Patents by Inventor Thomas Petasch
Thomas Petasch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7800849Abstract: In an apparatus for mounting two or more optical elements that are each held in an individual mount or in a support structure, said optical elements are mounted in a common mount. The relative positioning of the optical elements (10, 11) in the common mount (18) can be set.Type: GrantFiled: February 1, 2008Date of Patent: September 21, 2010Assignee: Carl Zeiss SMT AGInventors: Hubert Holderer, Thomas Petasch, Chris Reed, Dragos Pariza, Mike Meehan, Gary Krebs
-
Patent number: 7656595Abstract: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).Type: GrantFiled: September 17, 2008Date of Patent: February 2, 2010Assignee: Carl Zeiss SMT AGInventors: Klaus Beck, Bernhard Gellrich, Hubert Holderer, Thomas Petasch, Cornelia Roesch, Alexander Kohl
-
Publication number: 20090174874Abstract: An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.Type: ApplicationFiled: October 1, 2005Publication date: July 9, 2009Inventors: Johannes Rau, Armin Schoeppach, Bernhard Gellrich, Jens Kugler, Martin Mahlmann, Bernhard Geuppert, Thomas Petasch, Gerhard Fuerter
-
Publication number: 20090153829Abstract: Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.Type: ApplicationFiled: December 15, 2008Publication date: June 18, 2009Applicant: Carl Zeiss SMT AGInventors: Olaf Rogalsky, Boris Bittner, Thomas Petasch, Jochen Haeussler
-
Publication number: 20090122288Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).Type: ApplicationFiled: November 20, 2008Publication date: May 14, 2009Applicant: CARL ZEISS SMT AGInventors: Franz Sorg, Andreas Wurmbrand, Thomas Petasch, Dirk Schaffer, Siegfried Wahl
-
Publication number: 20090015947Abstract: In an apparatus for mounting two or more optical elements that are each held in an individual mount or in a support structure, said optical elements are mounted in a common mount. The relative positioning of the optical elements (10, 11) in the common mount (18) can be set.Type: ApplicationFiled: December 22, 2005Publication date: January 15, 2009Inventors: Hubert Holderer, Thomas Petasch, Chris Reed, Dragos Pariza, Mike Meehan, Gary Krebs
-
Publication number: 20090009892Abstract: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).Type: ApplicationFiled: September 17, 2008Publication date: January 8, 2009Applicant: CARL ZEISS SMT AGInventors: Klaus Beck, Bernhard Gellrich, Hubert Holderer, Thomas Petasch, Cornelia Roesch, Alexander Kohl
-
Patent number: 7471469Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).Type: GrantFiled: September 22, 2005Date of Patent: December 30, 2008Assignee: Carl Zeiss SMT AGInventors: Franz Sorg, Andreas Wurmbrand, Thomas Petasch, Dirk Schaffer, Siegfried Wahl
-
Patent number: 7457059Abstract: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).Type: GrantFiled: September 20, 2006Date of Patent: November 25, 2008Assignee: Carl Zeiss SMT AGInventors: Klaus Beck, Bernhard Gellrich, Hubert Holderer, Thomas Petasch, Cornelia Roesch, Alexander Kohl
-
Patent number: 7295331Abstract: The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2?) in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2?) is designed to apply a force in said extension (2, 2?).Type: GrantFiled: October 18, 2002Date of Patent: November 13, 2007Assignee: Carl Zeiss Smt AgInventors: Thomas Petasch, Hartmut Muenker, Bernhard Gellrich
-
Patent number: 7193794Abstract: An arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).Type: GrantFiled: February 13, 2004Date of Patent: March 20, 2007Assignee: Carl Zeiss SMT AGInventors: Klaus Beck, Bernhard Gellrich, Hubert Holderer, Thomas Petasch, Cornelia Roesch, Alexander Kohl
-
Publication number: 20070014038Abstract: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).Type: ApplicationFiled: September 20, 2006Publication date: January 18, 2007Inventors: Klaus Beck, Bernhard Gellrich, Hubert Holderer, Thomas Petasch, Cornelia Roesch, Alexander Kohl
-
