Abstract: An information display system for a vehicle is provided. In the information display system, a display device changes a position of a display screen by retracting a portion of a display screen from a visible space to an in invisible space and deploying the retracted portion of the display screen from the invisible space to the visible space. In accordance with the position of the display screen in the display device, a display controller changes information displayed on an effective display region of the display screen. The effective display region of the display screen is a region disposed in the visible space.

Abstract: An information display system for a vehicle is provided. In the information display system, a display device changes a position of a display screen by retracting a portion of a display screen from a visible space to an in invisible space and deploying the retracted portion of the display screen from the invisible space to the visible space. In accordance with the position of the display screen in the display device, a display controller changes information displayed on an effective display region of the display screen.

Abstract: A method for performing a spacer etch process is described. The method includes conformally applying a spacer material over a gate structure on a substrate, and performing a spacer etch process sequence to partially remove the spacer material from a capping region of the gate structure and a substrate region on the substrate adjacent a base of the gate structure, while retaining a spacer sidewall positioned along a sidewall of the gate structure.

Abstract: A method for performing a spacer etch process is described. The method includes conformally applying a spacer material over a gate structure on a substrate, and performing a spacer etch process sequence to partially remove the spacer material from a capping region of the gate structure and a substrate region on the substrate adjacent a base of the gate structure, while retaining a spacer sidewall positioned along a sidewall of the gate structure.

Abstract: A requester-side distributed ID management device (11) includes: an ID managing unit (111) that holds first user identification information associated with first server identification information, the first user identification information being for identifying the user of a first service providing server (12); an ID request processing unit (114) that receives a request from the first service providing server (12) for management user identification information for identifying the user of the second ID management device (21), the user corresponding to the first user identification information; and an inter-domain cooperating unit (113) that requests the management user identification information received by the ID request processing unit (114) from the second ID management device (21), and acquires the management user identification information from the second ID management device (21).

Abstract: An obtaining unit obtains information about a condition where a vehicle is placed. A detection unit detects at least one of a voice and an action of an occupant of the vehicle. An estimation unit estimates an in-vehicle apparatus to be a controlled target according to the condition where the vehicle is placed. A determination unit determines an in-vehicle apparatus to be a controlled in-vehicle apparatus and determines a control content thereof in consideration of the at least one of a voice and an action. A notification unit notifies the occupant of the in-vehicle apparatus to be controlled and the control content thereof determined by the determination unit. A control unit controls the in-vehicle apparatus according to the determination of the determination unit when receiving a response to the notification of the notification unit from the occupant to permit the control of the in-vehicle apparatus.

Abstract: A method for performing a spacer etch process is described. The method includes conformally applying a spacer material over a gate structure on a substrate, and performing a spacer etch process sequence to partially remove the spacer material from a capping region of the gate structure and a substrate region on the substrate adjacent a base of the gate structure, while retaining a spacer sidewall positioned along a sidewall of the gate structure.

Abstract: Adhesive composition according to the present invention includes an adhesive base agent consisting of a monomer and a polymerization initiator. Adhesion of the adhesive composition changes to take local maximum value, minimum value and a value greater than the local maximum value along with increase of irradiation amount of the electromagnetic wave or particle beam irradiated to the adhesive composition under a predetermined temperature environment. In a method for manufacturing a laminate according to the present invention allows for easy peeling of adherends and a layer of the adhesive composition when adhesion of the adhesive composition takes the minimum value.

Abstract: An adhesive composition which allows for preventing misalignment when mutually laminating adherends, mutually strongly bonding the adherends when correction of lamination is not required, as well as peeling the adherends without causing any damage thereto when correction of lamination is required. The adhesive composition includes an adhesive base agent consisting of a monomer and a polymerization initiator. Adhesive strength of the adhesive composition changes to take a local maximum value, a local minimum value and a value greater than the local maximum value along with increase of irradiation amount of the electromagnetic wave or particle beam irradiated to the adhesive composition under a predetermined temperature environment.

Abstract: In a work vehicle, a controller controls the displacement of a hydraulic motor by electronically controlling a motor displacement control part. When an inching operation member is being operated, the controller performs inching control for setting the minimum displacement of the hydraulic motor to a greater value in correspondence with a lower pilot pressure detected by a pilot pressure detector.

