Patents by Inventor Thomas Hantschel

Thomas Hantschel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240175896
    Abstract: One embodiment of the present disclosure is related to a method for producing a substrate comprising a plurality of tips suitable to be used in scanning probe microscopy (SPM), wherein as a first step, a substrate is produced or provided comprising a plurality of nano-sized tips, preferably arranged in a regular array and spaced apart by nano-sized interspacings. A mask is applied to this substrate, comprising multiple mask portions, wherein each mask portion covers at least one tip, whereafter the substrate is subjected to an etching process relative to the mask portions. After the removal of the mask portions, the method results in the creation of a substrate comprising multiple pedestals having each at least one nanotip on the upper surface thereof and spaced apart at a distance suitable for performing an SPM measurement of a given type.
    Type: Application
    Filed: November 30, 2023
    Publication date: May 30, 2024
    Inventors: Thomas Hantschel, XiuMei Xu
  • Patent number: 11955368
    Abstract: According to one aspect, a reconditioning wafer can include a carrier substrate that supports at least one array of regularly spaced protrusions configured to form indentations in a support surface of a wafer holding stage. The protrusions within the same array can have substantially the same shape and dimensions, thereby enabling a more reliable reconditioning process compared to prior art solutions. The protrusions may have the form of pyramids or pillars or other similar shapes with at least the tip of the protrusions formed of a material suitable to make the indentations. The reconditioning wafer can be obtainable by a molding technique wherein an array of molds can be created in a mold substrate. The molds can be filled with an indentation material such as diamond, and can be bonded to the carrier substrate. The mold substrate can be removed by thinning and wet etching.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: April 9, 2024
    Assignee: IMEC VZW
    Inventor: Thomas Hantschel
  • Publication number: 20230359793
    Abstract: A method for simulating a subterranean volume includes receiving one or more input parameters and one or more simulation realizations representing the subterranean domain, modeling the one or more simulation realizations as a target function of the one or more input parameters, training a machine-learning model to predict values for the target function using the one or more input parameters and the one or more simulation realizations, predicting a value for the target function based on a first candidate simulation or a first candidate output parameter of a simulation, selecting the first candidate simulation, the first candidate output parameter, or both based on the predicted value of the target function, and simulating the subterranean volume using the first candidate output parameter, or both.
    Type: Application
    Filed: September 23, 2021
    Publication date: November 9, 2023
    Inventors: Adrian KLEINE, Thomas HANTSCHEL
  • Patent number: 11650171
    Abstract: Methods and apparatus determine offcut angle of a crystalline sample using electron channeling patterns (ECPs), wherein backscattered electron intensity exhibits angular variation dependent on crystal orientation. A zone axis normal to a given crystal plane follows a circle as the sample is azimuthally rotated. On an ECP image presented with tilt angles as axes, the radius of the circle is the offcut angle of the sample. Large offcut angles are determined by a tilt technique that brings the zone axis into the ECP field of view. ECPs are produced with a scanning electron beam and a monolithic backscattered electron detector; or alternatively with a stationary electron beam and a pixelated electron backscatter diffraction detector. Applications include strain engineering, process monitoring, detecting spatial variations, and incoming wafer inspection. Methods are 40× faster than X-ray diffraction. 0.01-0.1° accuracy enables semiconductor applications.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: May 16, 2023
    Assignee: FEI Company
    Inventors: Han Han, Libor Strakos, Thomas Hantschel, Tomas Vystavel, Clement Porret
  • Publication number: 20220412900
    Abstract: Methods and apparatus determine offcut angle of a crystalline sample using electron channeling patterns (ECPs), wherein backscattered electron intensity exhibits angular variation dependent on crystal orientation. A zone axis normal to a given crystal plane follows a circle as the sample is azimuthally rotated. On an ECP image presented with tilt angles as axes, the radius of the circle is the offcut angle of the sample. Large offcut angles are determined by a tilt technique that brings the zone axis into the ECP field of view. ECPs are produced with a scanning electron beam and a monolithic backscattered electron detector; or alternatively with a stationary electron beam and a pixelated electron backscatter diffraction detector. Applications include strain engineering, process monitoring, detecting spatial variations, and incoming wafer inspection. Methods are 40× faster than X-ray diffraction. 0.01-0.1° accuracy enables semiconductor applications.
    Type: Application
    Filed: June 24, 2021
    Publication date: December 29, 2022
    Applicant: FEI Company
    Inventors: Han Han, Libor Strakos, Thomas Hantschel, Tomas Vystavel, Clement Porret
  • Publication number: 20220178236
    Abstract: A method, comprising receiving input data representing a subterranean formation, defining a grid representing the input data, with the grid including cells. The method also includes identifying at least one of the cells in which kerogen is present based on the input data, simulating hydrocarbon movement within the kerogen using the grid, and generating a model of hydrocarbon expulsion to pore space based on the simulating.
