Abstract: A method and apparatus for supporting a web of polishing material are generally provided. In one embodiment, an apparatus for supporting a web of polishing material includes a web of polishing media having a first portion disposed across a support surface of a platen assembly and a second portion wound on a first roll coupled to the platen assembly. A tensioning mechanism is coupled to the platen assembly and adapted to tension the web of polishing media in response to a diameter of the second portion of the web of polishing material wound on the first roll.

Abstract: Generally, a method and apparatus for supporting a web of polishing material. In one embodiment, the apparatus includes a platen and a blocker valve. The platen includes a support surface adapted to support the polishing material and a port fluidly coupled to the support surface. A housing that includes a supply port and an exit port has a venturi body disposed therein. The blocker valve has a first state whereby a flow through the housing and blocker valve causes vacuum to be drawn through the port disposed in the platen by the venturi body. In another embodiment, the flow through the venturi may be reversed by changing the state of the blocker valve to blow air through the port disposed in the platen, thereby placing the polishing material and the support surface of the platen in a spaced-apart relation.

Abstract: A chamber for transferring a substrate is provided. In one embodiment, a chamber for transferring a substrate includes at least one side wall supporting a lid and coupled to a chamber bottom. The side wall, lid and chamber bottom defining an evacuable volume therebetween. A passage is disposed at least partially through the side wall and chamber bottom. The passage has a first end that is disposed in the side wall and is exposed to the evacuable volume. The passage has a second end that is disposed on an exterior side of the chamber bottom. The passage may be utilized as a pumping port when coupled to a pumping system at the second end of the passage. Additionally, the port may be utilized as a sensor housing to shield the sensor from objects within the transfer chamber.

Abstract: An electrochemical deposition system comprising a fixture adapted to selectively grasp and release an electrochemical process cell is provided. The system may include a lift/lower mechanism coupled to the fixture and adapted to automatically stop lowering the fixture at a process cell elevation, a rotation mechanism coupled to the fixture and adapted to automatically stop rotating the fixture when aligned with a process cell location and when aligned with a process cell exchange location. The fixture adapted to selectively grasp and release an object to be lifted may include a cam/follower coupling between a rotatable portion of the fixture and a gripping portion of the fixture. To grasp a process cell with the fixture, the rotating portion of the fixture may be rotated so as to retract the gripping portion of the fixture causing the gripping portion to close around the process cell.