Patents by Inventor Takuya Matsui

Takuya Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120126142
    Abstract: Disclosed is a fluorescent analysis method whereby the throughput in DNA sequence analysis or the like can be improved. The method comprises irradiating a substrate, which carries biological molecules such as oligonucleotides immobilized thereon, with light for fluorescent measuring, collecting the generated fluorescence, dispersing the collected light, forming an image by focusing the light on a two-dimensional sensor, and then detecting the fluorescence with the two-dimensional sensor. In this method, since wavelengths are dispersed in different directions and then detected at the same time, the intensity of each dispersed wavelength and the position of the subject of spectroscopic imaging can be calculated even in the case where the wavelength dispersion distance is longer than the inter-lattice distance.
    Type: Application
    Filed: April 14, 2010
    Publication date: May 24, 2012
    Inventors: Takuya Matsui, Ryoji Inaba
  • Publication number: 20110284769
    Abstract: An object of the present invention relates to observation of single molecule fluorescence while temperature of a sample solution is controlled by a temperature controller and intrinsic fluorescence of the temperature controller is avoided, in a total internal reflection microscope. The present invention relates to provision of an opening at areas of the temperature controller through which incident light and reflected light pass, and configuration adopting a material with intrinsic fluorescence lower than that of the other parts, in a total internal reflection microscope including a prism and the temperature controller. The present invention enables intrinsic fluorescence of the temperature controller to be suppressed, which allows highly sensitive fluorescence observation while controlling sample solution temperature with high precision. For instance, this in turn allows the throughput of single molecule DNA sequencing using a total internal reflection microscope to be improved.
    Type: Application
    Filed: November 30, 2009
    Publication date: November 24, 2011
    Inventors: Takuya Matsui, Satoshi Takahashi, Takanobu Haga
  • Publication number: 20110284768
    Abstract: The present invention has an object to provide a method for efficiently detecting an image with a smaller number of pixels. The invention relates to fluorescence analysis which uses a substrate having a plurality of regions for being capable of immobilizing biologically-related molecules in positions of lattice points of a lattice structure, and which causes the fluorescence from a certain lattice point to be wavelength-dispersed in a direction other than the direction toward the adjacent closest lattice point. According to an embodiment, for example, the number of pixels of a two-dimensional sensor required for fluorescence analysis of the regions with the biologically-related molecules immobilized can be set to several hundred times to fifty times smaller than that in the conventional case without degrading the measurement accuracy. This can achieve the improvement of throughput, reduction in price, and/or improvement of the operability of an analyzing device.
    Type: Application
    Filed: November 30, 2009
    Publication date: November 24, 2011
    Inventors: Satoshi Takahashi, Tsuyoshi Sonehara, Tomoyuki Sakai, Takanobu Haga, Hirokazu Kato, Nobutaka Kumazaki, Takuya Matsui
  • Publication number: 20110077267
    Abstract: The present invention provides a triazolopyridine compound having a prolyl hydroxylase inhibitory action and an erythropoietin production-inducing ability. The present invention relates to a compound represented by the following formula [I]: wherein each symbol is as defined in the specification, or a pharmaceutically acceptable salt thereof, or a solvate thereof, as well as a prolyl hydroxylase inhibitor or erythropoietin production-inducing agent containing the compound. The compound of the present invention shows a prolyl hydroxylase inhibitory action and an erythropoietin production-inducing ability and is useful as a prophylactic or therapeutic agent for various diseases and pathologies (disorders) caused by decreased production of erythropoietin.
    Type: Application
    Filed: July 16, 2010
    Publication date: March 31, 2011
    Applicant: JAPAN TOBACCO INC.
