Patents by Inventor Tetsuo Adachi
Tetsuo Adachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150115269Abstract: This invention provides a semiconductor device with improved reliability. A semiconductor chip (semiconductor device) includes a plurality of electrode pads arranged in a plurality of lines extending along a side (chip side) of a perimeter of the semiconductor chip in plan view. Among the electrode pads, the areas of respective electrode pads arranged in a first line along the chip side are smaller than the areas of respective electrode pads arranged in a line located further than the first line from the chip side.Type: ApplicationFiled: October 17, 2014Publication date: April 30, 2015Inventors: Yasushi ISHII, Tetsuo Adachi
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Publication number: 20120218819Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: ApplicationFiled: November 29, 2011Publication date: August 30, 2012Inventors: Masataka KATO, Tetsuo ADACHI, Toshihiro TANAKA, Toshio SASAKI, Hitoshi KUME, Katsutaka KIMURA
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Patent number: 8072809Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: GrantFiled: June 1, 2010Date of Patent: December 6, 2011Assignee: Solid State Storage Solutions, Inc.Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Publication number: 20110229614Abstract: It is intended to provide a method of treating fish meat whereby the amount of so-called drip flowing out from fish meat, which is obtained by disassembling, cutting and forming landed fish and then freezing, in the course of the treatment and thawing can be largely reduced. This object is achieved by pre-drying molded fish meat, which has been prepared by disassembling landed fish and cutting them into various shapes, with a cold air so as to lightly dehydrate the surface part, dipping the fish meat in an aqueous solution of sodium chloride for a short period of time so that the fish meat surface turns into a gel to form a coating, vacuum-packaging it as such, further blowing a clean gas such as oxygen into the package to give a gas-containing package, then freezing it by the brine freezing method and storing in that state. Due to a series of the treating procedures as described above, the amount of the drip during thawing the fish meat is considerably reduced.Type: ApplicationFiled: July 16, 2008Publication date: September 22, 2011Applicant: TENPOINT MANUFACTURING CORPORATIONInventor: Tetsuo Adachi
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Publication number: 20110051515Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: ApplicationFiled: June 1, 2010Publication date: March 3, 2011Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Patent number: 7746697Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: GrantFiled: March 11, 2008Date of Patent: June 29, 2010Assignee: Solid State Storage Solutions, Inc.Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Patent number: 7745903Abstract: A technique is provided which permits formation within a single chip both a field effect transistor of high reliability capable of suppressing the occurrence of a crystal defect and a field effect transistor of a high integration degree. In a mask ROM section having an element isolation region with an isolation width of smaller than 0.3 ?m, a planar shape of each active region ACT is made polygonal by cutting off the corners of a quadrangle, thereby suppressing the occurrence of a crystal defect in the active region ACT and diminishing a leakage current flowing between the source and drain of a field effect transistor. In a sense amplifier data latch section which is required to have a layout of a small margin in the alignment between a gate G of a field effect transistor and the active region ACT, the field effect transistor is disposed at a narrow pitch by making the active region ACT quadrangular.Type: GrantFiled: July 15, 2009Date of Patent: June 29, 2010Assignee: Renesas Electronics Corp.Inventors: Tetsuo Adachi, Akihiko Sato
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Patent number: 7692234Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: GrantFiled: September 27, 2007Date of Patent: April 6, 2010Assignee: Renesas Technology Corp.Inventors: Tetsuo Adachi, Masataka Kato, Toshiaki Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine
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Publication number: 20090273038Abstract: A technique is provided which permits formation within a single chip both a field effect transistor of high reliability capable of suppressing the occurrence of a crystal defect and a field effect transistor of a high integration degree. In a mask ROM section having an element isolation region with an isolation width of smaller than 0.3 ?m, a planar shape of each active region ACT is made polygonal by cutting off the corners of a quadrangle, thereby suppressing the occurrence of a crystal defect in the active region ACT and diminishing a leakage current flowing between the source and drain of a field effect transistor. In a sense amplifier data latch section which is required to have a layout of a small margin in the alignment between a gate G of a field effect transistor and the active region ACT, the field effect transistor is disposed at a narrow pitch by making the active region ACT quadrangular.Type: ApplicationFiled: July 15, 2009Publication date: November 5, 2009Inventors: Tetsuo ADACHI, Akihiko SATO
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Publication number: 20090230453Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: ApplicationFiled: September 27, 2007Publication date: September 17, 2009Inventors: Tetsuo ADACHI, Masataka Kato, Toshiaki Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine
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Patent number: 7585745Abstract: A technique is provided which permits formation within a single chip both a field effect transistor of high reliability capable of suppressing the occurrence of a crystal defect and a field effect transistor of a high integration degree. In a mask ROM section having an element isolation region with an isolation width of smaller than 0.3 ?m, a planar shape of each active region ACT is made polygonal by cutting off the corners of a quadrangle, thereby suppressing the occurrence of a crystal defect in the active region ACT and diminishing a leakage current flowing between the source and drain of a field effect transistor. In a sense amplifier data latch section which is required to have a layout of a small margin in the alignment between a gate G of a field effect transistor and the active region ACT, the field effect transistor is disposed at a narrow pitch by making the active region ACT quadrangular.Type: GrantFiled: December 9, 2005Date of Patent: September 8, 2009Assignee: Renesas Technology Corp.Inventors: Tetsuo Adachi, Akihiko Sato
