Abstract: The present invention provides a sputtering apparatus and a film deposition method capable of forming a magnetic film with reduced variations in the direction of magnetic anisotropy. The sputtering apparatus of the present invention is provided with a rotatable cathode (802), a rotatable stage (801) and a rotatable shielding plate (805). The sputtering apparatus controls the rotation of at least one of the cathode (802), stage (801) and shielding plate (805) so that sputtered particles impinging at an angle formed with respect to a normal line of the substrate (804) of 0° or more and 50° or less out of sputtered particles generated from the target (803a) during sputtering are made to impinge on the substrate (804).

Abstract: The present invention provides a sputtering apparatus and a film forming method that can form a high quality film in a groove having a sloping wall such as a V-groove. The sputtering apparatus of the present invention includes a rotatable cathode (102), a rotatable stage (101), and a rotatable shield plate (105). The sputtering apparatus controls rotation of at least one of the cathode (102), the stage (101), and the shield plate (105) so that sputtering particles are incident on the V-groove formed in a substrate (104) at an angle of 50° or less with respect to a normal to a sloping wall of the V-groove.

Abstract: To provide a sputtering apparatus that enables oblique film forming by arranging a target and a substrate so as to allow sputtered particles emitted from the target to obliquely enter the substrate selectively, and can form a magnetic film having high uniaxial magnetic anisotropy uniformly and compactly. A sputtering apparatus includes a cathode having a sputtering target supporting surface, the cathode being provided with a rotation axis about which the sputtering target supporting surface rotates, and a stage having a substrate supporting surface, the stage being provided with a rotation axis about which the substrate supporting surface rotates, and the sputtering apparatus is constituted such that the sputtering target supporting surface and the substrate supporting surface face to each other, and are rotatable independently about respective rotation axes.

Abstract: A magnetron unit includes a plurality of first magnet elements each including first magnets which have the same polarity and are provided on two end portions of a yoke plate made of a magnetic material and a second magnet which has a polarity different from that of the first magnets and is provided on a middle portion of the yoke plate, a base plate on which a moving unit is placed to make each of the plurality of first magnet elements move in one direction, and a second magnet element which includes yoke plates made of a magnetic material and fixed to two end portions respectively, of the base plate, a magnet which has the same polarity as that of the second magnet and is placed on the yoke plate and a magnet which has the same polarity as that of the first magnet and is placed on the magnet.

Abstract: The magnet assembly includes one rotatable dipole magnet subassembly, which is formed from a permanent magnet and a magnetically permeable convex end portion coupled to each of both ends of the permanent magnet, and at least two magnetically permeable flux guide subassemblies, which are configured so as to be magnetically coupled to the dipole magnet subassembly. The flux guide subassembly has a concave end portion that fits into the convex end portion. The flux guide assemblies guide a flux from the dipole magnet subassembly and generate a flux outside. The condition of fitting into the flux guide subassemblies is reversed by rotating the dipole magnet subassembly, whereby it is possible to easily reverse the direction of a magnetic field generated outside.

Abstract: An absorption chiller-heater is driven by a high-temperature exhaust gas discharged from an external apparatus such as a gas turbine. The absorption chiller-heater includes an exhaust gas path for introducing a high-temperature exhaust gas serving as a heat source into the high-temperature generator, and then the exhaust heat recovery generator. The high-temperature generator and the exhaust heat recovery generator comprise a vertical heat transfer tube bank for allowing the high-temperature exhaust gas to pass therethrough, a gas-liquid separation chamber is provided above the vertical heat transfer tube bank so as to cover opening portions of the vertical heat transfer tube bank, and a solution supply chamber is provided below the vertical heat transfer tube bank so as to cover opening portions of the vertical heat transfer tube bank.

Abstract: An absorption cold or hot water generating machine is driven by a high-temperature exhaust gas discharged from an external apparatus such as a gas turbine. The absorption cold or hot water generating machine includes an exhaust gas path for introducing a high-temperature exhaust gas serving as a heat source into a high-temperature generator, and then an exhaust heat recovery generator. A low-temperature generator comprises a liquid film-type generator in which solution is sprayed on a heat transfer tube bank, and refrigerant vapor generated in the exhaust heat recovery generator is led to a heat transfer tube bank of the low-temperature generator.

Abstract: An absorption chiller-heater is driven by a high-temperature exhaust gas discharged from an external apparatus such as a gas turbine. The absorption chiller-heater includes an exhaust gas path for introducing a high-temperature exhaust gas serving as a heat source into the high-temperature generator, and then the exhaust heat recovery generator. The high-temperature generator and the exhaust heat recovery generator comprise a vertical heat transfer tube bank for allowing the high-temperature exhaust gas to pass therethrough, a gas-liquid separation chamber is provided above the vertical heat transfer tube bank so as to cover opening portions of the vertical heat transfer tube bank, and a solution supply chamber is provided below the vertical heat transfer tube bank so as to cover opening portions of the vertical heat transfer tube bank.

Abstract: An absorption cold or hot water generating machine is driven by a high-temperature exhaust gas discharged from an external apparatus such as a gas turbine. The absorption cold or hot water generating machine includes an exhaust gas path for introducing a high-temperature exhaust gas serving as a heat source into a high-temperature generator, and then an exhaust heat recovery generator. A low-temperature generator comprises a liquid film-type generator in which solution is sprayed on a heat transfer tube bank, and refrigerant vapor generated in the exhaust heat recovery generator is led to a heat transfer tube bank of the low-temperature generator.

Abstract: A semiconductor integrated circuit device includes a reference voltage generating circuit outputting a reference voltage from a step-up voltage, a step-up circuit stepping up the reference voltage within a range lower than an external power supply voltage and thus outputting the above step-up voltage, a step-down circuit stepping down the external power supply voltage and thus outputting a step-down voltage equal to the reference voltage, and an internal circuit receiving, as a power supply voltage thereof, the step-down voltage.

Abstract: A semiconductor memory device includes a plurality of banks each having a memory cell array and sense amplifiers, a data input/output circuit and an address circuit. A first part of the device receives control signals from an outside of the semiconductor memory device and generates a refresh signal therefrom. A second part generates bank select signals in response to the refresh signal, the bank select signals being used to select the plurality of banks. A third part receives the bank select signals and generating latch enable signals therefrom, the latch enable signals driving the sense amplifiers provided in the plurality of banks. A refresh operation is carried out by activating the sense amplifiers by using the latch enable signals.

Abstract: The present invention is provided with a film holding means, a plural of vessels, processing condition setting means for setting the processing condition corresponding to the qualitative state of the processing solution in each of the vessels, and film processing and transferring means for processing and transferring the undeveloped film, making it possible to prevent film injury and to perform the most appropriate film developing process independent of experience and skill, by holding the film, submerging the film in each of the vessels, shuffling the film in each of the vessels, and setting the processing condition corresponding to the qualitative state of each processing solution.