Patents by Inventor Tohru Ando
Tohru Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20110291692Abstract: Provided is an apparatus for automatically detecting a failure position on a specified wiring line. The apparatus and a method for automatically detecting the failure position even on a long wiring line by applying a probe and an electron beam onto a sample and using an image of the current absorbed by the sample are provided. The apparatus obtains an absorbed current image, while laterally moving at right angle with the probe applied onto the sample, and based on the obtained absorbed current image, correction is performed by means of both an image shift and a stage. Countermeasures are taken, using a stage not having a sample rotating stage, against factors including a hardware factor of not moving at a correct angle, such as backlash, the wiring line is accurately and continuously displayed even when the apparatus moves to the ends of the long wiring line, and the failure position is detected, while the apparatus automatically reciprocates several times between the both ends of the wiring line.Type: ApplicationFiled: January 20, 2010Publication date: December 1, 2011Inventors: Tohru Ando, Masaaki Komori, Takao Matsuura
-
Publication number: 20110291009Abstract: Disclosed is a device capable of probing with minimal effect from electron beams. Rough probing is made possible using a lower magnification than the magnification usually viewed. When target contact of semiconductor is detected, measurement position is set in the center of picture usually to move probe without moving stage. With the miniaturization, contact can be confirmed only at high magnification, although probe can be confirmed at low magnification on the contrary but it is necessary to display it in real time. Static image obtained at high magnification once is combined with image obtained at low magnification in real time from target contact required for probing and characteristic of probe to be displayed, so that probing at low magnification can be realized to reduce the effects of electron beams and obtain accurate electrical characteristics.Type: ApplicationFiled: January 20, 2010Publication date: December 1, 2011Applicant: Hitachi High-Technologies CorporationInventors: Tohru Ando, Masahiro Sasajima
-
Patent number: 8067752Abstract: A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.Type: GrantFiled: April 22, 2010Date of Patent: November 29, 2011Assignee: Hitachi High-Technologies CorporationInventors: Tohru Ando, Yasuhiko Nara, Tsutomu Saito, Shinichi Kato, Takeshi Sunaoshi
-
Patent number: 7989766Abstract: A sample inspection apparatus in which a fault in a semiconductor sample can be measured and analyzed efficiently. A plurality of probes are brought into contact with the sample. The sample is irradiated with an electron beam while a current flowing through the probes is measured. Signals from at least two probes are supplied to an image processing unit so as to form an absorbed electron current image. A difference between images obtained in accordance with a temperature change of the sample is obtained. A faulty point is identified from the difference between the images.Type: GrantFiled: April 1, 2009Date of Patent: August 2, 2011Assignee: Hitachi High-Technologies CorporationInventors: Yasuhiko Nara, Tohru Ando, Masahiro Sasajima, Tsutomu Saito, Tomoharu Obuki, Isamu Sekihara
-
Publication number: 20100200749Abstract: A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.Type: ApplicationFiled: April 22, 2010Publication date: August 12, 2010Applicant: Hitachi High-Technologies CorporationInventors: Tohru ANDO, Yasuhiko Nara, Tsutomu Saito, Shinichi Kato, Takeshi Sunaoshi
-
Publication number: 20100177954Abstract: A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed.Type: ApplicationFiled: March 22, 2010Publication date: July 15, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION.Inventors: Tohru ANDO, Tsutomu Saito, Yasuhiko Nara, Mikio Takagi, Koichi Takauchi
-
Patent number: 7732791Abstract: A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.Type: GrantFiled: August 6, 2007Date of Patent: June 8, 2010Assignee: Hitachi High-Technologies CorporationInventors: Tohru Ando, Yasuhiko Nara, Tsutomu Saito, Shinichi Kato, Takeshi Sunaoshi
-
Publication number: 20100116986Abstract: An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.Type: ApplicationFiled: January 21, 2010Publication date: May 13, 2010Applicant: Hitachi High-Technologies CorporationInventors: Tomoharu Obuki, Hiroshi Toyama, Yasuhiro Mitsui, Munetoshi Fukui, Yasuhiko Nara, Tohru Ando, Katsuo Ooki, Tsutomu Saito, Masaaki Komori
