Abstract: The present disclosure relates to a microphone. In some embodiments, the microphone may comprise a diaphragm, a backplate, and a sidewall stopper. The diaphragm has a venting hole disposed therethrough. The backplate is disposed over and spaced apart from the diaphragm. The sidewall stopper is disposed along a sidewall of the diaphragm exposing to the venting hole. Thus, the sidewall stopper is not limited by a distance between the movable part and the stable part of the microphone. Also, the sidewall stopper does not alternate the shape of movable part, and thus will less likely introduce crack to the movable part. In some embodiments, the sidewall stopper may be formed like a sidewall stopper by a self-alignment process, such that no extra mask is needed.

Abstract: A method for forming a MEMS device is provided. The method includes forming a stack of piezoelectric films and metal films on a base layer, wherein the piezoelectric films and the metal films are arranged in an alternating manner. The method also includes forming a first trench in the stack of the piezoelectric films and the metal films. The method further includes forming at least one void at the side wall of the first trench. In addition, the method includes forming a spacer structure in the at least one void. The method further includes forming a contact in the first trench after the formation of the spacer structure.

Abstract: In accordance with some embodiments, a method of forming an auto-focusing device is provided. The method includes forming a cantilever beam member. The cantilever beam member has a ring shape. The method further includes forming a piezoelectric member over the cantilever beam member. The method also includes forming a membrane over the cantilever beam member. The membrane has a first region and a second region. The first region has a planar surface, and the second region is located between the first region and an inner edge of the cantilever beam member and has a plurality of corrugation structures. In addition, the method includes applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer.

Abstract: Some embodiments of the present disclosure are related to an integrated chip including a first substrate underlying a second substrate. The first and second substrates at least partially define a cavity. An absorptive layer is disposed within the cavity and comprises a reactive mater. An absorption-enhancement layer is disposed along the absorptive layer and within the cavity. The absorption-enhancement layer is configured to pass the reactive material from a top surface to a bottom surface of the absorption-enhancement layer.

Abstract: The present disclosure relates to a method of manufacturing a MEMS device. In some embodiments, a first interlayer dielectric layer is formed over a substrate, and a diaphragm is formed over the first interlayer dielectric layer. Then, a second interlayer dielectric layer is formed over the diaphragm. A first etch is performed to form an opening through the second interlayer dielectric layer and the diaphragm and reaching into an upper portion of the first interlayer dielectric layer. A second etch is performed to the first interlayer dielectric layer and the second interlayer dielectric layer to form recesses above and below the diaphragm and to respectively expose a portion of a top surface and a portion of a bottom surface of the diaphragm. A sidewall stopper is formed along a sidewall of the diaphragm into the recesses of the first interlayer dielectric layer and the second interlayer dielectric layer.

Abstract: The present disclosure relates to a microphone. In some embodiments, the microphone may comprise a diaphragm, a backplate, and a sidewall stopper. The diaphragm has a venting hole disposed therethrough. The backplate is disposed over and spaced apart from the diaphragm. The sidewall stopper is disposed along a sidewall of the diaphragm exposing to the venting hole. Thus, the sidewall stopper is not limited by a distance between the movable part and the stable part of the microphone. Also, the sidewall stopper does not alternate the shape of movable part, and thus will less likely introduce crack to the movable part. In some embodiments, the sidewall stopper may be formed like a sidewall stopper by a self-alignment process, such that no extra mask is needed.

Abstract: The present disclosure relates to a microphone. In some embodiments, the microphone may comprise a substrate, a diaphragm, a backplate, and a sidewall stopper. The substrate has an opening disposed through the substrate. The diaphragm is disposed over the substrate and facing the opening of the substrate. The diaphragm has a venting hole overlying the opening of the substrate. A backplate is disposed over and spaced apart from the diaphragm. A sidewall stopper is disposed along a sidewall of the venting hole of the diaphragm and thus is not limited by a distance between the movable part and the stable part. Also, the sidewall stopper does not alternate the shape of movable part, and thus will less likely introduce crack to the movable part. In some embodiments, the sidewall stopper may be formed like a sidewall stopper by a self-alignment process, such that no extra mask is needed.

Abstract: Various embodiments of the present disclosure are directed towards a method for forming a piezoelectric device including a piezoelectric membrane and a plurality of conductive layers. The method includes forming the plurality of conductive layers in the piezoelectric membrane, the plurality of conductive layers are vertically offset one another. A masking layer is formed over the piezoelectric membrane. An etch process is performed according to the masking layer to concurrently expose an upper surface of each conductive layer in the plurality of conductive layers. A plurality of conductive vias are formed over the upper surface of the plurality of conductive layers.