    Inventors: Ikuo Mitani, Yosuke Ogoshi, Takuya Matsui, Masahiro Yokota, Masakazu Terashita, Dai Motoda, Kazuhito Ueyama, Hiroyuki Abe, Takahiro Hotta, Takashi Ito
  • Publication number: 20090320910
    Abstract: It relates to a transparent electrode substrate for a solar cell comprising a resin film [I] 1 and a film 2 comprising a metal oxide fabricated thereon, wherein the resin film [I] 1 is a fabricated body obtained by curing a photocurable composition and having an unevenness on the side of the resin film [I] 1 on which the film 2 comprising a metal oxide is fabricated
    Type: Application
    Filed: August 31, 2007
    Publication date: December 31, 2009
    Inventors: Takuya Matsui, Atsushi Masuda, Katsuhiko Katsuma, Seiichirou Hayakawa
  • Publication number: 20090242804
    Abstract: The present invention aims at reducing background noise derived from a substance that is present in the vicinity of a target substance such as a DNA and protein and attached to the surface of a substrate without an effect on a fluorescent dye labeling the target substance. The substrate that has a probe and is capable of interacting with the target substance is irradiated with noise removing light such that an evanescent field is generated on the surface of the substrate. A target substance and a foreign particle, which are non-specifically stuck to the surface of the substrate, are decomposed by the evanescent field generated by the irradiation with the noise removing light. The evanescent field present near the surface of the substrate has almost no effect on the probe.
    Type: Application
    Filed: March 9, 2009
    Publication date: October 1, 2009
    Inventors: Takayuki OBARA, Satoshi Takahashi, Akira Maekawa, Takuya Matsui, Nobutaka Kumazaki
  • Publication number: 20090113887
    Abstract: To permit driving a tilt cylinder and an angle cylinder at relatively low speed and also to permit driving an additional actuator at high speed. Provided are a tilt cylinder 9 and angle cylinder 10 for pivotally tilting a blade 7 selectively leftward and rightward and for pivotally angling the blade 7 selectively forward and rearward, respectively, and an additional actuator for actuating an additional attachment. Also provided are a tilting/angling pressure oil feed means comprising a tilting/angling directional control valve 19 for controlling a flow of pressure oil to be fed to one of the cylinders 9,10 and a selector valve 20 for selectively feeding pressure oil, which flows out of the directional control valve 19, to one of the cylinders 9,10. An additional pressure oil feed means for feeding pressure oil to the additional actuator 27 is provided independently of the tilting/angling directional control valve, and the additional pressure oil feed means has an additional directional control valve 29.
    Type: Application
    Filed: January 24, 2006
    Publication date: May 7, 2009
    Applicant: HITACHI CONSTRUCTION MACHINERY CO., LTD.
    Inventors: Kiwamu Takahashi, Yasutaka Tsuruga, Junya Kawamoto, Kenji Itou, Takuya Matsui
  • Patent number: 7513214
    Abstract: The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: April 7, 2009
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tomohiro Okumura, Hideo Haraguchi, Takuya Matsui, Izuru Matsuda, Akio Mitsuhashi
  • Publication number: 20070244096
    Abstract: Compounds, pharmaceutical compositions and methods that are useful in the treatment or prevention of metabolic and cell proliferative diseases or conditions are provided herein. In particular, the invention provides compounds which modulate the activity of proteins involved in lipid metabolism and cell proliferation.
    Type: Application
    Filed: May 2, 2007
    Publication date: October 18, 2007
    Applicant: Japan Tobacco Inc.
    Inventors: Brian Fox, Noboru Furukawa, Xiaolin Hao, Kiyosei Iio, Takashi Inaba, Simon Jackson, Frank Kayser, Marc Labelle, Kexue Li, Takuya Matsui, Dustin McMinn, Nobuya Ogawa, Steven Rubenstein, Shoichi Sagawa, Kazuyuki Sugimoto, Masahiro Suzuki, Masahiro Tanaka, Guosen Ye, Atsuhito Yoshida, Jian Zhang
  • Patent number: 7273704
    Abstract: A nucleic acid contained in a sample is quantified with high accuracy. The procedure includes the step of allowing the sample containing a specific nucleic acid to interact with a DNA microarray provided with a plurality of nucleic acid probe parts having a nucleic acid probe capable of hybridizing to the specific nucleic acid; the step of monitoring outputs from each of the plurality of nucleic acid probe parts due to hybridization between the nucleic acid probe and the specific nucleic acid to determine normal distribution of time taken to reach a predetermined output value with respect to each of the plurality of nucleic acid probe parts; and the step of quantifying the specific nucleic acid contained in the sample based on a maximum value determined from the normal distribution obtained in the above step.
