Patents by Inventor Tejinder Singh

Tejinder Singh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12183578
    Abstract: In an embodiment, a method for forming features for semiconductor processing. A first mandrel and a second mandrel are formed on a substrate. A first spacer is formed along a first sidewall of the first mandrel, and a second spacer is formed along a second sidewall of the second mandrel. A gap is defined between the first spacer and the second spacer. The gap is filled by a gap-filling material. In some examples, the gap-filling material includes a doped silicon material. In some examples, the first spacer and the second spacer each include a doped silicon material.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: December 31, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Takehito Koshizawa, Rui Cheng, Tejinder Singh, Hidetaka Oshio
  • Publication number: 20240372241
    Abstract: A magnetless cryogenic circulator is developed that has three identical resonators in three branches. Each branch connects two ports and each resonator has a capacitor connected across a tunable inductor. A set of tunable inductors modulated with modulation signals that have a relative phase of 0°, 120° and 240° provided through a circuit. A microstrip delay line for providing the modulation signal to the three resonators, wherein the resonators are modulated in time such that the degeneracy of the two inherent counter-rotating modes is lifted, achieving a non-reciprocal signal routing. All capacitors and inductors are monolithically integrated and fabricated using a multi-layer Nb-based process with Nb/AlOx/Nb JJs.
    Type: Application
    Filed: August 21, 2023
    Publication date: November 7, 2024
    Inventors: Navjot Kaur KHAIRA, Tejinder SINGH, Mehran GOLCHESHMEH, Raafat Rezk MANSOUR
  • Publication number: 20240372580
    Abstract: One example method includes receiving inputs (1) specifying a total power amount for the communication system, (2) specifying communication system operational parameters, and (3) specifying a number of elements implemented in the IRS. Based on the inputs, a portion of the total power amount needed to switch an element of the IRS from a passive element to an active element, an amplification amount of the element, and the SNR of the wireless signal received at the receiver when the first element is an active element are calculated for all combinations of elements of the IRS. Based on the calculations, a number of elements implemented in the IRS are selected to switch from passive elements to active elements that will result in a maximum SNR of the wireless signal received at the receiver.
    Type: Application
    Filed: May 1, 2023
    Publication date: November 7, 2024
    Inventors: Tejinder Singh, Davi V. Q. Rodrigues
  • Publication number: 20240340846
    Abstract: The technology described herein is directed towards a calibration procedure for remote estimation of the position and orientation of an intelligent reflective surface. The calibration is based on accurate estimation of the relative distances between each element of an intelligent reflective surface and a transmission-reception point, e.g., radar sensor, wireless access point and/or base station. A multifrequency (e.g., dual-tone) calibration signal is transmitted to selected elements of the intelligent reflective surface, with the returned calibration signals used to determine the distance to each selected element, from which distances to other elements are determined, along with the intelligent reflective surface's orientation. An active backscatter tag that boosts the returned signal improves the distance measurement accuracy.
    Type: Application
    Filed: April 5, 2023
    Publication date: October 10, 2024
    Inventors: Tejinder Singh, Davi V. Q. Rodrigues
  • Publication number: 20240337742
    Abstract: The technology described herein is directed towards determining a phase shift matrix for an intelligent reflective surface based on active tag-enhanced sensing that provides calibrated orientation data and distance data of the intelligent reflective surface relative to a transmission-reception point, such as a radar system, base station or wireless access point. The calibration data is based on accurate estimation of element distances to the intelligent reflective surface elements. Based on the calibration data, a phase shift matrix for the elements of the intelligent reflective surface is determined. The phase shift matrix can be used in optimizing the intelligent reflective surface for redirected communications with a target. Other calibration data can be obtained at the target for element distances of the intelligent reflective surface relative to the target.
