Patents by Inventor Tomoaki Sawabe
Tomoaki Sawabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190296155Abstract: A semiconductor device of an embodiment includes a first electrode; a second electrode; an oxide semiconductor layer provided between the first electrode and the second electrode and extending in a first direction; a gate electrode surrounding the oxide semiconductor layer; and a first gate insulating layer provided between the gate electrode and the oxide semiconductor layer, the first gate insulating layer surrounding the oxide semiconductor layer, and the first gate insulating layer having a length in the first direction shorter than a length of the oxide semiconductor layer in the first direction.Type: ApplicationFiled: August 14, 2018Publication date: September 26, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Tomoaki SAWABE, Tomomasa UEDA, Keiji IKEDA, Tsutomu TEZUKA, Nobuyoshi SAITO
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Publication number: 20190218321Abstract: A pattern forming material according to an embodiment is a pattern forming material comprising a polymer composed of a plurality of monomer units bonded to each other. Each of the monomer units includes an ester structure having a first carbonyl group and at least one second carbonyl group bonded to the ester structure. A second carbonyl group farthest from a main chain of the polymer constituting the pattern forming material among second carbonyl groups is in a linear chain state.Type: ApplicationFiled: September 6, 2018Publication date: July 18, 2019Applicant: Toshiba Memory CorporationInventors: Ryosuke YAMAMOTO, Seiji Morita, Norikatsu Sasao, Koji Asakawa, Tomoaki Sawabe, Shinobu Sugimura
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Publication number: 20190169461Abstract: According to one embodiment, a pattern formation method is disclosed. The method includes a preparation process, a block copolymer layer formation process, and a contact process. The preparation process includes preparing a pattern formation material including a block copolymer including a first block and a second block. The first block includes a first main chain and a plurality of first side chains. At least one of the first side chains includes a plurality of carbonyl groups. The block copolymer layer formation process includes forming a block copolymer layer on a first member. The block copolymer layer includes the pattern formation material and includes a first region and a second region. The first region includes the first block. The second region includes the second block. The contact process includes causing the block copolymer layer to contact a metal compound including a metallic element.Type: ApplicationFiled: July 27, 2018Publication date: June 6, 2019Applicant: Toshiba Memory CorporationInventors: Norikatsu Sasao, Koji Asakawa, Tomoaki Sawabe, Shinobu Sugimura
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Publication number: 20190121232Abstract: According to one embodiment, a pattern formation method can include performing a first processing of causing a surface of a first member of a processing body to be hydrophobic. The processing body includes the first member and a second member. The second member is provided at a portion of the first member. The method can include performing a second processing of causing the processing body to contact an atmosphere including a metal compound. The second processing is after the first processing. The method can include performing a third processing of processing the processing body in an atmosphere including at least one selected from the group consisting of water, oxygen, and ozone. The third processing is after the second processing. In addition, the method can include removing, after the third processing, at least a portion of another portion of the first member by using the second member as a mask.Type: ApplicationFiled: August 13, 2018Publication date: April 25, 2019Applicant: Toshiba Memory CorporationInventors: Tomoaki SAWABE, Shinobu Sugimura, Koji Asakawa
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Publication number: 20190084829Abstract: According to one embodiment, a pattern formation method is disclosed. The method can include a preparation process, a first layer formation process, a block copolymer layer formation process, and a contact process. The preparation process prepares a pattern formation material including a polymer including a first chemical structure including carbon, hydrogen, and a first group. The first group includes one of a vinyl group, a hydroxy group, or a first element. The first layer formation process forms a first layer on a base body. The first layer includes the pattern formation material. The block copolymer layer formation process forms a block copolymer layer on the first layer. The block copolymer layer includes a first polymer and a second polymer. The block copolymer layer formation process includes forming first and second regions. The contact process causes the block copolymer layer to contact a metal compound including a metallic element.Type: ApplicationFiled: March 9, 2018Publication date: March 21, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Norikatsu SASAO, Koji Asakawa, Seekei Lee, Naoko Kihara, Tomoaki Sawabe, Shinobu Sugimura
