Patents by Inventor Tohru Kubota

Tohru Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060241294
    Abstract: A novel organoxysilane compound bearing a protected piperazino group is provided. It can impart rigidity, high mechanical strength, and transparency in the UV region when used in paints, adhesives and the like.
    Type: Application
    Filed: April 19, 2006
    Publication date: October 26, 2006
    Inventors: Yoichi Tonomura, Tohru Kubota
  • Patent number: 7112710
    Abstract: By reacting ?,?-unsaturated carboxylic esters with hydrosilanes or hydrosiloxanes in the presence of a catalytic amount of tris(pentafluorophenyl)borane, silyl ketene acetals or disilyl ketene acetals with high purity are produced in high yields.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: September 26, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ayumu Kiyomori, Tohru Kubota
  • Patent number: 7056446
    Abstract: A method of easily manufacturing a nano-gap electrode by using a focused ion beam lithography includes a layer depositing step of depositing an electrode layer and a metal mask layer in this order on an insulating substrate, a mask pattern forming step of etching the metal mask layer by using the focused ion beam and thereby forming a mask pattern, a dry etching step of transferring a pattern to the electrode layer by dry etching, and a wet etching step of removing the metal mask layer by using a solution that selectively dissolves the metal mask layer compared to the electrode layer.
    Type: Grant
    Filed: September 16, 2003
    Date of Patent: June 6, 2006
    Assignee: Communications Research Laboratory, Independent Administrative Institution
    Inventors: Takashi Nagase, Tohru Kubota, Shinro Mashiko
  • Patent number: 7053233
    Abstract: A silane compound of the following formula (1) having two or more protected functional groups A-R—Si(CH3)nX3-n??(1) wherein A represents a group of the following formula wherein R1, R2 and R3 each independently represent a monovalent hydrocarbon group having 1 to 10 carbon atoms, a is an integer of 1 to 10, and b is an integer of 1 to 10, or wherein R1, R2 and R3 are as defined above, R represents a linear or branched, divalent hydrocarbon group having 2 to 10 carbon atoms, X represents a halogen atom or an organoxy group having 1 to 10 carbon atoms, and n is 0, 1 or 2 is prevented from the reaction of the functional groups per self when undergoing modification or treatment. When the protection is removed after introduction of the protected functional groups, quantitative and efficient introduction of the two or more functional groups is ensured, resulting in more developed effects of modification and addition.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: May 30, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota
  • Publication number: 20060074213
    Abstract: A novel monofunctional monomer having a cage oligosiloxane structure is represented by formula (1) wherein X is a polymerizable oxygen-containing C1-C40 group, R1 is a C1-C20 saturated hydrocarbon group, C6-C20 aromatic hydrocarbon group, C1-C20 organoxy group or halogen atom, and R is a non-polymerizable monovalent C1-C40 hydrocarbon group which is optionally halogenated. The monomer has improved compatibility with various solvents and polymerizable monomers. A method for preparing the same is also provided.
    Type: Application
    Filed: October 4, 2005
    Publication date: April 6, 2006
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ayumu Kiyomori, Tohru Kubota, Yasufumi Kubota, Takayuki Honma
  • Patent number: 6994945
    Abstract: Novel silicon-containing polymers are obtained by copolymerizing a vinylsilane monomer with a compound having a low electron density unsaturated bond such as maleic anhydride, maleimide derivatives or tetrafluoroethylene. Using the polymers, chemical amplification positive resist compositions sensitive to high-energy radiation and having a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching are obtained.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: February 7, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takanobu Takeda, Jun Hatakeyama, Toshinobu Ishihara, Tohru Kubota, Yasufumi Kubota
  • Publication number: 20050256329
    Abstract: By reacting ?,?-unsaturated carboxylic esters with hydrosilanes or hydrosiloxanes in the presence of a catalytic amount of tris(pentafluorophenyl)borane, silyl ketene acetals or disilyl ketene acetals with high purity are produced in high yields.
    Type: Application
    Filed: July 22, 2005
    Publication date: November 17, 2005
    Inventors: Ayumu Kiyomori, Tohru Kubota
  • Patent number: 6960679
    Abstract: By reacting ?,?-unsaturated carboxylic esters with hydrosilanes or hydrosiloxanes in the presence of a catalytic amount of tris(pentafluorophenyl)borane, silyl ketene acetals or disilyl ketene acetals with high purity are produced in high yields.
