Abstract: There is provided an electro-conductive belt including a resin material and conductive particles, the electro-conductive belt including: an innermost layer that contains none of the conductive particles; a first conductive layer that is adjacent to the innermost layer at an outer side thereof, a concentration of the conductive particles being highest in the first conductive layer; and a second conductive layer that is adjacent to the first conductive layer at an outer side thereof, the second conductive layer containing the conductive particles in a concentration lower than in the first conductive layer and higher than in the innermost layer.

Abstract: A tubular body 101 includes a layer containing a resin and conductive particles 112, the layer having a first region 111C that is free of conductive particles and lies at the outermost surface, and a second region 111B that has higher conductivity than other regions and lies closer to the innermost surface than the first region. A coating film of a coating liquid containing the conductive particles and resin material is dried, and then an eluting solvent for eluting the resin material from the film is applied thereto. As a result of this, the conductive particles are localized in the coating film at the side coated with the eluting solvent. Thereafter, upon drying the eluting solvent, the resin material dissolved in the eluting solvent deposits on the region where the conductive particles are localized, whereby a particle-free resin region free of the conductive particles is formed.

Abstract: An Escherichia bacterium having dihydrodipicolinate synthase and aspartokinase, both of which are desensitized to feedback inhibition by L-lysine. The intracellular activity of dihydrodipicolinate reductase in this bacterium can also be enhanced. Furthermore, a diaminopimelate dehydrogenase gene can be introduced into this bacterium, or intracellular activities of tetrahydrodipicolinate succinylase and succinyl diaminopimelate deacylase can be enhanced. Finally, the intracellular activities of aspartate-semialdehyde dehydrogenase or phosphoenolpyruvate carboxylase can be enhanced in this bacterium. The bacterium can be cultured in a suitable medium to produce and accumulate L-lysine in culture, and the L-lysine is collected from the culture.

Abstract: An Escherichia bacterium (1) which harbors dihydrodipicolinate synthase of which feedback inhibition by L-lysine is desensitized and aspartokinase of which feedback inhibition by L-lysine is desensitized, (2) in which intracellular activity of dihydrodipicolinate reductase is enhanced, and (3) in which a diaminopimelate dehydrogenase gene is introduced or intracellular activities of tetrahydrodipicolinate succinylase and succinyl diaminopimelate deacylase are enhanced, wherein intracellular activity of aspartate-semialdehyde dehydrogenase or phosphoenolpyruvate carboxylase is enhanced, is cultured in a suitable medium to produce and accumulate L-lysine in culture, and the L-lysine is collected from the culture.

Abstract: A variety of compositions that are particularly applicable for removing one or more of resist, etching residue, planarization residue, and copper oxide from a substrate comprising copper and a low-k dielectric material are described. The resist, residues, and copper oxide are removed by contacting the substrate surface with the composition, typically for a period of 30 seconds to 30 minutes, and at a temperature between 25° and 45° C. The composition includes a fluoride-providing component; at least 1% by weight of a water miscible organic solvent; an organic acid; and at least 81% by weight water. Typically the composition further includes up to about 0.4% of one or more chelators.

Abstract: A method and an apparatus for removing dissolved organic substances from an oily water obtained as a by-product from an oilfield, characterized in that an oily water obtained as a by-product from an oilfield by separating a crude oil from a crude oil/brine mixture is brought into contact with an adsorbent to adsorptively remove organic substances dissolved in the water containing oil suspended therein and that the adsorbent is regenerated.

Abstract: An image forming apparatus belt includes a belt main body; a guiding member that is fixed to the belt main body along at least a side edge on one side of the belt main body; and a detected portion for position detection that is provided in a slit of the guiding member.

Abstract: A bacterium belonging to the genus Escherichia which has an ability to produce L-lysine or L-threonine and which is modified so that a malic enzyme does not function normally in a cell, and a method for producing L-lysine or L-threonine, comprising culturing the bacterium in a medium to produce and cause accumulation of L-lysine or L-threonine, and collecting the L-lysine or L-threonine from the medium.

Abstract: The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.

Abstract: There is disclosed a method for producing an L-amino acid, for example L-threonine, L-lysine, L-histidine, L-phenylalanine, L-arginine, L-tryptophan or L-glutamic acid, using a bacterium of the Enterobacteriaceae family, wherein the bacterium has been modified to enhance an activity of L-arabinose permease.

