Abstract: The invention pertains to a method to sporulate coccidial oocysts purified from animal faeces (5), the method comprising providing the purified oocysts as a layer (40) on a supporting surface (22), maintaining the layer at least intermittently in an oxygen containing gaseous environment (60) having a relative humidity of at least 15% and maintaining the temperature of the oocysts between 19° C. and 37° C. The invention also pertains to sporulated oocysts obtained with this method and to a vaccine containing such sporulated oocysts.

Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

Abstract: The present invention generally relates to the fields of parasitology and immunology, and especially to a vaccine against Rhipicephalus ticks. In particular the invention relates to a composition comprising a first and a second protein, in particular Bm86 and Subolesin proteins, including their homologs or immunogenic fragments; to the use of such a composition as a vaccine against Rhipicephalus ticks, and to the use of the first and the second isolated proteins for the vaccination of a target against Rhipicephalus ticks.

Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.

Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.

Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Abstract: A snow compression and removal device is provided that includes a horizontal auger supported within a concave snow plow, a pump having an input disposed at a first end of the auger and an opening at a second end, a compression module first end disposed at an output of the pump, where the compression module includes a tubular casing having a snow inlet and a snow outlet, where the snow outlet has a converging or straight cross-section tubular shape that is perforated with air holes, and a conveyor screw, where the conveyor screw rotates on an axis that is disposed concentric to the tubular casing and spans from the snow inlet to the outlet and is powered to move and compact snow from the inlet to the outlet, where air from the snow is exhausted through the air holes, where the compressed snow is output.

Abstract: The present invention relates to the field of veterinary parasitology, especially of canine Babesiosis. In particular the invention relates to a polypeptide being a novel canine Babesia antigen (CBA), or fragments thereof, and to compositions comprising this antigen, to nucleic acids encoding the antigen, antibodies against the antigen, and medical uses of this antigen, fragments, antibodies, or encoding nucleic acids. In particular the invention relates to the use of such components in vaccines against canine Babesiosis.

Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.

Abstract: The present invention generally relates to the fields of parasitology and immunology, and especially to a vaccine against Rhipicephalus ticks. In particular the invention relates to a composition comprising a first and a second protein, in particular Bm86 and Subolesin proteins, including their homologs or immunogenic fragments; to the use of such a composition as a vaccine against Rhipicephalus ticks, and to the use of the first and the second isolated proteins for the vaccination of a target against Rhipicephalus ticks.

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Abstract: A snow compression and removal device is provided that includes a horizontal auger supported within a concave snow plow, a pump having an input disposed at a first end of the auger and an opening at a second end, a compression module first end disposed at an output of the pump, where the compression module includes a tubular casing having a snow inlet and a snow outlet, where the snow outlet has a converging or straight cross-section tubular shape that is perforated with air holes, and a conveyor screw, where the conveyor screw rotates on an axis that is disposed concentric to the tubular casing and spans from the snow inlet to the outlet and is powered to move and compact snow from the inlet to the outlet, where air from the snow is exhausted through the air holes, where the compressed snow is output.

Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.