Abstract: The present invention is a substrate treatment apparatus for performing solution treatment on a substrate, performing post-treatment in a treatment module subsequent to the solution treatment, including: a solution treatment section including a plurality of nozzles prepared for respective kinds of treatment solutions corresponding to lots of substrates; a transfer mechanism for transferring the substrate; a monitoring section monitoring whether there is a failure in discharge of the treatment solution in the nozzle; and a control unit outputting a control signal to prohibit the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle determined to have a failure by the monitoring section and to perform the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle other than the nozzle determined to have a failure.

Abstract: In a work vehicle, a controller controls the displacement of a hydraulic motor by electronically controlling a motor displacement control part. When an inching operation member is being operated, the controller performs inching control for setting the minimum displacement of the hydraulic motor to a greater value in correspondence with a lower pilot pressure detected by a pilot pressure detector.

Abstract: A substrate processing apparatus having various types of elements including a substrate carrier member for performing a substrate processing; and a control section in which a remote operation information transmitted from a remote control unit in a remote place through a communication network is provided only when there is an allow setting of a remote operation by a worker of the substrate processing apparatus with the safety of the remote operation work being confirmed, and the various types of elements are controlled based on the provided remote operation information.

Abstract: A requester-side distributed ID management device (11) includes: an ID managing unit (111) that holds first user identification information associated with first server identification information, the first user identification information being for identifying the user of a first service providing server (12); an ID request processing unit (114) that receives a request from the first service providing server (12) for management user identification information for identifying the user of the second ID management device (21), the user corresponding to the first user identification information; and an inter-domain cooperating unit (113) that requests the management user identification information received by the ID request processing unit (114) from the second ID management device (21), and acquires the management user identification information from the second ID management device (21).

Abstract: An obtaining unit obtains information about a condition where a vehicle is placed. A detection unit detects at least one of a voice and an action of an occupant of the vehicle. An estimation unit estimates an in-vehicle apparatus to be a controlled target according to the condition where the vehicle is placed. A determination unit determines an in-vehicle apparatus to be a controlled in-vehicle apparatus and determines a control content thereof in consideration of the at least one of a voice and an action. A notification unit notifies the occupant of the in-vehicle apparatus to be controlled and the control content thereof determined by the determination unit. A control unit controls the in-vehicle apparatus according to the determination of the determination unit when receiving a response to the notification of the notification unit from the occupant to permit the control of the in-vehicle apparatus.

Abstract: In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.

Abstract: There is provided a polarizing plate with optical compensation layers that contributes to reduction in thickness and has excellent heat resistance and moisture resistance. A polarizing plate with optical compensation layers according to an embodiment of the present invention includes: a polarizer; a first optical compensation layer; a second optical compensation layer; and a third optical compensation layer, in this order. The first optical compensation layer has a refractive index profile of nx>ny=nz, and an in-plane retardation Re1 of 200 to 300 nm; the second optical compensation layer has a refractive index profile of nx>ny=nz, and an in-plane retardation Re2 of 80 to 170 nm; and the third optical compensation layer is formed of a material exhibiting an optical negative uniaxial property, and the material is aligned so as to be inclined.

Abstract: Provided is an etching method capable of increasing a selectivity of a polysilicon film with respect to a silicon oxide film and suppressing the formation of recesses in a silicon base material. A wafer includes a gate oxide film, a polysilicon film and a hard mask film having an opening sequentially formed on a silicon base material, and has a native oxide film in a trench of the polysilicon film corresponding to the opening formed thereon. The native oxide film is etched, so that the polysilicon film is exposed at a bottom portion of the trench. An ambient pressure is set to be 13.3 Pa, and O2 gas, HBr gas and Ar gas are supplied to a processing space, and a frequency of bias voltage is set to be 13.56 MHz, so that the polysilicon film is etched by the plasma generated from the HBr gas to be completely removed.

Abstract: An object of the present invention is to maintain a coating and developing system by remotely operating it more safely. The present invention is a maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.

Abstract: There is provided a polarizing plate with optical compensation layers that contributes to reduction in thickness and has excellent heat resistance and moisture resistance. A polarizing plate with optical compensation layers according to an embodiment of the present invention includes: a polarizer; a first optical compensation layer; a second optical compensation layer; and a third optical compensation layer, in this order. The first optical compensation layer has a refractive index profile of nx>ny=nz, and an in-plane retardation Re1 of 200 to 300 nm; the second optical compensation layer has a refractive index profile of nx>ny=nz, and an in-plane retardation Re2 of 80 to 170 nm; and the third optical compensation layer is formed of a material exhibiting an optical negative uniaxial property, and the material is aligned so as to be inclined.