Patents by Inventor Titash Rakshit

Titash Rakshit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190319108
    Abstract: A semiconductor device and method for providing a semiconductor device are described. The semiconductor device includes a channel, a gate, and a multilayer gate insulator structure between the gate and the channel. The multilayer gate insulator structure includes at least one ferroelectric layer and at least one dielectric layer. The at least one ferroelectric layer and the at least one dielectric layer share at least one interface and have a strong polarization coupling.
    Type: Application
    Filed: September 25, 2018
    Publication date: October 17, 2019
    Inventors: Jorge A. Kittl, Borna J. Obradovic, Ryan M. Hatcher, Titash Rakshit
  • Publication number: 20190318775
    Abstract: A memory cell and method for utilizing the memory cell are described. The memory cell includes at least one ferroelectric transistor (FE-transistor) and at least one selection transistor coupled with the FE-transistor. An FE-transistor includes a transistor and a ferroelectric capacitor for storing data. The ferroelectric capacitor includes ferroelectric material(s). In some aspects, the memory cell consists of a FE-transistor and a selection transistor. In some aspects, the transistor of the FE-transistor includes a source, a drain and a gate coupled with the ferroelectric capacitor. In this aspect, the selection transistor includes a selection transistor source, a selection transistor drain and a selection transistor gate. In this aspect, a write port of the memory cell is the selection transistor source or the selection transistor drain. The other of the selection transistor source and drain is coupled to the ferroelectric capacitor.
    Type: Application
    Filed: September 26, 2018
    Publication date: October 17, 2019
    Inventors: Titash Rakshit, Borna J. Obradovic, Ryan M. Hatcher, Jorge A. Kittl
  • Patent number: 10424581
    Abstract: An integrated circuit (IC) including a circuit block including a plurality of complementary metal oxide semiconductor field-effect transistors (CMOSFETs), and a tunnel field-effect transistor (TFET) between the circuit block and ground for power gating the circuit block.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: September 24, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Titash Rakshit, Mark Rodder, Rwik Sengupta
  • Publication number: 20190280694
    Abstract: A computing cell and method for performing a digital XNOR of an input signal and weights are described. The computing cell includes at least one pair of FE-FETs and a plurality of selection transistors. The pair(s) of FE-FETs are coupled with a plurality of input lines and store the weight. Each pair of FE-FETs includes a first FE-FET that receives the input signal and stores a first weight and a second FE-FET that receives the input signal complement and stores a second weight. The selection transistors are coupled with the pair of FE-FETs.
    Type: Application
    Filed: September 20, 2018
    Publication date: September 12, 2019
    Inventors: Borna J. Obradovic, Ryan M. Hatcher, Jorge A. Kittl, Titash Rakshit
  • Publication number: 20190154493
    Abstract: A weight cell including first and second bi-directional memory elements each configured to switch between a first resistance state and a second resistance state different than the first resistance state. A first input line is connected to a first terminal of the first bi-directional memory element, and a second input line is connected to the first terminal of the second bi-directional memory element. A first diode in forward bias connects the second terminal of the first bi-directional memory element to a first output line, a second diode in reverse bias connects the second terminal of the second bi-directional memory element to a second output line, a third diode in reverse bias connects the second terminal of the first bi-directional memory element to the second output line, and a fourth diode in forward bias connects the second terminal of the second bi-directional memory element to the first output line.
    Type: Application
    Filed: February 1, 2018
    Publication date: May 23, 2019
    Inventors: Ryan M. Hatcher, Jorge A. Kittl, Borna J. Obradovic, Titash Rakshit
  • Publication number: 20190154933
    Abstract: A method for providing a vertical optical via for a semiconductor substrate is described. The semiconductor substrate has a front surface and a back side. A hard mask having an aperture therein is formed on the front surface. Part of the semiconductor substrate exposed by the aperture is removed to form a via hole. The via hole has a width not exceeding one hundred micrometers and a bottom. Cladding layer(s) and core layer(s) are provided in the via hole. The core layer(s) have at least a second index of refraction greater than that of the core layer(s). A portion of the semiconductor substrate including the back side is removed to expose a bottom portion of the core layer(s) and a bottom surface of the semiconductor substrate. The vertical optical via includes the cladding and core layers. The vertical optical via extends from the front surface to the bottom surface.
    Type: Application
    Filed: April 27, 2018
    Publication date: May 23, 2019
    Inventors: Daniel N. Carothers, Titash Rakshit
  • Publication number: 20190148298
    Abstract: An integrated circuit including a series of field effect transistors. Each field effect transistor includes a source region, a drain region, a channel region extending between the source region and the drain region, a gate on the channel region, a gate contact on the gate at an active region of the gate, a source contact on the source region, and a drain contact on the drain region. Upper surfaces of the source and drain contacts are spaced below an upper surface of the gate by a depth.
