Patents by Inventor Thomas Hantschel
Thomas Hantschel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11955368Abstract: According to one aspect, a reconditioning wafer can include a carrier substrate that supports at least one array of regularly spaced protrusions configured to form indentations in a support surface of a wafer holding stage. The protrusions within the same array can have substantially the same shape and dimensions, thereby enabling a more reliable reconditioning process compared to prior art solutions. The protrusions may have the form of pyramids or pillars or other similar shapes with at least the tip of the protrusions formed of a material suitable to make the indentations. The reconditioning wafer can be obtainable by a molding technique wherein an array of molds can be created in a mold substrate. The molds can be filled with an indentation material such as diamond, and can be bonded to the carrier substrate. The mold substrate can be removed by thinning and wet etching.Type: GrantFiled: July 13, 2020Date of Patent: April 9, 2024Assignee: IMEC VZWInventor: Thomas Hantschel
-
Publication number: 20230359793Abstract: A method for simulating a subterranean volume includes receiving one or more input parameters and one or more simulation realizations representing the subterranean domain, modeling the one or more simulation realizations as a target function of the one or more input parameters, training a machine-learning model to predict values for the target function using the one or more input parameters and the one or more simulation realizations, predicting a value for the target function based on a first candidate simulation or a first candidate output parameter of a simulation, selecting the first candidate simulation, the first candidate output parameter, or both based on the predicted value of the target function, and simulating the subterranean volume using the first candidate output parameter, or both.Type: ApplicationFiled: September 23, 2021Publication date: November 9, 2023Inventors: Adrian KLEINE, Thomas HANTSCHEL
-
Patent number: 11650171Abstract: Methods and apparatus determine offcut angle of a crystalline sample using electron channeling patterns (ECPs), wherein backscattered electron intensity exhibits angular variation dependent on crystal orientation. A zone axis normal to a given crystal plane follows a circle as the sample is azimuthally rotated. On an ECP image presented with tilt angles as axes, the radius of the circle is the offcut angle of the sample. Large offcut angles are determined by a tilt technique that brings the zone axis into the ECP field of view. ECPs are produced with a scanning electron beam and a monolithic backscattered electron detector; or alternatively with a stationary electron beam and a pixelated electron backscatter diffraction detector. Applications include strain engineering, process monitoring, detecting spatial variations, and incoming wafer inspection. Methods are 40× faster than X-ray diffraction. 0.01-0.1° accuracy enables semiconductor applications.Type: GrantFiled: June 24, 2021Date of Patent: May 16, 2023Assignee: FEI CompanyInventors: Han Han, Libor Strakos, Thomas Hantschel, Tomas Vystavel, Clement Porret
-
Publication number: 20220412900Abstract: Methods and apparatus determine offcut angle of a crystalline sample using electron channeling patterns (ECPs), wherein backscattered electron intensity exhibits angular variation dependent on crystal orientation. A zone axis normal to a given crystal plane follows a circle as the sample is azimuthally rotated. On an ECP image presented with tilt angles as axes, the radius of the circle is the offcut angle of the sample. Large offcut angles are determined by a tilt technique that brings the zone axis into the ECP field of view. ECPs are produced with a scanning electron beam and a monolithic backscattered electron detector; or alternatively with a stationary electron beam and a pixelated electron backscatter diffraction detector. Applications include strain engineering, process monitoring, detecting spatial variations, and incoming wafer inspection. Methods are 40× faster than X-ray diffraction. 0.01-0.1° accuracy enables semiconductor applications.Type: ApplicationFiled: June 24, 2021Publication date: December 29, 2022Applicant: FEI CompanyInventors: Han Han, Libor Strakos, Thomas Hantschel, Tomas Vystavel, Clement Porret
-
Publication number: 20220178236Abstract: A method, comprising receiving input data representing a subterranean formation, defining a grid representing the input data, with the grid including cells. The method also includes identifying at least one of the cells in which kerogen is present based on the input data, simulating hydrocarbon movement within the kerogen using the grid, and generating a model of hydrocarbon expulsion to pore space based on the simulating.Type: ApplicationFiled: March 6, 2020Publication date: June 9, 2022Inventors: Adrian Kleine, Christian Vogt, Thomas Hantschel
-
Patent number: 11269113Abstract: A method, apparatus, and program product model address a modeling gap existing between basin and reservoir modeling through the use of a Reservoir Fluid Geodynamics (RFG) model usable for simulations conducted at a relatively fine spatial resolution and over a geological timescale.Type: GrantFiled: July 22, 2016Date of Patent: March 8, 2022Assignee: Schlumberger Technology CorporationInventors: Armin Kauerauf, Oliver C. Mullins, Thomas Hantschel, Kang Wang, Adrian Kleine, Youxiang Zuo
-
Patent number: 11112427Abstract: The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.Type: GrantFiled: October 13, 2020Date of Patent: September 7, 2021Assignee: IMEC VZWInventors: Thomas Hantschel, Hugo Bender, Kristof Paredis, Antti Kanniainen
