Patents by Inventor Tatsuya Maeda
Tatsuya Maeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8207512Abstract: The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement.Type: GrantFiled: October 5, 2010Date of Patent: June 26, 2012Assignee: Hitachi High-Technologies CorporationInventors: Chie Shishido, Mayuka Oosaki, Mitsugu Sato, Hiroki Kawada, Tatsuya Maeda
-
Patent number: 8200006Abstract: Information indicating the reason for a failure of template matching is provided. Difference information between a first image, which is referred to as a template, and a third image that is selected by the operator from a second image and that is larger than the template is displayed.Type: GrantFiled: May 4, 2009Date of Patent: June 12, 2012Assignee: Hitachi High-Technologies CorporationInventors: Mitsuji Ikeda, Tatsuya Maeda, Osamu Nasu, Fumihiro Sasajima
-
Patent number: 8199962Abstract: A loudspeaker diaphragm having a small overall height dimension, in which a dome portion has a sufficient rigidity and which is capable of realizing a stable loudspeaker operation, wherein the loudspeaker diaphragm can realize a desirable sound reproduction without noise, or the like, with a frequency response that is flat over a wide range.Type: GrantFiled: August 22, 2008Date of Patent: June 12, 2012Assignee: Onkyo CorporationInventor: Tatsuya Maeda
-
Patent number: 8188427Abstract: A method and apparatus for alignment and astigmatism correction for a scanning electron microscope can prevent an alignment or correction error attributable to the conditions of a particular specimen. First, a difference is determined between optimal values acquired from an automatic axis alignment result on a standard sample, and those obtained from each of a plurality automatic axis alignment results on a observation target sample. An optimal value is then adjusted using the standard sample, by use of the difference thus obtained. Correspondingly, an optimal stigmator value (astigmatism correction signal) is acquired by using the standard sample, and storing the optimal stigmator value as a default value. The optimal stigmator value and the default value depending on the height of an observation target sample pattern are added, and an astigmatism correction is performed on the basis of the resultant stigmator value.Type: GrantFiled: July 30, 2008Date of Patent: May 29, 2012Assignee: Hitachi High-Technologies CorporationInventors: Junichi Kakuta, Kazuhiro Ueda, Tatsuya Maeda, Hiroyuki Saito, Katsuhiro Sasada
-
Patent number: 8124934Abstract: It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an error from an abnormality, the scanning electron microscope extracts a sample image lm(t2) obtained by retroceding from a sample image lm(te) stored so as to be associated with time te of error occurrence by a predetermined video quantity (for example, total recording time period t2) previously set and registered by an input-output device, from sample images stored in a recording device while being overwritten, and stores a resultant sample image in another recording device.Type: GrantFiled: November 4, 2008Date of Patent: February 28, 2012Assignee: Hitachi High-Technologies CorporationInventor: Tatsuya Maeda
-
Publication number: 20110278453Abstract: A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern by using each of the plural scanning electron microscopes.Type: ApplicationFiled: July 26, 2011Publication date: November 17, 2011Inventors: Mayuka Oosaki, Chie Shishido, Hiroki Kawada, Tatsuya Maeda
-
Patent number: 8003940Abstract: A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern formed on a wafer, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern formed on the wafer by using each of the plural scanning electron microscopes.Type: GrantFiled: January 7, 2009Date of Patent: August 23, 2011Assignee: Hitachi High-Technologies CorporationInventors: Mayuka Oosaki, Chie Shishido, Hiroki Kawada, Tatsuya Maeda
-
Publication number: 20110133080Abstract: The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement.Type: ApplicationFiled: October 5, 2010Publication date: June 9, 2011Inventors: Chie SHISHIDO, Mayuka OOSAKI, Mitsugu SATO, Hiroki KAWADA, Tatsuya MAEDA
-
Patent number: 7807980Abstract: The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement.Type: GrantFiled: December 29, 2006Date of Patent: October 5, 2010Assignee: Hitachi High-Technologies CorporationInventors: Chie Shishido, Mayuka Oosaki, Mitsugu Sato, Hiroki Kawada, Tatsuya Maeda
-
Patent number: 7684937Abstract: Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.Type: GrantFiled: April 7, 2008Date of Patent: March 23, 2010Assignee: Hitachi, Ltd.Inventors: Atsuko Yamaguchi, Hiroshi Fukuda, Hiroki Kawada, Tatsuya Maeda
-
Patent number: 7640509Abstract: A program creation apparatus creates a program for a microcomputer that includes an input section, a processor and an output section. The apparatus includes a GUI display section displaying a plurality of icons, each corresponding to each operation of the input section, the processor and the output section, and a program creator creating a program according to manipulation of the icons by a user.Type: GrantFiled: June 5, 2006Date of Patent: December 29, 2009Assignee: NEC Electronics CorporationInventors: Takahisa Gunji, Tatsuya Maeda
-