    Type: Application
    Filed: April 9, 2018
    Publication date: May 16, 2019
    Inventors: Rwik Sengupta, Mark Rodder, Joon Goo Hong, Titash Rakshit
  • Publication number: 20190148502
    Abstract: A field effect transistor including a source region, a drain region, a channel region extending between the source region and the drain region, a gate on the channel region, a gate contact on the gate at an active region of the gate, a source contact on the source region, a drain contact on the drain region, and recesses in the source and drain contacts substantially aligned with the gate contact. Upper surfaces of the recesses in the source and drain contacts are spaced below an upper surface of the gate by a depth.
    Type: Application
    Filed: September 4, 2018
    Publication date: May 16, 2019
    Inventors: Rwik Sengupta, Mark Rodder, Joon Goo Hong, Titash Rakshit
  • Publication number: 20190131977
    Abstract: A hardware cell and method for performing a digital XNOR of an input signal and weights are described. The hardware cell includes input lines, a plurality of pairs of magnetic junctions, output transistors and at least one selection transistor coupled with the output transistors. The input lines receive the input signal and its complement. The magnetic junctions store the weight. Each magnetic junction includes a reference layer, a free layer and a nonmagnetic spacer layer between the reference layer and the free layer. The free layer has stable magnetic states and is programmable using spin-transfer torque and/or spin-orbit interaction torque. The first magnetic junction of a pair receives the input signal. The second magnetic junction of the pair receives the input signal complement. The output transistors are coupled with the magnetic junctions such that each pair of magnetic junctions forms a voltage divider. The output transistors form a sense amplifier.
    Type: Application
    Filed: February 1, 2018
    Publication date: May 2, 2019
    Inventors: Borna J. Obradovic, Titash Rakshit, Ryan M. Hatcher, Jorge A. Kittl, Mark S. Rodder
  • Publication number: 20190079701
    Abstract: A memory device and method for providing the memory device are described. The memory device includes word lines, a first plurality of bit lines, a second plurality of bit lines and selectorless memory cells. Each selectorless memory cell is coupled with a word line, a first bit line of the first plurality of bit lines and a second bit line of the second plurality of bit lines. The selectorless memory cell includes first and second magnetic junctions. The first and second magnetic junctions are each programmable using a spin-orbit interaction torque. The word line is coupled between the first and second magnetic junctions. The first and second bit lines are coupled with the first and second magnetic junctions, respectively. The selectorless memory cell is selected for a write operation based on voltages in the word line, the first bit line and the second bit line.
    Type: Application
    Filed: December 18, 2017
    Publication date: March 14, 2019
    Inventors: Titash Rakshit, Borna J. Obradovic, Ryan M. Hatcher, Vladimir Nikitin, Dmytro Apalkov
  • Publication number: 20190080230
    Abstract: A hardware device and method for performing a multiply-accumulate operation are described. The device includes inputs lines, weight cells and output lines. The input lines receive input signals, each of which is has a magnitude and a phase and can represent a complex value. The weight cells couple the input lines with the output lines. Each of the weight cells has an electrical admittance corresponding to a weight. The electrical admittance is programmable and capable of being complex valued. The input lines, the weight cells and the output lines form a crossbar array. Each of the output lines provides an output signal. The output signal for an output line is a sum of an input signal for each of the input lines connected to the output line multiplied by the electrical admittance of each of the weight cells connecting the input lines to the output line.
    Type: Application
    Filed: December 20, 2017
    Publication date: March 14, 2019
    Inventors: Ryan M. Hatcher, Jorge A. Kittl, Borna J. Obradovic, Titash Rakshit
  • Publication number: 20190026627
    Abstract: A neuromorphic architecture for providing variable precision in a neural network, through programming. Logical pre-synaptic neurons are formed as configurable sets of physical pre-synaptic artificial neurons, logical post-synaptic neurons are formed as configurable sets of physical post-synaptic artificial neurons, and the logical pre-synaptic neurons are connected to the logical post-synaptic neurons by logical synapses each including a set of physical artificial synapses. The precision of the weights of the logical synapses may be varied by varying the number of physical pre-synaptic artificial neurons in each of the logical pre-synaptic neurons, and/or by varying the number of physical post-synaptic artificial neurons in each of the logical post-synaptic neurons.
    Type: Application
    Filed: February 7, 2018
    Publication date: January 24, 2019
    Inventors: Ryan M. Hatcher, Jorge A. Kittl, Borna J. Obradovic, Titash Rakshit
  • Publication number: 20190012593
    Abstract: A neuromorphic multi-bit digital weight cell configured to store a series of potential weights for a neuron in an artificial neural network. The neuromorphic multi-bit digital weight cell includes a parallel cell including a series of passive resistors in parallel and a series of gating transistors. Each gating transistor of the series of gating transistors is in series with one passive resistor of the series of passive resistors. The neuromorphic cell also includes a series of programming input lines connected to the series of gating transistors, an input terminal connected to the parallel cell, and an output terminal connected to the parallel cell.
