Patents by Inventor Tohru Kubota
Tohru Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5583244Abstract: Disclosed is a novel organosilicon-containing derivative of pullulan of which an organopolysiloxane moiety having a silethylene linkage is bonded to the glucose residue of pullulan through a urethane linkage. Different from conventional organopolysiloxane-modified pullulans, the inventive derivative is stable against attack of water and exhibits unique properties as a combination of the properties inherent in pullulan and in silicones. The organosilicon-containing pullulan of the invention can be easily prepared under mild reaction conditions by reacting an isocyanato group-containing organopolysiloxane with the glucosic hydroxy groups of pullulan.Type: GrantFiled: November 7, 1995Date of Patent: December 10, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Satoshi Uchida, Akira Yamamoto, Ikuo Fukui, Mikio Endo, Hiroshi Umezawa, Shigehiro Nagura, Tohru Kubota
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Patent number: 5461166Abstract: Disclosed are a conductive thienyl derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a silicon compound comprising 3-thienyl groups (thiophene derivative) used for forming the conductive monomolecular film and a method of manufacturing the same. A monomolecular ultrathin film comprising 3-thienyl groups and silicon groups is formed in the invention. The silicon compound used for forming the film is provided by reacting .omega.-(3-thienyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted compound, thus chemically bonding the monomolecular film to the substrate surface. Furthermore, a thienyl derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.Type: GrantFiled: February 3, 1995Date of Patent: October 24, 1995Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Norihisa Mino, Kazufumi Ogawa, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Kazuyuki Asakura
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Patent number: 5455360Abstract: Disclosed are a conductive pyrrole derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a monomer used for forming the conductive pyrrole derivative monomolecular film and method of manufacturing the same. The invention relates to a monomolecular ultrathin film comprising 1-pyrrolyl groups and silicon groups. The monomer used for forming the film is provided by reacting .omega.-(1-pyrrolyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted monomer, thus chemically bonding a monomolecular film to a substrate surface. Furthermore, a polypyrrole derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.Type: GrantFiled: August 18, 1993Date of Patent: October 3, 1995Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Norihisa Mino, Kazufumi Ogawa, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Katsuya Takemura
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Patent number: 5451693Abstract: Herein disclosed are a tert-butyl cycloalkyl dialkoxysilane compound which is quite useful as a water repellant for treating the surface of a variety of construction materials such as wood, concrete and marble and which can easily be used, and a method for preparing the compound. A Grignard reagent represented by the formula: R.sup.1 MgX is reacted with a silane compound represented by the formula: (CH.sub.3).sub.3 CSiH(OR.sup.2).sub.2. Then the resulting silane compound: (CH.sub.3).sub.3 CSiHR.sup.1 (OR.sup.2) is further reacted with an alcohol: R.sup.2 OH in the presence of a catalyst to give a tert-butyl cycloalkyl dialkoxysilane compound: (CH.sub.3).sub.3 CSiR.sup.1 (OR.sup.2).sub.2.Type: GrantFiled: September 7, 1994Date of Patent: September 19, 1995Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tohru Kubota, Akira Yamamoto, Muneo Kudo
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Patent number: 5440063Abstract: Dimethylchlorosilane and a triorganochlorosilane of the formula: R.sup.1 R.sup.2 R.sup.3 SiCl wherein R.sup.1, R.sup.2, and R.sup.3 are independently selected from monovalent hydrocarbon groups are concurrently prepared by reacting dimethyldichlorosilane with a SiH bond-containing silane compound of the formula: R.sup.1 R.sup.2 R.sup.3 SiH in the presence of a Lewis acid catalyst. The method is especially effective for concomitant preparation of dimethylchlorosilane and trimethylchlorosilane or t-butyldimethylchlorosilane in an inexpensive, simple, safe manner and in high yields.Type: GrantFiled: November 3, 1994Date of Patent: August 8, 1995Assignee: Shin-Etsu Chemical Company, LimitedInventors: Masaki Takeuchi, Akira Yamamoto, Mikio Endo, Tohru Kubota, Yasufumi Kubota
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Patent number: 5425988Abstract: A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.Type: GrantFiled: September 27, 1993Date of Patent: June 20, 1995Assignees: Matsushita Electrical Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.Inventors: Kazufumi Ogawa, Norihisa Mino, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Yasuhisa Tanaka
