Abstract: A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.

Abstract: A scanning probe microscopy device for mapping nanostructures on a sample surface of a sample is provided. The device may comprise a plurality probes for scanning the sample surface, and one or more motion actuators for enabling motion of the probes relative to the sample, wherein each of the plurality of probes comprises a probing tip mounted on a cantilever arranged for bringing the probing tip in contact with the sampling surface for enabling the scanning. The device may further comprise a plurality of Z-position detectors for determining a position of each probing tip along a Z-direction when the probing tip is in contact with the sample surface, wherein the Z-direction is a direction transverse to the sample surface, for enabling mapping of the nanostructures.

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract: An object is mounted on a surface of a sample carrier. Properties of the surface of the object are measured and/or modified by means of a plurality of independently movable heads, each comprising a microscopic probe. The heads being located between the surface of a reference grid plate and the surface of the sample carrier. Head specific target locations are selected for the heads. Each head is moved over the surface of the reference grid plate, to the target location of the head. During movement a position of the head is determined from markings on the reference grid plate sensed by sensor in the head. When the sensor has indicated that the head is at the target location selected for the head a force between the head and the reference grid plate is switched to seat and/or clamp the head on the reference grid plate.

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract: A scanning probe microscopy device for mapping nanostructures on a sample surface of a sample is provided. The device may comprise a plurality probes for scanning the sample surface, and one or more motion actuators for enabling motion of the probes relative to the sample, wherein each of the plurality of probes comprises a probing tip mounted on a cantilever arranged for bringing the probing tip in contact with the sampling surface for enabling the scanning. The device may further comprise a plurality of Z-position detectors for determining a position of each probing tip along a Z-direction when the probing tip is in contact with the sample surface, wherein the Z-direction is a direction transverse to the sample surface, for enabling mapping of the nanostructures.

Abstract: A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.

Abstract: An active vibration isolation and damping system (11) comprising a payload (12) that has to be isolated or damped, a vibration sensor (14) for detecting a vibration of the payload, an actuator (15) for moving the payload relative to a bearing body (13) supporting the payload, and a controller (16) for providing the actuator with a signal that is representative for the vibration. The system provides a solution for the tilting problem by applying a vibration sensor that has a low stiffness connection to the payload (12) for rotation along an axis (17) perpendicular to the gravitational force (18), and a high stiffness connection to the payload (12) for the vibration detectable with the vibration sensor.

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract: The invention relates to an instrument, preferably for minimally invasive surgery, comprising a frame (27) having a proximal end and a distal end, a first working element (4) having a first origin located at the distal end and a second working element (5) having a second origin and being arranged at the distal end cooperating with the first working element, a force sensor for measuring a force exerted on at least one of the said the first and the second working elements, wherein the distal end of the frame comprises an opening (23) between the first origin and the second origin, the force sensor being arranged on the frame in a vicinity of the opening.

Abstract: A vibration sensor comprises a reference mass, a resilient element supporting the reference mass, and a base supporting the resilient element, and further comprises a displacement sensor for determining the distance between the reference mass and the base. In accordance with the invention the vibration sensor comprises an actuator that is situated between the resilient element and the base, a second displacement sensor, and a controller for providing an output signal to the actuator.

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.

Abstract: The invention relates to a plant illumination device for exposing to light plants that are to be grown in a greenhouse, which plant illumination device comprises: at least one lighting fitting with a first light source, which first light source is an assimilation lamp in the form of an incandescent lamp or a gas discharge lamp, the first light source having a first spectrum, and said first light source having a power of at least 250 W; —at least one additional lighting unit (5) with an additional light source, which additional light source has an additional spectrum which differs significantly from the first spectrum, and in which the additional spectrum complements the first spectrum in at least a wavelength range which plays a role in a biological process in the plants to be exposed to light.

Abstract: A greenhouse lighting system comprising a greenhouse lighting fitting having a lamp holder (370) with an outer ring (371) provided in a cavity in the lamp holder; which can be electrically connected to a phase, and an assimilation lamp (140, 240, 340) which comprises a lamp cap (142, 242, 342) and a bulb and can be screwed into the lamp holder via an insertion opening. The greenhouse lighting system comprises an electrically insulating gasket (100, 200, 300) which is situated around the lamp cap of the assimilation lamp in such a manner that the lamp cap can no longer be touched with a finger when the lamp cap contacts the outer ring.

Abstract: The invention relates to a greenhouse lighting fitting that is in particular suitable for use in combination with an assimilation lamp. The greenhouse lighting fitting has a fitting body which comprises a fastening element for mechanically fastening the greenhouse lighting fitting to a part of a bearing structure, a reflector for directing the light emanating from a lamp fitted in the greenhouse lighting fitting downwards and a contact member for making an electrical connection with a lamp fitted in the greenhouse lighting fitting.

Abstract: A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Abstract: A lithographic apparatus is disclosed having an in situ ozonizer, which is used to produce ozone gas, for example, by UV irradiation of an oxygen-containing gas. The thus produced ozone is dissolved in ultra-pure water by contacting the ozone with the ultra-pure water through a permeable membrane.