    Type: Application
    Filed: March 6, 2020
    Publication date: June 9, 2022
    Inventors: Adrian Kleine, Christian Vogt, Thomas Hantschel
  • Patent number: 11269113
    Abstract: A method, apparatus, and program product model address a modeling gap existing between basin and reservoir modeling through the use of a Reservoir Fluid Geodynamics (RFG) model usable for simulations conducted at a relatively fine spatial resolution and over a geological timescale.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: March 8, 2022
    Assignee: Schlumberger Technology Corporation
    Inventors: Armin Kauerauf, Oliver C. Mullins, Thomas Hantschel, Kang Wang, Adrian Kleine, Youxiang Zuo
  • Patent number: 11112427
    Abstract: The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.
    Type: Grant
    Filed: October 13, 2020
    Date of Patent: September 7, 2021
    Assignee: IMEC VZW
    Inventors: Thomas Hantschel, Hugo Bender, Kristof Paredis, Antti Kanniainen
  • Patent number: 11035880
    Abstract: Example embodiments relate to methods for producing a probe suitable for scanning probe microscopy. One embodiment includes a method for producing a probe tip suitable for scanning probe microscopy. The method includes producing a probe tip body that includes at least an outer layer of a probe material. The method also includes, during the production of the probe tip body or after the production, forming a mask layer on the outer layer of probe material. Further, the method includes subjecting the probe tip body to a plasma etch procedure. The mask layer acts as an etch mask for the plasma etch procedure. The plasma etch procedure and the etch mask are configured to produce one or more tip portions formed of the probe material. The one or more tip portions are smaller and more pointed than the probe tip body prior to the plasma etch procedure.
    Type: Grant
    Filed: February 27, 2020
    Date of Patent: June 15, 2021
    Assignee: IMEC VZW
    Inventors: Thomas Hantschel, Thijs Boehme
  • Publication number: 20210116476
    Abstract: The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.
    Type: Application
    Filed: October 13, 2020
    Publication date: April 22, 2021
    Inventors: Thomas Hantschel, Hugo Bender, Kristof Paredis, Antti Kanniainen
  • Publication number: 20210020494
    Abstract: According to one aspect, a reconditioning wafer can include a carrier substrate that supports at least one array of regularly spaced protrusions configured to form indentations in a support surface of a wafer holding stage. The protrusions within the same array can have substantially the same shape and dimensions, thereby enabling a more reliable reconditioning process compared to prior art solutions. The protrusions may have the form of pyramids or pillars or other similar shapes with at least the tip of the protrusions formed of a material suitable to make the indentations. The reconditioning wafer can be obtainable by a molding technique wherein an array of molds can be created in a mold substrate. The molds can be filled with an indentation material such as diamond, and can be bonded to the carrier substrate. The mold substrate can be removed by thinning and wet etching.
    Type: Application
    Filed: July 13, 2020
    Publication date: January 21, 2021
    Inventor: Thomas Hantschel
  • Publication number: 20200278379
    Abstract: Example embodiments relate to methods for producing a probe suitable for scanning probe microscopy. One embodiment includes a method for producing a probe tip suitable for scanning probe microscopy. The method includes producing a probe tip body that includes at least an outer layer of a probe material. The method also includes, during the production of the probe tip body or after the production, forming a mask layer on the outer layer of probe material. Further, the method includes subjecting the probe tip body to a plasma etch procedure. The mask layer acts as an etch mask for the plasma etch procedure. The plasma etch procedure and the etch mask are configured to produce one or more tip portions formed of the probe material. The one or more tip portions are smaller and more pointed than the probe tip body prior to the plasma etch procedure.
    Type: Application
    Filed: February 27, 2020
    Publication date: September 3, 2020
    Inventors: Thomas Hantschel, Thijs Boehme
  • Patent number: 10605955
    Abstract: A method, apparatus, and program product utilize a multi-step subsidence inversion to model lithospheric layer thickness through geological time for a rift basin in a subsurface formation.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: March 31, 2020
    Assignee: Schlumberger Technology Corporation
    Inventors: Daniel Bruno Palmowski, Thomas Fuchs, Martin Rohde, Thomas Hantschel
  • Publication number: 20190293835
    Abstract: A method, apparatus, and program product model address a modeling gap existing between basin and reservoir modeling through the use of a Reservoir Fluid Geodynamics (RFG) model usable for simulations conducted at a relatively fine spatial resolution and over a geological timescale.
