Publication number: 20190249311
Abstract: A hard film for coating a surface of a base material, the hard film includes a layer A, a layer B, and a nanolayer-alternating layer. The layer A is an AlTiCr nitride of (AlaTibCrc?d)N, where ? is one or more elements selected from C, B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The layer B is an AlTiCr nitride or AlTiCr carbonitride of (AleTifCrg?h)CxN1-X, where ? is one or more elements selected from B, Si, V, Y, Zr, Nb, Mo, Hf, Ta, and W. The nanolayer-alternating layer is formed by alternately laminating a nanolayer A or a nanolayer B having the same composition as the layer A or B. And, the layer C is an AlCr(SiC) nitride or AlCr(SiC) carbonitride of [AliCrj(SiC)k?1]CYN1-Y, where ? is one or more elements selected from B, Ti, V, Y, Zr, Nb, Mo, Hf, Ta, and W.
Type:
Application
Filed:
October 25, 2016
Publication date:
August 15, 2019
Applicant:
OSG CORPORATION
Inventors:
Masatoshi SAKURAI, Mei WANG
Patent number: 10227687
Abstract: A hard lubrication film, with which a surface of a base material is coated, has two or more alternately laminated layers that are one or more A-layers made of (CraMobWcVdBe)1?x?yCxNy and one or more B-layers made of (CraMobWcVdBe)1?x?y?zCxNyOz. Atom ratios a, b, c, d, e=1?a?b?c?d, x+y, and y related to A-layers satisfy 0.2?a?0.7, 0.05?b?0.6, 0?c?0.3, 0?d?0.05, 0?e?0.05, 0.3?x+y?0.6, and 0?y?0.6, respectively. Atom ratios a, b, c, d, e=1?a?b?c?d, x, y, z, and x+y+z related to B-layers satisfy 0.2?a?0.7, 0.05?b?0.6, 0?c?0.3, 0?d?0.05, 0?e?0.05, 0?x?0.6, 0?y?0.6, 0<z?0.6, and 0.3?x+y+z?0.6, respectively. Each A-layer has a film thickness within a range of 2 nm or more to 1000 nm or less, each B-layer has a film thickness within a range of 2 nm or more to 500 nm or less, and wherein the hard lubrication film has a total film thickness within a range of 0.1 ?m or more to 10.0 ?m or less.
Type:
Grant
Filed:
November 26, 2013
Date of Patent:
March 12, 2019
Assignees:
OSG CORPORATION, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
Inventors:
Mei Wang, Masatoshi Sakurai, Yuji Sutou, Junichi Koike