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Publication number: 20190086803Abstract: According to one embodiment, a pattern formation method is disclosed. The method can include a film formation process, and a exposure process. The film formation process forms a pattern formation material film on a base body. The pattern formation material film includes a pattern formation material including a first portion and a second portion. The first portion includes at least one of acrylate or methacrylate. The second portion includes an alicyclic compound and a carbonyl group. The alicyclic compound has an ester bond to the at least one of the acrylate or the methacrylate. The carbonyl group is bonded to the alicyclic compound. The exposure process causes the pattern formation material film to expose to a metal compound including a metallic element.Type: ApplicationFiled: March 8, 2018Publication date: March 21, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Koji Asakawa, Seekei Lee, Naoko Kihara, Norikatsu Sasao, Tomoaki Sawabe, Shinobu Sugimura
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Publication number: 20190086805Abstract: According to one embodiment, a pattern formation material includes a first monomer. The first monomer includes a first molecular chain, a first group, and a second group. The first molecular chain includes a first end and a second end. The first group has an ester bond to the first end. The second group has an ester bond to the second end. The first group is one of acrylic acid or methacrylic acid. The second group is one of acrylic acid or methacrylic acid. The first molecular chain includes a plurality of first elements bonded in a straight chain configuration. The first elements are one of carbon or oxygen. The number of the first elements is 6 or more. A film including the first monomer is caused to absorb a metal compound including a metallic element.Type: ApplicationFiled: March 13, 2018Publication date: March 21, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Koji ASAKAWA, Naoko KIHARA, Seekei LEE, Norikatsu SASAO, Tomoaki SAWABE, Shinobu SUGIMURA
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Publication number: 20180350829Abstract: According to one embodiment, a memory includes: a member extending in a first direction and including an oxide semiconductor layer including first to third portions arranged in order from the bit line to the source line; first, second and third conductive layers arranged along the first direction and facing the first to third portions, respectively, the first conductive layer including first material, and each of the second and third conductive layer including a second material different from the first material; a memory cell in a first position corresponding to the first portion, the memory cell including a charge storage layer in the oxide semiconductor layer; a first transistor in a second position corresponding to the second portion; and a second transistor in a third position corresponding to the third portion.Type: ApplicationFiled: July 20, 2018Publication date: December 6, 2018Applicant: TOSHIBA MEMORY CORPORATIONInventors: Tsutomu TEZUKA, Fumitaka ARAI, Keiji IKEDA, Tomomasa UEDA, Nobuyoshi SAITO, Chika TANAKA, Kentaro MIURA, Tomoaki SAWABE
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Publication number: 20180331116Abstract: According to one embodiment, a memory includes: a first gate of a first transistor and a second gate electrode of the second transistor facing the a semiconductor layer; an oxide semiconductor layer between the first and second transistors and including first to fifth portions in order; a third gate of a first cell facing the first portion; a fourth gate of a third transistor facing the second portion; a fifth gate of a second cell facing the third portion; a sixth gate of a fourth transistor facing the fourth portion; an interconnect connected to the fifth portion; a source line connected to the first transistor; and a bit line connected to the second transistor. A material of the third gate is different from a material of the fourth gate.Type: ApplicationFiled: July 20, 2018Publication date: November 15, 2018Applicant: Toshiba Memory CorporationInventors: Tsutomu TEZUKA, Fumitaka ARAI, Keiji IKEDA, Tomomasa UEDA, Nobuyoshi SAITO, Chika TANAKA, Kentaro MIURA, Tomoaki SAWABE
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Publication number: 20180265616Abstract: According to one embodiment, a pattern formation material is included in a polymer layer to be provided between a block copolymer layer and a substrate. The block copolymer layer includes a block copolymer including a plurality of blocks. The pattern formation material includes a pattern formation polymer. The pattern formation polymer consists of a main chain including an acrylic backbone, and a side chain. One of the plurality of blocks include a plurality of polymer components. The plurality of polymer components are of mutually-different types. A solubility parameter of the pattern formation material is between a maximum value and a minimum value of a solubility parameter of the polymer components.Type: ApplicationFiled: September 13, 2017Publication date: September 20, 2018Applicant: Toshiba Memory CorporationInventors: Koji ASAKAWA, Norikatsu Sasao, Tomoaki Sawabe, Naoko Kihara, Shinobu Sugimura
