Patents by Inventor Tohru Ogawa

Tohru Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11409498
    Abstract: A data processing system calculates prediction or planning data of an object from observation data of a calculation object of the prediction or planning data and observation data of various factors, including a first processing section which identifies a model used for calculation of the prediction or planning data of each of the factors, a second processing section which calculates data which indices the kind of a time transition of the factor from the observation data of the factor and classifies the observation data of the factor by using the calculated data which indicates the kind of the time transition, and a third processing section which changes the model for calculation of the prediction or planning data on the basis of the classified observation data and the prediction data of the factor in a prediction or planning data calculation object time period and calculates the prediction or planning data.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: August 9, 2022
    Assignee: HITACHI, LTD.
    Inventors: Masato Utsumi, Tohru Watanabe, Yoshihisa Okamoto, Ikuo Shigemori, Hiroshi Iimura, Hiroaki Ogawa
  • Patent number: 7973021
    Abstract: An object of the present invention is to provide an immunomodulating agent in gut that can be ingested continuously in daily diet without adverse side effect. The object is attained by providing an immunomodulating agent in gut comprising a cyclic tetrasaccharide as an effective ingredient.
    Type: Grant
    Filed: September 15, 2006
    Date of Patent: July 5, 2011
    Assignee: Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo
    Inventors: Keiko Hino, Mayumi Kurose, Takeo Sakurai, Shinichiro Inoue, Tohru Ogawa, Kazuyuki Oku, Hiroto Chaen, Shigeharu Fukuda
  • Publication number: 20100143389
    Abstract: An object of the present invention is to provide an immunomodulating agent in gut that can be ingested continuously in daily diet without adverse side effect. The object is attained by providing an immunomodulating agent in gut comprising a cyclic tetrasaccharide as an effective ingredient.
    Type: Application
    Filed: September 15, 2006
    Publication date: June 10, 2010
    Inventors: Keiko Hino, Mayumi Kurose, Takeo Sakurai, Shinichiro Inoue, Tohru Ogawa, Kazuyuki Oku, Hiroto Chaen, Shigeharu Fukuda
  • Patent number: 7350503
    Abstract: A fuel injection pump 100 comprises a thermoelement CSD 47 for advancing injection timing in a cold temperature condition. The CSD 47 uses a piston 46 for opening and closing a sub port 42 formed in a plunger barrel 8. An electronic governor 2 is provided with a mechanism for decreasing an injected fuel quantity when an engine starts in a cold temperature condition. The mechanism shifts a rack position in a fuel-decrease direction in a cold temperature condition, and switches the rack position to a normal position in a normal temperature condition. A timing TR for shifting the rack position is set before or simultaneous to a timing TC for switch-off of the CSD 47.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: April 1, 2008
    Assignee: Yanmar Co., Ltd.
    Inventors: Masamichi Tanaka, Tohru Ogawa, Satoshi Hattori
  • Patent number: 7123797
    Abstract: The directional coupler switch is configured by a parallel waveguide including a first region which is subjected to a nonlinear action and a second region which is not subjected to a nonlinear action. A dispersion relationship of the first region is varied due to the nonlinear action to switch over an exit of light entering from an input side to cause the switch to function as an optical switch. A dispersion curve of the first region has: a region of a constant frequency in one of an even mode and an odd mode which are two kinds of eigen modes of the parallel waveguide; and a region in which gradients of the two eigen modes at frequencies belonging to a region other than the region of a constant frequency are substantially equal to each other. The gradients of the two kinds of eigen modes indicate monotone decreasing or monotone increasing.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: October 17, 2006
    Assignee: National Institute of Advance Industrial Science and Technology
    Inventors: Noritsugu Yamamoto, Tohru Ogawa
  • Publication number: 20060188199
    Abstract: The directional coupler switch is configured by a parallel waveguide including a first region which is subjected to a nonlinear action and a second region which is not subjected to a nonlinear action. A dispersion relationship of the first region is varied due to the nonlinear action to switch over an exit of light entering from an input side to cause the switch to function as an optical switch. A dispersion curve of the first region has: a region of a constant frequency in one of an even mode and an odd mode which are two kinds of eigen modes of the parallel waveguide; and a region in which gradients of the two eigen modes at frequencies belonging to a region other than the region of a constant frequency are substantially equal to each other. The gradients of the two kinds of eigen modes indicate monotone decreasing or monotone increasing.
