Abstract: An image sensor device comprising a silicon substrate having a plurality of CMOS circuit formed thereon, including a pixel array having a plurality of rows and a plurality of columns, a row addressing circuit operatively connected to each the pixel array and the timing control circuit, the row addressing circuit having a row bus that provides address lines to each row in the pixel array, a column addressing circuit, a pixel timing circuit, a timing control logic block, a signal processing circuit, and an interface circuit coupled to external computational means for provision of address and control signals to the sensor device, the interface circuit being operatively coupled the timing control logic, the pixel timing circuit, the row addressing circuit and the column addressing circuit.

Abstract: An X-Y addressable active pixel sensor that uses serial shift registers to select image windows resulting in less semiconductor area being employed compared with prior art address decoding techniques comprising: an X-Y addressable imager having signal lines in both X and Y directions; at least one pair of serial shift registers operatively connected to the X-Y imager such that there is at least one serial shift register in each x and y directions to select signal lines to be applied to the X-Y imager; and loading circuitry that provides the capability for selectively addressing imaging sub-windows by placing bit patterns into the shift registers.

Abstract: An active pixel sensor formed by creating an X-Y array of pixels on a semiconductor substrate. The two dimensional array of pixels is arranged in a plurality of rows and columns that are addressed by addressing circuits formed on the substrate. The active pixel sensor is functionally divided to enable the addressing and reading out of a plurality of pixels simultaneously by providing areas, each of the areas having a row addressing circuit and a column addressing circuit. A signal processing circuit is provided for each area to output a sequential series of pixels in each of the areas.

Abstract: An image sensor device comprising a silicon substrate having a plurality of CMOS circuit formed thereon, including a pixel array having a plurality of rows and a plurality of columns, a row addressing circuit operatively connected to each the pixel array and the timing control circuit, the row addressing circuit having a row bus that provides address lines to each row in the pixel array, a column addressing circuit, a pixel timing circuit, a timing control logic block, a signal processing circuit, and an interface circuit coupled to external computational means for provision of address and control signals to the sensor device, the interface circuit being operatively coupled the timing control logic, the pixel timing circuit, the row addressing circuit and the column addressing circuit.

Abstract: A pixel architecture for economizing area within the pixel leaving a greater proportion of area for photodetector area. Area is saved by employing a method of generating row select signals for active pixel sensors comprising the steps of providing an active pixel sensor having a plurality of pixels arranged in columns and rows and selecting rows within the active pixel sensor by application of a supply voltage to a transistor circuit within a predetermined row to be selected and removal of the supply voltage from the transistor circuits of unselected rows.

Abstract: Circuit architecture of an x-y addressable image sensor, in particular to that of a Complementary Metal Oxide Semiconductor (CMOS) active pixel sensor (APS).

Abstract: The optimization of two technologies (CMOS and CCD) wherein a pinned photodiode is integrated into the image sensing element of an active pixel sensor. Pinned photodiodes are fabricated with CCD process steps into the active pixel architecture. Charge integrated within the active pixel pinned photodiode is transferred into the charge sensing node by a transfer gate. The floating diffusion is coupled CMOS circuitry that can provide the addressing capabilities of individual pixels. Alternatively, a buried channel photocapacitor can be used in place of the pinned photodiode.

Abstract: An active pixel sensor architecture comprising a semiconductor substrate having a plurality of pixels formed, thereon, incorporating microlens and lightshields into the pixel architecture. Each of the pixels further comprising: a photodetector region upon which incident light will form photoelectrons to be collected as a signal charge; a device for transferring the signal charge from the photodetector region to a charge storage region that is covered by a light shield; a sense node that is an input to an amplifier; the sense node being operatively connected to the signal storage region. The pixel architecture facilitates symmetrical design of pixels which allows for incorporation of light shield and microlens technology into the design.

Abstract: The optimization of two technologies (CMOS and CCD) wherein a pinned photodiode is integrated into the image sensing element of an active pixel sensor. Pinned photodiodes are fabricated with CCD process steps into the active pixel architecture. Charge integrated within the active pixel pinned photodiode is transferred into the charge sensing node by a transfer gate. The floating diffusion is coupled CMOS circuitry that can provide the addressing capabilities of individual pixels. Alternatively, a buried channel photocapacitor can be used in place of the pinned photodiode.

Abstract: A pixelated image sensor having comprising a partially pinned photodiode which is formed a semiconductor of a first conductivity type formed on a surface of the sensor with at least one photodiode formed, within the semiconductor near the surface, the photodiode being formed from a second conductivity type opposite the first conductivity type; a pinning layer formed on the surface over at least a portion of the photodiode creating a pinned photodiode region, the pinning layer being formed from the first conductivity type; and an unpinned region formed near the surface in an area outside the portion used to form the pinning layer, the unpinned region is formed as a floating region that is employed as a capacitor. The partially pinned photodiode is useful in expanding the fill factor of photodetectors employing photodiode technology.

Abstract: The optimization of two technologies (CMOS and CCD) wherein a pinned photodiode is integrated into the image sensing element of an active pixel sensor. Pinned photodiodes are fabricated with CCD process steps into the active pixel architecture. Charge integrated within the active pixel pinned photodiode is transferred into the charge sensing node by a transfer gate. The floating diffusion is coupled CMOS circuitry that can provide the addressing capabilities of individual pixels. Alternatively, a buried channel photocapacitor can be used in place of the pinned photodiode.