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Publication number: 20180138048Abstract: According to one embodiment, a pattern formation method includes forming a structure body on a first surface of a patterning member, the structure body having protrusions and a recess. The protrusions are arranged at a first pitch along a first direction. The first direction is aligned with the first surface. The recess is between the protrusions. The method further includes forming a resin film of a block copolymer on the structure body. The block copolymer includes first portions and second portions. The first and second portions are arranged alternately at a second pitch along the first direction. The structure body includes first and second regions. The first portions are on the first regions. The second portions on the second regions. The method further includes removing the second portions and the second regions, introducing a metal to the first regions, and etching the patterning member using the first regions.Type: ApplicationFiled: September 13, 2017Publication date: May 17, 2018Applicant: Toshiba Memory CorporationInventors: Tomoaki SAWABE, Shinobu SUGIMURA, Koji ASAKAWA
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Patent number: 9927376Abstract: A template defect inspection method using an optical system includes emitting linearly polarized light to a template having a metal film formed on at least part of a concave-convex structure that is formed on a substrate and that has a line-and-space pattern, acquiring information on a polarization-rotated component, which is different from linearly polarized light incident on the template, of light reflected by the template in accordance with the emission thereto, converting the acquired information on the polarization-rotated component into an electrical signal, and processing the electrical signal.Type: GrantFiled: September 14, 2016Date of Patent: March 27, 2018Assignee: Toshiba Memory CorporationInventors: Tomoaki Sawabe, Shinobu Sugimura, Ryosuke Yamamoto, Seiji Morita
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Publication number: 20180019444Abstract: According to one embodiment, a light-emitting element includes a substrate, a first electrode, a first layer, a second electrode, a light-emitting layer, and a second layer. The substrate, the second electrode, and the first layer are light-transmissive. A refractive index of the first layer is lower than a refractive index of the substrate. At least a portion of the first layer is provided between the first electrode and a portion of the substrate. The second electrode is provided between the first electrode and at least a portion of the first layer. The light-emitting layer is provided between the first electrode and the second electrode. The second layer is light-transmissive. The second layer is configured to modify a travel direction of light incident on the second layer. At least a portion of the second layer is provided between the first electrode and at least a portion of the first layer.Type: ApplicationFiled: September 15, 2017Publication date: January 18, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Toshiya YONEHARA, Tomio ONO, Tomoaki SAWABE
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Patent number: 9865835Abstract: An organic electroluminescent device includes first and second substrates, first and second electrodes, an insulating layer, an organic light emitting layer, and an intermediate layer. The first electrode is provided on the first substrate. The insulating layer is provided on the first electrode. The insulating layer includes first and second openings. The second electrode includes first and second conductive parts. The first conductive part covers the first opening. The second conductive part covers the second opening. The organic light emitting layer includes first and second light emitting parts. The first light emitting part is provided between the first electrode and the first conductive part. The second light emitting part is provided between the first electrode and the second conductive part. The second substrate is provided on a stacked body including above. The intermediate layer is provided between the stacked body and the second substrate.Type: GrantFiled: July 30, 2015Date of Patent: January 9, 2018Assignee: Kabushiki Kaisha ToshibaInventors: Yasushi Shinjo, Tomoaki Sawabe, Akio Amano
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Publication number: 20180001341Abstract: According to one embodiment, a structure body includes a plurality of particles and a base body. The particles are separated from each other. The each of the particles includes a first polymer provided at an outer surface of the each of the particles. The base body includes a surface having a protrusion and a recess. The base body includes a second polymer provided at the surface. The second polymer is different from the first polymer. The particles are supported by the protrusion, and the particles are separated from the recess.Type: ApplicationFiled: February 17, 2017Publication date: January 4, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Tomoaki SAWABE, Akira WATANABE, Naoko KlHARA, Ryosuke YAMAMOTO
