Patents by Inventor Tomihiro Hashizume

Tomihiro Hashizume has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10586674
    Abstract: In order to provide a stable hexaboride single-crystal field emission electron source capable of heat-flashing, this field emission electron source is provided with a metal filament, a metal tube joined thereto, a hexaboride tip that emits electrons, and graphite sheets that are independent of the metal tube and the hexaboride tip. The hexaboride tip is arranged so as not to be in structural contact with the metal tube due to the graphite sheets. The hexaboride tip, the graphite sheets, and the metal tube are configured so as to be mechanically and electrically in contact with one another.
    Type: Grant
    Filed: November 24, 2016
    Date of Patent: March 10, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiaki Kusunoki, Tomihiro Hashizume, Keigo Kasuya, Takashi Ohshima, Yusuke Sakai, Yoichi Ose, Noriaki Arai
  • Patent number: 10522319
    Abstract: An electron beam apparatus which can stably achieve high spatial resolution also during low acceleration observation using CeB6 for the CFE electron source is provided. In an electron beam apparatus having a CFE electron source, the emitter of the electron beam of the CFE electron source is Ce hexaboride or a hexaboride of a lanthanoid metal heavier than Ce, the hexaboride emits the electron beam from the {310} plane, and the number of the atoms of the lanthanoid metal on the {310} plane is larger than the number of boron molecules comprising six boron atoms on the {310} plane.
    Type: Grant
    Filed: October 13, 2016
    Date of Patent: December 31, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Keigo Kasuya, Noriaki Arai, Toshiaki Kusunoki, Takashi Ohshima, Tomihiro Hashizume, Yusuke Sakai
  • Publication number: 20190385809
    Abstract: An electron source that can be used stably for a long time even when hexaboride is used, and an electron beam device using the electron source are provided. The invention is directed to an electron source which includes a filament made of a metal, a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery, and a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with a bottom of each of the plurality of recesses of the metal tube.
    Type: Application
    Filed: December 8, 2017
    Publication date: December 19, 2019
    Inventors: Toshiaki KUSUNOKI, Keigo KASUYA, Takashi OHSHIMA, Tomihiro HASHIZUME, Noriaki ARAI, Yoichi OSE
  • Publication number: 20190237289
    Abstract: An electron beam apparatus which can stably achieve high spatial resolution also during low acceleration observation using CeB6 for the CFE electron source is provided. In an electron beam apparatus having a CFE electron source, the emitter of the electron beam of the CFE electron source is Ce hexaboride or a hexaboride of a lanthanoid metal heavier than Ce, the hexaboride emits the electron beam from the {310} plane, and the number of the atoms of the lanthanoid metal on the {310} plane is larger than the number of boron molecules comprising six boron atoms on the {310} plane.
    Type: Application
    Filed: October 13, 2016
    Publication date: August 1, 2019
    Inventors: Keigo KASUYA, Noriaki ARAI, Toshiaki KUSUNOKI, Takashi OHSHIMA, Tomihiro HASHIZUME, Yusuke SAKAI
  • Publication number: 20190178640
    Abstract: To provide a sample for measuring particles enabling the three-dimensional particulate shape to be measured and the particulate species to be evaluated, the sample for measuring particles includes a substrate; isolated nanoparticles to be measured which are disposed on the substrate; and isolated standard nanoparticles which are disposed on the substrate in the vicinity of the isolated nanoparticles to be measured.
    Type: Application
    Filed: August 31, 2016
    Publication date: June 13, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Tomihiro HASHIZUME, Masatoshi YASUTAKE, Sanato NAGATA
  • Publication number: 20190066966
    Abstract: In order to provide a stable hexaboride single-crystal field emission electron source capable of heat-flashing, this field emission electron source is provided with a metal filament, a metal tube joined thereto, a hexaboride tip that emits electrons, and graphite sheets that are independent of the metal tube and the hexaboride tip. The hexaboride tip is arranged so as not to be in structural contact with the metal tube due to the graphite sheets. The hexaboride tip, the graphite sheets, and the metal tube are configured so as to be mechanically and electrically in contact with one another.
    Type: Application
    Filed: November 24, 2016
    Publication date: February 28, 2019
    Inventors: Toshiaki KUSUNOKI, Tomihiro HASHIZUME, Keigo KASUYA, Takashi OHSHIMA, Yusuke SAKAI, Yoichi OSE, Noriaki ARAI
  • Patent number: 10211022
    Abstract: A gas field ionization source in which an ion beam current is stable for a long time is achieved in an ion beam apparatus equipped with a field ionization source that supplies gas to a chamber, ionizes the gas, and applies the ion beam to a sample. The ion beam apparatus includes an emitter electrode having a needle-like extremity; a chamber inside which the emitter electrode is installed; a gas supply unit that supplies the gas to the chamber; a cooling unit that is connected to the chamber and cools the emitter electrode; a discharge type exhaust unit that exhausts gas inside the chamber; and a trap type exhaust unit that exhausts gas inside the chamber. The exhaust conductance of the discharge type exhaust unit is larger than the total exhaust conductance of the trap type exhaust unit.
