Patents by Inventor Tatsuya Hitomi

Tatsuya Hitomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240254389
    Abstract: A silicon etching solution containing an organic alkaline compound and water, the silicon etching solution further containing a compound represented by Formula (1) below, wherein a content of the compound represented by Formula (1) is 100 mass ppm or more: where R1 is a single bond or a hydrocarbon group having carbon number from 1 to 5, R2 and R3 are each independently a hydrogen atom, a halogen atom, a hydroxy group, an amino group, an acetyl group, a carboxy group, a silyl group, a boryl group, a nitrile group, a thio group, a seleno group, or a hydrocarbon group having carbon number from 1 to 10, and these groups optionally further have a substituent.
    Type: Application
    Filed: December 22, 2023
    Publication date: August 1, 2024
    Applicant: TOKUYAMA CORPORATION
    Inventors: Yoshiki SEIKE, Tatsuya HITOMI, Kohsuke NORO
  • Publication number: 20240170293
    Abstract: An etching solution has a high etching selectivity of silicon with respect to silicon-germanium and having high stability over time at a treating temperature in surface processing in manufacturing various semiconductor devices, particularly in various silicon composite semiconductor devices containing silicon-germanium. The silicon etching solution contains a compound having at least one carboxy group and having all pKa of 3.5 or more and 13 or less, or a salt thereof; an organic alkali; and water.
    Type: Application
    Filed: November 21, 2023
    Publication date: May 23, 2024
    Applicant: Tokuyama Corporation
    Inventors: Tatsuya Hitomi, Yoshiki Seike, Kohsuke Noro
  • Publication number: 20240170294
    Abstract: In etching of a single crystal silicon substrate having a Si crystal plane ((100) plane, (110) plane, and (111) plane) as a main plane, an etching rate on the (110) plane cannot be sufficiently reduced, and there is room for improvement in an etching rate ratio between the (110) plane and the (111) plane. An object of the present invention is to provide a silicon etching solution having excellent crystal plane isotropy in silicon etching and having a high etching selectivity ratio of silicon to a silicon oxide film. The problem is solved by a silicon etching solution containing: an acid group-containing compound having at least one acid group selected from the group consisting of a carboxy group, a sulfonic acid group, a phosphoric acid group, and a phosphonic acid group, and having pKa of 3.5 or more and 13 or less; a quaternary ammonium hydroxide; an oxidizing agent; and water.
    Type: Application
    Filed: November 21, 2023
    Publication date: May 23, 2024
    Applicant: Tokuyama Corporation
    Inventors: Tatsuya Hitomi, Yoshiki Seike, Kohshiro Okimura, Kohsuke Noro
  • Publication number: 20240067878
    Abstract: A silicon etching solution including an aqueous alkaline solution containing a hypohalite ion in a range of 0.05 mmol/L or greater and 5 mmol/L or less and having a pH of 12.5 or greater at 24° C.
    Type: Application
    Filed: August 29, 2023
    Publication date: February 29, 2024
    Applicant: TOKUYAMA CORPORATION
    Inventors: Tatsuya HITOMI, Yoshiki SEIKE, Kohsuke NORO, Kohshiro OKIMURA
  • Publication number: 20200377650
    Abstract: There is provided a polyester resin including a 2,5-furandicarboxylic acid unit and a cyclohexanedimethanol unit in a main chain, in which the polyester resin is high in molecular weight, has heat resistance and hydrolysis resistance, and is excellent in mechanical properties and melt heat stability. There is also provided a method for producing a polyester resin having the above characteristics. A polyester resin including a 2,5-furandicarboxylic acid unit and a 1,4-cyclohexanedimethanol unit as main constituent components, wherein the following (I) and (II) are satisfied: (I) the reduced viscosity (?sp/c) is 0.7 dL/g or more; and (II) the sum of a cyclovinylidene terminal and a methylcyclohexene terminal is 80 ?eq/g or less.
    Type: Application
    Filed: August 20, 2020
    Publication date: December 3, 2020
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Rie SHIRAHAMA, Tatsuya HITOMI, Atsushi KASAI
  • Patent number: 10815334
    Abstract: There is provided a polyester resin including a 2,5-furandicarboxylic acid unit and a cyclohexanedimethanol unit in a main chain, in which the polyester resin is high in molecular weight, has heat resistance and hydrolysis resistance, and is excellent in mechanical properties and melt heat stability. There is also provided a method for producing a polyester resin having the above characteristics. A polyester resin including a 2,5-furandicarboxylic acid unit and a 1,4-cyclohexanedimethanol unit as main constituent components, wherein the following (I) and (II) are satisfied: (I) the reduced viscosity (?sp/c) is 0.7 dL/g or more; and (II) the sum of a cyclovinylidene terminal and a methylcyclohexene terminal is 80 ?eq/g or less.
