Patents by Inventor Tejinder Singh

Tejinder Singh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11713543
    Abstract: The present disclosure relates to a fiber for manufacturing a stretchable hydrophobic fiber article, the fiber including silica nanoparticles which are surface-modified such that the silica nanoparticles include a hydrocarbon chain, and a styrene-based thermoplastic elastomer, a stretchable hydrophobic fiber article manufactured therefrom, and a manufacturing method thereof. A fiber and a fiber article according to the present disclosure may have high hydrophobicity, preferably both superhydrophobicity and elasticity. Further, as the fiber and fiber article have excellent mechanical stability and chemical durability, the fiber and fiber article may stably exhibit the aforementioned high hydrophobicity and elasticity even under the harsh conditions.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: August 1, 2023
    Inventors: Jung Kyun Im, Jong-Min Lim, Da Eun Lee, Hye Jin Yang, Eun Young Choi, Akula S. N. Murthy, Tejinder Singh
  • Patent number: 11638374
    Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.
    Type: Grant
    Filed: April 14, 2022
    Date of Patent: April 25, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian, Ho-yung David Hwang, Samuel E. Gottheim
  • Publication number: 20230115004
    Abstract: Embodiments of the present disclosure generally relate to a multilayer stack used as a mask in extreme ultraviolet (EUV) lithography and methods for forming a multilayer stack. In one embodiment, the method includes forming a carbon layer over a film stack, forming a metal rich oxide layer on the carbon layer by a physical vapor deposition (PVD) process, forming a metal oxide photoresist layer on the metal rich oxide layer, and patterning the metal oxide photoresist layer. The metal oxide photoresist layer is different from the metal rich oxide layer and is formed by a process different from the PVD process. The metal rich oxide layer formed by the PVD process improves adhesion of the metal oxide photoresist layer and increases the secondary electrons during EUV lithography, which leads to decreased EUV dose energies.
    Type: Application
    Filed: December 14, 2022
    Publication date: April 13, 2023
    Inventors: Tejinder SINGH, Lifan YAN, Abhijit B. MALLICK, Daniel Lee DIEHL, Ho-yung HWANG, Jothilingam RAMALINGAM
  • Patent number: 11550222
    Abstract: Embodiments of the present disclosure generally relate to a multilayer stack used as a mask in extreme ultraviolet (EUV) lithography and methods for forming a multilayer stack. In one embodiment, the method includes forming a carbon layer over a film stack, forming a metal rich oxide layer on the carbon layer by a physical vapor deposition (PVD) process, forming a metal oxide photoresist layer on the metal rich oxide layer, and patterning the metal oxide photoresist layer. The metal oxide photoresist layer is different from the metal rich oxide layer and is formed by a process different from the PVD process. The metal rich oxide layer formed by the PVD process improves adhesion of the metal oxide photoresist layer and increases the secondary electrons during EUV lithography, which leads to decreased EUV dose energies.
    Type: Grant
    Filed: June 2, 2020
    Date of Patent: January 10, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Tejinder Singh, Lifan Yan, Abhijit B. Mallick, Daniel Lee Diehl, Ho-yung Hwang, Jothilingam Ramalingam
  • Patent number: 11495461
    Abstract: Methods for forming a film stack comprising a hardmask layer and etching such hardmask layer to form features in the film stack are provided. The methods described herein facilitate profile and dimension control of features through a proper profile management scheme formed in the film stack. In one or more embodiments, a method for etching a hardmask layer includes forming a hardmask layer on a substrate, where the hardmask layer contains a metal-containing material containing a metal element having an atomic number greater than 28, supplying an etching gas mixture to the substrate, and etching the hardmask layer exposed by a photoresist layer.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: November 8, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tejinder Singh, Suketu Arun Parikh, Daniel Lee Diehl, Michael Anthony Stolfi, Jothilingam Ramalingam, Yong Cao, Lifan Yan, Chi-I Lang, Hoyung David Hwang
  • Publication number: 20220266194
    Abstract: In one embodiment, a gas conditioning system includes a trailer chassis, an inlet valve, a chiller, a separator, a system outlet, and a dehydration agent injection system. The inlet valve may be coupled to the trailer chassis and may be configured to direct flow to a fluid conduit. The chiller may be in thermal communication with the fluid conduit and is configured to remove heat from the flow within the fluid conduit The separator may be coupled to the trailer chassis and define a separator inlet to receive flow from the fluid conduit. The separator may be configured to direct conditioned gas from the separator inlet to a first separator outlet. The system outlet may be configured to receive flow from the first separator outlet. The dehydration agent injection system includes an injector, a dehydration agent, and a reboiler.
    Type: Application
    Filed: February 24, 2022
    Publication date: August 25, 2022
    Applicant: VoltaGrid LLC
    Inventors: Tejinder Singh Gill, Leslie Michael Wise, Nathan Ough
  • Publication number: 20220238531
    Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.