-
Patent number: 11035880Abstract: Example embodiments relate to methods for producing a probe suitable for scanning probe microscopy. One embodiment includes a method for producing a probe tip suitable for scanning probe microscopy. The method includes producing a probe tip body that includes at least an outer layer of a probe material. The method also includes, during the production of the probe tip body or after the production, forming a mask layer on the outer layer of probe material. Further, the method includes subjecting the probe tip body to a plasma etch procedure. The mask layer acts as an etch mask for the plasma etch procedure. The plasma etch procedure and the etch mask are configured to produce one or more tip portions formed of the probe material. The one or more tip portions are smaller and more pointed than the probe tip body prior to the plasma etch procedure.Type: GrantFiled: February 27, 2020Date of Patent: June 15, 2021Assignee: IMEC VZWInventors: Thomas Hantschel, Thijs Boehme
-
Publication number: 20210116476Abstract: The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.Type: ApplicationFiled: October 13, 2020Publication date: April 22, 2021Inventors: Thomas Hantschel, Hugo Bender, Kristof Paredis, Antti Kanniainen
-
Publication number: 20210020494Abstract: According to one aspect, a reconditioning wafer can include a carrier substrate that supports at least one array of regularly spaced protrusions configured to form indentations in a support surface of a wafer holding stage. The protrusions within the same array can have substantially the same shape and dimensions, thereby enabling a more reliable reconditioning process compared to prior art solutions. The protrusions may have the form of pyramids or pillars or other similar shapes with at least the tip of the protrusions formed of a material suitable to make the indentations. The reconditioning wafer can be obtainable by a molding technique wherein an array of molds can be created in a mold substrate. The molds can be filled with an indentation material such as diamond, and can be bonded to the carrier substrate. The mold substrate can be removed by thinning and wet etching.Type: ApplicationFiled: July 13, 2020Publication date: January 21, 2021Inventor: Thomas Hantschel
-
Publication number: 20200278379Abstract: Example embodiments relate to methods for producing a probe suitable for scanning probe microscopy. One embodiment includes a method for producing a probe tip suitable for scanning probe microscopy. The method includes producing a probe tip body that includes at least an outer layer of a probe material. The method also includes, during the production of the probe tip body or after the production, forming a mask layer on the outer layer of probe material. Further, the method includes subjecting the probe tip body to a plasma etch procedure. The mask layer acts as an etch mask for the plasma etch procedure. The plasma etch procedure and the etch mask are configured to produce one or more tip portions formed of the probe material. The one or more tip portions are smaller and more pointed than the probe tip body prior to the plasma etch procedure.Type: ApplicationFiled: February 27, 2020Publication date: September 3, 2020Inventors: Thomas Hantschel, Thijs Boehme
-
Patent number: 10605955Abstract: A method, apparatus, and program product utilize a multi-step subsidence inversion to model lithospheric layer thickness through geological time for a rift basin in a subsurface formation.Type: GrantFiled: May 12, 2016Date of Patent: March 31, 2020Assignee: Schlumberger Technology CorporationInventors: Daniel Bruno Palmowski, Thomas Fuchs, Martin Rohde, Thomas Hantschel
-
Publication number: 20190293835Abstract: A method, apparatus, and program product model address a modeling gap existing between basin and reservoir modeling through the use of a Reservoir Fluid Geodynamics (RFG) model usable for simulations conducted at a relatively fine spatial resolution and over a geological timescale.Type: ApplicationFiled: July 22, 2016Publication date: September 26, 2019Inventors: Armin Kauerauf, Oliver C. Mullins, Thomas Hantschel, Kang Wang, Adrian Kleine, Youxiang Zuo
-
Patent number: 10083258Abstract: A method for performing a field operation within a geologic basin having rock formations and a reservoir that includes fluids includes generating, by forward modeling using a petroleum system model (PSM), an estimate of a fluid property distribution of a fluid within the reservoir of the geologic basin. The method further includes detecting, from fluid samples, a fluid property gradient within the geologic basin. The fluid samples are extracted from within at least one wellbore drilled through the rock formations. The method further includes, comparing the estimate of the fluid property distribution with the detected fluid property gradient to generate a comparison result, iteratively adjusting, based on the comparison result, the PSM to generate an adjusted PSM, and performing, based on the adjusted PSM, the field operation within the geologic basin.Type: GrantFiled: September 11, 2014Date of Patent: September 25, 2018Assignee: Schlumberger Technology CorporationInventors: Armin I. Kauerauf, Daniel Bruno Palmowski, Thomas Hantschel, Oliver C. Mullins
-
Publication number: 20170329046Abstract: A method, apparatus, and program product utilize a multi-step subsidence inversion to model lithospheric layer thickness through geological time for a rift basin in a subsurface formation.Type: ApplicationFiled: May 12, 2016Publication date: November 16, 2017Inventors: Daniel Bruno Palmowski, Thomas Fuchs, Martin Rohde, Thomas Hantschel
