Abstract: An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that holds the optical member and the optical group holds the optical member so that it is movable relative to the optical group.

Abstract: A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction device corrects design data that should be input to the pattern image generation device based on the detection results. Accordingly, a pattern image is generated on an object by the pattern image generation device corresponding to the input of the design data after the correction, and because the object is exposed using the pattern image, a desired pattern is formed on the object with good precision.

Abstract: An exposure apparatus includes a first optical member via which an exposure beam exits; a first movable body which is movable on a light-exit side of the first optical member; a measuring member which is provided on the first movable body and which has an inclined surface to which a measuring beam for position measurement is irradiated; and a transmitting member which is provided on the first movable body, which has an end surface protruding more outwardly than the measuring member, and which has a transmitting area through which the measuring beam is transmissive. When the liquid immersion method is applied to the exposure apparatus, the substrate can be exposed efficiently and satisfactorily.

Abstract: A liquid immersion exposure apparatus includes: a first optical member having an exit surface via which an exposure beam exits; a first movable body movable with respect to the first optical member while holding a substrate; a cover member movable with movement of the first movable body and capable of retaining a liquid in a space formed between the exit surface and the cover member when the cover member is arranged at a position opposite to the exit surface; a first holding portion provided on the first movable body and holding the cover member; and a transport section removing the cover member from the first holding portion and moving the cover member independently from the first movable body. Upon exposing the substrate through the liquid, it is possible to suppress the deterioration of the performance which would be otherwise caused due to the cover member.

Abstract: An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region including a first region including a position facing the optical member and a second region different from the first region; a second movable member that is movable while holding the substrate independently from a first movable member, in a predetermined region including the first region and the second region; a first connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves one movable member in the first region; a second connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves the other movable member in the second region; and a third movable member that is provided on the first connection member and is movable to a position facing the optical member, and at leas

Abstract: A gun grip controller includes a rod-shaped controller body having a trigger-shaped lever and a steering dial or the like, for controlling a model car or the like, and a grip provided to protrude from the controller body. The grip is arranged so as to be rotatably attached to the controller body and also adapted so as to allow an occupation of both a protrusive position where the grip protrudes from the controller body in a direction crossing the longitudinal direction of the controller body, and a folded position where the grip is folded along the longitudinal direction of the controller body and adjacent to the outside of the controller body. Therefore, it is possible for the controller to occupy a compact configuration for packing and carrying purposes, in spite of its “gun-grip” configuration.

Abstract: An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that holds the optical member and the optical group holds the optical member so that it is movable relative to the optical group.

Abstract: This gun grip type controller 1 includes a rod-shaped controller body 3 having a trigger-shaped lever 23 and a steering dial 11, etc. for controlling a model car etc. and a grip 7 provided to protrude from the controller body 3. The grip 7 is arranged so as to be rotatable to the controller body 3 and also adapted so as to allow an occupation of both a protrusive position 25 where the grip protrudes from the controller body 3 to a direction crossing the longitudinal direction of the controller body 3 and a folding position 27 where the grip 7 is folded to a direction along the longitudinal direction of the controller body 3. Therefore, it is possible to provide the controller with a compact configuration when packing and carrying, in spite of its “gun-grip” configuration.

Abstract: A method and apparatus for the manufacture of circuits for a large display device using stitch exposure. In the peripheral region of a circuit pattern on a mask, the method of stitch exposing provides for a joining of pairs of stitch regions in order to join in an interfitting state such that a smaller mask can be combined to form a larger display device. By causing the corresponding positional relationship of mask and plate to change in a direction in which a pair of stitch regions face each other, the arrangement of respectively formed pattern counterparts, after being placed in a mutually complementary interfitting relationship, are transferred so as to be joined to the respective stitch region of a circuit pattern region periphery already transferred onto the plate.

Abstract: A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.

Abstract: A is a projection exposure apparatus has a light sending optical system exhibiting a high degree of freedom of light sending. The light sending optical system comprises a light introducing system for introducing light beams from a predetermined light source into a substrate stage, and a light irradiating system for irradiating a predetermined area with the light beams introduced into the substrate stage by the light introducing system. The light introducing system and the light irradiating system are mechanically separated but optically connectable only when the substrate stage is in a specified positional relationship with respect to the projection optical system.

Abstract: A projection exposure apparatus includes an illumination system for illuminating a mask, on which a pattern to be transferred is formed, with exposure light, a projection optical system for imaging and projecting the pattern on the mask onto a photosensitive substrate, beam radiation means for radiating an alignment beam with a wavelength different from the wavelength of the exposure light toward a first grating mark formed on the mask and a transparent portion near the first grating mark, and radiating the alignment beam onto a second grating mark formed on the photosensitive substrate via the transparent portion and the projection optical system, the beam radiation means having a four-beam generation member for generating two first alignment beams which cross each other on the first grating mark, and two second alignment beams which cross each other in a space separated by a predetermined distance from the surface of the mask.

Abstract: A fluorescent indicator apparatus comprises a first fluorescent display section including a plurality of grids, and anode segments corrsponding to the respective grids. A first driving device serves to drive the grids and the anode segments of the first fluorescent display section in a time-division manner to allow the anode segments of the first fluorescent display section to emit light. A second fluorescent display section includes a grid and an anode segment. A second driving device connected to the first driving device serves to drive the grid and the anode segment of the second fluorescent display section in synchronism with at least one of time-divided parts of the time-division drive of the first fluorescent display section to allow the anode of the second fluorescent display section to emit light.

Abstract: A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.