Abstract: An active pixel sensor architecture comprising a semiconductor substrate having a plurality of pixels formed, thereon, incorporating microlens and lightshields into the pixel architecture. Each of the pixels further comprising: a photodetector region upon which incident light will form photoelectrons to be collected as a signal charge; a device for transferring the signal charge from the photodetector region to a charge storage region that is covered by a light shield; a sense node that is an input to an amplifier; the sense node being operatively connected to the signal storage region. The pixel architecture facilitates symmetrical design of pixels which allows for incorporation of light shield and microlens technology into the design.

Abstract: A pixel architecture for economizing area within the pixel leaving a greater proportion of area for photodetector area. Area is saved by employing a method of generating row select signals for active pixel sensors comprising the steps of providing an active pixel sensor having a plurality of pixels arranged in columns and rows and selecting rows within the active pixel sensor by application of a supply voltage to a transistor circuit within a predetermined row to be selected and removal of the supply voltage from the transistor circuits of unselected rows.

Abstract: The optimization of two technologies (CMOS and CCD) wherein a pinned photodiode is integrated into the image sensing element of an active pixel sensor. Pinned photodiodes are fabricated with CCD process steps into the active pixel architecture. Charge integrated within the active pixel pinned photodiode is transferred into the charge sensing node by a transfer gate. The floating diffusion is coupled CMOS circuitry that can provide the addressing capabilities of individual pixels. Alternatively, a buried channel photocapacitor can be used in place of the pinned photodiode.

Abstract: A pixelated image sensor having comprising a partially pinned photodiode which is formed a semiconductor of a first conductivity type formed on a surface of the sensor with at least one photodiode formed, within the semiconductor near the surface, the photodiode being formed from a second conductivity type opposite the first conductivity type; a pinning layer formed on the surface over at least a portion of the photodiode creating a pinned photodiode region, the pinning layer being formed from the first conductivity type; and an unpinned region formed near the surface in an area outside the portion used to form the pinning layer, the unpinned region is formed as a floating region that is employed as a capacitor. The partially pinned photodiode is useful in expanding the fill factor of photodetectors employing photodiode technology.

Abstract: The optimization of two technologies (CMOS and CCD) wherein a pinned photodiode is integrated into the image sensing element of an active pixel sensor. Pinned photodiodes are fabricated with CCD process steps into the active pixel architecture. Charge integrated within the active pixel pinned photodiode is transferred into the charge sensing node by a transfer gate. The floating diffusion is coupled CMOS circuitry that can provide the addressing capabilities of individual pixels. Alternatively, a buried channel photocapacitor can be used in place of the pinned photodiode.

Abstract: The optimization of two technologies (CMOS and CCD) wherein a pinned photodiode is integrated into the image sensing element of an active pixel sensor. Pinned photodiodes are fabricated with CCD process steps into the active pixel architecture. Charge integrated within the active pixel pinned photodiode is transferred into the charge sensing node by a transfer gate. The floating diffusion is coupled CMOS circuitry that can provide the addressing capabilities of individual pixels. Alternatively, a buried channel photocapacitor can be used in place of the pinned photodiode.

Abstract: An image sensor, which is useful with a base image system, for use in taking an X-ray image of an object, includes a charge coupled device which has capacitors, which when charged by the base system, hold a voltage for a useful period of time which maintains the charge coupled device in a mode in which an X-ray generated image can be recorded therein when the charge coupled device is not directly electrically connected to the base image system. The charge coupled device is encapsulated in a material which is opaque to light but is transparent to X-rays. The image sensor has electrical contacts which are used to connect it to the base image system before and after but not during a time an X-ray image of an object is being recorded by the charge coupled device. A method of taking a dental X-ray involves placing the charge coupled device image sensor in direct electrical contact with a base image system to set the image sensor to a mode in which an image can be recorded therein.

Abstract: A power saving impedance transformation circuit for receiving a d-c biased signal comprises a junction transistor connected to operate as an emitter follower, means for connecting the base of the transistor to receive the signal, an operational amplifier having both inverting and non-inverting inputs, a first resistor connected between the emitter of the transistor and the operational amplifier inverting input, a second resistor equal to the first resistor in resistance and having one end connected to the operational amplifier inverting input, resistive means for connecting the other end of the second resistor to a first voltage source of a polarity which, in cooperation with the signal, forward biases the emitter-base junction of the transistor, the emitter-base junction of the transistor receiving its forward bias from the first voltage source exclusively through the first and second resistors and the resistive means, and means for connecting the collector of the transistor to a second voltage source of a p

Abstract: In a solid state image sensor, such as a CCD image sensor having lateral antiblooming protection, the level of which is controlled by an overflow gate voltage forming a barrier, the storage of electrons in the photodiode junction region of the sensor is eliminated by removing the barrier and allowing the charge to flow from the sensor's photodiode junctions into the overflow region. The charge flow is then detected as a function of the instantaneous light impinging on the photodiodes. The physical connections of the overflow gates are selected to form zones. Since the charge flow now represent the instantaneous light intensity, higher frequency components are detected than that limited by the sensor sampling rate. An amplifier is connected to sense the charge flow from each zone. With the range of light intensity being large the amplifier is provided with a logarithmic feed back element. This element provides compression of a signal representing the sensed charge flow.