Patents by Inventor Tatsuo Miyazaki

Tatsuo Miyazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130008781
    Abstract: A fluorine gas generating apparatus includes an electrolytic cell where the molten salt is retained and which is separated and divided above the liquid level of the molten salt into a first gas chamber where a product gas mainly containing a fluorine gas generated at an anode immersed in the molten salt is led and a second gas chamber where a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt is led, and a refining device refining the fluorine gas by coagulating with a cooling medium and trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode. The cooling medium for coagulation of the hydrogen fluoride gas in the refining device and discharged is re-used as a utility gas used at spots in the fluorine gas generating apparatus.
    Type: Application
    Filed: November 30, 2010
    Publication date: January 10, 2013
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Akiou Kikuchi, Akifumi Yao, Tatsuo Miyazaki, Nobuyuki Tokunaga
  • Publication number: 20120318665
    Abstract: [Object] To provide a fluorine gas generating system which can stably supply high purity fluorine gas while preventing blockade of a purification apparatus for adsorbing and removing hydrogen fluoride. [Solving means] A fluorine gas generating system characterized by including a purification apparatus 20 for adsorbing and removing hydrogen fluoride vaporized from a molten salt of an electrolysis tank 1 and mixed in fluorine gas generated at an anode 7, in which the purification apparatus 20 includes a cylindrical member through which main-product gas containing fluorine gas generated in the electrolysis tank 1 flows, a temperature regulator for regulating temperature of the cylindrical member, and an adsorbent holder disposed inside the cylindrical member, the adsorbent holder being disposed to form an aperture for securing a flow passage of the main-product gas inside the cylindrical member.
    Type: Application
    Filed: February 24, 2011
    Publication date: December 20, 2012
    Applicant: Central Glass Company, Limited
    Inventors: Tatsuo Miyazaki, Akifumi Yao, Takuya Kita
  • Publication number: 20120241313
    Abstract: A fluorine gas generating apparatus generating a fluorine gas by electrolyzing hydrogen fluoride in molten salt, includes: an electrolytic cell including, above a liquid level of molten salt, a first gas chamber into which a product gas mainly containing the fluorine gas generated at an anode immersed in the molten salt and a second gas chamber separated from the first gas chamber into which a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt; a hydrogen fluoride supply source retaining hydrogen fluoride to be replenished in the electrolytic cell; a refining device trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode to refine the fluorine gas; and a recovery facility conveying and recovering the hydrogen fluoride trapped in the refining device in the electrolytic cell or the hydrogen fluoride supply source.
    Type: Application
    Filed: November 25, 2010
    Publication date: September 27, 2012
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Akifumi Yao, Tatsuo Miyazaki, Yosuke Nakamura, Keita Nakahara, Nobuyuki Tokunaga
  • Publication number: 20120100491
    Abstract: A semiconductor production equipment includes a fluorine gas generator, and a detoxification device for combusting a waste gas containing a fluorine-based gas. The fluorine gas generator is configured to electrolyze hydrogen fluoride in an electrolytic bath of a molten salt containing hydrogen fluoride to generate a main product gas whose major component is fluorine gas at an anode side and generate a by-product gas whose major component is hydrogen at a cathode side. The semiconductor production equipment further includes a lead-out line for introducing the by-product gas generated from the fluorine gas generator to the detoxification device. The detoxification device includes a mechanism for using the by-product gas sent to the detoxification device as a combustion agent.
    Type: Application
    Filed: January 15, 2010
    Publication date: April 26, 2012
    Applicant: Central Glass Company, Limited
    Inventors: Isamu Mori, Akifumi Yao, Kenji Tanaka, Tatsuo Miyazaki
  • Publication number: 20120085640
    Abstract: A fluorine gas generation device includes an electrolytic cell that electrolyzes hydrogen fluoride in an electrolytic bath constituted of a molten salt containing hydrogen fluoride. The fluorine gas generation device liquefies and circulates a hydrogen fluoride gas vaporized from the molten salt and mist derived from the molten salt which is entrained on the gases generated by using a circulating device connected to a pipe on an upper portion of the electrolytic cell, thereby returning the hydrogen fluoride gas and the mist derived from the molten salt to the electrolytic cell.
    Type: Application
    Filed: May 12, 2010
    Publication date: April 12, 2012
    Applicant: Central Glass Company, Limited
    Inventors: Tatsuo Miyazaki, Isamu Mori
  • Publication number: 20120031752
    Abstract: A fluorine gas generating device 100 is provided which facilitates the maintenance operation of recovery and replacement of an adsorbing material that adsorbs hydrogen fluoride and supplies fluorine gas in a stable manner. The device comprises a refining line 20 that includes refining devices that, with the aid of adsorbing material, remove hydrogen fluoride gas that has been evaporated from a molten salt of an electrolytic tank 1 and mixed to fluorine gas generated at a positive pole 103a of the electrolytic tank. The refining line 20 comprises a first refining section 21 that includes at least two refining devices arranged in parallel and a second refining section 22 that includes at least two refining devices arranged in parallel and is positioned downstream of the first refining section 21. Fluorine gas that has passed through either one of the refining devices of the first refining section 21 is selectively led to either one of the refining devices of the second refining section.
