Abstract: Disclosed is a thermoacoustic engine having: resonance pipes including a working gas; motors; and a branch pipe, where each of the motors has a regenerator, a heater, and a cooler, a temperature gradient is given between both ends of the regenerator to generate self-excited oscillation of the working gas, a channel cross-sectional area of the resonance pipe that is coupled to the heater is expanded by a same amplification factor of a work flow based on the self-excited oscillation or by an amplification factor within a range of ±30% of the amplification factor of the work flow to a channel cross-sectional area of a resonance pipe that is coupled to the cooler, and a channel cross-sectional area of the regenerator is set by 4 to 36 times of the channel cross-sectional area of the resonance pipe that is coupled to the cooler.

Abstract: A coating and developing apparatus includes: first and second transfer mechanisms for transferring a substrate from a first mount module to a second mount module, one of the first and second transfer mechanisms being selected each time when the substrate transfer should be performed; first and second processing modules for performing substrate processing, for which the transfer of substrates is performed by the first and second transfer mechanisms, respectively; and a control unit. The control unit controls the transfer mechanisms for the substrate transfer by determining a delay time, representing a delay caused by the transfer of the substrate to the second mount module to the timing of transfer of a substrate from the first/second processing module, in regard to each of the first and second transfer mechanisms and selecting one of the first and second transfer mechanisms whose delay time is the shortest.

Abstract: A coating and developing apparatus forms a coating film including a resist film on a substrate and performs developing on the substrate after exposure and a plurality of unit blocks performing the same processing each includes plural kinds of processing modules. A control unit outputs a control signal to perform preparing individual conveying schedules for the one substrate according to the condition when the one substrate distributed into unit blocks is conveyed in the unit blocks, respectively, obtaining a residence time until the one substrate is conveyed in each unit block and is then conveyed out; and conveying the one substrate in the unit block having the shortest residence time and conveying the substrate based on the individual conveying schedules.

Abstract: A first transfer apparatus unloads and transfers substrates from a cassette. A first accommodating unit accommodates the substrates. First substrate processing units divided into at least two groups and arranged in a height direction performs a process to the substrates. Second accommodating units respectively corresponding to the groups are arranged to be parallel with the first accommodating unit in the height direction. Second transfer apparatuses respectively corresponding to the groups unload and transfer the substrates from the second accommodating units corresponding to the same groups into the first substrate processing units of the same groups. Second substrate processing units respectively corresponding to the groups are arranged to be parallel with the first and second accommodating units in the height direction.

Abstract: A substrate processing apparatus is provided with: a detection unit that detects a factor for which interlock is applied to one or more of a plurality of modules and outputs a detection signal; interlocking management unit that, based on the detection signal output from the detecting units, applies interlock to the module to be interlocked if the factor has been occurred; and an alarm management unit that determines parent-child relationships between a parent alarm indicating that the factor for which interlock is applied has been detected, and child alarms each indicating that interlock has been applied to each module, and causes a display unit to display in a grouped manner the parent alarm and the child alarm or alarms having the parent-child relationship.

Abstract: A disposable diaper includes a waist opening and a pair of leg openings with a composite stretchable member. The composite stretchable member includes first and second nonwoven fabric sheet parts and elastic members arranged therebetween. Each of the first and second nonwoven fabric sheet parts is provided with a plurality of convex-concave regions including convex and concave parts. At least one non-shaped region separates the convex-concave regions from each other in the longitudinal direction. The first and second nonwoven fabric sheet parts are overlaid so that the convex-concave regions of the first nonwoven fabric sheet part and the second nonwoven fabric sheet part adjoin each other and the non-shaped regions of the first nonwoven fabric sheet part and the second nonwoven fabric sheet part are separated from each other and are joined with each other by an adhesive applied to the elastic members.

Abstract: A substrate processing system 10 includes a multiple number of substrate processing units 40A and 40B having substrate processing modules 40a and 40b, respectively; substrate buffers 30a and 30b which respectively correspond to the substrate processing units 40A and 40B; and a first substrate transfer device 50 configured to take out substrates W from substrate receptacles 20 on substrate mounting tables 25 into substrate buffers 30a and 30b. When a second substrate transfer device 60b of the substrate processing unit 40B is broken down, a substrate W remaining in the substrate buffer 30b corresponding to the substrate processing unit 40B is delivered into the substrate buffer 30a corresponding to the substrate processing unit 40A by a substrate delivery device 35.

Abstract: A first transfer apparatus unloads and transfers substrates from a cassette. A first accommodating unit accommodates the substrates. First substrate processing units divided into at least two groups and arranged in a height direction performs a process to the substrates. Second accommodating units respectively corresponding to the groups are arranged to be parallel with the first accommodating unit in the height direction. Second transfer apparatuses respectively corresponding to the groups unload and transfer the substrates from the second accommodating units corresponding to the same groups into the first substrate processing units of the same groups. Second substrate processing units respectively corresponding to the groups are arranged to be parallel with the first and second accommodating units in the height direction.

Abstract: A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier.