    Type: Grant
    Filed: July 31, 2015
    Date of Patent: February 19, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Shinichi Matsubara, Hiroyasu Shichi, Yoshimi Kawanami, Tomihiro Hashizume
  • Publication number: 20190051491
    Abstract: An H3+ ion is used as an ion beam to achieve improvement in focusing capability influencing observed resolution and machining width, improvement in the beam stability, and a reduction in damage to the sample surface during the beam irradiation, in the process of observation and machining of the sample surface by the ion beam. The H3+ ion can be obtained by use of a probe current within a voltage range 21 around a second peak 23 occurring when an extracted voltage is applied to a needle-shaped emitter tip with an apex terminated by three atoms or less, in an atmosphere of hydrogen gas.
    Type: Application
    Filed: February 5, 2016
    Publication date: February 14, 2019
    Inventors: Shinichi MATSUBARA, Hiroyasu SHICHI, Tomihiro HASHIZUME, Yoshimi KAWANAMI
  • Patent number: 10073116
    Abstract: This sample holder for a scanning probe microscope is constituted of (1) a container that retains a liquid and (2) a flat-plate-shaped upper cover that covers an upper opening of the container and that has a narrow slit above the position where a sample is placed. In the upper cover, the slit has a slit width with which a thin film of the liquid is formed over the upper surface of the sample when the liquid fills the space between the container and the upper cover. The thin film of the liquid has a film thickness smaller than the distance between the upper surface of the sample and the upper cover.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: September 11, 2018
    Assignee: HITACHI, LTD.
    Inventors: Sanato Nagata, Tomihiro Hashizume, Akira Nambu, Hideaki Koizumi
  • Patent number: 9875878
    Abstract: Sample transferring can be securely and easily performed between an FIB device, an electron microscope, and an atom probe device, and atom probe analysis can be performed to a material that easily alters due to atmospheric exposure. A sample holder that holds a sample (12) is provided with an atmosphere-isolation mechanism that prevents the sample from altering due to the atmospheric exposure upon the sample transferring between the devices. There is provided a structure enabling of attaching and detaching a housing (21) of a sample holder leading end of a part of the atmosphere-isolation mechanism in an analytical vacuum device, such as the atom probe device.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: January 23, 2018
    Assignee: Hitachi, Ltd.
    Inventors: Takeshi Nakayama, Tomihiro Hashizume, Akira Sugawara
  • Publication number: 20170343580
    Abstract: This sample holder for a scanning probe microscope is constituted of (1) a container that retains a liquid and (2) a flat-plate-shaped upper cover that covers an upper opening of the container and that has a narrow slit above the position where a sample is placed. In the upper cover, the slit has a slit width with which a thin film of the liquid is formed over the upper surface of the sample when the liquid fills the space between the container and the upper cover. The thin film of the liquid has a film thickness smaller than the distance between the upper surface of the sample and the upper cover.
    Type: Application
    Filed: December 24, 2014
    Publication date: November 30, 2017
    Applicant: HITACHI, LTD.
    Inventors: Sanato NAGATA, Tomihiro HASHIZUME, Akira NAMBU, Hideaki KOIZUMI
  • Publication number: 20170229277
    Abstract: A gas field ionization source in which an ion beam current is stable for a long time is achieved in an ion beam apparatus equipped with a field ionization source that supplies gas to a chamber, ionizes the gas, and applies the ion beam to a sample. The ion beam apparatus includes an emitter electrode having a needle-like extremity; a chamber inside which the emitter electrode is installed; a gas supply unit that supplies the gas to the chamber; a cooling unit that is connected to the chamber and cools the emitter electrode; a discharge type exhaust unit that exhausts gas inside the chamber; and a trap type exhaust unit that exhausts gas inside the chamber. The exhaust conductance of the discharge type exhaust unit is larger than the total exhaust conductance of the trap type exhaust unit.
    Type: Application
    Filed: July 31, 2015
    Publication date: August 10, 2017
    Inventors: Shinichi MATSUBARA, Hiroyasu SHICHI, Yoshimi KAWANAMI, Tomihiro HASHIZUME
  • Publication number: 20170004952
    Abstract: Sample transferring can be securely and easily performed between an FIB device, an electron microscope, and an atom probe device, and atom probe analysis can be performed to a material that easily alters due to atmospheric exposure. A sample holder that holds a sample (12) is provided with an atmosphere-isolation mechanism that prevents the sample from altering due to the atmospheric exposure upon the sample transferring between the devices. There is provided a structure enabling of attaching and detaching a housing (21) of a sample holder leading end of a part of the atmosphere-isolation mechanism in an analytical vacuum device, such as the atom probe device.