    Type: Grant
    Filed: March 5, 2018
    Date of Patent: October 27, 2020
    Assignee: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Rie Shirahama, Tatsuya Hitomi, Atsushi Kasai
  • Publication number: 20180186927
    Abstract: There is provided a polyester resin including a 2,5-furandicarboxylic acid unit and a cyclohexanedimethanol unit in a main chain, in which the polyester resin is high in molecular weight, has heat resistance and hydrolysis resistance, and is excellent in mechanical properties and melt heat stability. There is also provided a method for producing a polyester resin having the above characteristics. A polyester resin including a 2,5-furandicarboxylic acid unit and a 1,4-cyclohexanedimethanol unit as main constituent components, wherein the following (I) and (II) are satisfied: (I) the reduced viscosity (?sp/c) is 0.7 dL/g or more; and (II) the sum of a cyclovinylidene terminal and a methylcyclohexene terminal is 80 ?eq/g or less.
    Type: Application
    Filed: March 5, 2018
    Publication date: July 5, 2018
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Rie SHIRAHAMA, Tatsuya Hitomi, Atsushi Kasai
  • Patent number: 9777152
    Abstract: To provide a polycarbonate resin composition excellent in surface hardness and impact strength. A polycarbonate resin composition comprising at least a polycarbonate resin (a) and a polycarbonate resin (b) having structural units different from the polycarbonate resin (a), which satisfies the requirements: (i) the pencil hardness of the polycarbonate resin (a) as specified by ISO15184 is higher than the pencil hardness of the polycarbonate resin (b) as specified by ISO15184; (ii) the weight ratio of the polycarbonate resin (a) to the polycarbonate resin (b) in the polycarbonate resin is from 1:99 to 45:55; (iii) the pencil hardness of the polycarbonate resin composition as specified by ISO15184 is higher by at least two ranks than the pencil hardness of the polycarbonate resin (b) as specified by ISO15184; and (iv) the Charpy impact strength of the polycarbonate resin composition is higher than the Charpy impact strength of the polycarbonate resin (a).
    Type: Grant
    Filed: October 1, 2012
    Date of Patent: October 3, 2017
    Assignees: Mitsubishi Chemical Corporation, Mitsubishi Engineering-Plastics Corporation
    Inventors: Tatsuya Hitomi, Ryouhei Nishihara, Masanori Yamamoto, Michio Nakata, Tetsurou Nobuyasu, Ryuuji Uchimura, Kazuyuki Takahashi, Kenji Tsuruhara, Tomonari Yokoyama
  • Patent number: 9771477
    Abstract: To provide a polycarbonate resin composition excellent in the surface hardness, the heat resistance, the moldability and the flame retardancy. A polycarbonate resin composition comprising at least a polycarbonate resin (a) and a polycarbonate resin (b) having structural units different from the polycarbonate resin (a), which satisfies the following requirements: (i) the pencil hardness of the polycarbonate resin (a) as specified by ISO 15184 is higher than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184; (ii) the glass transition point Tg(a) of the polycarbonate resin (a) and the glass transition point Tg(b) of the polycarbonate resin (b) satisfy the relation of the following (Formula 1): Tg(b)?45° C. <Tg(a)<Tg(b)?10° C.??(Formula 1): and (iii) the pencil hardness of the polycarbonate resin composition as specified by ISO 15184 is higher by at least two ranks than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184.
    Type: Grant
    Filed: April 28, 2016
    Date of Patent: September 26, 2017
    Assignees: Mitsubishi Chemical Corporation, Mitsubishi Engineering-Plastics Corporation
    Inventors: Tatsuya Hitomi, Ryouhei Nishihara, Masanori Yamamoto, Michio Nakata, Tetsurou Nobuyasu, Ryuuji Uchimura, Kazuyuki Takahashi, Kenji Tsuruhara, Tomonari Yokoyama
  • Patent number: 9522519
    Abstract: To provide a polycarbonate resin laminate having the surface hardness remarkably improved and being excellent in color and impact resistance.