    Type: Application
    Filed: March 29, 2010
    Publication date: February 9, 2012
    Applicant: Central Glass Company, Limited
    Inventors: Isamu Mori, Tatsuo Miyazaki, Akifumi Yao, Takuya Kita
  • Publication number: 20120006487
    Abstract: [Task] It is a task to provide a fluorine gas supply system which can stably supply fluorine gas generated by a fluorine gas generation device to a semiconductor processing device in a large quantity and in a precise concentration. [Means for solving task] In the fluorine gas supply system, a mixed gas stored in a buffer tank is introduced into a gas introducing piping before the mixed gas is adjusted in the buffer tank to circulate the mixed gas and a monitoring device is disposed which measures a fluorine gas concentration within the mixed gas so that, in response to the obtained fluorine gas concentration, a flow quantity of inert gas supply source can be adjusted.
    Type: Application
    Filed: February 26, 2010
    Publication date: January 12, 2012
    Applicant: Central Glass Company, Limited
    Inventors: Akiou Kikuchi, Isamu Mori, Akifumi Yao, Tatsuo Miyazaki, Keita Nakahara
  • Publication number: 20100015672
    Abstract: A transformant is prepared to insert at least a gene expression cassette comprising a gene involved in the synthesis of 2-deoxy-scyllo-inosose into E. coli as host cells. A 2-deoxy-scyllo-inosose is synthesized from D-glucose, oligosaccharide, polysaccharide, starch and rice bran, using the transformant. A culture solution containing the 2-deoxy-scyllo-inosose is treated with a mixed bed or double bed type column comprising a hydrogen form of strong acidic cation exchange resin and an organic ion form of basic anion exchange resin. The 2-deoxy-scyllo-inosose as purified is reacted with trimethoxymethane to convert into 2-deoxy-scyllo-inosose dimethylketal, and the dimethylketal is crystallized and purified. Then, DOI is highly purified through hydrolyzing the dimethylketal in the presence of acid.
    Type: Application
    Filed: March 23, 2006
    Publication date: January 21, 2010
    Applicants: Niigata Bio-Research Center, Inc., Mitsui Chemicals, Inc.
    Inventors: Masamichi Takagi, Takahisa Kogure, Naoki Wakisaka, Hiroaki Takaku, Katsumi Ajisaka, Tatsuo Miyazaki, Masao Hirayama
  • Publication number: 20090068083
    Abstract: A process for synthesizing a halogenated nitrogen represented by a formula of NFxL3-x, where L represents a halogen other than fluorine, and 1?x?3 is provided. This process includes the step of (a) reacting an ammonium complex compound that is one selected from the group consisting of NH4F.nHF, (NH4)yMFz.mHF and a mixture of these and that is in liquid form, with an interhalogen compound or a mixture of an interhalogen compound and F2 gas, wherein 1<n, 1?y?4, 2?z?8, 0.1?m, and M represents one selected from the group consisting of elements of group 1 to group 16 of periodic table and a mixed element of these elements.
    Type: Application
    Filed: June 16, 2006
    Publication date: March 12, 2009
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Isamu Mori, Tatsuo Miyazaki
  • Patent number: 6835440
    Abstract: A light guide plate of the present invention is characterized by being obtained by melt molding a thermoplastic resin having a melt flow rate of at least 50 [g/10 min.] under a load of 2.16 kgf at 280° C. The thermoplastic resin is preferably a thermoplastic resin containing an alicyclic structure, more preferably a norbornene-based polymer.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: December 28, 2004
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Yuichiro Konishi, Kazuyuki Obuchi, Tatsuo Miyazaki, Issei Ishimaru
  • Patent number: 5597498
    Abstract: There is disclosed a method for the plasma arc welding of corrugate membranes, which can prevent a welding failure from occurring around the corrugate portion. In this welding method, NC data for robot control are modified so as to gradually change a torch angle around the R portions at a rate not greater than the maximum angular velocity and increase a welding speed around the R portions of foot regions of corrugate portions 1B and 2B and the R portion of an apex 22 before a welding torch 12 reaches the R portions. Three parameters are prepared for determining the deformation of the corrugate portions 1B and 2B in terms of height, width of the foot regions and the swell of the trunk portion. Data indicative of the height and foot width of the corrugate portion measured by a laser displacement sensor 15 are compared with standard corrugation NC data, and the NC data for robot control are modified to correct the height, foot width and swell degree thereof by utilizing the parameters.
    Type: Grant
    Filed: July 24, 1995
    Date of Patent: January 28, 1997
    Assignee: Hitachi Zosen Corporation
    Inventors: Kazuyuki Sunayama, Kunio Miyawaki, Minoru Ohno, Tatsuo Miyazaki
  • Patent number: 4531039
    Abstract: An automatic valve seat build-up welding apparatus for a Y-type main steam isolation globe valve used in an atomic power station is disclosed which is characterized in that the valve seat can be build-up welded on the spot by the welding torch introduced into the valve box with the welding operation being carried out remotely from the spot and viewed by an image sensor positioned near the welding torch so that the exposure of an operator to a radioactive environment is prevented.
    Type: Grant
    Filed: December 21, 1982
    Date of Patent: July 23, 1985
    Assignee: Okano Valve Seizo Kabushiki Kaisha
    Inventors: Masami Okano, Akimasa Tanaka, Takeshi Suzuki, Akira Ishida, Tatsuo Miyazaki