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Patent number: 5342983Abstract: Organic silicon compounds which are expressed by the general chemical formulae (I) or (II): ##STR1## wherein R.sup.1 is a monovalent organic group with 1 to 8 carbon atoms; R.sup.2, R.sup.3 and R.sup.4 in each equation are independent and either a monovalent organic group with 1 to 8 carbon atoms or a siloxyl group expressed by ##STR2## wherein R.sup.5, R.sup.6 and R.sup.7 are independent in each equation and they are a monovalent organic group with 1 to 8 carbon atoms; and a is either 0, 1 or 2. The novel organic silicon compounds possess both a polymerizable double bond and organopolysiloxane within the same molecule. These compounds are superior in their polymerizability and copolymerizability and are useful as polymer reforming agents.Type: GrantFiled: March 5, 1993Date of Patent: August 30, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Toshio Yamazaki, Hideki Sugahara, Shoji Ichinohe, Toshinobu Ishihara, Tohru Kubota
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Patent number: 5342984Abstract: A triorganomonohalogenosilane is prepared by reacting a triorganomonohydrosilane represented by the following general formula (I):R.sup.1.sub.3 S i H (I)with a halogenated allyl compound represented by the following general formula (II): ##STR1## in the presence of metal palladium, or a salt or complex of palladium to replace the hydrogen atom directly bonded to the silicon atom of the triorganomonohydrosilane with a halogen atom. In Formula ( I ), the substituents R.sup.1 's directly bonded to the silicon atom may be identical to or different from one another and each represents a monovalent organic group. In Formula (II), the substituents R.sup.2 's may likewise be identical to or different from one another and each represents a hydrogen atom or a monovalent alkyl group and X represents a chlorine atom, a bromine atom or an iodine atom.Type: GrantFiled: June 29, 1993Date of Patent: August 30, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tohru Kubota, Mikio Endo
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Patent number: 5326895Abstract: 3-(Vinylbenzyloxy)propylsilane compounds represented by the general formula, CH.sub.2 CH.PHI. CH.sub.2 OCH.sub. CH.sub.2 CH.sub.2 SiR.sup.1.sub.n (OR.sup.2).sub.3-n (wherein R.sup.1 and R.sup.2 each represent a hydrocarbon residue containing 1 to 4 carbon atoms, and n represents an integer from 0 to 2) are provided as novel styrene skeleton-containing alkoxysilane compounds which are highly useful as silane coupling agent or polymerizing monomer.Type: GrantFiled: November 16, 1992Date of Patent: July 5, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tohru Kubota, Toshinobu Ishihara, Mikio Endo, Katsuhiro Uehara
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Patent number: 5294727Abstract: A method for preparing a tertiary hydrocarbon-silyl compound comprises the step of reacting a grignard reagent represented by the general formula: R.sup.1 MgX.sup.1 (wherein R.sup.1 represents a tertiary hydrocarbon group and X.sup.1 is a halogen atom) with a silicon atom-containing compound represented by the general formula: X.sup.2.sub.m R.sup.2.sub.n SiH.sub.4-m-n (wherein X.sup.2 is a halogen atom and may be identical to or different from X.sup.1 ; R.sup.2 is a monovalent hydrocarbon group; m is 1, 2 or 3; and n is 0, 1 or 2, provided that m+n is not more than 3 and that if n is 2, R.sup.2 's may be identical to or different from one another) in an aprotic inert organic solvent in the presence of a copper compound and/or a quaternary ammonium salt. According to this method, the tertiary hydrocarbon-silyl compounds can industrially efficiently and rapidly produced in high yields.Type: GrantFiled: November 12, 1992Date of Patent: March 15, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tohru Kubota, Toshinobu Ishihara, Mikio Endo
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Patent number: 5258537Abstract: An organodisiloxane represented by the general formula: R.sup.1 R.sup.2 R.sup.3 SiOSiR.sup.4 R.sup.5 R.sup.6 is reacted with thionyl chloride in the presence of an ammonium salt represented by the general formula: R.sup.7 R.sup.8 R.sup.9 R.sup.10 NX wherein R.sup.1 to R.sup.5 and R.sup.10 may be the same or different and each represents a monovalent hydrocarbon group or a hydrogen atom; R.sup.7 to R.sup.9 may be the same or different and each represents a monovalent hydrocarbon group; and X represents a monovalent anion. Thus, organomonochlorosilanes represented by R.sup.1 R.sup.2 R.sup.3 SiCl and R.sup.4 R.sup.5 R.sup.6 SiCl can be obtained.Type: GrantFiled: February 11, 1993Date of Patent: November 2, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Takeuchi, Toshinobu Ishihara, Tohru Kubota, Mikio Endo
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Patent number: 5254439Abstract: There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.Type: GrantFiled: March 20, 1992Date of Patent: October 19, 1993Assignees: Matsushita Electric Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.Inventors: Yoshiyuki Tani, Masayuki Endou, Kazufumi Ogawa, Yasuhisa Tanaka, Toshinobu Ishihara, Tohru Kubota
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Patent number: 5223170Abstract: A fiber treating composition based on an organopolysiloxane of the average compositional formula:R.sub.x.sup.1 R.sub.y.sup.2 SiO.sub.(4-x-y)/2 (1)wherein R.sup.1 is an organic group having a nitrogen atom, R.sup.2 is a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms or a group represented by --OR.sup.3 wherein R.sup.3 is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and letters x and y are 0<x<3, 0<y<3, and 1.8.ltoreq.x+y.ltoreq.2.2, at least 10 mol % of the R.sup.1 group being a group represented by the formula: ##STR1## wherein R.sup.4 is a divalent hydrocarbon group having 1 to 8 carbon atoms meets all the requirements of softness, hydrophilic property, and anti-yellowing at the same time in treating fibers and fabrics.Type: GrantFiled: July 31, 1991Date of Patent: June 29, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Ohashi, Yasuaki Hara, Toshinobu Ishihara, Tohru Kubota