    Type: Application
    Filed: April 5, 2023
    Publication date: October 10, 2024
    Inventors: Tejinder Singh, Davi V. Q. Rodrigues
  • Publication number: 20240332794
    Abstract: The technology described herein is directed towards phase-change material-based (e.g., chalcogenide) radio frequency components that can be used in unit cells of a reconfigurable intelligent surface. A tunable device for reconfigurable operation is described, in which the operational width of phase-change material in the conductive state is controlled to controllably vary the phase shift of each unit cell. The width can be selectively controlled by heating elements that change the operational width of the material's lower-resistance state relative to its higher resistance state, resulting in a phase change of a unit cell with respect to redirecting an electromagnetic wave. By arranging the heating elements below the material, and actuating each one to provide resistive or conductive states within the overall unit cell surface, an analog-like device is provided to provide more granular phase shift control of the cells of a reconfigurable intelligent surface.
    Type: Application
    Filed: April 3, 2023
    Publication date: October 3, 2024
    Inventor: Tejinder Singh
  • Publication number: 20240331951
    Abstract: The technology described herein is directed towards phase-change material-based (e.g., chalcogenide) radio frequency components including for use in unit cells of a reconfigurable intelligent surface. A multi-state tunable capacitive element for reconfigurable operation is described, in which phase-change material operates as a switching element to controllably vary capacitance of each unit cell. The multi-state tunable capacitive element can be made of multiple subcircuits in which capacitors of various values can be selectively switched in or out to vary the capacitance of the tunable capacitive element. Arranging the subcircuits with capacitors of different values, and actuating each one in or out of the overall capacitive element, an analog-like variable capacitor is realized that provides more granular phase shift control of cells of a reconfigurable intelligent surface.
    Type: Application
    Filed: April 3, 2023
    Publication date: October 3, 2024
    Inventor: Tejinder Singh
  • Publication number: 20240329253
    Abstract: The technology described herein is directed towards an autonomous reconfigurable intelligent surface (of a node) that is capable of detecting the node's surrounding environment and adjusting the redirection of impinging electromagnetic beams based on the detected environment. Real-time control of the reconfigurable intelligent surface is achieved from within the node itself, while the node consumes relatively little power. A LiDAR-based or other sensor coupled to the node provides a three-dimensional map of the environment's current state. Within the node, an AI module works with a controller to determine the phase of each reconfigurable unit-cell that forms the reconfigurable intelligent surface. The phase response of each cell redirects the impinging electromagnetic wave in the desired direction, e.g., to avoid an obstacle. This can significantly reduce coverage problems in the millimeter-wave band and even higher frequencies for beyond 5G and 6G applications.
    Type: Application
    Filed: April 3, 2023
    Publication date: October 3, 2024
    Inventor: Tejinder Singh
  • Publication number: 20240331950
    Abstract: The technology described herein is directed towards phase-change material-based (e.g., chalcogenide) radio frequency components that can be used in unit cells of a reconfigurable intelligent surface. A multi-state tunable capacitive element for reconfigurable operation is described, in which phase-change material operates as a switching element to controllably vary capacitance of each unit cell. The multi-state tunable capacitive element can be made of multiple subcircuits in which capacitors of various values can be selectively switched in or out to vary the capacitance of the multi-state tunable capacitive element, resulting in a phase change of a unit cell with respect to reflecting or refracting an electromagnetic wave. By arranging the subcircuits with capacitors of different values, and actuating each one in or out of the overall capacitive element, an analog-like variable capacitor is provided to provide more granular phase shift control of cells of a reconfigurable intelligent surface.
    Type: Application
    Filed: April 3, 2023
    Publication date: October 3, 2024
    Inventor: Tejinder Singh
  • Patent number: 11994800
    Abstract: Embodiments of the present disclosure generally relate to a multilayer stack used as a mask in extreme ultraviolet (EUV) lithography and methods for forming a multilayer stack. In one embodiment, the method includes forming a carbon layer over a film stack, forming a metal rich oxide layer on the carbon layer by a physical vapor deposition (PVD) process, forming a metal oxide photoresist layer on the metal rich oxide layer, and patterning the metal oxide photoresist layer. The metal oxide photoresist layer is different from the metal rich oxide layer and is formed by a process different from the PVD process. The metal rich oxide layer formed by the PVD process improves adhesion of the metal oxide photoresist layer and increases the secondary electrons during EUV lithography, which leads to decreased EUV dose energies.
