Abstract: A coordinate measuring device having a probe comprising a stylus (14) with a sensing member (18) for contacting the object (15) to be measured, a support unit (13) to which the stylus (14) is connected through elastic means (19), and magnet means (46) for damping vibrations of the stylus (14) by generating eddy currents in conductive material. The elastic means (19) comprise at least one leaf spring (41) made of conductive material, and said magnet means (46) generate eddy currents in said leaf spring (41).

Abstract: In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.

Abstract: An apparatus provided with wedge-shaped elements is proposed for the precision positioning of objects 37 to be measured or machined. A wedge-shaped translational body 32 is carried by two bearing wedges 24, 26. In accordance with the invention the wedges can be independently translated in the x direction. The body is translated in the z direction by moving the bearing wedges over an equal distance but in opposite directions. The body is translated in the y direction by moving the bearing wedges over an equal distance in the same direction. The mutually moving parts of the apparatus are carried by means of fluid bearings. A high precision is thus obtained, because fewer errors due to non-infinite stiffnesses and error motions are accumulated. A laser measuring apparatus 74, 38, 40 is used for measuring and adjusting the position of the object carrier 35.

Abstract: Method and device for rotating a wafer which is arranged floating in a reactor. The wafer is treated in a reactor of this nature, and it is important for this treatment to be carried out as uniformly as possible. For this purpose, it is proposed to rotate the wafer by allowing the gas flow to emerge perpendicular to the surface of the wafer and then to impart to this gas a component which is tangential with respect to the wafer, thus generating rotation. This tangential component may be generated by the provision of grooves, which may be of spiral or circular design.

Abstract: An apparatus provided with wedge-shaped elements is proposed for the precision positioning of objects 37 to be measured or machined. A wedge-shaped translational body 32 is carried by two bearing wedges 24, 26. In accordance with the invention the wedges can be independently translated in the x direction. The body is translated in the z direction by moving the bearing wedges over an equal distance but in opposite directions. The body is translated in the y direction by moving the bearing wedges over an equal distance in the same direction. The mutually moving parts of the apparatus are carried by means of fluid bearings. A high precision is thus obtained, because fewer errors due to non-infinite stiffnesses and error motions are accumulated. A laser measuring apparatus 74, 38, 40 is used for measuring and adjusting the position of the object carrier 34.

Abstract: Device for the floating accommodation of a wafer. This device comprises two mutually opposite parts which delimit a chamber in which the wafer is placed. By gas being supplied from opposite sides, the wafer is held in a floating position. To prevent the wafer from touching the lateral boundaries, it is proposed to provide a discharge of gas at least partially near the circumference of the chamber wherein the wafer is accommodated. This discharge is realised such that if the wafer moves from the intended position to such a gas discharge, by closing of said gas discharge, the pressure is locally increased such that a force is generated acting in opposite direction to return the wafer in the intended position.

Abstract: Precision measuring apparatus like Co-ordinate Measuring Machines (CMMs) are very susceptible to deformations due to temperature variations and gradients. In a known CCM such variations are counteracted by providing parts of the apparatus with an insulating PUR layer. According to the invention the metrology frame 2 of the measuring apparatus is provided with a heat shield 12, 15 which includes an inner layer 12, having a comparatively high heat resistance, and an outer layer (14) which has a comparatively low heat resistance. Temperature gradients causing deformations of the metrology frame 2 are thus effectively reduced, whereas homogeneous temperature variations can be easily compensated for by means of software correction. Moreover, the shield acts as a low-pass filter which reduces the temperature disturbances due to short-term heat inputs.

Abstract: Precision measuring apparatus like Co-ordinate Measuring Machines (CMMs) are very susceptible to deformations due to temperature variations and gradients. In a known CCM such variations are counteracted by providing parts of the apparatus with an insulating PUR layer. According to the invention the metrology frame 2 of the measuring apparatus is provided with a heat shield 12, 15 which includes an inner layer 12, having a comparatively high heat resistance, and an outer layer (14) which has a comparatively low heat resistance. Temperature gradients causing deformations of the metrology frame 2 are thus effectively reduced, whereas homogeneous temperature variations can be easily compensated for by means of software correction. Moreover, the shield acts as a low-pass filter which reduces the temperature disturbances due to short-term heat inputs.