Patents by Inventor Tomohiro Itoh

Tomohiro Itoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080245513
    Abstract: A tube for a heat exchanger is constructed of a single plate having one end portion and the other end portion in a width direction perpendicular to a tube longitudinal direction. The single plate having opposite first and second wall surfaces is bent to have a protruding portion at a position adjacent to the one end portion in the width direction and a contact portion adjacent to the protruding portion in the width direction. The protruding portion is configured to continuously extend in the longitudinal direction and to have a protruding tip on a side of the first wall surface, and the protruding tip contacts the first wall surface of a portion along the longitudinal direction. The second wall surface at the one end portion and the contact portion contacts the first wall surface at the other end portion and a position near the other end portion, respectively.
    Type: Application
    Filed: April 2, 2008
    Publication date: October 9, 2008
    Applicant: DENSO CORPORATION
    Inventors: Tomohiro Itoh, Takayuki Nagai
  • Patent number: 7161349
    Abstract: In a magnetic rotation angle sensor for detecting a rotation angle of a detection target, a yoke covers outer circumferences of a magnet and a Hall device. One of the magnet and the magnetic flux density detection device rotates together with the detection target. The Hall IC is radially shifted from a rotation center of the detection target. The magnetic flux density detection device has a detection surface that is in parallel to one of a tangential direction and a normal direction of a turning circle. The magnet is magnetized in the one of the tangential direction and the normal direction of the turning circle.
    Type: Grant
    Filed: May 12, 2006
    Date of Patent: January 9, 2007
    Assignee: Denso Corporation
    Inventors: Tomohiro Itoh, Takamitsu Kubota, Yoshiyuki Kono
  • Publication number: 20060261804
    Abstract: In a magnetic rotation angle sensor for detecting a rotation angle of a detection target, a yoke covers outer circumferences of a magnet and a Hall device. One of the magnet and the magnetic flux density detection device rotates together with the detection target. The Hall IC is radially shifted from a rotation center of the detection target. The magnetic flux density detection device has a detection surface that is in parallel to one of a tangential direction and a normal direction of a turning circle. The magnet is magnetized in the one of the tangential direction and the normal direction of the turning circle.
    Type: Application
    Filed: May 12, 2006
    Publication date: November 23, 2006
    Applicant: DENSO CORPORATION
    Inventors: Tomohiro Itoh, Takamitsu Kubota, Yoshiyuki Kono
  • Patent number: 6891914
    Abstract: The absorbing rods have a nearly the same shape as the shape of columnar control rods for PWR used in reactivity control of core in a reactor. The absorbing rods can shield neutrons, and are inserted in control rod guide pipes and measuring pipes in fuel assemblies.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: May 10, 2005
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Kiichiro Sakashita, Tomohiro Itoh, Katsunari Ohsono, Suguru Hode
  • Patent number: 5130690
    Abstract: A photoconductor which has an active layer including channels of ultrafine wire structures each having cross sectional lengths comparable to an electron de Broglie wavelength is provided. The photoconductor has a high gain and a considerably increased response speed. The electric current of the photoconductor may also be increased by introducing a superlattice structure.
    Type: Grant
    Filed: December 5, 1989
    Date of Patent: July 14, 1992
    Assignee: NEC Corporation
    Inventors: Yuji Ando, Tomohiro Itoh
  • Patent number: 4866490
    Abstract: A field effect transistor comprises a gate electrode applied with a gate voltage, a channel forming region forming a channel in response to the gate voltage, and source and drain regions formed on both sides of the channel forming region, respectively, the channel forming region being made of a semiconductor material having an electron affinity which decreases as the distance from one surface thereof increases. The channel is formed at the surface of the channel forming region. An additional semiconductor material having an electron affinity lower than the electron affinity at the surface of the channel forming region may be interposed between the gate electrode and the channel forming region.
    Type: Grant
    Filed: September 28, 1987
    Date of Patent: September 12, 1989
    Assignee: NEC Corporation
    Inventor: Tomohiro Itoh
  • Patent number: 4837605
    Abstract: For improvement in gate leakage current, there is disclosed a hetero-MIS gate type field effect transistor comprising (a) an indium-phosphide semi-insulating substrate, (b) an indium-phosphide active layer formed on a surface of the semi-insulating substrate, (c) an aluminum-gallium-arsenide layer formed on a surface of the indium-phosphide active layer, (d) a metal gate electrode formed on the aluminum-gallium-arsenide layer, and (e) source and drain electrodes formed on the indium-phosphide active layer and located at the both sides of the metal gate electrode, and the aluminum-gallium-arsenide layer has the highest aluminum atom composition at the upper surface portion contacting the metal gate electrode and the lowest aluminum atom composition at the lower surface portion contacting the indium-phosphide active layer, so that a discontinuity takes place between the indium-phosphide active layer and the aluminum-gallium-arsenide layer and a higher Schottky barrier is provided between the aluminum-gallium-ar
    Type: Grant
    Filed: December 9, 1987
    Date of Patent: June 6, 1989
    Assignee: NEC Corporation
    Inventors: Kensuke Kasahara, Tomohiro Itoh, Keiichi Ohata
  • Patent number: 4829346
    Abstract: A field-effect transistor comprises a semi-insulating InP substrate, a strained buffer layer of Al.sub.X Ga.sub.1-X As grown on the substrate, and an active layer of GaAs. The active layer is eased in regard to the influence of the lattice mismatching between the active layer and substrate. Such a field-effect transistor is associated with an optical device in a monolithic manner on a common semi-insulating InP substrate.
    Type: Grant
    Filed: January 5, 1988
    Date of Patent: May 9, 1989
    Assignee: NEC Corporation
    Inventors: Kensuke Kasahara, Tomoji Terakado, Yasumasa Inomoto, Akira Suzuki, Tomohiro Itoh
  • Patent number: 4740822
    Abstract: A field effect transistor comprises a gate electrode applied with a gate voltage, a channel forming region forming a channel in response to the gate voltage, and source and drain regions formed on both sides of the channel forming region, respectively, the channel forming region being made of a semiconductor material having an electron affinity which decreases as the distance from one surface thereof increases. The channel is formed at the surface of the channel forming region. An additional semiconductor material having an electron affinity lower than the electron affinity at the surface of the channel forming region may be interposed between the gate electrode and the channel forming region.
    Type: Grant
    Filed: April 18, 1985
    Date of Patent: April 26, 1988
    Assignee: NEC Corporation
    Inventor: Tomohiro Itoh