Abstract: A gasket assembly for sealing between a first component and a second component, the first component having a main cavity separated from a secondary cavity by at least one wall, the at least one wall having an aperture formed therethrough, includes a device configured to extend through the aperture. An aperture sealing insert is molded around a portion of the device, the aperture sealing insert sized and shaped to fit into the aperture. An aperture seal is disposed about an outer perimeter surface of the aperture sealing insert, the aperture seal configured to seal against surfaces defining the aperture. A gasket baseplate is configured to be disposed over the aperture sealing insert between the first component and the second component to fluidly seal the main cavity from the secondary cavity while enabling the device to pass through the aperture.

Abstract: Architectures and techniques for in-app behavior detection. A behavior detection agent within an application running on a hardware computing device captures events within the application. The events are inputs received from one or more sources external to the application. The behavior detection agent generates an event stream from the captured events. The behavior detection agent analyzes the event stream for significant feature frequencies and associations corresponding to one or more attack profiles. The behavior detection agent initiates an attack response in response to finding one or more significant feature frequencies and associations. The attack response comprises at least changing an operational configuration of the application.

Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.

Abstract: The present disclosure relates to a fiber for manufacturing a stretchable hydrophobic fiber article, the fiber including silica nanoparticles which are surface-modified such that the silica nanoparticles include a hydrocarbon chain, and a styrene-based thermoplastic elastomer, a stretchable hydrophobic fiber article manufactured therefrom, and a manufacturing method thereof. A fiber and a fiber article according to the present disclosure may have high hydrophobicity, preferably both superhydrophobicity and elasticity. Further, as the fiber and fiber article have excellent mechanical stability and chemical durability, the fiber and fiber article may stably exhibit the aforementioned high hydrophobicity and elasticity even under the harsh conditions.

Abstract: A power-take off (PTO) system for a vehicle having a powertrain comprising an engine and a hybrid electric transmission includes a PTO device configured to provide power to an accessory load of the vehicle, a housing for a gear clutch of the transmission, the housing being formed of steel, needle bearings for the gear clutch, and a gear defined by or attached to an outer surface of the housing, wherein at least one electric motor of the transmission is configured to drive the PTO device via the gear clutch and the gear while the engine is disconnected from the transmission or is shut off.

Abstract: Methods and apparatus for processing a substrate. The method, for example, includes directing a stream of material from a PVD source at a first non-perpendicular angle to selectively deposit the material on a top portion of one or more features on the substrate and form a first overhang and a second overhang extending beyond a third sidewall and a fourth sidewall that are arranged parallel and opposite to each other and at non-zero angles to a first sidewall and a second sidewall, the first sidewall and the second sidewall defining a length of the one or more features, and the third sidewall and fourth sidewall defining a width of the one or more features; performing an etch process to selectively remove some of the first sidewall and the second sidewall while keeping the third sidewall and fourth sidewall in intact and maintaining the width of the one or more features.

Abstract: A modular hybrid transmission configurable between a 9-speed configuration and an 8-speed configuration includes first, second, third, and fourth planetary gear sets each having first, second, and third elements. Seven torque transmitting devices are each selectively engageable to interconnect one of the first, second, and third elements of one of the planetary gear sets directly with (i) one of the first, second, and third elements of another one of the planetary gear sets, (ii) a housing, or (iii) an input member. The seven torque transmitting devices are selectively engageable to establish nine forward speed ratios and at least one reverse speed ratio. Upon removal of a fourth torque transmitting device, the transmission is arranged in the 8-speed configuration and the remaining six torque transmitting devices are selectively engageable to establish eight forward speed ratios and at least one reverse speed ratio.

Abstract: Embodiments of the present disclosure generally relate to a multilayer stack used as a mask in extreme ultraviolet (EUV) lithography and methods for forming a multilayer stack. In one embodiment, the method includes forming a carbon layer over a film stack, forming a metal rich oxide layer on the carbon layer by a physical vapor deposition (PVD) process, forming a metal oxide photoresist layer on the metal rich oxide layer, and patterning the metal oxide photoresist layer. The metal oxide photoresist layer is different from the metal rich oxide layer and is formed by a process different from the PVD process. The metal rich oxide layer formed by the PVD process improves adhesion of the metal oxide photoresist layer and increases the secondary electrons during EUV lithography, which leads to decreased EUV dose energies.

Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.