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Patent number: 5210252Abstract: The object of the present invention is to provide a styrene type alkoxysilane compound which is useful as a silane coupling agent or a polymerizable monomer and which can easily be synthesized and is not expensive.A 3-(vinylphenyloxy)propylsilane compound represented by the following general formula: ##STR1## wherein R.sup.1 and R.sup.2 each represents a hydrocarbon group having 1 to 4 carbon atoms and n is an integer ranging from 0 to 2.Type: GrantFiled: August 24, 1992Date of Patent: May 11, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tohru Kubota, Toshinobu Ishihara, Mikio Endo, Katsuhiro Uehara
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Patent number: 5202452Abstract: A silane compound represented by the following general Formula (I) is described: ##STR1## wherein R.sup.1 is an alkyl group with 1 to 4 carbon atoms;A is oxygen atom (--O--), carboxyl group ##STR2## or an alkylsilylene group ##STR3## wherein each R.sup.2 and R.sup.3 is an alkyl group with 1 to 4 carbon atoms;x is a halogen atom, or an alkoxyl group;m is an integer from 1 to 8;n is an integer from 0 to 2;p is an integer from 5 to 25; andq is an integer from 0 to 2.The silane compound is useful as a coating agent for various base materials, to provide lubricity, in addition to stain-proofing property.Type: GrantFiled: September 3, 1991Date of Patent: April 13, 1993Assignees: Matsushita Electric Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.Inventors: Kazufumi Ogawa, Norihisa Mino, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Yasuhisa Tanaka
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Patent number: 5126419Abstract: A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.Type: GrantFiled: December 3, 1990Date of Patent: June 30, 1992Assignees: Matsushita Electric Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.Inventors: Yoshiyuki Tani, Masayuki Endou, Kazufumi Ogawa, Yasuhisa Tanaka, Toshinobu Ishihara, Tohru Kubota
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Patent number: 5116973Abstract: A silane compound having the following formula, wherein R.sup.1 and R.sup.2 are each monovalent hydrocarbon radicals having 1 to 4 carbon atoms and n is an integer of 0, 1 or 2: ##STR1## which is manufactured by reacting 1-allyl-.epsilon.-caprolactam of the following formula: ##STR2## with a hydrogen silane of the following formula:HSiR.sup.1.sub.n (OR.sup.2).sub.3-nin the presence of a platinum-containing catalyst. The silane compound is useful as a surface treatment agent for imparting a moisture-repelling property to the surface of various materials.Type: GrantFiled: August 8, 1990Date of Patent: May 26, 1992Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tohru Kubota, Toshinobu Ishihara, Mikio Endo
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Patent number: 5081260Abstract: 3-(2-oxo-1-pyrrolidinyl)-propylsilane compounds represented by the following general formula (I) are herein disclosed: ##STR1## wherein R.sup.1 and R.sup.2 may be the same or different and each represents a hydrocarbon group having 1 to 4 carbon atoms; and n is an integer ranging from 0 to 2. The propylsilane compounds may be prepared by, for instance, reacting 1-allyl-2-oxopyrrolidine with a hydrogen silane such as trimethoxysilane or trichlorosilane in the presence of a platinum catalyst or further optionally reacting the resulting 3-(2-oxo-1-pyrrolidinyl)-propyl halogenosilane (in the case where a halogenosilane is used) with an alcohol such as methanol. These propylsilane compounds are effective as anti-clouding agent for treating the surface of a variety of substrate.Type: GrantFiled: April 13, 1990Date of Patent: January 14, 1992Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tohru Kubota, Toshinobu Ishihara, Mikio Endo
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Patent number: 5017715Abstract: A composition comprising iodotrimethylsilane in admixture with a polysiloxane is shelf stable for a long time and effective in various organic synthetic reactions.Type: GrantFiled: May 16, 1990Date of Patent: May 21, 1991Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Katsuyuki Oikawa, Toshinobu Ishihara, Mikio Endo, Tohru Kubota
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Patent number: 5000881Abstract: A novel organosilane compound having polymerizability is disclosed which is a vinyl .omega.-triorganosilyl n-undecanoate of the formula CH.sub.2 .dbd.CH--O--CO--(--CH.sub.2 --).sub.10 --SiR.sub.3, in which R is an alkyl group having 1 to 4 carbon atoms, alkoxy group having 1 to 4 carbon atoms or trialkyl siloxy group of which the alkyl group has 1 to 4 carbon atoms. This compound can be prepared by the hydrosilylation reaction between a triorganosilane of the formula HSiR.sub.3 and vinyl 10-undecenoate of the formulaCH.sub.2 .dbd.CH--O--CO--(--CH.sub.2 --).sub.8 --CH.dbd.CH.sub.2in the presence of a platinum catalyst. The compound is polymerizable to give not only a homopolymer of the compound alone but also a copolymer with other comonomers such as vinyl chloride, chloro trifluoroethylene, methyl methacrylate and the like.Type: GrantFiled: June 14, 1989Date of Patent: March 19, 1991Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Toshinobu Ishihara, Mikio Endo, Tohru Kubota