Patents by Inventor Tom Williams

Tom Williams has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070206354
    Abstract: A system that generates test patterns for detecting transition faults in an integrated circuit (IC). During operation, the system receives slack times for each net in the IC. Note that a slack time for a net is the minimum amount of delay that the given net can tolerate before violating a timing constraint. For each possible transition fault in the IC, the system uses the slack times for nets in the IC to generate a test pattern which exposes the transition fault by producing a transition that propagates along the longest path to the transition fault.
    Type: Application
    Filed: March 2, 2006
    Publication date: September 6, 2007
    Inventors: Rohit Kapur, Tom Williams, Cyrus Hay
  • Patent number: 7174551
    Abstract: A multiple task wait system and associated method allow a client application to wait for multiple tasks to be successfully or conditionally implemented before running subsequent tasks. Two mechanisms can be used to accomplish this multiple wait process: The first mechanism uses a multi-wait grouping process that is visible to the client, and the second mechanism uses a graphical representation to identify the tasks to be completed. The multi-wait grouping process allows a client to group a related set of tasks together for both control and documentation purposes. The client can add as many tasks as the resources of the computer allow to a group while defining the data flows and control flows between the tasks in the group using various graphical tools. The multi-wait system allows the client to define the constraints and conditions for a set of tasks to be considered complete, and further allows the system to define the constraints and conditions for considering all the tasks within the group to be completed.
    Type: Grant
    Filed: May 20, 2002
    Date of Patent: February 6, 2007
    Assignee: International Business Machines Corporation
    Inventors: Linnette Bakow, Shannon Matthew Farrington, Diane Friedman, Tom William Jacopi, Jacques Joseph Labrie, Thanh Vu Nguyen, Cheung-Yuk Wu
  • Publication number: 20060168701
    Abstract: An enhanced, diploid pollenizer watermelon plant and method used to maximize the yield of triploid seedless watermelons per area. The enhanced pollenizer watermelon plant of the invention is either a hybrid variety, an open-pollinated variety or a synthetic variety, that exhibits the characteristics of small leaves and fruit with a brittle rind that splits when the fruit is overripe or breaks when relatively small physical forces are applied. The watermelon plant of the invention is also preferably characterized by extended flowering duration, thereby increasing the number of triploid watermelon flowers that are pollinated and set fruit.
    Type: Application
    Filed: March 22, 2006
    Publication date: July 27, 2006
    Inventors: Xingping Zhang, Tom Williams
  • Publication number: 20050144673
    Abstract: Abstract of the Disclosure An enhanced, diploid pollenizer watermelon plant and method used to maximize the yield of triploid seedless watermelons per area. The enhanced pollenizer watermelon plant of the invention is either a hybrid variety, an open-pollinated variety or a synthetic variety, that exhibits the characteristics of small leaves and fruit with a brittle rind that splits when the fruit is overripe or breaks when relatively small physical forces are applied. The watermelon plant of the invention is also preferably characterized by extended flowering duration, thereby increasing the number of triploid watermelon flowers that are pollinated and set fruit.
    Type: Application
    Filed: January 22, 2003
    Publication date: June 30, 2005
    Inventors: Xingping Zhang, Tom Williams
  • Patent number: 6780277
    Abstract: An etching method and an etching apparatus are provided. Silicon (Si) from surfaces semiconductor wafers W dissolves into an etching liquid E stored in a process bath 10. On detection of the concentration of silicon by a concentration sensor 50, the etching liquid E in the process bath 10 is discharged while leaving a part of the etching liquid when the Si concentration in the etching liquid E reaches a designated concentration. After that, a new etching liquid of substantially equal to an amount of the discharged etching liquid E is supplied into the process bath 10 and added to the etching liquid remaining in the bath 10. Consequently, it is possible to restrict the etching rate just after the exchange of etching liquid from rising excessively.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: August 24, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Kenji Yokomizo, Tom Williams
  • Patent number: 6761227
    Abstract: The invention is an apparatus for aerating soil proximate to a plant with root system using a hand drill system, made of a polymer drill bit having a shaft with a vertical axis that is generally cylndrically shaped having a connector end and a drill end, an indentation in the drill bit between one-fourth and one-third of the overall length of the polymer drill bit from the drill end, and a drill with a connector to engage the polymer drill bit for forming a bore hole in soil adjacent a plant with root system.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: July 13, 2004
    Inventor: Tom William Messer
  • Publication number: 20030217089
    Abstract: A multiple task wait system and associated method allow a client application to wait for multiple tasks to be successfully or conditionally implemented before running subsequent tasks. Two mechanisms can be used to accomplish this multiple wait process: The first mechanism uses a multi-wait grouping process that is visible to the client, and the second mechanism uses a graphical representation to identify the tasks to be completed. The multi-wait grouping process allows a client to group a related set of tasks together for both control and documentation purposes. The client can add as many tasks as the resources of the computer allow to a group while defining the data flows and control flows between the tasks in the group using various graphical tools. The multi-wait system allows the client to define the constraints and conditions for a set of tasks to be considered complete, and further allows the system to define the constraints and conditions for considering all the tasks within the group to be completed.
    Type: Application
    Filed: May 20, 2002
    Publication date: November 20, 2003
    Applicant: International Business Machines Corporation
    Inventors: Linnette Bakow, Shannon Matthew Farrington, Diana Friedman, Tom William Jacopi, Jacques Joseph Labrie, Thanh Vu Nguyen, Cheung-Yuk Wu
  • Publication number: 20030173247
    Abstract: A substrate transport container is provided. Substrate transport container includes a container and a cover. The container includes an open top portion and a closed bottom portion, each having a perimeter greater than the middle portion of the container. The cover further includes a carrier, which is used for transporting information pertaining to the substrate.
    Type: Application
    Filed: October 21, 2002
    Publication date: September 18, 2003
    Inventors: Melissa Boom Coburn, Jeffrey Ego Kurt Lewin, Ken Raymond Spaeth, Tom William Woehrman, Shari Lavin LaPorte, R. Steven Griffin, John Edward Stasieluk
  • Publication number: 20020102851
    Abstract: An etching method and an etching apparatus are provided. Silicon (Si) from surfaces semiconductor wafers W dissolves into an etching liquid E stored in a process bath 10. On detection of the concentration of silicon by a concentration sensor 50, the etching liquid E in the process bath 10 is discharged while leaving a part of the etching liquid when the Si concentration in the etching liquid E reaches a designated concentration. After that, a new etching liquid of substantially equal to an amount of the discharged etching liquid E is supplied into the process bath 10 and added to the etching liquid remaining in the bath 10. Consequently, it is possible to restrict the etching rate just after the exchange of etching liquid from rising excessively.
    Type: Application
    Filed: March 22, 2002
    Publication date: August 1, 2002
    Applicant: Tokyo Electron Limited
    Inventors: Kenji Yokomizo, Tom Williams
  • Patent number: 6399517
    Abstract: An etching method and an etching apparatus are provided. Silicon (Si) from surfaces semiconductor wafers W dissolves into an etching liquid E stored in a process bath 10. On detection of the concentration of silicon by a concentration sensor 50, the etching liquid E in the process bath 10 is discharged while leaving a part of the etching liquid when the Si concentration in the etching liquid E reaches a designated concentration. After that, a new etching liquid of substantially equal to an amount of the discharged etching liquid E is supplied into the process bath 10 and added to the etching liquid remaining in the bath 10. Consequently, it is possible to restrict the etching rate just after the exchange of etching liquid from rising excessively.
    Type: Grant
    Filed: March 30, 1999
    Date of Patent: June 4, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Kenji Yokomizo, Tom Williams
  • Publication number: 20020001967
    Abstract: An etching method and an etching apparatus are provided. Silicon (Si) from surfaces semiconductor wafers W dissolves into an etching liquid E stored in a process bath 10. On detection of the concentration of silicon by a concentration sensor 50, the etching liquid E in the process bath 10 is discharged while leaving a part of the etching liquid when the Si concentration in the etching liquid E reaches a designated concentration. After that, a new etching liquid of substantially equal to an amount of the discharged etching liquid E is supplied into the process bath 10 and added to the etching liquid remaining in the bath 10. Consequently, it is possible to restrict the etching rate just after the exchange of etching liquid from rising excessively.
    Type: Application
    Filed: March 30, 1999
    Publication date: January 3, 2002
    Inventors: KENJI YOKOMIZO, TOM WILLIAMS
  • Patent number: 5701456
    Abstract: In a computerized database system, a query is formulated to retrieve data from the database by interactively identifying at least one table containing query data, and at least one column and at least one row in the identified table containing the query data. The rows are interactively identified using a condition statement. The condition statement is interactively formulated using at least one displayed flowline. Input is received from the user specifying a position on the flowline for insertion of a predicate and the predicate. The flowline is displayed with the predicate inserted in the specified location. The predicates are displayed on the flowline in between nodes. Predicates on the same flowline are combined through a logical AND operation. Predicates on different flowlines between the same nodes are combined through a logical OR operation. The flowline is converted to a corresponding Boolean algebra statement and displayed.
    Type: Grant
    Filed: August 30, 1995
    Date of Patent: December 23, 1997
    Assignee: International Business Machines Corporation
    Inventors: Tom William Jacopi, Brian Gerrit Payton, Howard Alexander Siwek
  • Patent number: 5360033
    Abstract: A hazardous fluid removal and storage apparatus for the fail-safe removal and storage of hazardous liquids. An electrically monitored and electro-pneumatically controlled system provides safe pumping and storage of hazardous liquids with automatic pump shut-down and warning signals for leak detection and full storage tank conditions.
    Type: Grant
    Filed: August 25, 1993
    Date of Patent: November 1, 1994
    Assignee: Ecologic Waste Systems Corporation
    Inventors: Tom Williams, Larry Goertzen
  • Patent number: 4206901
    Abstract: A metering apparatus for controlling the rate of closure of a pressure-actuated valve of a type normally used in irrigation systems. When a pressure-actuated valve is closing, fluid from a supply line must flow into a pressure-actuating chamber, gradually filling it to force the valve's plug member against its seat. The metering apparatus is a compressible spring through which fluid must flow to enter this pressure-actuating chamber. As the valve closes, it compresses the spring through which the fluid must flow, thereby restricting the rate of flow into the pressure-actuating chamber. This reduction in flow reduces the rate at which the valve's plug member approaches its seat in an exponential manner, allowing rapid closure at first which is reduced considerably as the plug approaches its seat.
    Type: Grant
    Filed: October 11, 1977
    Date of Patent: June 10, 1980
    Assignee: Thompson Manufacturing Co.
    Inventor: Tom Williams