Patents by Inventor Thomas Wallow

Thomas Wallow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Modified polycyclic polymers
    Patent number: 6451945
    Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: September 17, 2002
    Assignees: The B.F. Goodrich Company, International Business Machines Corp.
    Inventors: Saikumar Jayaraman, George Martin Benedikt, Larry Funderburk Rhodes, Richard Vicari, Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Thomas Wallow
  • Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
    Publication number: 20020128408
    Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
    Type: Application
    Filed: May 8, 2001
    Publication date: September 12, 2002
    Inventors: Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas Wallow
  • Polycyclic resist compositions with increased etch resistance
    Patent number: 6147177
    Abstract: Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: November 14, 2000
    Assignees: The B. F. Goodrich Company, International Business Machines Corporation
    Inventors: Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow