Patents by Inventor Tetsuya Endo

Tetsuya Endo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10918262
    Abstract: An insert molded product in which a metal base member and a resin are bonded together includes a ground layer; a noble metal layer formed of a noble metal; a compound layer formed of a compound containing silicon (Si) and oxygen (O); and a mixture layer where the compound and the resin are mixed together, wherein the ground layer, the noble metal layer, the compound layer, and the mixture layer are formed in this order on the metal base member, and wherein nickel (Ni) is included in both the compound layer and the mixture layer.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: February 16, 2021
    Assignee: OLYMPUS CORPORATION
    Inventors: Tetsuya Endo, Naohito Shiga, Kohei Shiramizu, Junko Nakamoto
  • Publication number: 20200191195
    Abstract: A countermeasure to seal squealing is performed at a low price using an extremely simple configuration without greatly modifying constituent elements of a seal which costs a great amount of time and money. An annular shape of grease lip portions is not symmetrical to a rotational center of a fixing member. Therefore, a relative rotational center of contacting target portions of the grease lip portions is eccentric by a distance with respect to a rotational center of a rotating shaft. When a slinger rotates, a friction force is generated between the contacting target portions of the grease lip portions and a flange surface. In a housing which supports the fixing member, torsion is generated by the friction force and a restoring force which is centered on the relative rotational center acts on the contacting target portions against the torsion.
    Type: Application
    Filed: July 19, 2018
    Publication date: June 18, 2020
    Inventors: Shigenobu HONDA, Tetsuya ENDO, Chiharu TADOKORO, Takuo NAGAMINE, Ken NAKANO
  • Patent number: 10323746
    Abstract: The invention provides a metal bellows type accumulator having an outer shell provided in its one end with a pressure introducing passage in an opening manner, and a metal bellows repeatedly formed peak portions directed to an outer side in a radial direction and trough portions directed to an inner side, capable of expanding and contracting in an axial direction and separating an inner chamber of the outer shell into a pressure introducing chamber communicated with the pressure introducing passage and a gas chamber charged with cushion gas. A tubular portion is provided at a position where an amplitude of vibration in a radial direction becomes maximum in the metal bellows, has a greater diameter than a maximum diameter portion of each of the peak portions and is in contactable with an inner peripheral surface of the outer shell at a predetermined width in the axial direction.
    Type: Grant
    Filed: May 18, 2016
    Date of Patent: June 18, 2019
    Assignee: EAGLE INDUSTRY CO., LTD.
    Inventors: Tetsuya Endo, Hideki Kuriyama
  • Patent number: 10265268
    Abstract: The present invention addresses the issue of providing an external composition for screen foamers such as pump foamers, that can be safely used even when not removed after application. Provided is an external composition for screen foamers, including a non-ionic surfactant as a foaming component and, ideally, being in a soluble state.
    Type: Grant
    Filed: December 24, 2015
    Date of Patent: April 23, 2019
    Assignee: POLA PHARMA INC.
    Inventors: Hirokazu Kobayashi, Takaaki Masuda, Tetsuya Endo, Kahori Fujii
  • Publication number: 20180338671
    Abstract: An insert molded product in which a metal base member and a resin are bonded together includes a ground layer; a noble metal layer formed of a noble metal; a compound layer formed of a compound containing silicon (Si) and oxygen (O); and a mixture layer where the compound and the resin are mixed together, wherein the ground layer, the noble metal layer, the compound layer, and the mixture layer are formed in this order on the metal base member, and wherein nickel (Ni) is included in both the compound layer and the mixture layer.
    Type: Application
    Filed: July 31, 2018
    Publication date: November 29, 2018
    Applicant: OLYMPUS CORPORATION
    Inventors: Tetsuya ENDO, Naohito SHIGA, Kohei SHIRAMIZU, Junko NAKAMOTO
  • Publication number: 20180087665
    Abstract: The invention provides a metal bellows type accumulator having an outer shell provided in its one end with a pressure introducing passage in an opening manner, and a metal bellows repeatedly formed peak portions directed to an outer side in a radial direction and trough portions directed to an inner side, capable of expanding and contracting in an axial direction and separating an inner chamber of the outer shell into a pressure introducing chamber communicated with the pressure introducing passage and a gas chamber charged with cushion gas. A tubular portion is provided at a position where an amplitude of vibration in a radial direction becomes maximum in the metal bellows, has a greater diameter than a maximum diameter portion of each of the peak portions and is in contactable with an inner peripheral surface of the outer shell at a predetermined width in the axial direction.
