Patents by Inventor Tomoatsu Ishibashi

Tomoatsu Ishibashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10315232
    Abstract: A cleaning member 10, for use in cleaning a substrate W, comprises: a tip surface 13 configured to be in contact with the substrate W when cleaning the substrate W, and the tip surface 13 being not covered with a skin layer 11; and a circumferential part having a covered part 16, which is disposed on the base end side and a circumferential surface of which is covered with the skin layer 11, and an exposed part 17, which is disposed on the tip end side and a circumferential surface of which is not covered with the skin layer 11.
    Type: Grant
    Filed: February 13, 2017
    Date of Patent: June 11, 2019
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Publication number: 20190164769
    Abstract: An apparatus for cleaning a substrate has a holding unit 60 that holds a substrate W; a rotated unit 30 connected to the holding unit 60; a rotating unit 35 that is provided on a peripheral outer side of the rotated unit 30 and rotates the rotated unit 30; and a cleaning unit 10, 20 that physically cleans the substrate W held by the holding unit 60.
    Type: Application
    Filed: June 26, 2017
    Publication date: May 30, 2019
    Applicant: EBARA CORPORATION
    Inventors: Shinji KAJITA, Hisajiro NAKANO, Tomoatsu ISHIBASHI, Koichi FUKAYA, Yasuyuki MOTOSHIMA, Yohei ETO, Fumitoshi OIKAWA
  • Publication number: 20190088510
    Abstract: High-performance substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus are provided. A substrate cleaning apparatus, including: a substrate holding and rotating mechanism that holds and rotates a substrate; a first cleaning mechanism that brings a cleaning tool into contact with the substrate to clean the substrate, cleans the substrate using two-fluid jet, or cleans the substrate using ozone water; and a second cleaning mechanism that cleans the substrate using an ultrasonic cleaning liquid is provided.
    Type: Application
    Filed: February 28, 2017
    Publication date: March 21, 2019
    Inventor: Tomoatsu ISHIBASHI
  • Publication number: 20190080933
    Abstract: A washing device includes: a plurality of spindles which holds a substrate and rotates the substrate about a central axis of the substrate as a rotary axis; and a single tube nozzle which discharges a washing liquid toward an upper surface of the substrate, wherein the single tube nozzle discharges the washing liquid so that the washing liquid lands in front of the center of the substrate and the landed washing liquid flows on the upper surface of the substrate toward the center of the substrate. A liquid flow on the upper surface of the substrate after landing of the washing liquid discharged from the single tube nozzle passes through the center of the substrate.
    Type: Application
    Filed: November 13, 2018
    Publication date: March 14, 2019
    Inventor: Tomoatsu ISHIBASHI
  • Patent number: 10192757
    Abstract: A substrate cleaning apparatus capable of quickly removing cleaning liquid that has been used in cleaning of a substrate with a roll cleaning tool from the substrate. The substrate cleaning apparatus includes a substrate holder configured to hold and rotate a substrate; a cleaning-liquid supply nozzle configured to supply cleaning liquid onto a first region of the substrate; a roll cleaning tool configured to be placed in sliding contact with the substrate in the presence of the cleaning liquid to thereby clean the substrate; and a fluid supply nozzle configured to supply fluid, which is constituted by pure water or chemical liquid, onto a second region of the substrate. The second region is located at an opposite side of the first region with respect to the roll cleaning tool, and a supply direction of the fluid is a direction from a central side toward a peripheral side of the substrate.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: January 29, 2019
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: 10170344
    Abstract: A washing device includes: a plurality of spindles which holds a substrate and rotates the substrate about a central axis of the substrate as a rotary axis; and a single tube nozzle which discharges a washing liquid toward an upper surface of the substrate, wherein the single tube nozzle discharges the washing liquid so that the washing liquid lands in front of the center of the substrate and the landed washing liquid flows on the upper surface of the substrate toward the center of the substrate. A liquid flow on the upper surface of the substrate after landing of the washing liquid discharged from the single tube nozzle passes through the center of the substrate.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: January 1, 2019
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: 10163664
    Abstract: A substrate cleaning apparatus (50) that cleans a substrate (S) includes: circumference supporting members (51) that support and rotate the substrate (S); a sponge (541) having a cleaning surface that is brought into contact with the surface to be cleaned of the substrate (S) being rotated by the circumference supporting members (51), and cleans the surface to be cleaned; an arm (53) that moves the sponge (541) in a radial direction of the substrate (S) while maintaining the cleaning surface in contact with the surface to be cleaned; and a controller (60) that controls the contact pressure of the cleaning surface on the surface to be cleaned. When the sponge (541) is located near the edge of the substrate (S), the controller (60) adjusts the contact pressure to a smaller value than that of when the sponge (541) is located near the center of the substrate (S).
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: December 25, 2018
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: 10090189
    Abstract: A substrate cleaning apparatus capable of removing particles that exist in minute recesses formed on a substrate surface is disclosed. The substrate cleaning apparatus includes a substrate holder configured to hold a substrate; and a two-fluid nozzle configured to deliver a two-fluid jet onto a surface of the substrate. The two-fluid nozzle includes a first jet nozzle configured to emit a first two-fluid jet and a second jet nozzle configured to emit a second two-fluid jet at a velocity higher than a velocity of the first two-fluid jet, and the second jet nozzle surrounds the first jet nozzle.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: October 2, 2018
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: 10008380
    Abstract: A substrate drying apparatus includes a drying gas nozzle configured so that, assuming that a surface WA of the substrate W is a projection plane, regarding the drying gas flow Gf in the nozzle moving direction Dr, a collision position Gfw with the substrate W is located downstream of a projected discharge position Gfv?, the projected discharge position Gfv? being a discharge position from the drying gas nozzle projected on the projection plane. In a three-dimensional space, the drying gas flow Gf is inclined, such that an angle ? formed by an axis Ga of the drying gas flow Gf and a vertical line Wp of the substrate W is in a range from a half contact angle ?/2 to an angle determined by deducting the half contact angle ?/2 from 90°, the half contact angle ?/2 being a half of the contact angle ?.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: June 26, 2018
    Assignee: EBARA CORPORATION
    Inventors: Tomoatsu Ishibashi, Takahiro Ogawa, Kenichi Sugita, Shinji Kajita, Koichi Fukaya, Akira Nakamura
  • Patent number: 10002778
    Abstract: A substrate cleaning apparatus includes outer circumference supporting members 32 that support the outer circumference of a rotating substrate W, a swing cleaning member 34 that swings between a first peripheral position B and a second peripheral position B? of the substrate W while passing a center portion A of the substrate W to clean a front surface of the rotating substrate W, and an elongated supporting member 36 that extends long from a third peripheral position C to a fourth peripheral position C? of the substrate W so as to pass the center portion A and supports the rear surface of the rotating substrate W. The first peripheral position B is disposed between a position D of the outer circumference supporting member 32 of the plurality of outer circumference supporting members 32 and closest to the third peripheral position C and the third peripheral position C.
    Type: Grant
    Filed: June 10, 2015
    Date of Patent: June 19, 2018
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Publication number: 20180126422
    Abstract: A cleaning member 10, for use in cleaning a substrate W, comprises: a tip surface 13 configured to be in contact with the substrate W when cleaning the substrate W, and the tip surface 13 being not covered with a skin layer 11; and a circumferential part having a covered part 16, which is disposed on the base end side and a circumferential surface of which is covered with the skin layer 11, and an exposed part 17, which is disposed on the tip end side and a circumferential surface of which is not covered with the skin layer 11.
