Abstract: A substrate washing device includes a roll washing member, a single tube nozzle and spray nozzle. The roll washing member linearly extends over the entire length of the diameter of the substrate and comes into slide-contact with the surface of the substrate. The single tube nozzle discharges washing liquid onto a roll winding side of the roll washing member so that the first washing liquid lands in the front center of the substrate. The spray nozzle sprays a second washing liquid in a fan shape toward a second area when the roll winding side area is divided into two areas.

Abstract: According to one embodiment of the present disclosure, provided is a substrate cleaning method that performs an operation, in a state where a cleaning member is in contact with a rotating substrate, the cleaning member is moved between a first position on the substrate and a second position close to an edge of the substrate, n times (n is an integer of 2 or more), wherein a controller, which controls a driver that moves the cleaning member, controls the driver to perform an edge cleaning step to perform cleaning of the substrate in a state where the cleaning member is in contact with the second position on the substrate for a predetermined period of time after the cleaning member reaches the second position at least in one operation of the first to the (n-1)th operations.

Abstract: High-performance substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus are provided. A substrate cleaning apparatus, including: a substrate holding and rotating mechanism that holds and rotates a substrate; a first cleaning mechanism that brings a cleaning tool into contact with the substrate to clean the substrate, cleans the substrate using two-fluid jet, or cleans the substrate using ozone water; and a second cleaning mechanism that cleans the substrate using an ultrasonic cleaning liquid is provided.

Abstract: Providing a substrate cleaning device and a substrate cleaning method having high detergency. Provided is a substrate cleaning device including: a substrate rotating mechanism that rotates a substrate; and a first nozzle and a second nozzle that eject an ultrasonic cleaning solution toward a predetermined surface of the substrate that is rotated, wherein the first nozzle and the second nozzle are held in one casing.

Abstract: A roll-type cleaning member for scrubbing and cleaning a target cleaning surface of a substrate includes a plurality of nodules formed on a surface thereof. Each nodule includes a slit which extends so as not to be parallel to the rotation direction of the roll-type cleaning member, upstream edges are formed by the slit so as to serve as edges first contacting the target cleaning surface when a cleaning surface of the nodule contacts the target cleaning surface of the substrate by the rotation of the roll-type cleaning member, and the upstream edges are provided at a plurality of positions of the cleaning surface of the nodule in the circumferential direction.

Abstract: A cover for a swing member of a substrate processing apparatus includes an upper surface including a first groove, and a first side edge and a second side edge located respectively at both ends of the upper surface in the short-length direction of the cover, where a bottom portion of the first groove is located lower than the first side edge and the second side edge.

Abstract: A substrate drying device is provided that can suppress occurrence of a micro size defect (for example, a defect having a defect size of 20 nm or less). A substrate drying device 1 includes a substrate holding unit 11 which holds a substrate W, a gas generator 60 which generates a drying gas G including at least IPA vapor and for drying the substrate W, and a drying gas nozzle 30 which supplies the drying gas G to the surface WA of the substrate W. A filter 67 for filtering the drying gas G is provided in the gas generator 60. A defect size D allowed in a defect test after the drying of the substrate W is set to 20 nm or less and a ratio D/F of the defect size D and a filter size F of the filter 67 is set to 4 or more.

Abstract: The present invention relates to a substrate cleaning apparatus, a polishing apparatus, a buffing apparatus, a substrate processing apparatus, a machine learning apparatus used for any of these apparatuses, and a substrate cleaning method, which are improved in terms of both performance and throughput. The substrate cleaning apparatus (16) includes: a cleaning tool (77) configured to clean a substrate (W) held by a substrate holder (71, 72, 73, 74); a surface-property measuring device configured to obtain surface data of the cleaning tool (77); and a controller (30) configured to determine a replacement time of the cleaning tool (77) based on the surface data.