Patent number: 7082693Abstract: An apparatus for adjusting devices and for setting adjustments, in particular in a ?m range, nm range and below, in particular of optical elements in semiconductor lithography, comprising a base part and a head part spaced apart therefrom, the two parts being connected to one another by at least one adjustment device, and the adjustment device having side parts, the angle of which, or the spacing between which, can be adjusted or set by a length-adjustment device.Type: GrantFiled: March 25, 2002Date of Patent: August 1, 2006Assignee: Carl Zeiss SMT AGInventors: Klaus-Dieter Klein, Thomas Petasch, Hartmut Muenker
-
Publication number: 20060158749Abstract: The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).Type: ApplicationFiled: September 22, 2005Publication date: July 20, 2006Inventors: Franz Sorg, Andreas Wurmbrand, Thomas Petasch, Dirk Schaffer, Siegfried Wahl
-
Patent number: 7061698Abstract: In the case of a lens system (1), in particular in the case of a projection lens system for semiconductor lithography, it is possible to exchange at least one optical element, in particular the final optical element in the beam direction in the form of an end plate (3). For adjusting the exchangeable optical element (3), an optical quality fit with a fitting surface (6) is set between the optical element (3) and a mount (5) or a part connected to a mount (5).Type: GrantFiled: April 25, 2002Date of Patent: June 13, 2006Assignee: Carl Zeiss SMT AGInventors: Karlfrid Osterried, Thomas Petasch, Jens Kugler
-
Patent number: 6870632Abstract: An apparatus or mounting an optical element in an optical system, in particular a mirror or a lens, in a projection exposure machine, in particular a projection lens in semiconductor lithography, is connected to an external base structure with the aid of at least three articulation sites that are arranged on the circumference of the optical element and at which a bearing device acts in each case, wherein the bearing device has at least one bending element, resembling a leaf spring, arranged tangentially to the optical element, and at least one bending element, resembling a leaf spring, arranged in the radial direction relative to the optical element.Type: GrantFiled: March 27, 2002Date of Patent: March 22, 2005Assignee: Carl Zeiss SMT AGInventors: Thomas Petasch, Hartmut Muenker, Klaus-Dieter Klein
-
Publication number: 20040257683Abstract: The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2′) in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2′) is designed to apply a force in said extension (2, 2′).Type: ApplicationFiled: April 15, 2004Publication date: December 23, 2004Inventors: Thomas Petasch, Hartmut Muenker, Bernhard Gellrich
-
Publication number: 20040174619Abstract: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).Type: ApplicationFiled: February 13, 2004Publication date: September 9, 2004Applicant: Carl Zeiss SMT AGInventors: Klaus Beck, Bernhard Gellrich, Hubert Holderer, Thomas Petasch, Cornelia Roesch, Alexander Kohl
-
Publication number: 20020186479Abstract: The invention relates to an optical system comprising at least one first and second optical element, whereby the optical elements are arranged at a predetermined distance from one another, using a mounting. The mounting comprises compensation elements for modifying the predetermined distance between a first optical element and a second optical element, according to the temperature. The optical system is a telescope and the distance between the primary mirror and the secondary mirror is modified according to the temperature.Type: ApplicationFiled: January 14, 2002Publication date: December 12, 2002Inventors: Armin Schoppach, Paul Kaufmann, Thomas Petasch, Walter Krenkel, Ralph Renz
-
Publication number: 20020176094Abstract: An apparatus or mounting an optical element in an optical system, in particular a mirror or a lens, in a projection exposure machine, in particular a projection lens in semiconductor lithography, is connected to an external base structure with the aid of at least three articulation sites that are arranged on the circumference of the optical element and at which a bearing device acts in each case, wherein the bearing device has at least one bending element, resembling a leaf spring, arranged tangentially to the optical element, and at least one bending element, resembling a leaf spring, arranged in the radial direction relative to the optical element.Type: ApplicationFiled: March 27, 2002Publication date: November 28, 2002Inventors: Thomas Petasch, Hartmut Muenker, Klaus-Dieter Klein