Abstract: The present disclosure relates to a microphone. In some embodiments, the microphone may comprise a substrate, a diaphragm, a backplate, and a sidewall stopper. The substrate has an opening disposed through the substrate. The diaphragm is disposed over the substrate and facing the opening of the substrate. The diaphragm has a venting hole overlying the opening of the substrate. A backplate is disposed over and spaced apart from the diaphragm. A sidewall stopper is disposed along a sidewall of the venting hole of the diaphragm and thus is not limited by a distance between the movable part and the stable part. Also, the sidewall stopper does not alternate the shape of movable part, and thus will less likely introduce crack to the movable part. In some embodiments, the sidewall stopper may be formed like a sidewall stopper by a self-alignment process, such that no extra mask is needed.

Abstract: Some embodiments of the present disclosure are related to an integrated chip including a first substrate underlying a second substrate. The first and second substrates at least partially define a cavity. An absorptive layer is disposed within the cavity and comprises a reactive mater. An absorption-enhancement layer is disposed along the absorptive layer and within the cavity. The absorption-enhancement layer is configured to pass the reactive material from a top surface to a bottom surface of the absorption-enhancement layer.

Abstract: An integrated chip including a first substrate, a second substrate overlying the first substrate, and a third substrate overlying the second substrate is provided. The first, second, and third substrates at least partially define a cavity, and the second substrate includes a movable mass in the cavity between the first and third substrates. A getter structure is in the cavity and includes a getter layer and a filter layer. The getter layer comprises a getter material. The filter layer has a first side adjoining the getter layer, and further has a second side that is opposite the first side and that faces the cavity. The filter layer is configured to pass the getter material from the first side to the second side while blocking any impurities.

Abstract: A ligand of Formula (I) is provided: wherein A4 represents a hydrogen atom, a nitro group, an amino group, a thiocyanato group, or —Z—Y, in which Z is a divalent linking group and Y is a group derived from a biocompatible molecule, with the proviso that when X is methylene, A4 cannot be a hydrogen atom or a nitro group. A metal complex having the ligand is also provided and is useful as a blood pool contrast agent or a targeting contrast agent.

Abstract: A nanoparticle contains a core including superparamagnetic nanoparticles and having an outer surface, and siloxanyl moieties covalently coupled to the outer surface of the core and having Formula (I): In formula (I): X1 and X2 independently represent methylene, ethylene or propylene; R represents an optionally substituted pyridyl group, or —S—R is a group derived from a targeting ligand containing —SH group and effective to bind specifically with a predetermined targeted cell in an object; n and m independently represent an integer ranging from 1 to 3; and p represents an integer ranging from 9 to 45. The nanoparticles are suitable for use as a magnetic resonance imaging contrast agent.

Abstract: A nanoparticle contains a core including superparamagnetic nanoparticles and having an outer surface, and siloxanyl moieties covalently coupled to the outer surface of the core and having Formula (I): In formula (I): X1 and X2 independently represent methylene, ethylene or propylene; R represents an optionally substituted pyridyl group, or —S—R is a group derived from a targeting ligand containing —SH group and effective to bind specifically with a predetermined targeted cell in an object; n and m independently represent an integer ranging from 1 to 3; and p represents an integer ranging from 9 to 45. The nanoparticles are suitable for use as a magnetic resonance imaging contrast agent.

Abstract: The preparation method of the magnetic nanoparticle (MNP) includes steps of: (a) reacting folic acid (FA) with Pluronic F127 (PF127) to form FA-PF127; (b) reacting poly(acrylic acid) (PAA) with FeCl3 to form PAA-bound iron oxide (PAAIO); and (c) reacting FA-PF127 with PAAIO via N-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride (EDAC) mediation to form FA-PF127-PAAIO. FA-PF127-PAAIO is nontoxic and shows the superparamagnetic property at room temperature. The Nile red-loaded FA-PF127-PAAIO can be performed as the chemotherapy agent and the contrast agent on magnetic resonance (MR) imaging.

Abstract: A ligand of Formula (I) is provided: wherein A4 represents a hydrogen atom, a nitro group, an amino group, a thiocyanato group, or —Z—Y, in which Z is a divalent linking group and Y is a group derived from a biocompatible molecule, with the proviso that when X is methylene, A4 cannot be a hydrogen atom or a nitro group. A metal complex having the ligand is also provided and is useful as a blood pool contrast agent or a targeting contrast agent.

Abstract: The present invention provides the synthetic method and superparamagnetic iron oxide nanoparticles capable of targeting to the folic acid receptors existing on the cell membranes and with high relaxivity. The iron oxide nanoparticles of the present invention can further be used as the contrast agents for magnetic resonance imaging (MRI).

Abstract: The present invention provides the synthetic method and superparamagnetic iron oxide nanoparticles capable of targeting to the folic acid receptors existing on the cell membranes and with high relaxivity. The iron oxide nanoparticles of the present invention can further be used as the contrast agents for magnetic resonance imaging (MRI).