containing gas; a second cleaning step of, after the first cleaning step, providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and a third cleaning step of, after the second cleaning step, providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.
    Type: Grant
    Filed: May 2, 2016
    Date of Patent: September 3, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Takuya Kubo, Song yun Kang, Keiichi Shimoda, Tetsuya Ohishi