    Type: Grant
    Filed: December 14, 2022
    Date of Patent: May 28, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Tejinder Singh, Lifan Yan, Abhijit B. Mallick, Daniel Lee Diehl, Ho-yung Hwang, Jothilingam Ramalingam
  • Publication number: 20240172568
    Abstract: A monolithic radio frequency (RF) power limiter for protecting sensitive superconductor receiver components from high-power microwave signals is disclosed. In some embodiments, two low-Tc superconductor (LTS) microstrip lines; one of which is coupled with an array of RF superconducting quantum interference devices (rf-SQUIDs); are combined with a pair of hybrid couplers to provide the power limiting operation at very low RF power levels. A microstrip line coupled to an array of rf-SQUIDs behaves as a power dependent phase shifter and its phase can be controlled by the input RF power. In one embodiment, a monolithically integrated wideband hybrid coupler is used as it dictates the bandwidth of the overall device.
    Type: Application
    Filed: February 28, 2023
    Publication date: May 23, 2024
    Inventors: Navjot Kaur KHAIRA, Tejinder SINGH, Raafat Rezk MANSOUR
  • Publication number: 20240157282
    Abstract: A modular gas processing system built with various gas processing modules and cubes improve transportability and customization. Individual gas processing modules and cubes can be included or removed in multiple combinations for customization because each module has a common interconnection point for connecting to any other gas processing module and cube.
    Type: Application
    Filed: November 15, 2022
    Publication date: May 16, 2024
    Applicant: VOLTAGRID LLC
    Inventors: Nathan Ough, Leslie Michael Wise, Tejinder Singh Gill
  • Publication number: 20240105387
    Abstract: The technology described herein is directed towards a capacitor with a modified design (relative to standard capacitors), in which a first conductor is coupled to a second conductor via a distributed array of conducting interconnects through a dielectric that separates the conductors. The array of interconnects can be geometrically distributed. The array of conducting interconnects, not present in standard capacitors, results in capacitors with larger self-resonant frequency, e.g., having a substantially stable capacitance over a range of high radio frequencies, e.g., from one gigahertz to twenty gigahertz. This further provides an improved quality factor. The improvements resulting from the array of interconnects, facilitates more optimal surface current density. The modified capacitor provides benefits in various circuits, e.g., in a tuning element as part of an impedance matching network, in a millimeter wave frequency phase shifter for antenna elements, and so on.
    Type: Application
    Filed: September 23, 2022
    Publication date: March 28, 2024
    Inventors: Tejinder Singh, Morris Repeta
  • Publication number: 20240098516
    Abstract: The technology described herein is directed towards increasing the secrecy capacity/performance of an intelligent reflective surface (IRS)-assisted communication system. Described is determining a location for placement of the IRS to achieve the maximum secrecy capacity with respect to a receiver in an environment. Gradient descent along with ray tracing, facilitates determination of the optimal placement, which can be used along with an alignment strategy of tile-allocation and phase-shift adjustment for the IRS to optimize the secrecy capacity within constraints. When implemented at the determined location, IRS-assisted communications result in significant improvement of the secrecy capacity performance for an (e.g., indoor) media communication network.
    Type: Application
    Filed: September 19, 2023
    Publication date: March 21, 2024
    Inventors: Ozlem Yildiz, Mohammad Alavirad, Tejinder Singh
  • Publication number: 20230393573
    Abstract: The present disclosure relates to systems, non-transitory computer-readable media, and methods for generating and transmitting autonomous vehicle prepositioning instructions to improve network coverage. In particular, in one or more embodiments, the disclosed systems subdivide a geographic transportation service area into subregions, generate a set of waypoints and circuits for the subregions. Moreover, in one or more embodiments, the disclosed systems utilize an optimization model to assign autonomous vehicles to the set of waypoints and circuits and transmit digital prepositioning instructions to the autonomous vehicles to traverse the waypoints and circuits.
