Abstract: Disclosed is a method for measuring lipoprotein's uptake ability, comprising: preparing lipoprotein incorporating labeled sterol by mixing lipoprotein in a sample with the labeled sterol, in a presence of at least one compound selected from the group consisting of: a compound comprising a hydrocarbon chain having at least one carbon-carbon unsaturated bond (excluding a sterol); and a saturated aliphatic compound having no phosphodiester bond; and measuring an ability to uptake the labeled sterol, based on a label of the labeled sterol incorporated into the lipoprotein.

Abstract: An image processing system according to the present invention includes at least one memory and at least one processor which function as: an acquiring unit configured to acquire information on a captured moving image: a detecting unit configured to detect, on a basis of the information acquired by the acquiring unit, an edge point of an affected area in a diameter direction thereof from a locus of light moving inside the affected area; and a providing unit configured to provide information on an outer periphery of the affected area on a basis of a plurality of points detected by the detecting unit.

Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal includes (a) providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and (b) after (a), providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.

Abstract: The present invention addresses the problem of providing a method and a reagent for measuring the uptake capacity of a lipoprotein with higher accuracy. This problem is solved by preparing a lipoprotein incorporating a labeled sterol, by mixing the lipoprotein in a sample and the labeled sterol in the presence of a surfactant having no cyclic structure, and measuring the uptake capacity of the labeled sterol of the lipoprotein.

Abstract: The present invention relates to a method for measuring the cholesterol uptake capacity of lipoproteins. The present invention also relates to a reagent kit for measuring the cholesterol uptake capacity of lipoproteins. The present invention further relates to a tagged cholesterol which can be used in the method and the reagent kit.

Abstract: The first film forming device is configured to form a film using plasma in a consistent vacuum state. In the forming of the first substrate product, the first substrate product is formed in a consistent vacuum state. The first substrate product has the support base, a first lamination region, and a metal region. The first lamination region is provided on the support base. The metal region is provided on the first lamination region, and has a first metal layer and a second metal layer. The first metal layer is provided on the first lamination region, and the second metal layer is provided on the first metal layer. A material of the first metal layer has TiN or Ta, and a material of the second metal layer has TaN or Ru.

Abstract: The present invention relates to a method for measuring the cholesterol uptake capacity of lipoproteins. The present invention also relates to a reagent kit for measuring the cholesterol uptake capacity of lipoproteins. The present invention further relates to a tagged cholesterol which can be used in the method and the reagent kit.

Abstract: In a method for etching a multilayer film of a target object by using a plasma processing apparatus, the multilayer film of the target object includes a layer made of a metal magnetic material and a mask is provided on the multilayer film. The multilayer film is etched in a state where a pressure in a processing chamber of the plasma processing apparatus is set to a first pressure that is a relatively high pressure. Subsequently, the multilayer film is further etched in a state where the pressure in the processing chamber is set to a second pressure lower than the first pressure.

Abstract: A diamond coating includes a first diamond layer made of minute diamond particles and a second diamond layer made of coarse diamond particles: in a flank-face side diamond coating, a mean coat thickness d2 is not less than 3 ?m and not more than 25 ?m, a first diamond layer is formed on a surface side and a second diamond layer is formed on a tool base side: a rake-face side diamond coating is in a smaller range of 50 ?m or 1/10 of a tool diameter from a tip of a base cutting-edge part; in the rake-face side diamond coating, a mean coat thickness d1 is a smaller one in a range not less than 0 ?m and not more than 5.0 ?m or a range less than d2: and a boundary part between the first diamond layer and the second diamond layer.

Abstract: In a method of etching according to one embodiment, a multilayer film having a magnetic tunnel junction layer is etched. In the method of etching, a plasma processing apparatus is used. A chamber body of the plasma processing apparatus provides an internal space. In the method of etching, a workpiece is accommodated in the internal space. Next, the multilayer film is etched by plasma of a first gas generated in the internal space. The first gas includes carbon and a rare gas and does not include hydrogen. Next, the multilayer film is further etched by plasma of a second gas generated in the internal space. The second gas includes oxygen and a rare gas and does not include carbon and hydrogen.

Abstract: A sample analyzing method includes: denaturing DNA by heating a measurement specimen; bleaching the measurement specimen to inhibit autofluorescence from the measurement specimen; binding a fluorescent dye to a test substance in the measurement specimen; and capturing an image of fluorescence originated from the fluorescent dye by irradiating the measurement specimen with light. The DNA denaturation treatment is performed before the bleaching.