    Type: Application
    Filed: April 14, 2022
    Publication date: July 28, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian, Ho-Yung David Hwang, Samuel E. Gottheim
  • Patent number: 11335690
    Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.
    Type: Grant
    Filed: January 12, 2021
    Date of Patent: May 17, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian, Ho-yung David Hwang, Samuel E. Gottheim
  • Patent number: 11299027
    Abstract: The present invention provides a power system for a hybrid vehicle, relating to the field of hybrid vehicles. The power system for a hybrid vehicle adopts a first planetary gear mechanism with two sun gears, the first sun gear rotates with an input shaft, the second sun gear and the input shaft are independent of each other, and the second sun gear achieves different motion states through a second brake or/and a second clutch, and cooperates with a first brake to provide different transmission ratios of four to six gears when an engine and motors are in driving, so that the power system is simple in structure and low in cost, and the fuel economy and acceleration dynamic performance of the power system are improved.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: April 12, 2022
    Assignee: NINGBO UMD AUTOMATIC TRANSMISSION CO., LTD.
    Inventors: Zhiling Qiu, Tejinder Singh, Jun Fu, Choonghyeo Kim, Daguo Luo, Xiaozhe Lin, Ruiping Wang
  • Patent number: 11267329
    Abstract: A power system for a hybrid vehicle includes a first planetary gear mechanism and a second planetary gear mechanism that cooperate with each other, wherein a first sun gear rotates with a first input shaft, a second sun gear and the first input shaft are independent from each other, the second sun gear achieve different movement states through a first brake, a second brake and a second clutch, to provide different transmission ratios, so that the power system is simple in structure, low in cost and more flexible in adaptability. Further, a second electric motor is connected with the first input shaft through a third planetary gear mechanism, can reduce the speed of the second electric motor through the planetary gear mechanism, and increase the torque, to effectively reduce the size of the second electric motor or improve the acceleration performance of the vehicle.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: March 8, 2022
    Assignees: NINGBO UMD AUTOMATIC TRANSMISSION CO., LTD, ZHEJIANG GEELY HOLDING GROUP CO., LTD
    Inventors: Tejinder Singh, Zhiling Qiu, Weiqian Xie, Jun Fu
  • Publication number: 20220013359
    Abstract: In an embodiment, a method for forming features for semiconductor processing. A first mandrel and a second mandrel are formed on a substrate. A first spacer is formed along a first sidewall of the first mandrel, and a second spacer is formed along a second sidewall of the second mandrel. A gap is defined between the first spacer and the second spacer. The gap is filled by a gap-filling material. In some examples, the gap-filling material includes a doped silicon material. In some examples, the first spacer and the second spacer each include a doped silicon material.
    Type: Application
    Filed: August 27, 2021
    Publication date: January 13, 2022
    Inventors: Takehito KOSHIZAWA, Rui CHENG, Tejinder SINGH, Hidetaka OSHIO
  • Patent number: 11189710
    Abstract: Method of forming an electronic device with a bottom isolation dielectric between a pair of gate stacks is described. Each of the gate stacks comprises a plurality of gate layers. A sacrificial film having a liner on a top and side thereof is on top of the gate layers. A capping layer is on the top of the liner.
    Type: Grant
    Filed: May 15, 2020
    Date of Patent: November 30, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Byeong Chan Lee, Tejinder Singh, Bencherki Mebarki
  • Patent number: 11180016
    Abstract: The present invention provides a power system for a hybrid vehicle, relating to the field of hybrid vehicles. The power system mainly includes an engine, a first motor, a second motor, a first planetary gear mechanism, a second planetary gear mechanism, a first input shaft, a first clutch, a brake, and a second clutch. Since the second motor is connected to the first input shaft through the second planetary gear mechanism, the planetary gear mechanism can reduce the speed of the second motor and increase the torque to effectively reduce the size of the second motor or improve the acceleration performance of the vehicle. Since the first clutch between the first input shaft and the engine is disengaged when driven by the second motor, the drag resistance of the engine is reduced, and the fuel economy of the vehicle is improved.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: November 23, 2021
    Assignees: NINGBO UMD AUTOMATIC TRANSMISSION CO., LTD., ZHEJIANG GEELY HOLDING GROUP CO., LTD
    Inventors: Zhiling Qiu, Tejinder Singh, Weiqian Xie
  • Patent number: 11145509
    Abstract: In an embodiment, a method for forming features for semiconductor processing. A first mandrel and a second mandrel are formed on a substrate. A first spacer is formed along a first sidewall of the first mandrel, and a second spacer is formed along a second sidewall of the second mandrel. A gap is defined between the first spacer and the second spacer. The gap is filled by a gap-filling material. In some examples, the gap-filling material includes a doped silicon material. In some examples, the first spacer and the second spacer each include a doped silicon material.