Publication number: 20090242765Abstract: It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an error from an abnormality, the scanning electron microscope extracts a sample image lm(t2) obtained by retroceding from a sample image lm(te) stored so as to be associated with time te of error occurrence by a predetermined video quantity (for example, total recording time period t2) previously set and registered by an input-output device, from sample images stored in a recording device while being overwritten, and stores a resultant sample image in another recording device.Type: ApplicationFiled: November 4, 2008Publication date: October 1, 2009Inventor: Tatsuya MAEDA
-
Publication number: 20090214122Abstract: Information indicating the reason for a failure of template matching is provided. Difference information between a first image, which is referred to as a template, and a third image that is selected by the operator from a second image and that is larger than the template is displayed.Type: ApplicationFiled: May 4, 2009Publication date: August 27, 2009Applicant: Hitachi High-Technologies CorporationInventors: Mitsuji IKEDA, Tatsuya Maeda, Osamu Nasu, Fumihiro Sasajima
-
Patent number: 7545977Abstract: Information indicating the reason for a failure of template matching is provided. Difference information between a first image, which is referred to as a template, and a third image that is selected by the operator from a second image and that is larger than the template is displayed.Type: GrantFiled: August 7, 2006Date of Patent: June 9, 2009Assignee: Hitachi High-Technologies CorporationInventors: Mitsuji Ikeda, Tatsuya Maeda, Osamu Nasu, Fumihiro Sasajima
-
Publication number: 20090121134Abstract: A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern formed on a wafer, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern formed on the wafer by using each of the plural scanning electron microscopes.Type: ApplicationFiled: January 7, 2009Publication date: May 14, 2009Inventors: Mayuka Oosaki, Chie Shishido, Hiroki Kawada, Tatsuya Maeda
-
Publication number: 20090060251Abstract: A loudspeaker diaphragm having a small overall height dimension, in which a dome portion has a sufficient rigidity and which is capable of realizing a stable loudspeaker operation, wherein the loudspeaker diaphragm can realize a desirable sound reproduction without noise, or the like, with a frequency response that is flat over a wide range.Type: ApplicationFiled: August 22, 2008Publication date: March 5, 2009Inventor: Tatsuya MAEDA
-
Publication number: 20090041333Abstract: An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.Type: ApplicationFiled: October 10, 2008Publication date: February 12, 2009Inventors: Satoru YAMAGUCHI, Takashi Iizumi, Osamu Komuro, Hidetoshi Morokuma, Tatsuya Maeda, Juntaro Arima, Yasuhiko Ozawa
-
Publication number: 20090032693Abstract: The present invention aims to provide an axis alignment method, astigmatism correction method and SEM for implementing these methods, which can prevent an alignment or correction error attributable to conditions of a specimen. A first aspect is to obtain the difference between the optimal values acquired from an automatic axis alignment result on a standard sample and from each of automatic axis alignment results on a observation target sample, and to correct an optimal value adjusted using the standard sample by use of the difference thus obtained. A second aspect is to acquire an optimal stigmator value (astigmatism correction signal) by using the standard sample, to store the optimal stigmator value as a default value, to add the optimal stigmator value and the default value depending on the height of an observation target sample pattern, and to perform an astigmatism correction on the basis of the resultant stigmator value.Type: ApplicationFiled: July 30, 2008Publication date: February 5, 2009Applicant: Hitachi High-Technologies CorporationInventors: Junichi Kakuta, Kazuhiro Ueda, Tatsuya Maeda, Hiroyuki Saito, Katsuhiro Sasada
-
Patent number: 7476857Abstract: A system for controlling a tool-to-tool matching between a plurality of scanning electron microscopes for pattern dimension measurement includes a measuring unit for, at regular intervals, measuring a tool-to-tool disparity between canning electron microscopes based on secondary electron image data, and measuring indicators indicating states of the microscopes, a tool-to-tool-disparity causing factor analyzing unit for analyzing a relationship between the tool-to-tool disparity and the values of the indicators measured by the measuring unit to estimate a factor that has caused said tool-to-tool disparity, and an output unit for displaying and outputting the tool-to-tool disparity causing factor estimated by the tool-to-tool-disparity causing factor analyzing unit.Type: GrantFiled: October 20, 2006Date of Patent: January 13, 2009Assignee: Hitachi High-Technologies CorporationInventors: Mayuka Oosaki, Chie Shishido, Hiroki Kawada, Tatsuya Maeda
-
Patent number: 7446313Abstract: It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an error from an abnormality, the scanning electron microscope extracts a sample image Im(t2) obtained by retroceding from a sample image Im(te) stored so as to be associated with time te of error occurrence by a predetermined video quantity (for example, total recording time period t2) previously set and registered by an input-output device, from sample images stored in a recording device while being overwritten, and stores a resultant sample image in another recording device.Type: GrantFiled: February 21, 2006Date of Patent: November 4, 2008Assignee: Hitachi High-Technologies CorporationInventor: Tatsuya Maeda