Abstract: Provided is a cell analyzer including: a light source unit configured to apply light to test cells each containing first substances which are bound to first fluorescent dyes and which serve as an index for therapeutic strategy judgement; an image capturing unit configured to capture an image of fluorescence caused by the light; a processing unit configured to process the image obtained by the image capturing unit; and a display unit configured to display a process result obtained by the processing unit, wherein the processing unit obtains a first image by performing an inactivation process of quenching the first fluorescent dyes, an activation process of activating a part of the first fluorescent dyes that have been quenched, and an image capturing process of capturing, by means of the image capturing unit, an image of the fluorescence by applying light from the light source unit to each test cell; extracts bright points based on the first fluorescent dyes on the basis of the first image; classifies the extra

Abstract: A sample analyzing method includes: denaturing DNA by heating a measurement specimen; bleaching the measurement specimen to inhibit autofluorescence from the measurement specimen; binding a fluorescent dye to a test substance in the measurement specimen; and capturing an image of fluorescence originated from the fluorescent dye by irradiating the measurement specimen with light. The DNA denaturation treatment is performed before the bleaching.

Abstract: A sample analyzing method includes: denaturing DNA by heating a measurement specimen; bleaching the measurement specimen to inhibit autofluorescence from the measurement specimen; binding a fluorescent dye to a test substance in the measurement specimen; and capturing an image of fluorescence originated from the fluorescent dye by irradiating the measurement specimen with light. The DNA denaturation treatment is performed before the bleaching.

Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal includes (a) providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and (b) after (a), providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.

Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal, the method include a first cleaning step of providing a gas containing a hydrogen-containing gas, and removing a carbon-containing deposition by plasma generated from the gas containing the hydrogen-containing gas; a second cleaning step of, after the first cleaning step, providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and a third cleaning step of, after the second cleaning step, providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.

Abstract: There is provided a method of processing a workpiece for manufacturing a magnetoresistive effect element, the workpiece including a first multilayer film and a second multilayer film, the first multilayer film including a first magnetic layer, a second magnetic layer and a tunnel barrier layer formed between the first magnetic layer and the second magnetic layer, and the second multilayer film constituting a pinning layer in the magnetoresistive effect element. The method includes etching the first multilayer film and the second multilayer film, and heating the workpiece after the etching or during the etching. The heating includes heating the workpiece while adjusting an ambient condition of the workpiece.

Abstract: There is provided an workpiece etching method executed in manufacturing a magneto-resistive effect element, the workpiece including first and second multilayer films, the first multilayer film including first and second magnetic layers and a tunnel barrier layer formed between the first and second magnetic layers, and the second multilayer film being a multilayer film constituting a pinning layer in the magneto-resistive effect element. The method includes: etching the first multilayer film; generating plasma of a first gas including hydrocarbon and noble gases inside a chamber of a plasma processing apparatus to etch the second multilayer film inside the chamber; and generating plasma of a second gas including gas containing carbon and oxygen, an oxygen gas and a noble gas and not containing hydrogen inside the chamber to remove a carbon-containing deposit formed on the workpiece in the generating the plasma of the first gas.

Abstract: A method of cleaning a substrate processing apparatus that etches a film including a metal, the method include a first cleaning step of providing a gas containing a hydrogen-containing gas, and removing a carbon-containing deposition by plasma generated from the gas containing the hydrogen-containing gas; a second cleaning step of, after the first cleaning step, providing an inert gas, and removing a metal-containing deposition by plasma generated from the inert gas; and a third cleaning step of, after the second cleaning step, providing a gas containing a fluorine-containing gas and an oxygen-containing gas, and removing a silicon-containing deposition by plasma generated from the gas containing the fluorine-containing gas and the oxygen-containing gas.

Abstract: In order to provide a separating agent for liquid chromatography that is able to separate a protein using target characteristics as an index while retaining the original steric structure, the separating agent for liquid chromatography is equipped with a substrate, a recognition site including a compound that operates by recognizing characteristics of biopolymers such as proteins, and a spacer that bonds the recognition site to the substrate, wherein the spacer has an effective length to enable the recognition site to operate by reaching deep portions of the steric structure of a target biopolymer.