-
Patent number: 9612258Abstract: The disclosed technology relates generally to probe configurations, and more particularly to probe configurations and methods of making probe configurations that have a diamond body and a diamond layer covering at least an apex region of the diamond body. In one aspect, a method of fabricating a probe configuration includes forming a probe tip. Forming the probe tip includes providing a substrate and forming a recessed mold into the substrate on a first side of the substrate, wherein the recessed mold is shaped to form a probe body having an apex region. Forming the probe tip additionally includes forming a first diamond layer on the substrate on the first side, wherein forming the first diamond layer includes at least partially filling the recessed mold with the first diamond layer such that a probe body having an apex region is formed in the recessed mold.Type: GrantFiled: October 29, 2014Date of Patent: April 4, 2017Assignees: IMEC, Katholieke Universiteit LeuvenInventors: Thomas Hantschel, Menelaos Tsigkourakos, Wilfried Vandervorst
-
Patent number: 9102084Abstract: A solar cell structure formed by extruding/dispensing materials on a substrate such that centrally disposed conductive high aspect ratio line structures (gridlines) are formed on the substrate surface with localized support structures coincidentally disposed on opposing side surfaces of the gridlines such that the gridlines are surrounded or otherwise supported by the localized support structures. In one embodiment the localized support structures are transparent, remain on the substrate after the co-extrusion process, and are covered by a layer of material. In another embodiment, the localized support structures are sacrificial support structures that are removed as part of the solar cell structure manufacturing process. In both cases the co-extrusion process is performed such that both the central gridline and the localized support structures are in direct contact with the surface of the substrate.Type: GrantFiled: June 18, 2010Date of Patent: August 11, 2015Assignee: SolarWorld Innovations GmbHInventors: David K. Fork, Thomas Hantschel
-
Publication number: 20150185249Abstract: The disclosed technology relates generally to probe configurations, and more particularly to probe configurations and methods of making probe configurations that have a diamond body and a diamond layer covering at least an apex region of the diamond body. In one aspect, a method of fabricating a probe configuration includes forming a probe tip. Forming the probe tip includes providing a substrate and forming a recessed mold into the substrate on a first side of the substrate, wherein the recessed mold is shaped to form a probe body having an apex region. Forming the probe tip additionally includes forming a first diamond layer on the substrate on the first side, wherein forming the first diamond layer includes at least partially filling the recessed mold with the first diamond layer such that a probe body having an apex region is formed in the recessed mold.Type: ApplicationFiled: October 29, 2014Publication date: July 2, 2015Inventors: Thomas HANTSCHEL, Menelaos TSIGKOURAKOS, Wilfried VANDERVORST
-
Publication number: 20150081265Abstract: A method for performing a field operation within a geologic basin having rock formations and a reservoir that includes fluids includes generating, by forward modeling using a petroleum system model (PSM), an estimate of a fluid property distribution of a fluid within the reservoir of the geologic basin. The method further includes detecting, from fluid samples, a fluid property gradient within the geologic basin. The fluid samples are extracted from within at least one wellbore drilled through the rock formations. The method further includes, comparing the estimate of the fluid property distribution with the detected fluid property gradient to generate a comparison result, iteratively adjusting, based on the comparison result, the PSM to generate an adjusted PSM, and performing, based on the adjusted PSM, the field operation within the geologic basin.Type: ApplicationFiled: September 11, 2014Publication date: March 19, 2015Inventors: ARMIN I. KAUERAUF, DANIEL BRUNO PALMOWSKI, THOMAS HANTSCHEL, OLIVER C. MULLINS
-
Patent number: 8902221Abstract: Prospect assessment and play chance mapping tools are provided. For assessing potential resources, example systems provide dynamically linked chance maps, transformed in real time from geological properties. Input geological maps or other data are dynamically linked to resulting chance maps, so that changes in the input maps automatically update the chance map in real time. Users can generate a custom risk matrix dynamically linking geological maps with chance maps via interface tools, dropping maps directly into the matrix. A transform may programmatically convert the geologic domain to the chance domain. The user can navigate input maps, select areas of interest, and drag-and-drop geologic properties into an uncertainty engine and distribution builder for uncertainty assessment based on geologic reality. A merge tool can programmatically unify multiple geological interpretations of a prospect. The merge tool outputs a single chance of success value for multiple geologic property values at each grid node.Type: GrantFiled: October 12, 2011Date of Patent: December 2, 2014Assignee: Schlumberger Technology CorporationInventors: Thomas Hantschel, Alexander Martin Wilson, Nicola Tessen, Glenn Koller, Martin Neumaier