Abstract: A solid sample fabricating method includes preparing a specimen containing a first substance, which is in a liquid phase at normal temperature and normal pressure, and a second substance different from the first substance, which is in a solid or a liquid phase at the normal temperature and the normal pressure, the second substance being dispersed in the first substance, and attaching the specimen as a droplet to a surface of a cooled stage, whereby an entire region to be observed is converted into an amorphous state.

Abstract: The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.

Abstract: One example of a separation-material composition for a photo-resist according to the present invention comprises 5.0 weight % of sulfamic acid, 34.7 weight % of H2O, 0.3 weight % of ammonium 1-hydrogen difluoride, 30 weight % of N,N-dimethylacetamide and 30 weight % of diethylene glycol mono-n-buthyl ether. Another example of a separation-material composition for a photo-resist according to the present invention comprises 1-hydroxyethylidene-1, 3.0 weight % of 1-diphosphonic acid, 0.12 weight % of ammonium fluoride, 48.38 weight % of H2O and 48.5 weight % of diethylene glycol mono-n-buthyl ether. The separation-material composition for the photo-resist is mainly used for a medicinal liquid washing liquid/scientific liquid in order to remove the photo-resist residuals and the by-product polymer after an ashing process of a photo-resist mask.

Abstract: One example of a separation-material composition for a photo-resist according to the present invention comprises 5.0 weight % of sulfamic acid, 34.7 weight % of H2O, 0.3 weight % of ammonium 1-hydrogen difluoride, 30 weight % of N,N-dimethylacetamide and 30 weight % of diethylene glycol mono-n-buthyl ether. Another example of a separation-material composition for a photo-resist according to the present invention comprises 1-hydroxyethylidene-1, 3.0 weight % of 1-diphosphonic acid, 0.12 weight % of anmonium fluoride, 48.38 weight % of H2O and 48.5 weight % of diethylene glycol mono-n-buthl ether. The separation-material composition for the photo-resist is mainly used for a medicinal liquid washing liquid/scientific liquid in order to remove the photo-resist residuals and the by-product polymer after an ashing process of a photo-resist mask.

Abstract: A method and a device for removing dissolved organic material in oilfield produced water which are characterized by bringing an adsorbent into contact with oilfield produced water obtained by separation of crude oil from a mixture of crude oil and salt water, adsorbing and removing dissolved organic material in the emulsion, and regenerating the adsorbent.

Abstract: A bacterium belonging to the genus Escherichia which has an ability to produce L-lysine or L-threonine and which is modified so that a malic enzyme does not function normally in a cell, and a method for producing L-lysine or L-threonine, comprising culturing the bacterium in a medium to produce and cause accumulation of L-lysine or L-threonine, and collecting the L-lysine or L-threonine from the medium.

Abstract: The cleaning composition for removing resists includes a salt of hydrofluoric acid and a base not containing a metal (A component), a water-soluble organic solvent (B1 component), at least one organic acid or inorganic acid (C component), water (D component), and, optionally, an ammonium salt (E1 component), and having a pH 4-8. Thus, in manufacturing a semiconductor device, such as a copper interconnecting process, efficiency of removing resist residue and other etching residue after etching or ashing is improved, and corrosion resistance of a copper and an insulating film is also improved.

Abstract: A method for producing a target substance by utilizing a microorganism by culturing the microorganism in a medium to produce and accumulate the target substance in the medium and collecting the target substance from the culture is described. The microorganism is a mutant recombinant strain in which maltose assimilation is controlled by reducing or eliminating the interaction between IIAGlc protein of the glucose PTS and a protein involved in non-PTS uptake of maltose.

Abstract: A variety of compositions that are particularly applicable for removing one or more of resist, etching residue, planarization residue, and copper oxide from a substrate comprising copper and a low-k dielectric material are described. The resist, residues, and copper oxide are removed by contacting the substrate surface with the composition, typically for a period of 30 seconds to 30 minutes, and at a temperature between 25° and 45° C. The composition includes a fluoride-providing component; at least 1% by weight of a water miscible organic solvent; an organic acid; and at least 81% by weight water. Typically the composition further includes up to about 0.4% of one or more chelators.

Abstract: The present invention describes a method for producing a target substance by utilizing a microorganism comprising culturing the microorganism in a medium, allowing the target substance to accumulate, and collecting the target substance from the medium. Also the microorganism used in the present invention is a mutant strain whereby maltose assimilation is controlled by the interaction between IIAGlc protein of glucose PTS and MalK.