    Type: Grant
    Filed: April 22, 2004
    Date of Patent: November 1, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ayumu Kiyomori, Tohru Kubota
  • Publication number: 20050234254
    Abstract: A silane compound of the following formula (1) having two or more protected functional groups A-R—Si(CH3)nX3-n??(1) wherein A represents a group of the following formula wherein R1, R2 and R3 each independently represent a monovalent hydrocarbon group having 1 to 10 carbon atoms, a is an integer of 1 to 10, and b is an integer of 1 to 10, or wherein R1, R2 and R3 are as defined above, R represents a linear or branched, divalent hydrocarbon group having 2 to 10 carbon atoms, X represents a halogen atom or an organoxy group having 1 to 10 carbon atoms, and n is 0, 1 or 2 is prevented from the reaction of the functional groups per self when undergoing modification or treatment. When the protection is removed after introduction of the protected functional groups, quantitative and efficient introduction of the two or more functional groups is ensured, resulting in more developed effects of modification and addition.
    Type: Application
    Filed: April 13, 2005
    Publication date: October 20, 2005
    Inventors: Yoichi Tonomura, Tohru Kubota
  • Patent number: 6943264
    Abstract: By reacting a branched siloxane compound of formula (2) containing compounds of formula (1) as an impurity with a disiloxane compound of formula (3) in the presence of an acid compound, there is prepared a branched siloxane of formula (2) containing a reduced level of compounds of formula (1). R1nSi(OSiR23)3-n(OR3)??(1) R1nSi(OSiR23)4-n??(2) R23SiOSiR23??(3) R1 is a monovalent hydrocarbon group, R2 and R3 are H or monovalent hydrocarbon groups, and n is 0 or 1.
    Type: Grant
    Filed: August 26, 2004
    Date of Patent: September 13, 2005
    Assignee: Shin-Etsu Chemical, Co., Ltd.
    Inventors: Yasufumi Kubota, Tohru Kubota
  • Publication number: 20050138804
    Abstract: The object of the present invention is to provide a nano-scale molecular assembly such as a conductive nano-wire. Specifically, there is provided an electrolytic apparatus for forming a molecular assembly, including two electrodes and an electrolytic cell holding an electrolyte and the two electrodes, wherein the gap between the two electrodes is from 1 nm to 100 ?m, by allowing the electrolytic cell to hold an electrolyte containing molecules that is to constitute the molecular assembly, and applying a voltage across the two electrodes in the state wherein the electrolyte and the two electrodes are in contact.
    Type: Application
    Filed: March 7, 2003
    Publication date: June 30, 2005
    Applicant: National Institute of Information and Communication Technology
    Inventors: Hiroyuki Hasegawa, Tohru Kubota, Shinro Mashiko
  • Patent number: 6875881
    Abstract: A branched tetrasiloxane is prepared by preforming a liquid mixture of a disiloxane compound, an alcohol and an acid catalyst, adding a trialkoxysilane compound to the mixture for reaction, and adding water to the reaction mixture for co-hydrolysis, thereby forming a branched tetrasiloxane. The method is capable of preparing a branched tetrasiloxane, especially methyltris(trimethylsiloxy)silane having a sufficiently high purity to use as cosmetic oil in good yields.
    Type: Grant
    Filed: May 27, 2004
    Date of Patent: April 5, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasufumi Kubota, Tohru Kubota, Satoshi Onai, Koji Sakuta, Akira Yamamoto
  • Patent number: 6875880
    Abstract: A compound having a non-silanol hydroxyl group and a compound having a silanol group are subjected to dehydrative condensation in the presence of a compound of formula (1), (2) or (3): MXn??(1) ZaSiR1bR2cR3d??(2) CmF2m+1SO3Y??(3) wherein M is a metal, n is the valence of metal M, and X is halogen or CmF2m+1SO3; a=1 to 4, b, c and d=0 to 3, a+b+c+d=4, R1, R2 and R3 are monovalent hydrocarbon groups, Z is halogen or CmF2m+1SO3; Y is H or HW, W is an amine NR4R5R6 or a nitrogen-containing heterocyclic compound, R4, R5 and R6 are H or monovalent hydrocarbyl groups, and m=0 to 10. The method is effective in silylating the hydroxyl group without generating a substantial amount of harmful by-products such as hydrogen chloride or triethylamine hydrochloride.