Abstract: A coating and developing apparatus forms a coating film including a resist film on a substrate and performs developing on the substrate after exposure and a plurality of unit blocks performing the same processing each includes plural kinds of processing modules. A control unit outputs a control signal to perform preparing individual conveying schedules for the one substrate according to the condition when the one substrate distributed into unit blocks is conveyed in the unit blocks, respectively, obtaining a residence time until the one substrate is conveyed in each unit block and is then conveyed out; and conveying the one substrate in the unit block having the shortest residence time and conveying the substrate based on the individual conveying schedules.

Abstract: A coating and developing apparatus includes: first and second transfer mechanisms for transferring a substrate from a first mount module to a second mount module, one of the first and second transfer mechanisms being selected each time when the substrate transfer should be performed; first and second processing modules for performing substrate processing, for which the transfer of substrates is performed by the first and second transfer mechanisms, respectively; and a control unit. The control unit controls the transfer mechanisms for the substrate transfer by determining a delay time, representing a delay caused by the transfer of the substrate to the second mount module to the timing of transfer of a substrate from the first/second processing module, in regard to each of the first and second transfer mechanisms and selecting one of the first and second transfer mechanisms whose delay time is the shortest.

Abstract: A substrate processing unit 14 includes processing modules 2 each performing a process on a substrate, and a substrate transfer device 121 is provided between a mounting unit 11 and the processing modules. A parameter storage unit 3 stores sets of transfer parameter 33 where an operating speed of the substrate transfer device corresponds to a processing number of substrates per a unit time. A parameter selecting unit 4 compares a processing number of substrates per a unit time determined based on a recipe 31 corresponding to the process, with those corresponding to the transfer parameters and selects a transfer parameter corresponding to the minimum processing number of substrates among the processing numbers of substrates equal to or larger than that determined based on the recipe. A transfer control units 151 to 153 control the substrate transfer device based on a set value of the selected transfer parameter.

Abstract: Disclosed is a thermoacoustic engine having: resonance pipes including a working gas; motors; and a branch pipe, where each of the motors has a regenerator, a heater, and a cooler, a temperature gradient is given between both ends of the regenerator to generate self-excited oscillation of the working gas, a channel cross-sectional area of the resonance pipe that is coupled to the heater is expanded by a same amplification factor of a work flow based on the self-excited oscillation or by an amplification factor within a range of ±30% of the amplification factor of the work flow to a channel cross-sectional area of a resonance pipe that is coupled to the cooler, and a channel cross-sectional area of the regenerator is set by 4 to 36 times of the channel cross-sectional area of the resonance pipe that is coupled to the cooler.

Abstract: A substrate processing apparatus is provided with: a detection unit (41a through 41d) that detects a factor for which interlock is applied to one or more of a plurality of modules and outputs a detection signal; interlocking means (42 and 43a through 43c) that, based on the detection signal output from the detecting units, applies interlock to the module to be interlocked if the factor has been occurred; and an alarm management unit (4) that determines parent-child relationships between a parent alarm indicating that the factor for which interlock is applied has been detected, and child alarms each indicating that interlock has been applied to each module, and causes a display unit (5) to display in a grouped manner the parent alarm and the child alarm or alarms having the parent-child relationship.

Abstract: A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode.

Abstract: A substrate processing system 10 includes a multiple number of substrate processing units 40A and 40B having substrate processing modules 40a and 40b, respectively; substrate buffers 30a and 30b which respectively correspond to the substrate processing units 40A and 40B; and a first substrate transfer device 50 configured to take out substrates W from substrate receptacles 20 on substrate mounting tables 25 into substrate buffers 30a and 30b. When a second substrate transfer device 60b of the substrate processing unit 40B is broken down, a substrate W remaining in the substrate buffer 30b corresponding to the substrate processing unit 40B is delivered into the substrate buffer 30a corresponding to the substrate processing unit 40A by a substrate delivery device 35.

Abstract: A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier.

Abstract: A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier.

Abstract: A plurality of process modules for conducting processes on a wafer; conveying modules for conveying the wafer, a turnout module for transferring the wafer to/from the conveying module, and a CPU for detecting a trouble occurring in the process module and centrally controlling each of the modules based on a detection signal. When the controller detects the trouble occurring in any one of the process modules, the wafer to be conveyed to the process module where the trouble occurs is conveyed to the turnout module, and conveyance of the wafer before the process module where the trouble occurs is temporarily stopped, and conveyance and processing of the other wafer are continued, and thereafter, conveyance and processing of the wafer before the process module where the trouble occurs are conducted.

Abstract: A coating and developing system and control method is provided. The system and control method curtails the amount of time for which a substrate is held with no purpose while improving the throughput of the coating and developing system. An inspection station through which a substrate processed in a processing station is transferred to a carrier station includes a plurality of different inspection modules respectively taking different inspection times, a buffer unit for temporarily holding a substrate and a substrate carrying means controlled by a controller. When the inspection module is engaged in inspecting a substrate, the substrate carrying means carries another substrate to be inspected by the same inspection module to the buffer unit and the substrate is held in the buffer unit. Thus, the holding of wafers in the inspection modules can be suppressed and the throughput can be improved.