Abstract: The disclosure provides a jig for attaching and detaching a cleaning member, which facilitates attaching and detaching the cleaning member to and from a rotation device without holding the cleaning member directly by hand, even when there is no sufficient spacing around the cleaning member. The jig 100 for attaching and detaching a cleaning member 60 includes a pair of jig bodies 110 capable of clamping two ends 63 of a holder 62 of the cleaning member 60, and a connecting mechanism 120 that interlocks the movements of the pair of jig bodies 110 between a clamped state in which two ends 63 of the holder 62 are clamped and a non-clamped state in which the clamped state is released.

Abstract: Provided is a substrate cleaning apparatus including: a substrate support mechanism configured to support a substrate; and a roll-type first cleaning member configured to clean a first surface of the substrate by rotating while being in contact with a bevel and/or an edge of the first surface of the substrate, wherein a rotation axis of the first cleaning member is in parallel with the substrate, and the first cleaning member has a large diameter portion and a small diameter portion.

Abstract: A substrate cleaning apparatus comprises a substrate holding roller and an edge cleaner. The substrate holding roller is configured to hold and rotate a substrate to be processed. The edge cleaner is in contact with an edge portion of the substrate to be processed and includes resin material containing fluororesin particles at least in a portion in contact with the substrate to be processed.

Abstract: To perform both buff cleaning of a substrate surface and cleaning of an edge part of the substrate, a cleaning module includes: a rotary table configured to support a circular substrate and have a diameter smaller than a diameter of the substrate; a buff cleaning portion configured to buff clean a front side of the substrate while contacting the front side of the substrate supported by the rotary table; a buff cleaning portion movement mechanism configured to move the buff cleaning portion with respect to the substrate; a buff cleaning portion control mechanism configured to control an operation of the buff cleaning portion movement mechanism; and an edge cleaning portion configured to clean an edge part of the substrate while contacting the edge part of the substrate supported by the rotary table.

Abstract: A storage container of a scrub member includes a container main body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid body are engaged.

Abstract: A substrate washing device includes an arm and a two-fluid jet nozzle which is supported on a leading end of the arm. The two-fluid jet nozzle may be moved towards the outer circumference of the substrate from the center of the substrate by a rotation of the arm. The substrate washing device may also include an on-arm washing liquid supply nozzle, which may supply a washing liquid to the upper surface of the substrate in a vicinity of the two-fluid jet nozzle.

Abstract: A storage container of a scrub member includes a container main body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid body are engaged.

Abstract: A substrate washing device includes an arm and a two-fluid jet nozzle which is supported on a leading end of the arm. The two-fluid jet nozzle may be moved towards the outer circumference of the substrate from the center of the substrate by a rotation of the arm. The substrate washing device may also include an on-arm washing liquid supply nozzle, which may supply a washing liquid to the upper surface of the substrate in a vicinity of the two-fluid jet nozzle.

Abstract: An apparatus for cleaning a substrate has a holding unit 60 that holds a substrate W; a rotated unit 30 connected to the holding unit 60; a rotating unit 35 that is provided on a peripheral outer side of the rotated unit 30 and rotates the rotated unit 30; and a cleaning unit 10, 20 that physically cleans the substrate W held by the holding unit 60.

Abstract: Provided is a substrate processing apparatus including: a first cleaning member configured to clean a substrate by a contact face on which a skin layer is provided; and a second cleaning member configured to clean the substrate after cleaned by the first cleaning member, by a contact face on which a skin layer is not provided.

Abstract: According to one embodiment, a substrate cleaning apparatus that cleans a substrate while rotating the substrate, the substrate cleaning apparatus includes: a first cleaning liquid supplier that sprays cleaning liquid in a spray shape at a first spraying angle toward a center of the substrate; and a second cleaning liquid supplier that sprays cleaning liquid in a spray shape at a second spraying angle greater than the first spraying angle toward an area between the center of the substrate and an edge of the substrate.

Abstract: A storage container of a scrub member includes a container warn body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid both are engaged.