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Patent number: 7528036Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: GrantFiled: April 18, 2005Date of Patent: May 5, 2009Assignee: Renesas Technology Corp.Inventors: Tetsuo Adachi, Masataka Kato, Toshiaki Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine
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Publication number: 20080233728Abstract: Provided is a manufacturing method of a semiconductor device which has the following steps of forming a plurality of layered patterns obtained by stacking an insulating film, a conductor film for forming a floating gate electrode and another insulating film over a semiconductor substrate in the order of mention, forming sidewalls over the side surfaces of the plurality of layered patterns, removing a damage layer of the semiconductor substrate between any two adjacent layered patterns by dry etching, forming an insulating film over the semiconductor substrate between two adjacent layered patterns, and forming a plurality of assist gate electrodes over the insulating film between two adjacent layered patterns in self alignment therewith. According to the present invention, a semiconductor device having a flash memory has improved reliability.Type: ApplicationFiled: May 30, 2008Publication date: September 25, 2008Inventors: Naohiro HOSODA, Tetsuo Adachi
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Publication number: 20080219082Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: ApplicationFiled: March 11, 2008Publication date: September 11, 2008Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Patent number: 7419869Abstract: Provided is a manufacturing method of a semiconductor device which has the following steps of forming a plurality of layered patterns obtained by stacking an insulating film, a conductor film for forming a floating gate electrode and another insulating film over a semiconductor substrate in the order of mention, forming sidewalls over the side surfaces of the plurality of layered patterns, removing a damage layer of the semiconductor substrate between any two adjacent layered patterns by dry etching, forming an insulating film over the semiconductor substrate between two adjacent layered patterns, and forming a plurality of assist gate electrodes over the insulating film between two adjacent layered patterns in self alignment therewith. According to the present invention, a semiconductor device having a flash memory has improved reliability.Type: GrantFiled: February 9, 2006Date of Patent: September 2, 2008Assignee: Renesas Technology Corp.Inventors: Naohiro Hosoda, Tetsuo Adachi
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Patent number: 7366016Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: GrantFiled: January 25, 2007Date of Patent: April 29, 2008Assignee: Solid State Storage Solutions, LLCInventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura
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Patent number: 7304345Abstract: A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.Type: GrantFiled: November 4, 2005Date of Patent: December 4, 2007Assignee: Renesas Technology Corp.Inventors: Tetsuo Adachi, Masataka Kato, Toshiaki Nishimoto, Nozomu Matsuzaki, Takashi Kobayashi, Yoshimi Sudou, Toshiyuki Mine
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Patent number: 7282411Abstract: An AND flash memory of the type wherein a memory cell is constituted of n-type semiconductor regions (a source and a drain) formed in a p-type well of a semiconductor substrate and three gates (including a floating gate, a control gate and a selective gate) is manufactured. In the manufacture, arsenic (As) is introduced into a p-type well in the vicinity of one of side walls of the selective gate to form n-type semiconductor regions (a source and a drain). Thereafter, to cope with a drain disturb problem, the substrate is thermally treated by use of an ISSG (In-Situ Steam Generation) oxidation method so that a first gate, insulating film disposed in the vicinity of one of side walls, at which the n-type semiconductor regions have been formed, is formed thick.Type: GrantFiled: January 18, 2005Date of Patent: October 16, 2007Assignee: Renesas Technology Corp.Inventors: Kenji Kanamitsu, Takashi Moriyama, Naohiro Hosoda, Keiichi Haraguchi, Tetsuo Adachi
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Publication number: 20070186824Abstract: A sidewalk tile with snow-removal function is stably obtained that is capable of being heated to a desired temperature, while at the same time sufficiently maintaining strength. A heat-generating concrete body is obtained by mixing particle-form (granular) or powder-form carbon material with un-hardened concrete at a specified ratio, and then pressing it with a high-pressure press at a pressure of approximately 980 kN to remove moisture and to form it into a tile shape. A pair of electrodes are embedded in end sections on both ends in the width direction of the heat-generating concrete body. The outer surfaces of the heat-generating concrete body are covered with an insulation-coating layer. One side and the circumference of the heat-generating concrete body are covered with un-hardened concrete and formed into a single tile shape by pressing with a high-pressure press to obtain a sidewalk tile with the snow-removal function.Type: ApplicationFiled: December 24, 2004Publication date: August 16, 2007Applicant: HITOMI TAKAHASHIInventors: Hitomi Takahashi, Teitaro Takahashi, Tetsuo Adachi, Hiroshi Kameyama
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Publication number: 20070127295Abstract: Disclosed is a nonvolatile memory system including at least one nonvolatile memory each having a plurality of nonvolatile memory cells and a buffer memory; and a control device coupled to the nonvolatile memory. The control device is enabled to receive external data and to apply the data to the nonvolatile memory, and the nonvolatile memory is enabled to operate a program operation including storing the received data to the buffer memory and storing the data held in the buffer memory to ones of nonvolatile memory cells. Moreover, the control device is enabled to receive external data while the nonvolatile memory is operating in the program operation. Also, the buffer memory is capable of receiving a unit of data, equal to the data length of data to be stored at one time of the program operation, the data length being more than 1 byte.Type: ApplicationFiled: January 25, 2007Publication date: June 7, 2007Inventors: Masataka Kato, Tetsuo Adachi, Toshihiro Tanaka, Toshio Sasaki, Hitoshi Kume, Katsutaka Kimura