    Type: Grant
    Filed: April 20, 2020
    Date of Patent: October 12, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Takehito Koshizawa, Rui Cheng, Tejinder Singh, Hidetaka Oshio
  • Publication number: 20210309092
    Abstract: The present invention provides a power system for a hybrid vehicle, relating to the field of hybrid vehicles. The power system mainly includes an engine, a first motor, a second motor, a first planetary gear mechanism, a second planetary gear mechanism, a first input shaft, a first clutch, a brake, and a second clutch. Since the second motor is connected to the first input shaft through the second planetary gear mechanism, the planetary gear mechanism can reduce the speed of the second motor and increase the torque to effectively reduce the size of the second motor or improve the acceleration performance of the vehicle. Since the first clutch between the first input shaft and the engine is disengaged when driven by the second motor, the drag resistance of the engine is reduced, and the fuel economy of the vehicle is improved.
    Type: Application
    Filed: March 14, 2019
    Publication date: October 7, 2021
    Applicants: NINGBO UMD AUTOMATIC TRANSMISSION CO., LTD., ZHEJIANG GEELY HOLDING GROUP CO., LTD
    Inventors: Zhiling QIU, Tejinder SINGH, Weiqian XIE
  • Publication number: 20210291637
    Abstract: The present invention provides a power system for a hybrid vehicle, relating to the field of hybrid vehicles. The power system for a hybrid vehicle adopts a first planetary gear mechanism with two sun gears, the first sun gear rotates with an input shaft, the second sun gear and the input shaft are independent of each other, and the second sun gear achieves different motion states through a second brake or/and a second clutch, and cooperates with a first brake to provide different transmission ratios of four to six gears when an engine and motors are in driving, so that the power system is simple in structure and low in cost, and the fuel economy and acceleration dynamic performance of the power system are improved.
    Type: Application
    Filed: March 14, 2019
    Publication date: September 23, 2021
    Applicant: NINGBO UMD AUTOMATIC TRANSMISSION CO., LTD.
    Inventors: Zhiling QIU, Tejinder SINGH, Jun FU, Choonghyeo KIM, Daguo LUO, Xiaozhe LIN, Ruiping WANG
  • Publication number: 20210178889
    Abstract: A power system for a hybrid vehicle includes a first planetary gear mechanism and a second planetary gear mechanism that cooperate with each other, wherein a first sun gear rotates with a first input shaft, a second sun gear and the first input shaft are independent from each other, the second sun gear achieve different movement states through a first brake, a second brake and a second clutch, to provide different transmission ratios, so that the power system is simple in structure, low in cost and more flexible in adaptability. Further, a second electric motor is connected with the first input shaft through a third planetary gear mechanism, can reduce the speed of the second electric motor through the planetary gear mechanism, and increase the torque, to effectively reduce the size of the second electric motor or improve the acceleration performance of the vehicle.
    Type: Application
    Filed: February 16, 2021
    Publication date: June 17, 2021
    Applicants: NINGBO UMD AUTOMATIC TRANSMISSION CO., LTD, ZHEJIANG GEELY HOLDING GROUP CO., LTD
    Inventors: Tejinder SINGH, Zhiling QIU, Weiqian XIE, Jun FU
  • Patent number: 11035455
    Abstract: A gasket assembly for sealing between a first component and a second component, the first component having a main cavity separated from a secondary cavity by at least one wall, the at least one wall having an aperture formed therethrough, includes a device configured to extend through the aperture. An aperture sealing insert is molded around a portion of the device, the aperture sealing insert sized and shaped to fit into the aperture. An aperture seal is disposed about an outer perimeter surface of the aperture sealing insert, the aperture seal configured to seal against surfaces defining the aperture. A gasket baseplate is configured to be disposed over the aperture sealing insert between the first component and the second component to fluidly seal the main cavity from the secondary cavity while enabling the device to pass through the aperture.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: June 15, 2021
    Assignee: FCA US LLC
    Inventors: Mark Nikprelevic, Derrick S Reiss, Tejinder Singh, Mark C Graebner, Richard Scorzelli, Namrood Al-Mooshi
  • Patent number: 11025652
    Abstract: Architectures and techniques for in-app behavior detection. A behavior detection agent within an application running on a hardware computing device captures events within the application. The events are inputs received from one or more sources external to the application. The behavior detection agent generates an event stream from the captured events. The behavior detection agent analyzes the event stream for significant feature frequencies and associations corresponding to one or more attack profiles. The behavior detection agent initiates an attack response in response to finding one or more significant feature frequencies and associations. The attack response comprises at least changing an operational configuration of the application.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: June 1, 2021
    Assignee: salesforce.com, inc.
    Inventors: Philip Raymond Nadeau, Tejinder Singh Aulakh, Ping Yan, Huy Nhut Hang
  • Publication number: 20210134807
    Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.
    Type: Application
    Filed: January 12, 2021
    Publication date: May 6, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Tejinder Singh, Takehito Koshizawa, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian, Ho-yung David Hwang, Samuel E. Gottheim