Patents by Inventor Thomas Knisley

Thomas Knisley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210292901
    Abstract: Methods for depositing protective coatings on aerospace components are provided and include sequentially exposing the aerospace component to a chromium precursor and a reactant to form a chromium-containing layer on a surface of the aerospace component by an atomic layer deposition process. The chromium-containing layer contains metallic chromium, chromium oxide, chromium nitride, chromium carbide, chromium silicide, or any combination thereof.
    Type: Application
    Filed: May 26, 2021
    Publication date: September 23, 2021
    Inventors: Thomas KNISLEY, Mark SALY, David Alexander BRITZ, David THOMPSON
  • Publication number: 20210262084
    Abstract: Methods for depositing tellurium-containing films on a substrate are described. The substrate is exposed to a tellurium precursor and a reactant to form the tellurium-containing film (e.g., elemental tellurium, tellurium oxide, tellurium carbide, tellurium silicide, germanium telluride, antimony telluride, germanium antimony telluride). The exposures can be sequential or simultaneous.
    Type: Application
    Filed: February 1, 2021
    Publication date: August 26, 2021
    Applicants: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Charles H. Winter, Apoorva Upadhyay
  • Publication number: 20210189562
    Abstract: Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing the substrate surfaces to a blocking compound to selectively form a blocking layer on at least a portion of the first surface over the second surface. The substrate is sequentially exposed to a metal precursor with a kinetic diameter in excess of 21 angstroms and a reactant to selectively form a metal-containing layer on the second surface over the blocking layer or the first surface. The relatively larger metal precursors of some embodiments allow for the use of blocking layers with gaps or voids without the loss of selectivity.
    Type: Application
    Filed: February 23, 2021
    Publication date: June 24, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Bhaskar Jyoti Bhuyan, Mark Saly, David Thompson, Tobin Kaufman-Osborn, Kurt Fredrickson, Thomas Knisley, Liqi Wu
  • Patent number: 11028480
    Abstract: Methods for depositing protective coatings on aerospace components are provided and include sequentially exposing the aerospace component to a chromium precursor and a reactant to form a chromium-containing layer on a surface the aerospace component by an atomic layer deposition process. The chromium-containing layer contains metallic chromium, chromium oxide, chromium nitride, chromium carbide, chromium silicide, or any combination thereof.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: June 8, 2021
    Inventors: Thomas Knisley, Mark Saly, David Alexander Britz, David Thompson
  • Publication number: 20210155646
    Abstract: Halide ligand free rhenium complexes are described as well as methods for depositing rhenium-containing films. Some embodiments provide a rhenium complex with a general formula of O3ReO-M-R1R2R3, where M is a group IV element, R1 is selected from H, alkyl, alkenyl, alkynyl, an aromatic ring, or alkoxy, and R2 and R3 are each independently selected from H, alkyl, alkenyl, alkynyl, an aromatic ring, or alkoxy, or R2 and R3 join together to form a ring structure or an oxo group. Some embodiments provide a rhenium complex with a general formula of Re(NR?)3(NHR?), where R? and R? are independently selected from H, alkyl, alkenyl, alkynyl, or an aromatic ring.
    Type: Application
    Filed: November 20, 2020
    Publication date: May 27, 2021
    Applicants: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Charles H. Winter, Stefan Cwik
  • Publication number: 20210071299
    Abstract: Embodiments of the present disclosure generally relate to protective coatings on substrates and methods for depositing the protective coatings. In one or more embodiments, a method of forming a protective coating on a substrate includes depositing a chromium oxide layer containing amorphous chromium oxide on a surface of the substrate during a first vapor deposition process and heating the substrate containing the chromium oxide layer comprising the amorphous chromium oxide to convert at least a portion of the amorphous chromium oxide to crystalline chromium oxide during a first annealing process. The method also includes depositing an aluminum oxide layer containing amorphous aluminum oxide on the chromium oxide layer during a second vapor deposition process and heating the substrate containing the aluminum oxide layer disposed on the chromium oxide layer to convert at least a portion of the amorphous aluminum oxide to crystalline aluminum oxide during a second annealing process.