    Type: Application
    Filed: July 22, 2016
    Publication date: September 26, 2019
    Inventors: Armin Kauerauf, Oliver C. Mullins, Thomas Hantschel, Kang Wang, Adrian Kleine, Youxiang Zuo
  • Patent number: 10083258
    Abstract: A method for performing a field operation within a geologic basin having rock formations and a reservoir that includes fluids includes generating, by forward modeling using a petroleum system model (PSM), an estimate of a fluid property distribution of a fluid within the reservoir of the geologic basin. The method further includes detecting, from fluid samples, a fluid property gradient within the geologic basin. The fluid samples are extracted from within at least one wellbore drilled through the rock formations. The method further includes, comparing the estimate of the fluid property distribution with the detected fluid property gradient to generate a comparison result, iteratively adjusting, based on the comparison result, the PSM to generate an adjusted PSM, and performing, based on the adjusted PSM, the field operation within the geologic basin.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: September 25, 2018
    Assignee: Schlumberger Technology Corporation
    Inventors: Armin I. Kauerauf, Daniel Bruno Palmowski, Thomas Hantschel, Oliver C. Mullins
  • Publication number: 20170329046
    Abstract: A method, apparatus, and program product utilize a multi-step subsidence inversion to model lithospheric layer thickness through geological time for a rift basin in a subsurface formation.
    Type: Application
    Filed: May 12, 2016
    Publication date: November 16, 2017
    Inventors: Daniel Bruno Palmowski, Thomas Fuchs, Martin Rohde, Thomas Hantschel
  • Patent number: 9612258
    Abstract: The disclosed technology relates generally to probe configurations, and more particularly to probe configurations and methods of making probe configurations that have a diamond body and a diamond layer covering at least an apex region of the diamond body. In one aspect, a method of fabricating a probe configuration includes forming a probe tip. Forming the probe tip includes providing a substrate and forming a recessed mold into the substrate on a first side of the substrate, wherein the recessed mold is shaped to form a probe body having an apex region. Forming the probe tip additionally includes forming a first diamond layer on the substrate on the first side, wherein forming the first diamond layer includes at least partially filling the recessed mold with the first diamond layer such that a probe body having an apex region is formed in the recessed mold.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: April 4, 2017
    Assignees: IMEC, Katholieke Universiteit Leuven
    Inventors: Thomas Hantschel, Menelaos Tsigkourakos, Wilfried Vandervorst
  • Patent number: 9102084
    Abstract: A solar cell structure formed by extruding/dispensing materials on a substrate such that centrally disposed conductive high aspect ratio line structures (gridlines) are formed on the substrate surface with localized support structures coincidentally disposed on opposing side surfaces of the gridlines such that the gridlines are surrounded or otherwise supported by the localized support structures. In one embodiment the localized support structures are transparent, remain on the substrate after the co-extrusion process, and are covered by a layer of material. In another embodiment, the localized support structures are sacrificial support structures that are removed as part of the solar cell structure manufacturing process. In both cases the co-extrusion process is performed such that both the central gridline and the localized support structures are in direct contact with the surface of the substrate.
    Type: Grant
    Filed: June 18, 2010
    Date of Patent: August 11, 2015
    Assignee: SolarWorld Innovations GmbH
    Inventors: David K. Fork, Thomas Hantschel
  • Publication number: 20150185249
    Abstract: The disclosed technology relates generally to probe configurations, and more particularly to probe configurations and methods of making probe configurations that have a diamond body and a diamond layer covering at least an apex region of the diamond body. In one aspect, a method of fabricating a probe configuration includes forming a probe tip. Forming the probe tip includes providing a substrate and forming a recessed mold into the substrate on a first side of the substrate, wherein the recessed mold is shaped to form a probe body having an apex region. Forming the probe tip additionally includes forming a first diamond layer on the substrate on the first side, wherein forming the first diamond layer includes at least partially filling the recessed mold with the first diamond layer such that a probe body having an apex region is formed in the recessed mold.
    Type: Application
    Filed: October 29, 2014
    Publication date: July 2, 2015
    Inventors: Thomas HANTSCHEL, Menelaos TSIGKOURAKOS, Wilfried VANDERVORST
  • Publication number: 20150081265
    Abstract: A method for performing a field operation within a geologic basin having rock formations and a reservoir that includes fluids includes generating, by forward modeling using a petroleum system model (PSM), an estimate of a fluid property distribution of a fluid within the reservoir of the geologic basin. The method further includes detecting, from fluid samples, a fluid property gradient within the geologic basin. The fluid samples are extracted from within at least one wellbore drilled through the rock formations. The method further includes, comparing the estimate of the fluid property distribution with the detected fluid property gradient to generate a comparison result, iteratively adjusting, based on the comparison result, the PSM to generate an adjusted PSM, and performing, based on the adjusted PSM, the field operation within the geologic basin.
    Type: Application
    Filed: September 11, 2014
    Publication date: March 19, 2015
    Inventors: ARMIN I. KAUERAUF, DANIEL BRUNO PALMOWSKI, THOMAS HANTSCHEL, OLIVER C. MULLINS