    Type: Grant
    Filed: August 12, 2002
    Date of Patent: September 25, 2007
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takuya Matsui, Yuji Miyahara, Kumiko Hattori
  • Patent number: 7244727
    Abstract: Compounds, pharmaceutical compositions and methods that are useful in the treatment or prevention of metabolic and cell proliferative diseases or conditions are provided herein. In particular, the invention provides compounds which modulate the activity of proteins involved in lipid metabolism and cell proliferation.
    Type: Grant
    Filed: November 21, 2003
    Date of Patent: July 17, 2007
    Assignee: Japan Tobacco Inc.
    Inventors: Brian M. Fox, Noboru Furukawa, Xiaolin Hao, Kiyosei Iio, Takashi Inaba, Simon M. Jackson, Frank Kayser, Marc Labelle, Kexue Li, Takuya Matsui, Dustin L. McMinn, Nobuya Ogawa, Steven M. Rubenstein, Shoichi Sagawa, Kazuyuki Sugimoto, Masahiro Suzuki, Masahiro Tanaka, Guosen Ye, Atsuhito Yoshida, Jian Zhang
  • Publication number: 20060088839
    Abstract: A nucleic acid contained in a sample is quantified with high accuracy. The procedure includes the step of allowing the sample containing a specific nucleic acid to interact with a DNA microarray provided with a plurality of nucleic acid probe parts having a nucleic acid probe capable of hybridizing to the specific nucleic acid; the step of monitoring outputs from each of the plurality of nucleic acid probe parts due to hybridization between the nucleic acid probe and the specific nucleic acid to determine normal distribution of time taken to reach a predetermined output value with respect to each of the plurality of nucleic acid probe parts; and the step of quantifying the specific nucleic acid contained in the sample based on a maximum value determined from the normal distribution obtained in the above step.
    Type: Application
    Filed: August 12, 2002
    Publication date: April 27, 2006
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takuya Matsui, Yuji Miyahara, Kumiko Hattori
  • Publication number: 20060078948
    Abstract: An object of the present invention is to provide an analytical method and an analytical instrument with high capability of quantitative determination and reproducibility which can be used for detecting the minor difference between expression levels and measuring the protein concentration, for example. An analytical method for a biological sample is disclosed, wherein two or more labels are present in the same area, and the signal intensity of one specific label is used to normalize the signal intensity of other labels. An analytical instrument, a microarray, and an immunoassay are also disclosed.
    Type: Application
    Filed: September 30, 2005
    Publication date: April 13, 2006
    Inventors: Takuya Matsui, Katsuhiro Kanda
  • Publication number: 20050011453
    Abstract: The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.
    Type: Application
    Filed: August 18, 2004
    Publication date: January 20, 2005
    Inventors: Tomohiro Okumura, Hideo Haraguchi, Takuya Matsui, Izuru Matsuda, Akio Mitsuhashi
  • Patent number: 6808759
    Abstract: The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.
    Type: Grant
    Filed: February 23, 2000
    Date of Patent: October 26, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tomohiro Okumura, Hideo Haraguchi, Takuya Matsui, Izuru Matsuda, Akio Mitsuhashi
  • Publication number: 20040209871
    Abstract: Compounds, pharmaceutical compositions and methods that are useful in the treatment or prevention of metabolic and cell proliferative diseases or conditions are provided herein. In particular, the invention provides compounds which modulate the activity of proteins involved in lipid metabolism and cell proliferation.