    Type: Application
    Filed: August 24, 2005
    Publication date: August 24, 2006
    Inventors: Noritsugu Yamamoto, Tohru Ogawa
  • Publication number: 20060153719
    Abstract: A fuel injection pump 100 comprises a thermoelement CSD 47 for advancing injection timing in a cold temperature condition. The CSD 47 uses a piston 46 for opening and closing a sub port 42 formed in a plunger barrel 8. An electronic governor 2 is provided with a mechanism for decreasing an injected fuel quantity when an engine starts in a cold temperature condition. The mechanism shifts a rack position in a fuel-decrease direction in a cold temperature condition, and switches the rack position to a normal position in a normal temperature condition. A timing TR for shifting the rack position is set before or simultaneous to a timing TC for switch-off of the CSD 47.
    Type: Application
    Filed: November 14, 2003
    Publication date: July 13, 2006
    Inventors: Masamichi Tanaka, Tohru Ogawa, Satoshi Hattori
  • Patent number: 6880508
    Abstract: A start assister (10) of a fuel injection pump, comprising a piston (46) inlayed into a housing (H), an upper chamber (49) formed over the piston (46), lower chamber (48) formed under the piston (46), wherein a sub port (42) is opened and closed by sliding of the piston (46), and a fuel injection timing is advanced by closing the sub port (42). A thermo-element (61) for sliding the piston is arranged on one side of the piston (46) in sliding direction. A telescopic pin (61a) of the thermo-element (61) is arranged in a low-pressure chamber (50) divided into the upper chamber and the lower chamber, and a connection pin (62) is interposed between the telescopic pin (61a) and the piston (46).
    Type: Grant
    Filed: March 5, 2004
    Date of Patent: April 19, 2005
    Assignee: Yanmar Co., Ltd.
    Inventors: Masamichi Tanaka, Junichi Samo, Satoshi Hattori, Tohru Ogawa
  • Publication number: 20040197198
    Abstract: A start assister (10) of a fuel injection pump, comprising a piston (46) inlayed into a housing (H), an upper chamber (49) formed over the piston (46), lower chamber (48) formed under the piston (46), wherein a sub port (42) is opened and closed by sliding of the piston (46), and a fuel injection timing is advanced by closing the sub port (42). A thermo-element (61) for sliding the piston is arranged on one side of the piston (46) in sliding direction. A telescopic pin (61a) of the thermo-element (61) is arranged in a low-pressure chamber (50) divided into the upper chamber and the lower chamber, and a connection pin (62) is interposed between the telescopic pin (61a) and the piston (46).
    Type: Application
    Filed: March 5, 2004
    Publication date: October 7, 2004
    Inventors: Masamichi Tanaka, Junichi Samo, Satoshi Hattori, Tohru Ogawa
  • Patent number: 6673526
    Abstract: A pattern formation method and method and apparatus for production of a semiconductor device using that method which irradiate light from a light source to a phase shifting mask through a fly's-eye lens comprised of an assembly of a plurality of lenses, transfer the pattern of the phase shifting mask onto the substrate, and form the pattern on the substrate, wherein the amount of light made incident upon the center portion of the fly's-eye lens is lowered by 2 to 90 percent, preferably 10 to 90 percent, further preferably 20 to 80 percent or 20 to 60 percent, relative to the amount of light incident upon the peripheral portion of the fly's-eye lens.
    Type: Grant
    Filed: August 23, 1995
    Date of Patent: January 6, 2004
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Masaya Uematsu
  • Patent number: 6611317
    Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm−1 or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm−1.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: August 26, 2003
    Assignees: Asahi Glass Company, Limited, Semiconductor Leading Edge Technologies, Inc.
    Inventors: Tohru Ogawa, Hideo Hosono, Shinya Kikugawa, Yoshiaki Ikuta, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa
  • Patent number: 6448861
    Abstract: A limiter is connected with the output of a PLL to limit the amplitude of the output from the PLL. The output from limiter is supplied to a voltage-controlled oscillator (VCXO). The limiter determines the difference between the input signal and the output signal. If the difference exceeds a predetermined value, the change in the output from the limiter is limited to the predetermined value. If the difference does not exceed the predetermined value, the change in the output is considered to be a difference value.
    Type: Grant
    Filed: February 20, 2001
    Date of Patent: September 10, 2002
    Assignee: Fujitsu Limited
    Inventors: Noboru Kawada, Takashi Kaku, Takeshi Asahina, Tohru Ogawa, Hideo Miyazawa
  • Publication number: 20010009391
    Abstract: A limiter is connected with the output of a PLL to limit the amplitude of the output from the PLL. The output from limiter is supplied to a voltage-controlled oscillator (VCXO). The limiter determines the difference between the input signal and the output signal. If the difference exceeds a predetermined value, the change in the output from the limiter is limited to the predetermined value. If the difference does not exceed the predetermined value, the change in the output is considered to be a difference value.