    Type: Grant
    Filed: January 21, 2003
    Date of Patent: April 5, 2005
    Assignee: Shin-Etsu Chemical, Co., Ltd.
    Inventors: Hiromi Nishiwaki, Ayumu Kiyomori, Tohru Kubota
  • Publication number: 20050070729
    Abstract: A ?,?-unsaturated carboxylic acid silyl ester is prepared by reacting an ?,?-unsaturated carboxylic acid ester with a hydrosilane or hydrosiloxane in the presence of tris(pentafluorophenyl)borane. ?,?-Unsaturated carboxylic acid derivatives are readily prepared through fewer steps and in high yields.
    Type: Application
    Filed: September 23, 2004
    Publication date: March 31, 2005
    Inventors: Ayumu Kiyomori, Tohru Kubota
  • Publication number: 20050049427
    Abstract: By reacting a branched siloxane compound of formula (2) containing compounds of formula (1) as an impurity with a disiloxane compound of formula (3) in the presence of an acid compound, there is prepared a branched siloxane of formula (2) containing a reduced level of compounds of formula (1). R1nSi(OSiR23)3-n(OR3)??(1) R1nSi (OSiR23)4-n??(2) R23SiOSiR23??(3) R1 is a monovalent hydrocarbon group, R2 and R3 are H or monovalent hydrocarbon groups, and n is 0 or 1.
    Type: Application
    Filed: August 26, 2004
    Publication date: March 3, 2005
    Inventors: Yasufumi Kubota, Tohru Kubota
  • Publication number: 20040242912
    Abstract: A branched tetrasiloxane is prepared by preforming a liquid mixture of a disiloxane compound, an alcohol and an acid catalyst, adding a trialkoxysilane compound to the mixture for reaction, and adding water to the reaction mixture for co-hydrolysis, thereby forming a branched tetrasiloxane. The method is capable of preparing a branched lo tetrasiloxane, especially methyltris(trimethylsiloxy)silane having a sufficiently high purity to use as cosmetic oil in good yields.
    Type: Application
    Filed: May 27, 2004
    Publication date: December 2, 2004
    Inventors: Yasufumi Kubota, Tohru Kubota, Satoshi Onai, Koji Sakuta, Akira Yamamoto
  • Publication number: 20040242911
    Abstract: Bissilylamino group-bearing chlorosilane compounds of formula (1):
    Type: Application
    Filed: May 27, 2004
    Publication date: December 2, 2004
    Inventors: Yoichi Tonomura, Tohru Kubota
  • Publication number: 20040215033
    Abstract: By reacting &agr;,&bgr;-unsaturated carboxylic esters with hydrosilanes or hydrosiloxanes in the presence of a catalytic amount of tris(pentafluorophenyl)borane, silyl ketene acetals or disilyl ketene acetals with high purity are produced in high yields.
    Type: Application
    Filed: April 22, 2004
    Publication date: October 28, 2004
    Inventors: Ayumu Kiyomori, Tohru Kubota
  • Publication number: 20040161708
    Abstract: A method of easily manufacturing a nano-gap electrode by using a focused ion beam lithography includes a layer depositing step of depositing an electrode layer and a metal mask layer in this order on an insulating substrate, a mask pattern forming step of etching the metal mask layer by using the focused ion beam and thereby forming a mask pattern, a dry etching step of transferring a pattern to the electrode layer by dry etching, and a wet etching step of removing the metal mask layer by using a solution that selectively dissolves the metal mask layer compared to the electrode layer.
    Type: Application
    Filed: September 16, 2003
    Publication date: August 19, 2004
    Applicant: Communications Research Laboratory, Independent Administrative Institution
    Inventors: Takashi Nagase, Tohru Kubota, Shinro Mashiko
  • Patent number: 6623909
    Abstract: Polymers comprising recurring units of formula (1) are provided wherein R1 is a straight, branched or cyclic divalent C1-20 hydrocarbon group or a bridged cyclic hydrocarbon group, R is hydrogen atom or an acid labile group, 0≦m≦3, 0≦n≦3 and 0≦m+n≦6. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.
    Type: Grant
    Filed: June 1, 2001
    Date of Patent: September 23, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Toshiaki Takahashi, Toshinobu Ishihara, Jun Watanabe, Tohru Kubota, Yoshio Kawai