-
Patent number: 7700916Abstract: A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed.Type: GrantFiled: October 20, 2006Date of Patent: April 20, 2010Assignee: Hitachi High-Technologies CorporationInventors: Tohru Ando, Tsutomu Saito, Yasuhiko Nara, Mikio Takagi, Koichi Takauchi
-
Patent number: 7663104Abstract: An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.Type: GrantFiled: February 27, 2008Date of Patent: February 16, 2010Assignee: Hitachi High-Technologies CorporationInventors: Tomoharu Obuki, Hiroshi Toyama, Yasuhiro Mitsui, Munetoshi Fukui, Yasuhiko Nara, Tohru Ando, Katsuo Ooki, Tsutomu Saito, Masaaki Komori
-
Publication number: 20090250610Abstract: A sample inspection apparatus in which a fault in a semiconductor sample can be measured and analyzed efficiently. A plurality of probes are brought into contact with the sample. The sample is irradiated with an electron beam while a current flowing through the probes is measured. Signals from at least two probes are supplied to an image processing unit so as to form an absorbed electron current image. A difference between images obtained in accordance with a temperature change of the sample is obtained. A faulty point is identified from the difference between the images.Type: ApplicationFiled: April 1, 2009Publication date: October 8, 2009Inventors: Yasuhiko NARA, Tohru ANDO, Masahiro SASAJIMA, Tsutomu SAITO, Tomoharu OBUKI, Isamu SEKIHARA
-
Publication number: 20080237462Abstract: A semiconductor testing method capable of quickly counting semiconductor cells with accuracy is achieved. Since an SEM is adjusted in a specific condition, the rotation axis of a stage and the axis of an optical system are deviated from each other in a different observation environment and a different adjustment environment. The deviation between the axes is easily adjusted in each observation environment, so that the deviation is reduced. A seemingly horizontal or vertical line is drawn with a mouse and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line.Type: ApplicationFiled: August 6, 2007Publication date: October 2, 2008Applicant: Hitachi High-Technologies CorporationInventors: Tohru ANDO, Yasuhiko Nara, Tsutomu Saito, Shinichi Kato, Takeshi Sunaoshi
-
Publication number: 20080203297Abstract: An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.Type: ApplicationFiled: February 27, 2008Publication date: August 28, 2008Applicant: Hitachi High-Technologies CorporationInventors: Tomoharu OBUKI, Hiroshi Toyama, Yasuhiro Mitsui, Munetoshi Fukui, Yasuhiko Nara, Tohru Ando, Katsuo Ooki, Tsutomu Saito, Masaaki Komori
-
Publication number: 20070274593Abstract: A specified position in an array structure in which a reference pattern is displayed repetitively through reference pattern counting is identified. In an array structure image, the pattern detection estimating area generated from a starting point, the address of the starting point, and a unit vector are compared with a pattern detected position found in pattern matching with the reference pattern image, to execute pattern counting while determining correct detection, oversights, wrong detection, etc. Array structure images are photographed sequentially while moving the visual field with the use of an image shifting deflector to continue the pattern counting started at the starting point to identify the ending point specified with an address. If the ending point is not reached only with use of the image shifting deflector, the visual field moving range of the image shifting deflector is moved with use of a specimen stage.Type: ApplicationFiled: February 8, 2007Publication date: November 29, 2007Inventors: Ruriko Tsuneta, Tohru Ando, Junzo Azuma
-
Publication number: 20070124713Abstract: A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed.Type: ApplicationFiled: October 20, 2006Publication date: May 31, 2007Inventors: Tohru Ando, Tsutomu Saito, Yasuhiko Nara, Mikio Takagi, Koichi Takauchi
-
Patent number: 5460977Abstract: According to the present invention, a peptide which causes the blast formation of lymphocytes sensitized by mites is provided, and mite allergy is diagnosed by using the peptide. The present invention relates to a peptide, that is, pentadecapeptide and triacontapeptide, which causes the blast formation of lymphocytes sensitized by mites and to a diagnostic agent for mite allergy while uses the peptide.Type: GrantFiled: March 30, 1994Date of Patent: October 24, 1995Assignees: Torii & Co., Asahi Breweries, Ltd.Inventors: Tohru Ando, Shigeru Ikeda, Yasushi Okumura