    Type: Application
    Filed: December 5, 2013
    Publication date: January 5, 2017
    Inventors: Takeshi NAKAYAMA, Tomihiro HASHIZUME, Akira SUGAWARA
  • Patent number: 9423416
    Abstract: Provided is a scanning probe microscope that takes measurements at high spatial resolution on physical information such as array structure of water molecules at a specimen-culture fluid interface in a culture fluid as well as irregularities of the surface of a specimen and composition distribution and array structure of molecules, proteins, etc. even in the atmosphere, an ambient air, vacuum, among others. The scanning probe microscope includes: a probing needle (1); a specimen holder (11) in which a specimen (3) is mounted; an oscillator (2) that produces a periodic oscillation to change the probing needle position; a pulse oscillation type laser light source (27, 28) that emits light toward a spot, which is put under measurement by the probing needle, on the specimen; a detector (25) that measures intensity of output light which is output from the specimen by energy spectroscopy; and a control device (26).
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: August 23, 2016
    Assignee: Hitachi, Ltd.
    Inventors: Akira Nambu, Tsuyoshi Yamamoto, Hideaki Koizumi, Tomihiro Hashizume, Seiji Heike
  • Publication number: 20150192604
    Abstract: At the time of carrying out measurement of a biological tissue with a probe microscope, measurement is to be realized while maintain survival conditions for a cell. As a holder for the probe microscope, a measurement holder including: a container in which a measurement object is housed; a first cover section which covers at least a part of the measurement object and has an aperture for inserting a measurement probe; and a second cover section which is connected to the first cover section, covers the container, and has an aperture for inserting the measurement probe, is used.
    Type: Application
    Filed: July 27, 2012
    Publication date: July 9, 2015
    Applicant: HITACHI, LTD.
    Inventors: Tsuyoshi Yamamoto, Seiji Heike, Akira Nambu, Tomihiro Hashizume, Hideaki Koizumi
  • Publication number: 20150177275
    Abstract: Provided is a scanning probe microscope that takes measurements at high spatial resolution on physical information such as array structure of water molecules at a specimen-culture fluid interface in a culture fluid as well as irregularities of the surface of a specimen and composition distribution and array structure of molecules, proteins, etc. even in the atmosphere, an ambient air, vacuum, among others. The scanning probe microscope includes: a probing needle (1); a specimen holder (11) in which a specimen (3) is mounted; an oscillator (2) that produces a periodic oscillation to change the probing needle position; a pulse oscillation type laser light source (27, 28) that emits light toward a spot, which is put under measurement by the probing needle, on the specimen; a detector (25) that measures intensity of output light which is output from the specimen by energy spectroscopy; and a control device (26).
    Type: Application
    Filed: August 28, 2012
    Publication date: June 25, 2015
    Inventors: Akira Nambu, Tsuyoshi Yamamoto, Hideaki Koizumi, Tomihiro Hashizume, Seiji Heike
  • Patent number: 8847173
    Abstract: To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: September 30, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshimi Kawanami, Shinichi Matsubara, Hironori Moritani, Noriaki Arai, Hiroyasu Shichi, Tomihiro Hashizume, Hiroyasu Kaga, Norihide Saho, Hiroyuki Muto, Yoichi Ose
  • Publication number: 20130279652
    Abstract: Provided is a measuring apparatus which is capable of measuring the distribution of a specific element in a specimen by soft X rays in a state where there is no effect by a staining agent and the like even though the specimen is composed of living single cells or cell aggregates living as they are, extracted in vitro from an organism. A measuring apparatus using soft X rays includes a connection part which is connected with a soft X ray beam line, a mechanism which light-collects a spot size of soft X rays into a micro beam, and a low vacuum vessel having a measurement chamber in which a specimen is disposed.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 24, 2013
    Applicant: HITACHI, LTD.
    Inventors: Akira NAMBU, Kazuhiro UEDA, Tsuyoshi YAMAMOTO, Hideaki KOIZUMI, Tomihiro HASHIZUME
  • Patent number: 8530865
    Abstract: A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: September 10, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Shinichi Matsubara, Takashi Ohshima, Satoshi Tomimatsu, Tomihiro Hashizume, Tohru Ishitani
  • Publication number: 20130119252
    Abstract: To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.
    Type: Application
    Filed: July 13, 2011
    Publication date: May 16, 2013
    Inventors: Yoshimi Kawanami, Shinichi Matsubara, Hironori Moritani, Noriaki Arai, Hiroyasu Shichi, Tomihiro Hashizume, Hiroyasu Kaga, Norihide Saho, Hiroyuki Muto, Yoichi Ose