Patents by Inventor Timotheus Franciscus Sengers
Timotheus Franciscus Sengers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20110007285Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: February 2, 2010Publication date: January 13, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeiko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
-
Publication number: 20110001942Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: February 2, 2010Publication date: January 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Theodorus Maria Butler, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Staaijer, Bob Streefkerk, Helmar Van Santen
-
Patent number: 7671968Abstract: A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.Type: GrantFiled: July 14, 2006Date of Patent: March 2, 2010Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Arno Jan Bleeker, Heine Melle Mulder, Oscar Franciscus Jozephus Noordman, Timotheus Franciscus Sengers, Laurentius Catrinus Jorritsma, Mark Trentelman, Gerrit Streutker
-
Publication number: 20090290135Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.Type: ApplicationFiled: July 30, 2009Publication date: November 26, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar San Santen
-
Patent number: 7619747Abstract: An analyzer plate positioned between a projection system and a radiation sensor is illuminated by a projected beam of radiation. The analyzer plate includes two crossing regions, each of which transmits radiation with a different polarization direction. The beam of projection radiation is patterned without influencing the polarization of the beam. By patterning the beam of projection radiation so that one region receives more radiation than the other region, the radiation sensor is given polarization selectivity.Type: GrantFiled: December 17, 2004Date of Patent: November 17, 2009Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof
-
Publication number: 20090251674Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: June 4, 2009Publication date: October 8, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Patent number: 7593092Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: GrantFiled: June 8, 2006Date of Patent: September 22, 2009Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
-
Patent number: 7593093Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: GrantFiled: February 26, 2007Date of Patent: September 22, 2009Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
-
Publication number: 20090207397Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: March 26, 2009Publication date: August 20, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
-
Patent number: 7542127Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.Type: GrantFiled: December 21, 2005Date of Patent: June 2, 2009Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Nicolaas Antonius Allegondus Johannes Van Asten, Wilhelmus Josephus Box, Tjarko Adriaan Rudolf Van Empel, Leon Martin Levasier, Erik Roelof Loopstra, Marcel Johannus Elisabeth Hubertus Muitjens, Luberthus Ouwehand, Leon Joseph Marie Van Den Schoor, Marcel Beckers, Rob Jansen, Elke Van Loenhout
-
Patent number: 7528929Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: November 12, 2004Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
-
Publication number: 20090027642Abstract: An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.Type: ApplicationFiled: September 26, 2008Publication date: January 29, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Arjen Boogaard, Timotheus Franciscus Sengers, Wilhelmus Sebastianus Marcus Maria Ketelaars, Carolus Ida Maria Spee
-
Patent number: 7453078Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.Type: GrantFiled: September 7, 2007Date of Patent: November 18, 2008Assignee: ASML Netherlands B.V.Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
-
Patent number: 7450217Abstract: A coating for sensors and/or parts of an exposure apparatus, for example a sensor on a substrate table of a lithography apparatus, include a semiconductor, a photocatalyst, and/or a metal oxide.Type: GrantFiled: January 12, 2005Date of Patent: November 11, 2008Assignee: ASML Netherlands B.V.Inventors: Arjen Boogaard, Timotheus Franciscus Sengers, Wilhelmus Sebastianus Marcus Maria Ketelaars, Carolus Ida Maria Antonius Spee
-
Publication number: 20080158528Abstract: In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.Type: ApplicationFiled: November 21, 2007Publication date: July 3, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Heine Melle Mulder, Timotheus Franciscus Sengers, Freerk Adriaan Stoffels, Laurentius Catrinus Jorritsma, Reiner Maria Jungblut
-
Patent number: 7282701Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.Type: GrantFiled: February 28, 2005Date of Patent: October 16, 2007Assignee: ASML Netherlands B.V.Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
-
Patent number: 7224436Abstract: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.Type: GrantFiled: March 15, 2006Date of Patent: May 29, 2007Assignee: ASML Netherlands B.V.Inventors: Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Timotheus Franciscus Sengers, Alexander Straaijer, Bob Streefkerk
-
Patent number: 7213963Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: GrantFiled: June 1, 2004Date of Patent: May 8, 2007Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van de Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
-
Patent number: 7199858Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: GrantFiled: November 12, 2003Date of Patent: April 3, 2007Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
-
Patent number: 7184122Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: July 12, 2004Date of Patent: February 27, 2007Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard