Abstract: Dielectric compositions encompassing one or more poly(arylene ether) polymers are provided. The dielectric compositions have the repetitive structural unit: where n=1 to 200, Y and Ar are each a divalent arylene radical, Y derived from bisphenol compounds of general formula HO—Y—OH, Ar derived from difluoro diarylacetylenes and/or ethynylated benzophenones of general formula F—Ar—F and Z is optionally hydrogen, a methyl group or derived from a monofluoro-benzophenone derivative of general formula Z—F. Such poly(arylene ether) polymers are employed with a variety of microelectronic devices, for example, integrated circuits and multichip modules.

Abstract: A polymeric low dielectric constant solution includes a low dielectric constant polymer dissolved in an aromatic aliphatic ether solvent. The polymer preferably is a poly(arylene ether) and the solvent preferably is anisole, methylanisole, phenetole or mixtures thereof. A process for forming a dielectric film on a substrate by spin-coating the polymeric solution is also provided.

Abstract: An oxidizing slurry for removal of low dielectric constant materials. The slurry is formed utilizing non-oxidizing particles with a separate oxidizing agent, oxidizing particles alone or reducible abrasive particles with a compatible oxidizing agent. The particles can be formed of a metal oxide, nitride, or carbide material, by itself or mixtures thereof, or can be coated on a core material such as silicon dioxide or can be coformed therewith. A preferred oxidizing slurry is multi-modal in particle size distribution. Although developed for utilization in CMP semiconductor processing the oxidizing slurry of the present invention also can be utilized for other high precision polishing processes.

Abstract: Nanoporous polymeric materials are fabricated in which polymeric strands are crosslinked via ring structures. Preferred ring structures are formed de novo during crosslinking, and at least some of the ring structures are preferably included in the backbones of the strands. At least one of the ring structures may advantageously comprise an aromatic structure, and may more advantageously comprise a benzyl moiety. Especially preferred polymers comprise a poly(arylene ether) synthesized from a difluoroaromatic portion and an aromatic bisphenolic portion. In another preferred aspect, the difluoroaromatic portions of the poly(arylene ether) carry at least two different crosslinking functionalities. In an even more preferred aspect, the crosslinking functionalities comprise an ethynyl and a tetracyclone. Nanoporosity is preferably introduced by thermolyzing one or more thermolabile portions in the crosslinked polymer. An especially preferred thermolabile portion comprises ethylene glycol-poly(caprolactone).

Abstract: Compositions and methods are provided in which nanoporous polymeric materials are produced via stable, polymeric template strands having reactive groups that can be used for forming crosslinking functionalities and/or adding thermolabile groups, wherein at least some of the thermolabile groups are thermolyzed to produce voids. The template strands preferably comprise aromatic systems and vicinal keto groups, such as a polybenzil formed from fluorene bisphenol or 3,3'-dihydroxytolane with 4,4'-difluorobenzil. At least some of the reactive groups preferably react using an addition-elimination reaction. Especially preferred thermolabile groups comprise poly(propylene oxide), and especially preferred crosslinkers comprise ethynyl-moiety and tetracyclone moieties.

Abstract: Dielectric compositions encompassing one or more poly(arylene ether) polymers are provided. The dielectric compositions have the repetitive structural unit: ##STR1## where n=0 to 1; m=0 to 1-n; and Y.sub.1, Y.sub.2, Ar.sub.1 and Ar.sub.2 are each a divalent arylene radical, Y.sub.1 and Y.sub.2 derived from biphenol compounds, Ar.sub.1 derived from difluoroarylethynes and Ar.sub.2 derived from difluoroaryl compounds. Where both Y.sub.1 and Y.sub.2 are derived from fluorene bisphenol, n=0.1 to 1. Such poly(arylene ether) polymers are employed with a variety of microelectronic devices, for example, integrated circuits and multichip modules.