    Type: Grant
    Filed: February 3, 2014
    Date of Patent: December 20, 2016
    Assignees: Mitsubishi Chemical Corporation, Mitsubishi Engineering-Plastics Corporation
    Inventors: Tatsuya Hitomi, Ryouhei Nishihara, Kiyotaka Hirano, Yoshitaka Shiraishi, Masanori Yamamoto, Tomonari Yokoyama, Masahide Shidou
  • Publication number: 20160237276
    Abstract: To provide a polycarbonate resin composition excellent in the surface hardness, the heat resistance, the moldability and the flame retardancy. A polycarbonate resin composition comprising at least a polycarbonate resin (a) and a polycarbonate resin (b) having structural units different from the polycarbonate resin (a), which satisfies the following requirements: (i) the pencil hardness of the polycarbonate resin (a) as specified by ISO 15184 is higher than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184; (ii) the glass transition point Tg(a) of the polycarbonate resin (a) and the glass transition point Tg(b) of the polycarbonate resin (b) satisfy the relation of the following (Formula 1): Tg(b)?45° C.<Tg(a)<Tg(b)?10° C.??(Formula 1) and (iii) the pencil hardness of the polycarbonate resin composition as specified by ISO 15184 is higher by at least two ranks than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184.
    Type: Application
    Filed: April 28, 2016
    Publication date: August 18, 2016
    Applicants: Mitsubishi Chemical Corporation, Mitsubishi Engineering-Plastics Corporation
    Inventors: Tatsuya HITOMI, Ryouhei NISHIHARA, Masanori YAMAMOTO, Michio NAKATA, Tetsurou NOBUYASU, Ryuuji UCHIMURA, Kazuyuki TAKAHASHI, Kenji TSURUHARA, Tomonari YOKOYAMA
  • Patent number: 9193825
    Abstract: The present invention relates to a polycarbonate resin having, in the molecule, at least a structural unit represented by the following formula (1), wherein the terminal hydroxyl group concentration of the polycarbonate resin is 300 ppm or less: wherein each of R1 and R2 independently represents a substituted or unsubstituted alkyl group having a carbon number of 1 to 20 or a substituted or unsubstituted aryl group, and X represents a single bond, a carbonyl group, a substituted or unsubstituted alkylidene group, a substituted or unsubstituted sulfur atom, or an oxygen atom.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: November 24, 2015
    Assignee: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Masahide Shidou, Tatsuya Hitomi
  • Publication number: 20150018510
    Abstract: The present invention relates to a polycarbonate resin having, in the molecule, at least a structural unit represented by the following formula (1), wherein the terminal hydroxyl group concentration of the polycarbonate resin is 300 ppm or less: wherein each of R1 and R2 independently represents a substituted or unsubstituted alkyl group having a carbon number of 1 to 20 or a substituted or unsubstituted aryl group, and X represents a single bond, a carbonyl group, a substituted or unsubstituted alkylidene group, a substituted or unsubstituted sulfur atom, or an oxygen atom.
    Type: Application
    Filed: September 30, 2014
    Publication date: January 15, 2015
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Masahide SHIDOU, Tatsuya Hitomi
  • Publication number: 20140147651
    Abstract: To provide a polycarbonate resin laminate having the surface hardness remarkably improved and being excellent in color and impact resistance.
    Type: Application
    Filed: February 3, 2014
    Publication date: May 29, 2014
    Applicants: MITSUBISHI ENGINEERING-PLASTICS CORPORATION, MITSUBISHI CHEMICAL CORPORATION
    Inventors: Tatsuya HITOMI, Ryouhei Nishihara, Kiyotaka Hirano, Yoshitaka Shiraishi, Masanori Yamamoto, Tomonari Yokoyama, Masahide Shidou
  • Publication number: 20140018498
    Abstract: To provide a polycarbonate resin composition excellent in the surface hardness, the heat resistance, the moldability and the flame retardancy. A polycarbonate resin composition comprising at least a polycarbonate resin (a) and a polycarbonate resin (b) having structural units different from the polycarbonate resin (a), which satisfies the following requirements: (i) the pencil hardness of the polycarbonate resin (a) as specified by ISO 15184 is higher than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184; (ii) the glass transition point Tg(a) of the polycarbonate resin (a) and the glass transition point Tg(b) of the polycarbonate resin (b) satisfy the relation of the following (Formula 1): Tg(b)?45° C.<Tg(a)<Tg(b)?10° C.??(Formula 1) (iii) the pencil hardness of the polycarbonate resin composition as specified by ISO 15184 is higher by at least two ranks than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184.
    Type: Application
    Filed: September 12, 2013
    Publication date: January 16, 2014
    Applicants: Mitsubishi Engineering-Plastics Corporation, Mitsubishi Chemical Corporation
    Inventors: Tatsuya HITOMI, Ryouhei NISHIHARA, Masanori YAMAMOTO, Michio NAKATA, Tetsurou NOBUYASU, Ryuuji UCHIMURA, Kazuyuki TAKAHASHI, Kenji TSURUHARA, Tomonari YOKOYAMA
  • Publication number: 20130030112
    Abstract: To provide a polycarbonate resin composition excellent in the surface hardness, the heat resistance, the moldability and the flame retardancy. A polycarbonate resin composition comprising at least a polycarbonate resin (a) and a polycarbonate resin (b) having structural units different from the polycarbonate resin (a), which satisfies the following requirements: (i) the pencil hardness of the polycarbonate resin (a) as specified by ISO 15184 is higher than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184; (ii) the glass transition point Tg(a) of the polycarbonate resin (a) and the glass transition point Tg(b) of the polycarbonate resin (b) satisfy the relation of the following (Formula 1): Tg(b)?45° C.<Tg(a)<Tg(b)?10° C.??(Formula 1) and (iii) the pencil hardness of the polycarbonate resin composition as specified by ISO 15184 is higher by at least two ranks than the pencil hardness of the polycarbonate resin (b) as specified by ISO 15184.
    Type: Application
    Filed: October 1, 2012
    Publication date: January 31, 2013
    Inventors: Tatsuya HITOMI, Ryouhei NISHIHARA, Masanori YAMAMOTO, Michio NAKATA, Tetsurou NOBUYASU, Ryuuji UCHIMURA, Kazuyuki TAKAHASHI, Kenji TSURUHARA, Tomonari YOKOYAMA
  • Publication number: 20130030113
    Abstract: To provide a polycarbonate resin composition excellent in surface hardness and impact strength. A polycarbonate resin composition comprising at least a polycarbonate resin (a) and a polycarbonate resin (b) having structural units different from the polycarbonate resin (a), which satisfies the requirements: (i) the pencil hardness of the polycarbonate resin (a) as specified by ISO15184 is higher than the pencil hardness of the polycarbonate resin (b) as specified by ISO15184; (ii) the weight ratio of the polycarbonate resin (a) to the polycarbonate resin (b) in the polycarbonate resin is from 1:99 to 45:55; (iii) the pencil hardness of the polycarbonate resin composition as specified by ISO15184 is higher by at least two ranks than the pencil hardness of the polycarbonate resin (b) as specified by ISO15184; and (iv) the Charpy impact strength of the polycarbonate resin composition is higher than the Charpy impact strength of the polycarbonate resin (a).
    Type: Application
    Filed: October 1, 2012
    Publication date: January 31, 2013
    Inventors: Tatsuya HITOMI, Ryouhei Nishihara, Masanori Yamamoto, Michio Nakata, Tetsurou Nobuyasu, Ryuuji Uchimura, Kazuyuki Takahashi, Kenji Tsuruhara, Tomonari Yokohama
  • Patent number: 8362191
    Abstract: A polyamide resin comprising a dicarboxylic acid constitutional unit comprising an adipic acid unit and a diamine constitutional unit comprising a pentamethylenediamine unit and a hexamethylenediamine unit wherein a weight ratio of the pentamethylenediamine unit to the hexamethylenediamine unit being in the range of 95:5 to 60:40; a vibration-welded molded product having an excellent vibration welding strength, a hinged molded product and a binding band having an excellent low-temperature toughness, and a filament having an excellent transparency which are obtained from the polyamide resin; and a hinged molded product comprising a polyamide resin constituted of an adipic acid unit and a pentamethylenediamine unit.
    Type: Grant
    Filed: April 26, 2010
    Date of Patent: January 29, 2013
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Masaaki Miyamoto, Tatsuya Hitomi, Yuuichi Nishida
  • Patent number: 8158730
    Abstract: To provide a polyamide resin excellent in lasting thermal stability and having a high biomass ratio. A polyamide resin comprising adipic acid units, pentamethylenediamine units and 6-aminocaproic acid units as constituents, wherein the weight ratio of the sum of the adipic acid units and the pentamethylenediamine units to the 6-aminocaproic acid units is 97:3 to 75:25. The pentamethylenediamine is preferably one produced from lysine using lysine decarboxylase, lysine decarboxylase-producing cells or a treated product of the cells.
    Type: Grant
    Filed: May 10, 2007
    Date of Patent: April 17, 2012
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Masaaki Miyamoto, Tatsuya Hitomi
  • Publication number: 20100206459
    Abstract: A polyamide resin comprising a dicarboxylic acid constitutional unit comprising an adipic acid unit and a diamine constitutional unit comprising a pentamethylenediamine unit and a hexamethylenediamine unit wherein a weight ratio of the pentamethylenediamine unit to the hexamethylenediamine unit being in the range of 95:5 to 60:40; a vibration-welded molded product having an excellent vibration welding strength, a hinged molded product and a binding band having an excellent low-temperature toughness, and a filament having an excellent transparency which are obtained from the polyamide resin; and a hinged molded product comprising a polyamide resin constituted of an adipic acid unit and a pentamethylenediamine unit.
    Type: Application
    Filed: April 26, 2010
    Publication date: August 19, 2010
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Masaaki Miyamoto, Tatsuya Hitomi, Yuuichi Nishida