Abstract: A modular hybrid transmission configurable between a 9-speed configuration and an 8-speed configuration includes first, second, third, and fourth planetary gear sets each having first, second, and third elements. Seven torque transmitting devices are each selectively engageable to interconnect one of the first, second, and third elements of one of the planetary gear sets directly with (i) one of the first, second, and third elements of another one of the planetary gear sets, (ii) a housing, or (iii) an input member. The seven torque transmitting devices are selectively engageable to establish nine forward speed ratios and at least one reverse speed ratio. Upon removal of a fourth torque transmitting device, the transmission is arranged in the 8-speed configuration and the remaining six torque transmitting devices are selectively engageable to establish eight forward speed ratios and at least one reverse speed ratio.

Abstract: In an embodiment, a method for forming features for semiconductor processing. A first mandrel and a second mandrel are formed on a substrate. A first spacer is formed along a first sidewall of the first mandrel, and a second spacer is formed along a second sidewall of the second mandrel. A gap is defined between the first spacer and the second spacer. The gap is filled by a gap-filling material. In some examples, the gap-filling material includes a doped silicon material. In some examples, the first spacer and the second spacer each include a doped silicon material.

Abstract: Method of forming an electronic device with a bottom isolation dielectric between a pair of gate stacks is described. Each of the gate stacks comprises a plurality of gate layers. A sacrificial film having a liner on a top and side thereof is on top of the gate layers. A capping layer is on the top of the liner.

Abstract: Methods for forming a film stack comprising a hardmask layer and etching such hardmask layer to form features in the film stack are provided. The methods described herein facilitate profile and dimension control of features through a proper profile management scheme formed in the film stack. In one or more embodiments, a method for etching a hardmask layer includes forming a hardmask layer on a substrate, where the hardmask layer contains a metal-containing material containing a metal element having an atomic number greater than 28, supplying an etching gas mixture to the substrate, and etching the hardmask layer exposed by a photoresist layer.

Abstract: Methods and apparatus for processing a substrate. The method, for example, includes directing a stream of material from a PVD source at a first non-perpendicular angle to selectively deposit the material on a top portion of one or more features on the substrate and form a first overhang and a second overhang extending beyond a third sidewall and a fourth sidewall that are arranged parallel and opposite to each other and at non-zero angles to a first sidewall and a second sidewall, the first sidewall and the second sidewall defining a length of the one or more features, and the third sidewall and fourth sidewall defining a width of the one or more features; performing an etch process to selectively remove some of the first sidewall and the second sidewall while keeping the third sidewall and fourth sidewall in intact and maintaining the width of the one or more features.

Abstract: Methods and apparatus for processing a substrate are provided herein. In some embodiments, a method for processing a substrate includes: directing a stream of material from a PVD source toward a surface of a substrate at a non-perpendicular angle to the plane of the surface to selectively deposit the material on a top portion of one or more features on the substrate and form an overhang extending beyond a first sidewall of the one or more features; and etching a first layer of the substrate beneath the one or more features selective to the deposited material.

Abstract: Among other things, embodiments of the present disclosure help identify anomalous web browser session behavior. Other embodiments may be described and/or claimed.

Abstract: Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.

Abstract: A transmission includes input and output shafts, a hybrid module coupled to the input shaft and a gearbox coupled to the module and output shaft. The hybrid module includes a first electric motor under driven by a gearset; a second electric motor coupled to a module output, a disconnect clutch coupled to the gearset and selectively to the input shaft; and a launch clutch coupled to the disconnect clutch and selectively to the module output. The gearbox includes three gearsets and five torque transmitting devices operable to generate six forward speeds. One torque transmitting device is a clutch brake applied with a piston that reaches over a park gear, and one is a selectable one way clutch. Two of the torque transmitting devices are radially stacked rotating clutches. The transmission includes and/or facilitates an engine only mode, an electric only mode, a hybrid mode and a battery charging mode.

Abstract: A gasket assembly for sealing between a first component and a second component, the first component having a main cavity separated from a secondary cavity by at least one wall, the at least one wall having an aperture formed therethrough, includes a device configured to extend through the aperture. An aperture sealing insert is molded around a portion of the device, the aperture sealing insert sized and shaped to fit into the aperture. An aperture seal is disposed about an outer perimeter surface of the aperture sealing insert, the aperture seal configured to seal against surfaces defining the aperture. A gasket baseplate is configured to be disposed over the aperture sealing insert between the first component and the second component to fluidly seal the main cavity from the secondary cavity while enabling the device to pass through the aperture.

Abstract: Architectures and techniques for in-app behavior detection. A behavior detection agent within an application running on a hardware computing device captures events within the application. The events are inputs received from one or more sources external to the application. The behavior detection agent generates an event stream from the captured events. The behavior detection agent analyzes the event stream for significant feature frequencies and associations corresponding to one or more attack profiles. The behavior detection agent initiates an attack response in response to finding one or more significant feature frequencies and associations. The attack response comprises at least changing an operational configuration of the application.