    Type: Application
    Filed: February 13, 2017
    Publication date: May 10, 2018
    Inventor: Tomoatsu ISHIBASHI
  • Publication number: 20180068877
    Abstract: According to one embodiment, a substrate cleaning apparatus that cleans a substrate while rotating the substrate, the substrate cleaning apparatus includes: a first cleaning liquid supplier that sprays cleaning liquid in a spray shape at a first spraying angle toward a center of the substrate; and a second cleaning liquid supplier that sprays cleaning liquid in a spray shape at a second spraying angle greater than the first spraying angle toward an area between the center of the substrate and an edge of the substrate.
    Type: Application
    Filed: August 29, 2017
    Publication date: March 8, 2018
    Applicant: Ebara Corporation
    Inventor: Tomoatsu ISHIBASHI
  • Patent number: 9824903
    Abstract: A substrate cleaning apparatus including a self-cleaning device is disclosed. The substrate cleaning apparatus includes a self-cleaning device configured to clean a cylindrical scrub-cleaning tool that is rubbed against a substrate surface. The self-cleaning device includes a cleaning body having an inner circumferential surface that is shaped along an circumferential surface of the scrub-cleaning tool, and at least one cleaning nozzle configured to eject a cleaning fluid toward the circumferential surface of the scrub-cleaning tool through a gap between the circumferential surface of the scrub-cleaning tool and the inner circumferential surface of the cleaning body.
    Type: Grant
    Filed: April 23, 2014
    Date of Patent: November 21, 2017
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Publication number: 20170323809
    Abstract: A substrate washing device includes a substrate holding mechanism 70 that holds a substrate W, a substrate rotating mechanism 72 that rotates the substrate W held by the substrate holding mechanism 70, and a two-fluid nozzle 46 that ejects a two-fluid jet toward a surface of the rotating substrate W. The two-fluid nozzle 46 is formed of a conductive material. Accordingly, the electrification amount of droplets ejected as the two-fluid jet from the two-fluid nozzle 46 can be suppressed.
    Type: Application
    Filed: May 8, 2017
    Publication date: November 9, 2017
    Inventors: Koichi FUKAYA, Tomoatsu ISHIBASHI, Hisajiro NAKANO
  • Publication number: 20170316960
    Abstract: A substrate cleaning apparatus (50) that cleans a substrate (S) includes: circumference supporting members (51) that support and rotate the substrate (S); a sponge (541) having a cleaning surface that is brought into contact with the surface to be cleaned of the substrate (S) being rotated by the circumference supporting members (51), and cleans the surface to be cleaned; an arm (53) that moves the sponge (541) in a radial direction of the substrate (S) while maintaining the cleaning surface in contact with the surface to be cleaned; and a controller (60) that controls the contact pressure of the cleaning surface on the surface to be cleaned. When the sponge (541) is located near the edge of the substrate (S), the controller (60) adjusts the contact pressure to a smaller value than that of when the sponge (541) is located near the center of the substrate (S).
    Type: Application
    Filed: October 20, 2015
    Publication date: November 2, 2017
    Inventor: Tomoatsu ISHIBASHI
  • Publication number: 20170316959
    Abstract: A substrate cleaning roll that has a cylindrical shape and scrubs a surface of a substrate by rotating about a rotational axis in a longitudinal direction in contact with the substrate, the longitudinal direction being parallel to the surface of the substrate, the substrate cleaning roll including a bevel cleaner at least at one end of the substrate cleaning roll in the longitudinal direction, the bevel cleaner including a sloping surface to be in contact with an outermost edge of a bevel portion at a rim of the substrate when the substrate cleaning roll comes into contact with the substrate and cleans the surface of the substrate.
    Type: Application
    Filed: October 20, 2015
    Publication date: November 2, 2017
    Applicant: Ebara Corporation
    Inventor: Tomoatsu ISHIBASHI
  • Patent number: D799768
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: October 10, 2017
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: D800401
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: October 17, 2017
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: D805268
    Type: Grant
    Filed: October 12, 2016
    Date of Patent: December 12, 2017
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi
  • Patent number: D822926
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: July 10, 2018
    Assignee: EBARA CORPORATION
    Inventor: Tomoatsu Ishibashi