Abstract: Embodiments of a microelectronic assembly that includes: a package substrate, comprising buildup layers of an organic dielectric material and a plurality of layers of conductive traces in the organic dielectric material, the package substrate having a first surface and a second surface opposite the first surface; and a plurality of integrated circuit (IC) dies coupled to the package substrate on the first side. The plurality of layers of conductive traces comprises a pair of stripline traces or microstrips in one of the layers, the stripline traces or microstrips are surrounded by air gap structures in the organic dielectric material, and the air gap structures are exposed on the first surface.

Abstract: A device comprises a substrate and an IC die, which may be a photonic IC. The substrate comprises a first surface, a second surface opposite the first surface, an optical waveguide integral with the substrate, and a hole extending from the first surface to the second surface. The hole comprises a first sidewall. The optical waveguide is between the first surface and the second surface, parallel to the first surface, and comprises a first end which extends to the first sidewall. The IC die is within the hole and comprises a second sidewall and an optical port at the second sidewall. The second sidewall is proximate to the first sidewall and the first end of the optical waveguide is proximate to and aligned with the optical port. The substrate may include a recess to receive another device comprising a socket.

Abstract: An electronic device includes a substrate including a core layer; a cavity formed in the core layer, wherein the cavity includes sidewalls plated with a conductive material; a prefabricated passive electronic component disposed in the cavity; and a cavity sidewall connection providing electrical continuity from the plated cavity sidewalls to a first surface of the substrate and to a second surface of the substrate.

Abstract: Disclosed herein are microelectronic structures including bridges, as well as related assemblies and methods. In some embodiments, a microelectronic structure may include a substrate and a bridge.

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic component may include a substrate having a first face and an opposing second face, wherein the substrate includes a through-substrate via (TSV); a first mold material region at the first face, wherein the first mold material region includes a first through-mold via (TMV) conductively coupled to the TSV; and a second mold material region at the second face, wherein the second mold material region includes a second TMV conductively coupled to the TSV.

Abstract: Optical connectors with alignment features, and methods of forming the same, are disclosed herein. In one example, an optical ferrule includes holes to couple a fiber array to the optical ferrule, a mating protrusion to mate with an optical receptacle, and alignment features to align the fiber array with optical waveguides in the optical receptacle. The optical receptacle includes the optical waveguides, a mating cavity to mate with the mating protrusion on the optical ferrule, and alignment features to mate with the alignment features on the optical ferrule.

Abstract: In one embodiment, an integrated circuit device includes a substrate, an electronic integrated circuit (EIC), a photonics integrated circuit (PIC) electrically coupled to the EIC, and a glass block at least partially in a cavity defined by the substrate and at an end of the substrate. The glass block defines an optical path with one or more optical elements to direct light between the PIC and a fiber array unit (FAU) when attached to the glass block.

Abstract: Embodiments herein relate to systems, apparatuses, or processes for forming a silicide and a silicon nitrate layer between a copper feature and dielectric to reduce delamination of the dielectric. Embodiments allow an unroughened surface for the copper feature to reduce the insertion loss for transmission lines that go through the unroughened surface of the copper. Embodiments may include sequential interlayers between a dielectric and copper. Other embodiments may be described and/or claimed.

Abstract: A glass substrate houses an embedded multi-die interconnect bridge that is part of a semiconductor device package. Through-glass vias communicate to a surface for mounting on a semiconductor package substrate.

Abstract: In one embodiment, a substrate includes a glass core layer defining a plurality of holes between a first side of the glass core layer and a second side of the glass core layer opposite the first side and a conductive metal inside the holes of the glass core layer. The conductive metal electrically couples the first side of the glass core layer and the second side of the glass core layer. The substrate also includes a dielectric material between the conductive metal and the inside surfaces of the holes of the glass core layer.

Abstract: In one embodiment, a substrate includes a glass core layer defining a plurality of holes between a first side of the glass core layer and a second side of the glass core layer opposite the first side and a conductive metal inside the holes of the glass core layer. The conductive metal electrically couples the first side of the glass core layer and the second side of the glass core layer. The substrate also includes a dielectric material between the conductive metal and the inside surfaces of the holes of the glass core layer.