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Publication number: 20180000365Abstract: According to one embodiment, a detection device includes a substrate, a light detector, a light emitter. The substrate is light-transmissive. The light emitter is provided between the substrate and the light detector. The light emitter includes a first electrode, a light-emitting layer, and a plurality of second electrodes. The first electrode is provided between the light detector and the substrate. The first electrode is light-transmissive. The light-emitting layer is provided between the light detector and the first electrode. The second electrodes are provided between the light detector and the light-emitting layer.Type: ApplicationFiled: September 15, 2017Publication date: January 4, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Toshiya YONEHARA, Tomoaki SAWABE, Akio AMANO
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Publication number: 20180000364Abstract: According to one embodiment, a light-emitting element includes a substrate, a first electrode, a second electrode, and a light-emitting layer. The substrate is light-transmissive. The second electrode is provided between the first electrode and a portion of the substrate. The second electrode is light-transmissive. A light-emitting layer is provided between the first electrode and the second electrode. The substrate includes a first region and a second region. The first region overlaps at least a portion of the light-emitting layer in a first direction, the first direction is from the second electrode toward the first electrode. The second region is provided around the first region along a plane perpendicular to the first direction. The substrate has an opening provided in at least a portion of the second region.Type: ApplicationFiled: September 15, 2017Publication date: January 4, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Toshiya YONEHARA, Tomio ONO, Tomoaki SAWABE
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Publication number: 20170269005Abstract: A template defect inspection method using an optical system includes emitting linearly polarized light to a template having a metal film formed on at least part of a concave-convex structure that is formed on a substrate and that has a line-and-space pattern, acquiring information on a polarization-rotated component, which is different from linearly polarized light incident on the template, of light reflected by the template in accordance with the emission thereto, converting the acquired information on the polarization-rotated component into an electrical signal, and processing the electrical signal.Type: ApplicationFiled: September 14, 2016Publication date: September 21, 2017Inventors: Tomoaki SAWABE, Shinobu SUGIMURA, Ryosuke YAMAMOTO, Seija MORITA
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Patent number: 9680124Abstract: An organic electroluminescent device includes first and second electrode and an organic light emitting layer. The first electrode has an upper face. The organic light emitting layer is provided on the first electrode. The second electrode is provided on the organic light emitting layer. The second electrode includes a plurality of conductive parts. The conductive parts extend in a first direction parallel to the upper face and are arranged in a second direction. The second direction is parallel to the upper face and intersects with the first direction. When a length of each of the conductive parts in the second direction is set to W1 (micrometer), and a pitch of each of the conductive parts is set to P1 (micrometer). The W1 and the P1 satisfy a relationship of W1??647(1?W1/P1)+511 and a relationship of W1??882(1?W1/P1)+847.Type: GrantFiled: July 31, 2015Date of Patent: June 13, 2017Assignee: Kabushiki Kaisha ToshibaInventors: Daimotsu Kato, Hayato Kakizoe, Tomoaki Sawabe, Keiji Sugi, Atsushi Wada, Yukitami Mizuno, Tomio Ono, Shintaro Enomoto, Tomoko Sugizaki, Akio Amano, Yasushi Shinjo
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Patent number: 9653706Abstract: According to one embodiment, an organic electroluminescent element includes a first electrode, an organic layer, and a second electrode. The first electrode is light-transmissive. The organic layer is provided on the first electrode. The second electrode is provided on the organic layer. The second electrode is light-reflective and includes a first conductive portion and a second conductive portion. The first conductive portion extends in a first direction. The second conductive portion extends in a second direction intersecting the first direction. The second conductive portion intersects the first conductive portion. A length in the first direction of the first conductive portion is longer than 1 mm and not more than 47 mm. A length in the second direction of the second conductive portion is longer than 1 mm and not more than 47 mm.Type: GrantFiled: May 13, 2016Date of Patent: May 16, 2017Assignee: Kabushiki Kaisha ToshibaInventors: Akio Amano, Tomoaki Sawabe, Keiji Sugi, Daimotsu Kato, Hayato Kakizoe, Tomio Ono