    Type: Application
    Filed: February 20, 2001
    Publication date: July 26, 2001
    Inventors: Noboru Kawada, Takashi Kaku, Takeshi Asahina, Tohru Ogawa, Hideo Miyazawa
  • Patent number: 6071765
    Abstract: A method of forming a polycrystalline silicon thin film improved in crystallinity and a channel of a transistor superior in electrical characteristics by the use of such a polycrystalline silicon thin film. An amorphous silicon layer of a thickness preferably of 30 nm to 50 nm is formed on a substrate. Next, substrate heating is performed to set the amorphous silicon layer to preferably 350.degree. C. to 500.degree. C., more preferably 350.degree. C. to 450.degree. C. Then, at least the amorphous silicon layer is irradiated with laser light of an excimer laser energy density of 100 mJ/cm.sup.2 to 500 mJ/cm.sup.2, preferably 280 mJ/cm.sup.2 to 330 mJ/cm.sup.2, and a pulse width of 80 ns to 200 ns, preferably 140 ns to 200 ns, so as to directly anneal the amorphous silicon layer and form a polycrystalline silicon thin film. The total energy of the laser used for the irradiation of excimer laser light is at least 5 J, preferably at least 10 J.
    Type: Grant
    Filed: August 20, 1997
    Date of Patent: June 6, 2000
    Assignee: Sony Corporation
    Inventors: Takashi Noguchi, Tohru Ogawa, Yuji Ikeda
  • Patent number: 5869803
    Abstract: A method of forming a polycrystalline silicon thin film includes irradiating an amorphous silicon layer with laser light of an excimer laser energy density of 100 mJ/cm.sup.2 to 500 mJ/cm.sup.2, preferably 280 mJ/cm.sup.2 to 330 mJ/cm.sup.2, and a pulse width of 80 ns to 200 ns, preferably 140 ns to 200 ns, so as to directly anneal the amorphous silicon layer and form a polycrystalline silicon thin film. The total energy of the laser used for the irradiation of excimer laser light is at least 5 J, preferably at least 10 J. The laser device includes an homogenizer movably mounted at the end of the optical path of the laser beam.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: February 9, 1999
    Assignee: Sony Corporation
    Inventors: Takashi Noguchi, Tohru Ogawa, Yuji Ikeda
  • Patent number: 5698352
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.
    Type: Grant
    Filed: March 19, 1997
    Date of Patent: December 16, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Tetsuo Gocho
  • Patent number: 5689513
    Abstract: A data transmission system having, in addition to a normal system operation mode, a test mode wherein a plurality of stations confirm each other through sending and receiving check data for security confirmation and wherein the actual line switching operation is not performed. In the test mode, when notifying test data for confirmation of another station, the call terminating station side notifies the accurate data, while the call originating station side activating the test mode notifies deliberately changed check data thereby enabling a test for confirmation of the continuance of connection with a backup line without suspending communication with the working line.
    Type: Grant
    Filed: March 29, 1996
    Date of Patent: November 18, 1997
    Assignee: Fujitsu Limited
    Inventors: Ryoji Okita, Tohru Ogawa, Michiko Kawada
  • Patent number: 5677111
    Abstract: A process for production of a micropattern, comprised of a step for forming an antireflection film comprised of an inorganic film on an underlying substrate, a step for forming a resist film on said antireflection film, a step for exposing said resist film using i-rays or light of a wavelength shorter than i-ray and transferring a mask pattern to the resist film, a step for using the resist film on which the mask pattern had been transferred as a mask to etch the antireflection film and transfer the mask pattern to the antireflection film; and a step for using the antireflection film on which said mask pattern had been transferred as a mask to etch the underlying substrate and transfer the mask pattern to the underlying substrate.
    Type: Grant
    Filed: October 24, 1995
    Date of Patent: October 14, 1997
    Assignee: Sony Corporation
    Inventor: Tohru Ogawa
  • Patent number: 5670297
    Abstract: A process for formation of a metal pattern comprising the steps of forming a silicide metal film on an underlying substrate, forming an anti-reflection film on the underlying substrate on which the silicide metal film is formed, forming a resist film on the anti-reflection film, patterning the resist film by photolithography to form a predetermined pattern, and using the thus patterned resist film as a mask and etching the silicide metal film on the underlying substrate, wherein the optical constants and the thickness of the anti-reflection film are determined to give the smallest standing wave effect at the time of photolithography in accordance with the type of the silicide metal film.
    Type: Grant
    Filed: November 9, 1995
    Date of Patent: September 23, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Hiroyuki Nakano
  • Patent number: 5648202
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.
    Type: Grant
    Filed: September 28, 1995
    Date of Patent: July 15, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Tetsuo Gocho