    Type: Application
    Filed: October 31, 2019
    Publication date: March 11, 2021
    Inventors: Kenichi OHNO, Eric H. LIU, Sukti CHATTERJEE, Yuriy MELNIK, Thomas KNISLEY, David Alexander BRITZ, Lance A. SCUDDER, Pravin K. NARWANKAR
  • Publication number: 20210050211
    Abstract: Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride, rhenium oxide, rhenium carbide). The exposures can be sequential or simultaneous. The rhenium-precursors are substantially free of halogen.
    Type: Application
    Filed: August 10, 2020
    Publication date: February 18, 2021
    Applicants: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Charles H. Winter, Stefan Cwik
  • Publication number: 20210028004
    Abstract: Methods of forming SiCON films comprising sequential exposure to a silicon precursor and a mixture of alkanolamine and amine reactants and an optional plasma are described. Methods of forming a silicon-containing film comprising sequential exposure to a silicon precursor and an epoxide with an optional plasma exposure are also described.
    Type: Application
    Filed: October 12, 2020
    Publication date: January 28, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Mark Saly, David Thompson, Thomas Knisley, Bhaskar Jyoti Bhuyan
  • Publication number: 20200392624
    Abstract: Methods for depositing a yttrium-containing film through an atomic layer deposition process are described. Some embodiments of the disclosure utilize a plasma-enhanced atomic layer deposition process. Also described is an apparatus for performing the atomic layer deposition of the yttrium containing films.
    Type: Application
    Filed: August 24, 2020
    Publication date: December 17, 2020
    Inventors: Lakmal C. Kalutarage, Mark Saly, Thomas Knisley, Benjamin Schmiege, David Thompson
  • Publication number: 20200392623
    Abstract: Metal coordination complexes comprising an iridium atom coordinated to at least one diazabutadiene based ligand having a structure represented by: where R1 and R4 are independently selected from the group consisting of C1-C4 alkyl and amino groups, and each of R2 and R3 are independently selected from the group consisting of H, C1-C3 alkyl, or amino groups are described. Processing methods using the metal coordination complexes are also described.
    Type: Application
    Filed: June 29, 2020
    Publication date: December 17, 2020
    Applicant: Applied Materials, Inc.
    Inventor: Thomas Knisley
  • Publication number: 20200392626
    Abstract: Embodiments of the present disclosure generally relate to protective coatings on aerospace components and methods for depositing the protective coatings. In one or more embodiments, a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum (e.g., nickel-aluminum superalloy) and heating the aerospace component containing the metal oxide template layer during a thermal process and/or an oxidation process. The thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.
    Type: Application
    Filed: September 4, 2019
    Publication date: December 17, 2020
    Inventors: Sukti CHATTERJEE, Kenichi OHNO, Lance A. SCUDDER, Yuriy MELNIK, David A. BRITZ, Pravin K. NARWANKAR, Thomas KNISLEY, Mark SALY, Jeffrey ANTHIS
  • Publication number: 20200362458
    Abstract: Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride). The exposures can be sequential or simultaneous.