    Type: Application
    Filed: May 18, 2016
    Publication date: March 29, 2018
    Inventors: Tetsuya ENDO, Hideki KURIYAMA
  • Patent number: 9911526
    Abstract: A magnet unit has a first magnet element and a second magnet element. The first magnet element includes a first magnet which is provided to stand upright on a yoke plate, a second magnet which is provided to stand upright on the yoke plate and has a magnetic pole unlike the first magnet, and a third magnet which is provided with a tilt between the first magnet and the second magnet. The second magnet element includes a fourth magnet which is provided to stand upright on the yoke plate, a fifth magnet which is arranged to stand upright on the yoke plate and has a magnetic pole unlike the fourth magnet, and a sixth magnet which is provided with a tilt between the fourth magnet and the fifth magnet. The first magnet element and the second magnet element are alternately arranged in an endless shape.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: March 6, 2018
    Assignee: CANON ANELVA CORPORATION
    Inventors: Tetsuya Endo, Einstein Noel Abarra
  • Publication number: 20170354598
    Abstract: The present invention addresses the issue of providing an external composition for screen foamers such as pump foamers, that can be safely used even when not removed after application. Provided is an external composition for screen foamers, including a non-ionic surfactant as a foaming component and, ideally, being in a soluble state.
    Type: Application
    Filed: December 24, 2015
    Publication date: December 14, 2017
    Inventors: Hirokazu KOBAYASHI, Takaaki MASUDA, Tetsuya ENDO, Kahori FUJII
  • Publication number: 20170028684
    Abstract: According to the present invention, there is provided an insert molded article comprising: a first member having gold plating formed at the surface; a surface layer of a porous silica film or an amorphous silica film, formed on at least a part of the surface of the gold plating; and a resin part molded on at least a part of the surface layer such that the resin part adheres tightly to the surface layer.
    Type: Application
    Filed: October 13, 2016
    Publication date: February 2, 2017
    Applicant: OLYMPUS CORPORATION
    Inventors: Shigeru IMAI, Naohito SHIGA, Tetsuya ENDO
  • Patent number: 9437404
    Abstract: A sputtering apparatus is provided with an elongated target holder, a substrate holder having a substrate receiving surface, and a mask assembly having an opening configured between the target holder and the substrate holder. The mask assembly is comprised of a first and second masking part having facing edges that form the opening and are disposed parallel to the substrate receiving surface and independently movable in a direction perpendicular to the length of the target holder and parallel to the substrate receiving surface, or in a direction perpendicular to the substrate receiving surface.
    Type: Grant
    Filed: May 8, 2013
    Date of Patent: September 6, 2016
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Noel Abarra, Tetsuya Endo
  • Patent number: 9299544
    Abstract: A sputtering apparatus includes a target electrode capable of mounting a target, a first support member which supports the target electrode, a magnet unit which forms a magnetic field on a surface of the target, a second support member which supports the magnet unit, and a force generation portion which is provided between the first support member and the second support member, and generates a second force in a direction opposite to a first force that acts on the second support member by an action of the magnetic field formed between the target and the magnet unit, wherein the second force has a magnitude which increases as the magnet unit comes closer to the target electrode.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: March 29, 2016
    Assignee: CANON ANELVA CORPORATION
    Inventor: Tetsuya Endo
  • Publication number: 20150235751
    Abstract: A magnet unit has a first magnet element and a second magnet element. The first magnet element includes a first magnet which is provided to stand upright on a yoke plate, a second magnet which is provided to stand upright on the yoke plate and has a magnetic pole unlike the first magnet, and a third magnet which is provided with a tilt between the first magnet and the second magnet. The second magnet element includes a fourth magnet which is provided to stand upright on the yoke plate, a fifth magnet which is arranged to stand upright on the yoke plate and has a magnetic pole unlike the fourth magnet, and a sixth magnet which is provided with a tilt between the fourth magnet and the fifth magnet. The first magnet element and the second magnet element are alternately arranged in an endless shape.
    Type: Application
    Filed: April 27, 2015
    Publication date: August 20, 2015
    Inventors: TETSUYA ENDO, EINSTEIN NOEL ABARRA
  • Patent number: 9058962
    Abstract: A magnet unit has a first magnet element and a second magnet element. The first magnet element includes a first magnet which is provided to stand upright on a yoke plate, a second magnet which is provided to stand upright on the yoke plate and has a magnetic pole unlike the first magnet, and a third magnet which is provided with a tilt between the first magnet and the second magnet. The second magnet element includes a fourth magnet which is provided to stand upright on the yoke plate, a fifth magnet which is arranged to stand upright on the yoke plate and has a magnetic pole unlike the fourth magnet, and a sixth magnet which is provided with a tilt between the fourth magnet and the fifth magnet. The first magnet element and the second magnet element are alternately arranged in an endless shape.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: June 16, 2015
    Assignee: Canon Anelva Corporation
    Inventors: Tetsuya Endo, Einstein Noel Abarra
  • Patent number: 8999121
    Abstract: The present invention provides a sputtering apparatus and a film-forming method capable of forming a magnetic film having a reduced variation in the orientation of the magnetic anisotropy. The sputtering apparatus of the present invention is equipped with a rotatable cathode and a rotatable stage. The stage can have an electrostatic chuck. Moreover, the stage may electrically be connected with a bias power source capable of applying a bias voltage to the stage. Furthermore, the stage may have the electrostatic chuck and electrically be connected with the bias power source.
