Abstract: Provided are methods and articles of manufacture for use with cell therapy for the treatment of diseases or conditions, e.g., cancer, including for predicting and treating a toxicity. In some embodiments, the toxicity is a neurotoxicity or cytokine release syndrome (CRS), such as a severe neurotoxicity or a severe CRS. The methods generally involve detecting a marker by assaying a biological sample from a subject that is a candidate for treatment, optionally with a cell therapy, to determine if the subject is at risk for developing the toxicity, such as neurotoxicity or CRS or severe neurotoxicity or severe CRS. In some embodiments, the methods and articles of manufacture further includes a regent for assaying the biological sample and instructions for determining the percentage or number of cells positive for the marker in the biological sample.

Abstract: Provided are adoptive cell therapy methods involving the administration of doses of cells for treating disease and conditions, including certain B cell malignancies. The cells generally express recombinant receptors such as chimeric antigen receptors (CARs). In some embodiments, the methods are for treating subjects with non-Hodgkin lymphoma (NHL). In some embodiments, the methods are for treating subjects with relapsed or refractory NHL. Also provided are articles of manufacture and prophylactic treatments in connection with adoptive therapy methods.

Abstract: Provided are adoptive cell therapy methods involving the administration of doses of cells for treating disease and conditions, including certain B cell malignancies. The cells generally express recombinant receptors such as chimeric antigen receptors (CARs). In some embodiments, the methods are for treating subjects with non-Hodgkin lymphoma (NHL). In some embodiments, the methods are for treating subjects with relapsed or refractory NHL. Also provided are articles of manufacture and prophylactic treatments in connection with adoptive therapy methods.

Abstract: A connection assembly in a vehicle comprises a bracket including a sliding groove; and a connector including a base plate configured to be received in the sliding groove of the bracket. The base plate or an inner wall of the sliding groove has a raised portion and a through hole on the raised portion. At a locked position, the base plate is at least partially received in the sliding groove and contacts the inner wall of the sliding groove under a pressure via the raised portion.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria abrasive, (b) a surfactant comprising an amine-containing anchor group and ethylene oxide-propylene oxide stabilizing group, wherein the surfactant has a molecular weight of from about 1000 Daltons to about 5000 Daltons, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a pH of about 3 to about 6. The invention further provides a method of chemically mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrates contain silicon oxide.

Abstract: A fastener assembly for an interior trim part in a vehicle is provided. The fastener assembly includes a fixed element and a movable element. The fixed element includes a base panel with a through hole and a plurality of engaging parts extending from a surface of the base panel, and the engaging parts are flexible and deformable towards or away from a central axis of the through hole. The movable element includes a flange and an engaging shaft extending from a surface of the flange, and the engaging shaft passes through the through hole of the fixed element to be engaged with the engaging parts at a fixed position.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria, (b) a water-soluble cationic polymer or copolymer, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a pH of about 3 to about 6. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide.

Abstract: The seatbelt buckle assembly comprises a buckle; a buckle supporting member connected to the buckle and including thereupon a first aperture and an opposing second aperture spaced apart along a width direction together to receive a fastener for assembling the buckle supporting member to the structural frame; and a spring to contact the buckle supporting member and the structural frame.

Abstract: A connection assembly in a vehicle comprises a bracket including a sliding groove; and a connector including a base plate configured to be received in the sliding groove of the bracket. The base plate or an inner wall of the sliding groove has a raised portion and a through hole on the raised portion. At a locked position, the base plate is at least partially received in the sliding groove and contacts the inner wall of the sliding groove under a pressure via the raised portion.

Abstract: A window switch assembly of a vehicle comprises a base; a rail on the base; and a control member partially received in the rail and slidable in the rail. The rail includes a first rail body extending at a traverse direction, a first end portion and a second end portion communicated with the first rail body. The first end portion includes a first switch and a second switch opposite each other in a longitudinal direction, and the second end portion includes a third switch and a fourth switch opposite each other in the longitudinal direction. The control member selectively contacts the first switch and the second switch to control a first window, and selectively contacts the third switch and the fourth switch to control a second window.

Abstract: A fastener assembly for an interior trim part in a vehicle is provided. The fastener assembly comprises a fixed element and a movable element. The fixed element includes a base panel with a through hole and a plurality of engaging parts extending from a surface of the base panel, and the engaging parts are flexible and deformable towards or away from a central axis of the through hole. The movable element includes a flange and an engaging shaft extending from a surface of the flange, and the engaging shaft passes through the through hole of the fixed element to be engaged with the engaging parts at a fixed position.

Abstract: A window switch assembly of a vehicle comprises a base; a rail on the base; and a control member partially received in the rail and slidable in the rail. The rail includes a first rail body extending at a traverse direction, a first end portion and a second end portion communicated with the first rail body. The first end portion includes a first switch and a second switch opposite each other in a longitudinal direction, and the second end portion includes a third switch and a fourth switch opposite each other in the longitudinal direction. The control member selectively contacts the first switch and the second switch to control a first window, and selectively contacts the third switch and the fourth switch to control a second window.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria abrasive, (b) a surfactant comprising an amine-containing anchor group and ethylene oxide-propylene oxide stabilizing group, wherein the surfactant has a molecular weight of from about 1000 Daltons to about 5000 Daltons, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a pH of about 3 to about 6. The invention further provides a method of chemically mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrates contain silicon oxide.

Abstract: Described are compositions useful in methods for chemical-mechanical processing a surface of a substrate, especially a substrate that contains dielectric material, wherein the composition contains cyclodextrin and an alkylamine.

Abstract: Described are chemical-mechanical polishing compositions (e.g., slurries) and methods of using the slurries for chemical-mechanical polishing (or planarizing) a surface of a substrate that contains tungsten, the compositions containing cationic surfactant and cyclodextrin.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria, (b) a water-soluble cationic polymer or copolymer, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a pH of about 3 to about 6. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide.

Abstract: Described are compositions useful in methods for chemical-mechanical processing a surface of a substrate, especially a substrate that contains dielectric material, wherein the composition contains cyclodextrin and an alkylamine.

Abstract: The seatbelt buckle assembly comprises a buckle; a buckle supporting member connected to the buckle and including thereupon a first aperture and an opposing second aperture spaced apart along a width direction together to receive a fastener for assembling the buckle supporting member to the structural frame; and a spring to contact the buckle supporting member and the structural frame.

Abstract: Described are chemical-mechanical polishing compositions (e.g., slurries) and methods of using the slurries for chemical-mechanical polishing (or planarizing) a surface of a substrate that contains tungsten, the compositions containing cationic surfactant and cyclodextrin.

Abstract: A chemical-mechanical polishing composition includes colloidal silica abrasive particles having a chemical compound incorporated therein. The chemical compound may include a nitrogen-containing compound such as an aminosilane or a phosphorus-containing compound. Methods for employing such compositions include applying the composition to a semiconductor substrate to remove at least a portion of a layer.