    Type: Application
    Filed: May 14, 2020
    Publication date: November 19, 2020
    Applicants: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Stefan Cwik, Charles H. Winter
  • Publication number: 20200340107
    Abstract: Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. In one or more embodiments, a method for depositing a coating on an aerospace component includes depositing one or more layers on a surface of the aerospace component using an atomic layer deposition or chemical vapor deposition process, and performing a partial oxidation and annealing process to convert the one or more layers to a coalesced layer having a preferred phase crystalline assembly. During oxidation cycles, an aluminum depleted region is formed at the surface of the aerospace component, and an aluminum oxide region is formed between the aluminum depleted region and the coalesced layer. The coalesced layer forms a protective coating, which decreases the rate of aluminum depletion from the aerospace component and the rate of new aluminum oxide scale formation.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 29, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sukti CHATTERJEE, Lance A. SCUDDER, Yuriy MELNIK, David A. BRITZ, Thomas KNISLEY, Kenichi OHNO, Pravin K. NARWANKAR
  • Patent number: 10804094
    Abstract: Methods of forming SiCON films comprising sequential exposure to a silicon precursor and a mixture of alkanolamine and amine reactants and an optional plasma are described. Methods of forming a silicon-containing film comprising sequential exposure to a silicon precursor and an epoxide with an optional plasma exposure are also described.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: October 13, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Mark Saly, David Thompson, Thomas Knisley, Bhaskar Jyoti Bhuyan
  • Patent number: 10760159
    Abstract: Methods for depositing a yttrium-containing film through an atomic layer deposition process are described. Some embodiments of the disclosure utilize a plasma-enhanced atomic layer deposition process. Also described is an apparatus for performing the atomic layer deposition of the yttrium containing films.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: September 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Lakmal C. Kalutarage, Mark Saly, Thomas Knisley, Benjamin Schmiege, David Thompson
  • Publication number: 20200240018
    Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.
    Type: Application
    Filed: April 8, 2020
    Publication date: July 30, 2020
    Inventors: Yuriy MELNIK, Sukti CHATTERJEE, Kaushal GANGAKHEDKAR, Jonathan FRANKEL, Lance A. SCUDDER, Pravin K. NARWANKAR, David Alexander BRITZ, Thomas KNISLEY, Mark SALY, David THOMPSON
  • Publication number: 20200240017
    Abstract: Described are lanthanide-containing metal coordination complexes which may be used as precursors in thin film depositions, e.g. atomic layer deposition processes. More specifically, described are homoleptic lanthanide-aminoalkoxide metal coordination complexes, lanthanide-carbohydrazide metal coordination complexes, and lanthanide-diazadiene metal coordination complexes. Additionally, methods for depositing lanthanide-containing films through an atomic layer deposition process are described.
    Type: Application
    Filed: January 25, 2020
    Publication date: July 30, 2020
    Inventors: Thomas Knisley, Mark Saly
  • Publication number: 20200234943
    Abstract: Methods of enhancing selective deposition are described. In some embodiments, a blocking layer is deposited on a metal surface before deposition of a dielectric. In some embodiments, a metal surface is functionalized to enhance or decrease its reactivity.
    Type: Application
    Filed: July 17, 2018
    Publication date: July 23, 2020
    Inventors: Bhaskar Jyoti Bhuyan, Mark Saly, Lakmal C. Kalutarage, Thomas Knisley
  • Patent number: 10697060
    Abstract: Metal coordination complexes comprising an iridium atom coordinated to at least one diazabutadiene based ligand having a structure represented by: where R1 and R4 are independently selected from the group consisting of C1-C4 alkyl and amino groups, and each of R2 and R3 are independently selected from the group consisting of H, C1-C3 alkyl, or amino groups are described. Processing methods using the metal coordination complexes are also described.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: June 30, 2020
    Assignee: Applied Materials, Inc.
    Inventor: Thomas Knisley
  • Patent number: 10633740
    Abstract: Protective coatings on an aerospace component and methods for depositing the protective coatings are provided. A method for depositing a coating on an aerospace component includes exposing an aerospace component to a first precursor and a first reactant to form a first deposited layer on a surface of the aerospace component by a chemical vapor deposition (CVD) process or a first atomic layer deposition (ALD) process and exposing the aerospace component to a second precursor and a second reactant to form a second deposited layer on the first deposited layer by a second ALD process, where the first deposited layer and the second deposited layer have different compositions from each other.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: April 28, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Yuriy Melnik, Sukti Chatterjee, Kaushal Gangakhedkar, Jonathan Frankel, Lance A. Scudder, Pravin K. Narwankar, David Alexander Britz, Thomas Knisley, Mark Saly, David Thompson