    Type: Application
    Filed: June 7, 2022
    Publication date: December 7, 2023
    Inventors: Renaud Louis Jean-Paul de Peretti, Aseem Garg, Philippe Charles Amilcar Mizrahi, Ramon Dario Iglesias, Hao Yi Ong, Tejinder Singh Aulakh, Timothy Tay Chao
  • Patent number: 11713543
    Abstract: The present disclosure relates to a fiber for manufacturing a stretchable hydrophobic fiber article, the fiber including silica nanoparticles which are surface-modified such that the silica nanoparticles include a hydrocarbon chain, and a styrene-based thermoplastic elastomer, a stretchable hydrophobic fiber article manufactured therefrom, and a manufacturing method thereof. A fiber and a fiber article according to the present disclosure may have high hydrophobicity, preferably both superhydrophobicity and elasticity. Further, as the fiber and fiber article have excellent mechanical stability and chemical durability, the fiber and fiber article may stably exhibit the aforementioned high hydrophobicity and elasticity even under the harsh conditions.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: August 1, 2023
    Inventors: Jung Kyun Im, Jong-Min Lim, Da Eun Lee, Hye Jin Yang, Eun Young Choi, Akula S. N. Murthy, Tejinder Singh
  • Patent number: 11638374
    Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.
    Type: Grant
    Filed: April 14, 2022
    Date of Patent: April 25, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian, Ho-yung David Hwang, Samuel E. Gottheim
  • Publication number: 20230115004
    Abstract: Embodiments of the present disclosure generally relate to a multilayer stack used as a mask in extreme ultraviolet (EUV) lithography and methods for forming a multilayer stack. In one embodiment, the method includes forming a carbon layer over a film stack, forming a metal rich oxide layer on the carbon layer by a physical vapor deposition (PVD) process, forming a metal oxide photoresist layer on the metal rich oxide layer, and patterning the metal oxide photoresist layer. The metal oxide photoresist layer is different from the metal rich oxide layer and is formed by a process different from the PVD process. The metal rich oxide layer formed by the PVD process improves adhesion of the metal oxide photoresist layer and increases the secondary electrons during EUV lithography, which leads to decreased EUV dose energies.
    Type: Application
    Filed: December 14, 2022
    Publication date: April 13, 2023
    Inventors: Tejinder SINGH, Lifan YAN, Abhijit B. MALLICK, Daniel Lee DIEHL, Ho-yung HWANG, Jothilingam RAMALINGAM
  • Patent number: 11550222
    Abstract: Embodiments of the present disclosure generally relate to a multilayer stack used as a mask in extreme ultraviolet (EUV) lithography and methods for forming a multilayer stack. In one embodiment, the method includes forming a carbon layer over a film stack, forming a metal rich oxide layer on the carbon layer by a physical vapor deposition (PVD) process, forming a metal oxide photoresist layer on the metal rich oxide layer, and patterning the metal oxide photoresist layer. The metal oxide photoresist layer is different from the metal rich oxide layer and is formed by a process different from the PVD process. The metal rich oxide layer formed by the PVD process improves adhesion of the metal oxide photoresist layer and increases the secondary electrons during EUV lithography, which leads to decreased EUV dose energies.
    Type: Grant
    Filed: June 2, 2020
    Date of Patent: January 10, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Tejinder Singh, Lifan Yan, Abhijit B. Mallick, Daniel Lee Diehl, Ho-yung Hwang, Jothilingam Ramalingam
  • Patent number: 11495461
    Abstract: Methods for forming a film stack comprising a hardmask layer and etching such hardmask layer to form features in the film stack are provided. The methods described herein facilitate profile and dimension control of features through a proper profile management scheme formed in the film stack. In one or more embodiments, a method for etching a hardmask layer includes forming a hardmask layer on a substrate, where the hardmask layer contains a metal-containing material containing a metal element having an atomic number greater than 28, supplying an etching gas mixture to the substrate, and etching the hardmask layer exposed by a photoresist layer.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: November 8, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tejinder Singh, Suketu Arun Parikh, Daniel Lee Diehl, Michael Anthony Stolfi, Jothilingam Ramalingam, Yong Cao, Lifan Yan, Chi-I Lang, Hoyung David Hwang