Patents by Inventor Tohru Kiuchi
Tohru Kiuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11342206Abstract: A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.Type: GrantFiled: December 12, 2019Date of Patent: May 24, 2022Assignee: Nikon CorporationInventors: Hideo Mizutani, Tohru Kiuchi, Toru Kawaguchi, Takashi Masukawa
-
Publication number: 20220082458Abstract: A flexible sensor includes a substrate having flexibility; and a sensor element provided on the substrate, wherein the sensor element includes a transistor having a gate electrode, a source electrode, and a drain electrode; and a variable resistance portion connected to either of the gate electrode, the source electrode, and the drain electrode, and the variable resistance portion has a resistance value changeable due to a strain, and wherein the variable resistance portion includes an extension portion extending in a direction.Type: ApplicationFiled: November 23, 2021Publication date: March 17, 2022Applicant: NIKON CORPORATIONInventors: Shohei KOIZUMI, Yoshiaki KITO, Takachika SHIMOYAMA, Katsuhiro HATAYAMA, Kentaro YAMADA, Tohru KIUCHI, Yasuteru FUKAWA
-
Patent number: 11073767Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.Type: GrantFiled: May 20, 2020Date of Patent: July 27, 2021Assignee: Nikon CorporationInventors: Masaki Kato, Tohru Kiuchi
-
Publication number: 20200310253Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.Type: ApplicationFiled: May 20, 2020Publication date: October 1, 2020Applicant: NIKON CORPORATIONInventors: Masaki KATO, Tohru KIUCHI
-
Patent number: 10691027Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.Type: GrantFiled: November 22, 2019Date of Patent: June 23, 2020Assignee: Nikon CorporationInventors: Masaki Kato, Tohru Kiuchi
-
Publication number: 20200118847Abstract: A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.Type: ApplicationFiled: December 12, 2019Publication date: April 16, 2020Applicant: NIKON CORPORATIONInventors: Hideo MIZUTANI, Tohru KIUCHI, Toru KAWAGUCHI, Takashi MASUKAWA
-
Publication number: 20200089129Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.Type: ApplicationFiled: November 22, 2019Publication date: March 19, 2020Applicant: NIKON CORPORATIONInventors: Masaki KATO, Tohru KIUCHI
-
Patent number: 10591827Abstract: A pattern exposure apparatus comprising: a rotary drum that supports a flexible substrate, which is exposed with a mask pattern formed on an outer circumferential surface of a cylindrical mask that rotates about a first center axis; a rotary drum-side scale portion that is arranged for measuring a movement of the substrate which is fed in a circumferential direction by a rotation of the rotary drum, that includes a scale; a first projection optical system that projects an exposure light; a second projection optical system that projects an exposure light; a first reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale; and a second reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale.Type: GrantFiled: September 24, 2018Date of Patent: March 17, 2020Assignee: Nikon CorporationInventors: Masaki Kato, Tohru Kiuchi
-
Patent number: 10541160Abstract: A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.Type: GrantFiled: December 22, 2010Date of Patent: January 21, 2020Assignee: Nikon CorporationInventors: Hideo Mizutani, Tohru Kiuchi, Toru Kawaguchi, Takashi Masukawa
-
Patent number: 10527945Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.Type: GrantFiled: July 10, 2019Date of Patent: January 7, 2020Assignee: Nikon CorporationInventors: Masaki Kato, Tohru Kiuchi
-
Publication number: 20190332018Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.Type: ApplicationFiled: July 10, 2019Publication date: October 31, 2019Applicant: NIKON CORPORATIONInventors: Masaki KATO, Tohru KIUCHI
-
Publication number: 20190025713Abstract: A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.Type: ApplicationFiled: September 24, 2018Publication date: January 24, 2019Applicant: NIKON CORPORATIONInventors: Masaki KATO, Tohru KIUCHI
-
Patent number: 10156795Abstract: A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.Type: GrantFiled: May 21, 2018Date of Patent: December 18, 2018Assignee: NIKON CORPORATIONInventors: Masaki Kato, Tohru Kiuchi
-
Publication number: 20180267413Abstract: A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.Type: ApplicationFiled: May 21, 2018Publication date: September 20, 2018Inventors: Masaki KATO, Tohru KIUCHI
-
Patent number: 10007190Abstract: A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.Type: GrantFiled: February 21, 2017Date of Patent: June 26, 2018Assignee: NIKON CORPORATIONInventors: Masaki Kato, Tohru Kiuchi
-
Publication number: 20170168400Abstract: A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.Type: ApplicationFiled: February 21, 2017Publication date: June 15, 2017Applicant: NIKON CORPORATIONInventors: Masaki KATO, Tohru KIUCHI
-
Patent number: 9651868Abstract: A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.Type: GrantFiled: March 8, 2013Date of Patent: May 16, 2017Assignee: NIKON CORPORATIONInventors: Masaki Kato, Tohru Kiuchi
-
Patent number: 9193560Abstract: A leader member includes a connection portion that is connected to a substrate and a position reference portion that is used at least for aligning the substrate with the connection portion.Type: GrantFiled: May 18, 2012Date of Patent: November 24, 2015Assignee: NIKON CORPORATIONInventors: Tomohide Hamada, Tohru Kiuchi
-
Patent number: 9178155Abstract: In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.Type: GrantFiled: October 9, 2009Date of Patent: November 3, 2015Assignee: NIKON CORPORATIONInventors: Kei Nara, Tomohide Hamada, Masaki Kato, Tohru Kiuchi
-
Patent number: 9152062Abstract: Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the predetermined area of the sheet material applied with the two-dimensional tension. The methods then illuminate an energy beam corresponding to the pattern to the predetermined area of the sheet material adsorbed to the reference surface.Type: GrantFiled: June 18, 2012Date of Patent: October 6, 2015Assignee: NIKON CORPORATIONInventors: Tohru Kiuchi, Hideo Mizutani