Patents by Inventor Theodorus Marinus Modderman

Theodorus Marinus Modderman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10324384
    Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.
    Type: Grant
    Filed: June 4, 2015
    Date of Patent: June 18, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Gerben Pieterse, Theodorus Wilhelmus Polet, Johannes Jacobus Matheus Baselmans, Willem Jan Bouman, Theodorus Marinus Modderman, Cornelius Maria Rops, Bart Smeets, Koen Steffens, Ronald Van Der Ham
  • Patent number: 10248035
    Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Theodorus Marinus Modderman
  • Patent number: 10222706
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Grant
    Filed: June 18, 2015
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Publication number: 20180210350
    Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.
    Type: Application
    Filed: June 4, 2015
    Publication date: July 26, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerben PIETERSE, Theodorus Wilhelmus POLET, Johannes Jacobus Matheus BASELMANS, Willem Jan BOUMAN, Theodorus Marinus MODDERMAN, Cornelius Maria ROPS, Bart SMEETS, Koen STEFFENS, Ronald VAN DER HAM
  • Patent number: 10001712
    Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: June 19, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Theodorus Wilhelmus Polet, Johannes Jacobus Matheus Baselmans, Willem Jan Bouman, Han Henricus Aldegonda Lempens, Theodorus Marinus Modderman, Cornelius Maria Rops, Bart Smeets, Koen Steffens, Ronald Van Der Ham
  • Patent number: 9964858
    Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
    Type: Grant
    Filed: July 23, 2015
    Date of Patent: May 8, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman
  • Publication number: 20180059556
    Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
    Type: Application
    Filed: November 2, 2017
    Publication date: March 1, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Theodorus Marinus MODDERMAN
  • Patent number: 9835960
    Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
    Type: Grant
    Filed: July 21, 2016
    Date of Patent: December 5, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Theodorus Marinus Modderman
  • Publication number: 20170219939
    Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.
    Type: Application
    Filed: June 26, 2015
    Publication date: August 3, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Theodorus Wilhelmus POLET, Johannes Jacobus BASELMANS, Willem Jan BOUMAN, Han Henricus Aldegonda LEMPENS, Theodorus Marinus MODDERMAN, Cornelius Maria ROPS, Bart SMEETS, Koen STEFFENS, Ronald VAN DER HAM
  • Publication number: 20170010546
    Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
    Type: Application
    Filed: July 21, 2016
    Publication date: January 12, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Theodorus Marinus MODDERMAN
  • Patent number: 9417535
    Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
    Type: Grant
    Filed: March 18, 2015
    Date of Patent: August 16, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Theodorus Marinus Modderman
  • Patent number: 9329494
    Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: May 3, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Theodorus Marinus Modderman
  • Publication number: 20160062248
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Application
    Filed: November 10, 2015
    Publication date: March 3, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
  • Publication number: 20150362844
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Application
    Filed: June 18, 2015
    Publication date: December 17, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Antonius Theodorus Anna Maria DERKSEN, Christiaan Alexander HOOGENDAM, Aleksey KOLESNYCHENKO, Erik Roelof LOOPSTRA, Theodorus Marinus MODDERMAN, Johannes Catharinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Helmar VAN SANTEN
  • Patent number: 9195153
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: November 24, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
  • Publication number: 20150331334
    Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
    Type: Application
    Filed: July 23, 2015
    Publication date: November 19, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joannes Theodoor DE SMIT, Vadim Yevgenyevich BANINE, Theodorus Hubertus Josephus BISSCHOPS, Marcel Mathijs Theodore Marie DIERICHS, Theodorus Marinus MODDERMAN
  • Patent number: 9116443
    Abstract: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate table exchange and/or substrate loading and unloading.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: August 25, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Theodorus Marinus Modderman
  • Patent number: 9110389
    Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: August 18, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joannes Theodoor De Smit, Vadim Yevgenyevich Banine, Theodorus Hubertus Josephus Bisschops, Marcel Mathijs Theodore Marie Dierichs, Theodorus Marinus Modderman
  • Patent number: 9091940
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: July 28, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Joeri Lof, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Alexander Straaijer, Bob Streefkerk, Joannes Theodoor De Smit, Helmar Van Santen
  • Publication number: 20150192864
    Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
    Type: Application
    Filed: March 18, 2015
    Publication date: July 9, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Theodorus Marinus MODDERMAN