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic component may include a substrate having a first face and an opposing second face, wherein the substrate includes a through-substrate via (TSV); a first mold material region at the first face, wherein the first mold material region includes a first through-mold via (TMV) conductively coupled to the TSV; and a second mold material region at the second face, wherein the second mold material region includes a second TMV conductively coupled to the TSV.

Abstract: Embodiments disclosed herein include electronic packages with thermal solutions. In an embodiment, an electronic package comprises a package substrate, a first die electrically coupled to the package substrate, and an integrated heat spreader (IHS) that is thermally coupled to a surface of the first die. In an embodiment, the IHS comprises a main body having an outer perimeter, and one or more legs attached to the outer perimeter of the main body, wherein the one or more legs are supported by the package substrate. In an embodiment, the electronic package further comprises a thermal block between the package substrate and the main body of the IHS, wherein the thermal block is within the outer perimeter of the main body.

Abstract: A glass substrate houses an embedded multi-die interconnect bridge that is part of a semiconductor device package. Through-glass vias communicate to a surface for mounting on a semiconductor package substrate.

Abstract: A microelectronic structure, a semiconductor package including the same, and a method of forming same. The microelectronic structures includes: a substrate defining a cavity therein; a bridge die within the cavity, the bridge die to electrically couple a pair of dies to be provided on a surface of the substrate; an electrical coupling layer between a top surface of the cavity and a bottom surface of the bridge die. The electrical coupling layer includes: a non-conductive component including a die bonding film and defining holes therein; and electrically conductive structures in the holes, the electrically conductive structures electrically coupling the substrate with the bridge die.

Abstract: In one embodiment, a package substrate includes a substrate core, buildup layers, and one or more conductive traces. The substrate core includes at least one dielectric layer with hollow glass fibers. The buildup layers include dielectric layers below and above the substrate core.

Abstract: Embodiments disclosed herein include electronic packages and methods of forming such packages. In an embodiment an electronic package comprises a package substrate, and a first level interconnect (FLI) bump region on the package substrate. In an embodiment, the FLI bump region comprises a plurality of pads, and a plurality of bumps, where each bump is over a different one of the plurality of pads. In an embodiment, the electronic package further comprises a guard feature adjacent to the FLI bump region. In an embodiment, the guard feature comprises, a guard pad, and a guard bump over the guard pad, wherein the guard feature is electrically isolated from circuitry of the electronic package.

Abstract: Embodiments herein describe techniques for a semiconductor device including a package substrate having a core layer. An inductor may include a first coaxial line and a second coaxial line vertically through the core layer, and an interconnect within the package substrate coupling the first coaxial line and the second coaxial line. A first magnetic segment may surround the first coaxial line within the core layer, and a second magnetic segment may surround the second coaxial line within the core layer. In addition, a third magnetic segment may surround the interconnect and be coupled to the first magnetic segment and the second magnetic segment. Other embodiments may be described and/or claimed.

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a glass substrate, having a surface, including a through-glass-substrate via (TGV) and a cavity on the surface; a first die nested in the cavity; an insulating material on the surface of the glass substrate; a first conductive pillar and a second conductive pillar through the insulating material; a capacitor, in the insulating material, including a first conductive layer, on the surface of the glass substrate, electrically coupled to the TGV and the first conductive pillar forming a first plate of the capacitor, a dielectric layer on the first conductive layer; and a second conductive layer, on the dielectric layer, electrically coupled to the second conductive pillar forming a second plate of the capacitor; and a second die, on the insulating material, electrically coupled to the first die.

Abstract: Microelectronic assemblies including photonic integrated circuits (PICs), related devices and methods, are disclosed herein. For example, in some embodiments, a photonic assembly may include an integrated circuit (IC) in a first layer, wherein the first layer includes a substrate having a first surface, an opposing second surface, and a lateral surface substantially perpendicular to the first and second surfaces, wherein the substrate includes a waveguide between the first and second surfaces, and wherein and the IC is nested in a cavity in the substrate; a PIC in a second layer, wherein the second layer is on the first layer and an active surface of the PIC faces the first layer, and wherein the IC is electrically coupled to the active side of the PIC; and an optical component optically coupled to the active surface of the PIC and the waveguide in the substrate at the second surface.