    Type: Application
    Filed: November 21, 2003
    Publication date: October 21, 2004
    Applicants: Tularik Inc., Japan Tobacco Inc.
    Inventors: Brian M. Fox, Noboru Furukawa, Xiaolin Hao, Kiyosei Iio, Takashi Inaba, Simon M. Jackson, Frank Kayser, Marc Labelle, Kexue Li, Takuya Matsui, Dustin L. McMinn, Nobuya Ogawa, Steven M. Rubenstein, Shoichi Sagawa, Kazuyuki Sugimoto, Masahiro Suzuki, Masahiro Tanaka, Guosen Ye, Atsuhito Yoshida, Jian Zhang
  • Patent number: 6648976
    Abstract: A plasma processing apparatus includes a vacuum chamber for evacuating gas therefrom, for introducing reaction gas therein, and for generating plasma therein through high frequency power application. A substrate hold stage is set in the vacuum chamber, with the substrate hold stage including a set face having a recessed part, wherein a rear face of a substrate to be subjected to plasma processing is held on the set face.
    Type: Grant
    Filed: February 23, 2000
    Date of Patent: November 18, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Izuru Matsuda, Hideo Haraguchi, Takuya Matsui, Shigeyuki Yamamoto
  • Publication number: 20020168814
    Abstract: A plasma processing method includes evacuating a vacuum chamber while supplying a gas into the vacuum chamber, thereby controlling an interior of the vacuum chamber to a pressure, and supplying a high frequency power of a frequency of 50 MHz-3 GHz to an antenna which is set opposite to a substrate placed at a substrate electrode in the vacuum chamber and which has a structure with a dielectric member held between a wall face of the vacuum chamber opposite to the substrate and a metallic plate, thereby generating plasma inside the vacuum chamber and processing the substrate, wherein the high frequency power is supplied to satisfy a relation 3r<c/(f·∈½)<9r when c is a light velocity (m/sec), f is a frequency (Hz) of the high frequency power, ∈ is a relative permittivity of the dielectric member, and r is a half (m) of a longer line of a shape of the dielectric member.
    Type: Application
    Filed: June 26, 2002
    Publication date: November 14, 2002
    Inventors: Tomohiro Okumura, Takuya Matsui
  • Patent number: 6432730
    Abstract: A plasma processing method includes evacuating a vacuum chamber while supplying a gas into the vacuum chamber, thereby controlling an interior of the vacuum chamber to a pressure, and supplying a high frequency power of a frequency of 50 MHz-3 GHz to an antenna which is set opposite to a substrate placed to a substrate electrode in the vacuum chamber and which has a structure with a dielectric member held between a wall face of the vacuum chamber opposite to the substrate and a metallic plate, thereby generating plasma inside the vacuum chamber and processing the substrate, wherein the high frequency power is supplied to satisfy a relation 3r<c/(f·∈½)<9r when c is a light velocity (m/sec), f is a frequency (Hz) of the high frequency power, ∈ is a relative permittivity of the dielectric member and, r is a half (m) of a longer line of a shape of the dielectric member.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: August 13, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tomohiro Okumura, Takuya Matsui
  • Patent number: 6355573
    Abstract: A plasma processing method that controls an interior of a vacuum chamber to a specified pressure by introducing gas into the vacuum chamber and evacuating the interior of the vacuum chamber. A high-frequency power having a frequency of 50 MHz to 3 GHz is supplied to a site of an antenna other than its center and periphery with the antenna provided opposite to a substrate in the vacuum chamber, in a state where a general center of the antenna and the vacuum chamber are short-circuited to each other. Meanwhile, the interior of the vacuum chamber is controlled to the specified pressure, and plasma is generated within the vacuum chamber and the substrate placed on a substrate electrode is processed within the vacuum chamber.
    Type: Grant
    Filed: May 10, 2000
    Date of Patent: March 12, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tomohiro Okumura, Masaki Suzuki, Takuya Matsui