    Type: Application
    Filed: November 7, 2017
    Publication date: January 10, 2019
    Inventors: Borna J. Obradovic, Titash Rakshit, Rwik Sengupta, Joon Goo Hong, Ryan M. Hatcher, Jorge A. Kittl, Mark S. Rodder
  • Publication number: 20180300618
    Abstract: A neuromorphic weight cell (NWC) including a resistor ladder including a plurality of resistors connected in series, and a plurality of shunting nonvolatile memory (NVM) elements, each of the shunting NVM elements being coupled in parallel to a corresponding one of the resistors.
    Type: Application
    Filed: August 15, 2017
    Publication date: October 18, 2018
    Inventors: Borna J. Obradovic, Titash Rakshit, Jorge A. Kittl, Ryan Hatcher
  • Patent number: 10084058
    Abstract: Embodiments described include straining transistor quantum well (QW) channel regions with metal source/drains, and conformal regrowth source/drains to impart a uni-axial strain in a MOS channel region. Removed portions of a channel layer may be filled with a junction material having a lattice spacing different than that of the channel material to causes a uni-axial strain in the channel, in addition to a bi-axial strain caused in the channel layer by a top barrier layer and a bottom buffer layer of the quantum well.
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: September 25, 2018
    Assignee: Intel Corporation
    Inventors: Prashant Majhi, Mantu K. Hudait, Jack T. Kavalieros, Ravi Pillarisetty, Marko Radosavljevic, Gilbert Dewey, Titash Rakshit, Willman Tsai
  • Patent number: 10026751
    Abstract: A semiconductor device includes a series of metal routing layers and a complementary pair of planar field-effect transistors (FETs) on an upper metal routing layer of the metal routing layers. The upper metal routing layer is M3 or higher. Each of the FETs includes a channel region of a crystalline material. The crystalline material may include one or more transition metal dichalcogenide materials such as MoS2, WS2, WSe2, and/or combinations thereof.
    Type: Grant
    Filed: July 14, 2016
    Date of Patent: July 17, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Titash Rakshit, Borna J. Obradovic, Rwik Sengupta, Wei-E Wang, Ryan Hatcher, Mark S. Rodder
  • Patent number: 10008580
    Abstract: According to an embodiment of the present invention, a method of manufacturing a FET device having a set BTBT leakage and a maximum VDD includes: determining an x value in InxGa1-xAs according to the BTBT leakage and the maximum VDD, and forming a channel utilizing InxGa1-xA, wherein x is not 0.53.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: June 26, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Borna J. Obradovic, Titash Rakshit, Mark S. Rodder
  • Publication number: 20180174034
    Abstract: A neuromorphic device for the analog computation of a linear combination of input signals, for use, for example, in an artificial neuron. The neuromorphic device provides non-volatile programming of the weights, and fast evaluation and programming, and is suitable for fabrication at high density as part of a plurality of neuromorphic devices. The neuromorphic device is implemented as a vertical stack of flash-like cells with a common control gate contact and individually contacted source-drain (SD) regions. The vertical stacking of the cells enables efficient use of layout resources.
    Type: Application
    Filed: April 14, 2017
    Publication date: June 21, 2018
    Inventors: Borna J. Obradovic, Titash Rakshit, Mark S. Rodder
  • Publication number: 20180130785
    Abstract: A semiconductor device includes a series of metal routing layers and a complementary pair of planar field-effect transistors (FETs) on an upper metal routing layer of the metal routing layers. The upper metal routing layer is M3 or higher. Each of the FETs includes a channel region of a crystalline material. The crystalline material may include polycrystalline silicon. The upper metal routing layer M3 or higher may include cobalt.
    Type: Application
    Filed: February 24, 2017
    Publication date: May 10, 2018
    Inventors: Wei-E Wang, Titash Rakshit, Borna J. Obradovic, Chris Bowen, Mark S. Rodder
  • Patent number: 9966137
    Abstract: A neuron circuit for use in a neural network is disclosed. The neural network includes a plurality of field effect transistors having confined channels. The sources and drains of the field effect transistors are connected in series. A plurality of input terminals for receiving a plurality of input voltages may be connected to a drain terminal of a corresponding field effect transistor. The threshold voltages of the field effect transistors can be programmed by increasing or decreasing a number of excess minority carriers in the confined channels, thereby programming the resistance presented by the field effect transistor.
    Type: Grant
    Filed: November 3, 2016
    Date of Patent: May 8, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Titash Rakshit, Borna J. Obradovic