Abstract: There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition that exhibit higher resolution than conventional positive resist compositions, good in-plane dimension uniformity of developed resist patterns on substrates such as mask blanks and high etching resistance.

Abstract: A glass run includes a main body portion attached to a channel portion DC provided along an inner periphery of a door frame and having an approximately U-shape in section, formed of a base bottom portion and an exterior sidewall portion and an interior sidewall portion extending from the base bottom portion and an exterior seal lip and an interior seal lip extending from almost front ends of the exterior sidewall portion and the interior sidewall portion to an inside of the main body portion. Moreover, for the glass run, by molding, integrally formed is an entire longitudinal area having a sectional shape having the main body portion and the interior and exterior seal lips and provided with an upper side portion corresponding to an upper edge portion of a door glass and a front vertical side portion and a rear vertical side portion corresponding to a front edge portion and a rear edge portion of the door glass.

Abstract: A polymer for use in photoresist compositions is synthesized by effecting polymerization reaction to form a polymerization product mixture and subjecting the mixture to molecular weight fractionation by a liquid phase separation technique using a good solvent and a poor solvent. The fractionation step is iterated at least twice, and one iteration of fractionation includes adding a good solvent which is different from the good solvent added in the other iteration of fractionation.

Abstract: An efficient coating machine capable of hardening coating on works in a short hardening time with a small-sized hardening oven at reduced costs. The coating machine has a painting booth, a hardening oven and a work transfer device. The work transfer device has a rotary shaft provided at a center of the coating machine, and a plurality of hangers, each holding one piece of work and being turnable about the rotary shaft. The painting booth and the hardening oven are arranged around the rotary shaft into an arc-shaped configuration, respectively. The hardening oven has an arc-shaped work passage adapted to move the works. One piece of work is coated in the painting booth and continuously transferred to the work passage of the hardening oven while being held with each of the hangers and turned about the rotary shaft. In the work passage, the work is blown with hot air fed from a hot air generating device for hardening the coating on the work.

Abstract: A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl group is bonded and vicinal carbon atoms bonded thereto, the vicinal carbon atoms having in total at least two fluorine atoms bonded thereto. Addition of polymer (D) ensures uniform development throughout the resist film, enabling to form a resist pattern having high CD uniformity.

Abstract: Provided are a preparation method of a resist composition which enables stabilization of a dissolution performance of a resist film obtained from the resist composition thus prepared; and a resist composition obtained by the preparation process and showing small lot-to-lot variations in degradation over time. The process of the present invention is for preparing a chemically amplified resist composition containing a binder, an acid generator, a nitrogenous basic substance and a solvent and it has steps of selecting, as the solvent, a solvent having a peroxide content not greater than an acceptable level, and mixing constituent materials of the resist composition in the selected solvent.

Abstract: A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 ?m, the composition exhibits a high resolution in that a resist coating formed from the composition can be processed into such a fine size pattern while the formation of bridges between pattern features is minimized.

Abstract: A weather strip has a trim part 5 to be attached to a peripheral part of a door opening corresponding to a door and a sealing part projecting from the trim part 5 and having a hollow part. The weather strip is obtainable by coating a treatment liquid containing a simple sulfur, a sulfur compound, or both of the simple sulfur and the sulfur compound on an outer surface of the sealing part of an extruded, non-vulcanized, and non-foamed intermediate molded body and vulcanizing and foaming the intermediate molded body by passing the intermediate molded body through a heating zone. By the above production steps, in the trim part, a skin layer that is harder than a sponge layer is formed on the sponge layer and a superficial part of the trim part. The skin layer has a width of 10 mm or more in a width direction and a uniform thickness set in a range of 0.04 mm to 0.15 mm.

Abstract: A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from collapsing after development, and has improved etch resistance.

Abstract: There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition that exhibit higher resolution than conventional positive resist compositions, good in-plane dimension uniformity of developed resist patterns on substrates such as mask blanks and high etching resistance.

Abstract: A glass run includes a main body portion and a pair of seal lips. Further, the glass run is constituted by a vehicle exterior side molded member and a vehicle interior side molded member divided at a bottom portion of the main body portion. Further, the vehicle exterior side molded member and the vehicle interior side molded member include engaging portions for engaging to be integrated with each other. By integrating the vehicle exterior side molded member and the vehicle interior side molded member by the engaging portions, the vehicle exterior side molded member is restricted from being shifted to move relative to the vehicle interior side molded member in a vehicle width direction and in a longitudinal direction of the vehicle interior side molded member.

Abstract: A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), an organic solvent, a crosslinker, and an optional photoacid generator. In formula (1), R1 and R2 are hydrogen or methyl, m is 0 or a positive integer of 1 to 5, p and q are positive numbers. The composition has a high contrast of alkali dissolution rate before and after exposure, high resolution and good etching resistance.

Abstract: An efficient coating machine capable of hardening coating on works in a short hardening time with a small-sized hardening oven at reduced costs. The coating machine has a painting booth, a hardening oven and a work transfer device. The work transfer device has a rotary shaft provided at a center of the coating machine, and a plurality of hangers, each holding one piece of work and being turnable about the rotary shaft. The painting booth and the hardening oven are arranged around the rotary shaft into an arc-shaped configuration, respectively. The hardening oven has an arc-shaped work passage adapted to move the works. One piece of work is coated in the painting booth and continuously transferred to the work passage of the hardening oven while being held with each of the hangers and turned about the rotary shaft. In the work passage, the work is blown with hot air fed from a hot air generating device for hardening the coating on the work.

Abstract: A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), a photoacid generator, and a crosslinker. In formula (1), X is alkyl or alkoxy, R1 and R2 are H, OH, alkyl, substitutable alkoxy or halogen, R3 and R4 are H or CH3, n is an integer of 1 to 4, m and k are an integer of 1 to 5, p, q and r are positive numbers. The composition has a high contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution and good etching resistance.

Abstract: The object of the present invention is to provide a method of reclaiming crosslinked rubber wherein a reduction of qualities due to generation of decomposed products hardly occurs, and a molding of reclaimed rubber. In a reclamation step of reclaiming crosslinked rubber 10 by applying shear stress thereto and/or in a subsequent step in the present invention, a degasification carrier is introduced and decomposed products in the crosslinked rubber 10 are removed together with the degasification carrier. Also the disclosed is a molding of reclaimed rubber prepared by re-crosslinking reclaimed rubber obtained by this method.

Abstract: The object of the present invention is to provide a method of reclaiming crosslinked rubber, which can reclaim various kinds of crosslinked rubbers whose reclamation is difficult. The method of reclaiming crosslinked rubber 10 of the present invention includes a step of reclaiming crosslinked rubber by applying shear stress to the crosslinked rubber 10, wherein the maximum pressure in the reclaiming step is 1.5 MPa or more.

Abstract: There is disclosed a wear resistant surface layer composed of 40 to 70 wt. % cobalt or cobalt base alloy as binder and the balance is substantially chromium oxide particles.