Abstract: A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

Abstract: A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: The invention relates to Babesia proteins of a 28kDa protein family and to immunogenic fragments of such proteins, to nucleic acids encoding such proteins or fragments, to cDNA fragments, recombinant DNA molecules, live recombinant carriers, or host cells comprising such nucleic acids, to vaccines, to methods for the preparation of such vaccines, to the use of such proteins or fragments for the prophylactic or therapeutic treatment of an infection or its clinical signs caused by an organism of the family Babesiidae, and to diagnostic tests for detection of nucleic acids, antibodies or antigens of an organism of the family Babesiidae.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: The present invention relates to nucleic acid sequences encoding novel Babesia canis associated proteins and to cDNA fragments, recombinant DNA molecules and live recombinant carriers comprising these sequences. Furthermore, the invention relates to host cells comprising such nucleic acid sequences, cDNA fragments, recombinant DNA molecules and live recombinant carriers. Also, the invention relates to proteins encoded by these nucleotide sequences, to vaccines for combating Babesia canis infections comprising these proteins or genetic material encoding these proteins and methods for the preparation of vaccines. Another embodiment of the invention relates to these Babesia canis associated proteins for use in vaccines and to the use of the Babesia canis associated proteins in the manufacture of vaccines.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line for connection with the article clamp. According to the invention, a buffer volume is provided for providing a buffered gas pressure pulse in the supply line. In this way, faster clamp response times can be realized.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

Abstract: The present invention relates to coccidia strains and, in one embodiment, to microbiological cultures comprising such strains. In preferred embodiments, the coccidia strains are selected for tolerance to one group of coccidiostatic drugs, sensitivity to a second group of coccidiostatic drugs, and decreased proliferative capacity. Another embodiment of the invention relates to vaccines based on the coccidia strains according to the invention.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a substrate support constructed to support a substrate, a projection system configured to project a patterned radiation beam onto a target portion of the substrate, and a frame onto which at least a part of the projection system is mounted. A fluid provider is arranged to provide a fluid between the substrate and a downstream end of the projection system. The apparatus also includes an actuator associated with the frame and with the fluid provider and arranged to position the fluid provider, and a cushion system for cushioning vibrational forces when the actuator positions the fluid provider.

Abstract: The present invention relates to nucleic acid sequences encoding novel Babesia canis associated proteins and to cDNA fragments, recombinant DNA molecules and live recombinant carriers comprising these sequences. Furthermore, the invention relates to host cells comprising such nucleic acid sequences, cDNA fragments, recombinant DNA molecules and live recombinant carriers. Also, the invention relates to proteins encoded by these nucleotide sequences, to vaccines for combating Babesia canis infections comprising these proteins or genetic material encoding these proteins and methods for the preparation of vaccines. Another embodiment of the invention relates to these Babesia canis associated proteins for use in vaccines and to the use of the Babesia canis associated proteins in the manufacture of vaccines.

Abstract: A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surface to support the article on the protrusions. The apparatus also includes a detector for detecting height deviations of the protrusions that affect a surface flatness of the article, a height adjustment device arranged to independently modify a height of the individual protrusions when the support table is operable in the apparatus, and a controller coupled between the detector and the height adjustment device and arranged to control the height adjustment device to adjust the height of the protrusions corresponding to the detected height deviations of the protrusions that affect the surface flatness of the article.

Abstract: The present invention relates to nucleic acid sequences encoding novel Babesia canis associated proteins and to cDNA fragments, recombinant DNA molecules and live recombinant carriers comprising these sequences. Furthermore, the invention relates to host cells comprising such nucleic acid sequences, cDNA fragments, recombinant DNA molecules and live recombinant carriers. Also, the invention relates to proteins encoded by these nucleotide sequences, to vaccines for combating Babesia canis infections comprising these proteins or genetic material encoding these proteins and methods for the preparation of vaccines. Another embodiment of the invention relates to these Babesia canis associated proteins for use in vaccines and to the use of the Babesia canis associated proteins in the manufacture of vaccines.

Abstract: The present invention relates to coccidiosis strains and, in another embodiment to microbiological cultures comprising such strains. Another embodiment of the invention relates to vaccines based thereon. Still other embodiments relate to the use of such strains for the preparation of vaccines for the protection against coccidiosis and to methods for the preparation of such vaccines.

Abstract: The invention is directed to a vaccine comprising Babesia canis antigens from a strain of Babesia canis rossi and another Babesia canis subspecies.Such a vaccine gives both homologous protection, and heterologous protection to infection with strains other than those of which the antigens have been isolated.Preferably the antigens are soluble antigens which can be harvested from the supernatant of a culture of Babesia parasites.