    Type: Grant
    Filed: May 26, 2011
    Date of Patent: April 7, 2015
    Assignee: Canon Anelva Corporation
    Inventors: Kyosuke Sugi, Tetsuya Endo, Einstein Noel Abarra
  • Patent number: 8810974
    Abstract: The present invention is directed to align crystal c-axes in magnetic layers near two opposed junction wall faces of a magnetoresistive element so as to be almost perpendicular to the junction wall faces. A magnetic sensor stack body has, on a substrate, a magnetoresistive element whose electric resistance fluctuates when a bias magnetic field is applied and, on sides of opposed junction wall faces of the magnetoresistive element, field regions including magnetic layers for applying the bias magnetic field to the element. The magnetoresistive element has at least a ferromagnetic stack on a part of an antiferromagnetic layer, and width of an uppermost face of the ferromagnetic stack along a direction in which the junction wall faces are opposed to each other is smaller than width of an uppermost face of the antiferromagnetic layer in the same direction.
    Type: Grant
    Filed: August 4, 2010
    Date of Patent: August 19, 2014
    Assignee: Canon Anelva Corporation
    Inventors: Abarra Einstein Noel, Masahiro Suenaga, Yoshinori Ota, Tetsuya Endo
  • Patent number: 8778150
    Abstract: To provide a magnetron sputtering cathode, a magnetron sputtering apparatus, and a method of manufacturing a magnetic device, capable of generating a leakage magnetic field sufficiently large to form a magnetic tunnel necessary for discharge on the surface of a target even when the target is a magnetic body and thick and a ferromagnetic body is used as the target. The magnetron sputtering cathode of the present invention includes a target having a second annular groove provided on the sputtering surface of the target, a third annular projection provided on the non-sputtering surface of the target, a fourth annular groove provided outside the third annular projection on the non-sputtering surface, and a fourth annular projection provided outside the fourth annular groove on the non-sputtering surface. Further, the magnetron sputtering cathode includes a first magnet and a second magnet 6 having a polarity different from that of the first magnet on the non-sputtering surface side.
    Type: Grant
    Filed: February 8, 2010
    Date of Patent: July 15, 2014
    Assignee: Canon Anelva Corporation
    Inventors: Tetsuya Endo, Einstein Noel Abarra
  • Patent number: 8776542
    Abstract: A cooling system that cools a wafer in a vacuum chamber of a sputtering apparatus, includes a wafer cooling stage for cooling the wafer, a cooling mechanism for cooling the wafer cooling stage, cooling gas supply units which introduces a cooling gas to the wafer cooling stage, a wafer rotating mechanism which holds the wafer in a state separated from the wafer cooling stage by a predetermined gap, and is rotated while holding the wafer, and a driving mechanism which rotates the wafer rotating mechanism at a predetermined rotational speed.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: July 15, 2014
    Assignee: Canon Anelva Corporation
    Inventors: Tetsuya Endo, Einstein Noel Abarra
  • Publication number: 20140097079
    Abstract: The present invention provides a film forming method which can reduce deterioration of film thickness distribution even if the thickness of a film to be formed is extremely small while improving use efficiency of a target and a sputtering apparatus. A film forming method by a sputtering apparatus according to one embodiment of the present invention has a first step of fixing a magnet to a first position and performing film formation on a substrate on a substrate support surface, a second step of moving the magnet to a second position different from the first position after finishing the film formation on the substrate and then fixing it thereto, and a third step of performing film formation on the substrate on the substrate support surface by using the magnet fixed to the second position.
    Type: Application
    Filed: December 6, 2013
    Publication date: April 10, 2014
    Applicant: Canon Anelva Corporation
    Inventors: Tetsuya ENDO, Hiroyuki HOSOYA
  • Patent number: 8673124
    Abstract: The present invention provides a magnet unit and a magnetron sputtering apparatus which can suppress the consumption amount of a target by efficiently consuming the target and can easily cause erosion on the target to progress uniformly regardless whether the target size is small or large and whether the target is made of magnetic material or not.
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: March 18, 2014
    Assignee: Canon Anelva Corporation
    Inventors: Tetsuya Endo, Einstein Noel Abarra
  • Publication number: 20130299345
    Abstract: A sputtering apparatus is provided with an elongated target holder, a substrate holder having a substrate receiving surface, and a mask assembly having an opening configured between the target holder and the substrate holder. The mask assembly is comprised of a first and second masking part having facing edges that form the opening and are disposed parallel to the substrate receiving surface and independently movable in a direction perpendicular to the length of the target holder and parallel to the substrate receiving surface, or in a direction perpendicular to the substrate receiving surface.
    Type: Application
    Filed: May 8, 2013
    Publication date: November 14, 2013
    Applicant: iZA CORPORATION
    Inventors: Noel Abarra, Tetsuya Endo