Abstract: A maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.

Abstract: In order to decrease hydroscopic expansion of a resin-modified dental glass ionomer cement without losing high mechanical strength and adhesiveness to tooth structure and to lower a solubility, a dental cement consists of a liquid agent which includes a (meth)acrylate monomer having an acid group; a (meth)acrylate monomer having two or less hydroxyl groups and/or amino groups, not having an acid group, and having 160 or more molecular weight; water if necessary; and an amine compound as a polymerization initiator for a polymerization catalyst in a powder agent, and a powder agent which includes metal oxide powder used for fluoroaluminosilicate glass powder, dental zinc phosphate cement powder or dental carboxylate cement powder; and an organic aromatic compound and a peroxide, where the organic aromatic compound contains at least one —SO2— group as a polymerization catalyst.

Abstract: The liquid crystal display of the present invention comprises a liquid crystal cell; and a laminated optical film mounted together with a polarizing plate on each of both sides of the liquid crystal cell, the laminated optical film comprising a laminate that comprises: an optical film (1) obtained by stretching a polymer film comprising a polycarbonate resin and a styrene resin, wherein a photoelastic coefficient is 2.0×10?11 to 6.0×10?11 m2/N, and a three dimensional refractive index is controlled so that an Nz coefficient expressed with Nz=(nx1?nz1)/(nx1?ny1) satisfy a relationship of Nz?0.9, and a front retardation (Re)=(nx1?ny1)×d1 satisfy a relationship of Re?80 nm, an optical film (2) showing optically positive uniaxial property that satisfies a relationship of nx2>ny2?nz2, and an optical film (3) formed of a material showing optically negative uniaxial property, and the material being tilting aligned.

Abstract: A dental cement comprises a first paste including a (meth)acrylate monomer having an acid group, the (meth)acrylate monomer not having an acid group, having two or less of hydroxyl groups and/or amino groups and having a molecular weight of 160 or more, the filler having a specific average particle size and being inactive to the (meth)acrylate monomer having an acid group, and the amine compound as a accelerator for the undermentioned polymerizing catalyst; and the second paste including a (meth)acrylate monomer not having an acid group, having two or less of hydroxyl groups and/or amino groups and having a molecular weight of 160 or more, a filler having a specific particle size, and an organic aromatic compound having at least one —SO2— group and the peroxide as a polymerizing catalyst, thereby providing a dental cement large flexural strength, adhesiveness to dentin, small hygroscopic expansion, and low solubility.

Abstract: In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.

Abstract: To separate a catalyst for polymerizing a monomer contained in a liquid or paste dental composition containing at least a monomer, such as a dental resin cement, an autopolymerizing dental resin or a resin-reinforced dental glass ionomer cement, from the liquid or paste dental composition to thereby improve storage stability of the dental composition and reduce number of division of the dental composition, an extrusion nozzle for a dental composition mounted on one end of an extruder for extruding a liquid or paste dental composition containing at least a monomer, the extrusion nozzle contains a catalyst for polymerizing the monomer contained in the dental composition during extrusion, and the catalyst is attached to an inner wall of an extruding channel of the extrusion nozzle.

Abstract: A Walsh code assigning apparatus includes a retaining unit retaining assignment order information about an order of assignment of the plural Walsh codes such that one Walsh code having a smaller bit length becomes unable to he orthogonally separated as being precedent over another Walsh code having a larger bit length and a controller including a retrieving unit retrieving an idle Walsh code having an assignment request bit length in accordance with the assignment order information retained in the retaining unit, and assigning unit assigning the idle Walsh code, which has been obtained by the retrieving unit, to the spreading code of a last-named communication channel for which the assignment request is issued.

Abstract: A dual damascene structure with a lesser degree of shoulder loss is achieved. In a method for forming a dual damascene structure having a shoulder in an organic low k film layer by dry-etching the organic low k film layer 208 and a mask layer 210 formed over the organic low k film 208 using at least two different mixed gases, a first step in which the mask layer is etched using a first process gas and then the organic low k film layer is etched into a predetermined depth by continuously using the first process gas and a second step following the first step, in which the organic low k film layer is etched using a second process gas are executed. Since a protective wall is formed at a side wall of a via during the first step, the extent of the shoulder loss occurring in the junction region where a trench and a via form a junction can be reduced.

Abstract: An object of the present invention is to maintain a coating and developing system by remotely operating it more safely. The present invention is a maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.

Abstract: A dual damascene structure with a lesser degree of shoulder loss is achieved. In a method for forming a dual damascene structure having a shoulder in an organic low k film layer by dry-etching the organic low k film layer 208 and a mask layer 210 formed over the organic low k film 208 using at least two different mixed gases, a first step in which the mask layer is etched using a first process gas and then the organic low k film layer is etched into a predetermined depth by continuously using the first process gas and a second step following the first step, in which the organic low k film layer is etched using a second process gas are executed. Since a protective wall is formed at a side wall of a via during the first step, the extent of the shoulder loss occurring in the junction region where a trench and a via form a junction can be reduced.

Abstract: A Walsh code assigning apparatus includes retaining means for retaining assignment order information about an order of assignment of the plural Walsh codes such that one Walsh code having a smaller bit length becomes unable to be orthogonally separated as being precedent over another Walsh code having a larger bit length and controlling means including retrieving means for retrieving an idle Walsh code having an assignment request bit length in accordance with the assignment order information retained in the retaining means, and assigning means for assigning the idle Walsh code, which has been obtained by the retrieving means, to the spreading code of the last-named communication channel for which the assignment request is issued. With this apparatus, efficient assignment of a Walsh code of any bit length can be realized by controlling an order of assignment of Walsh code in a communication system handles Walsh codes of different bit lengths.

Abstract: In a mobile communication system in which mobile terminals register their locations at specified intervals of time, the velocities of the mobile terminals are determined, and the registration intervals are adjusted according to the velocities. Longer intervals are assigned for lower velocities, thereby conserving battery power and system resources. Methods of determining velocity include the use of positional information provided by base stations, and the sensing of Doppler frequency shifts.