Abstract: An optical apparatus includes a light emitting apparatus and a host apparatus. The light emitting apparatus includes a housing extending in a first direction, a light emitting device mounted in the housing, an optical connector including a first optical connection part provided at one end of the housing, and an electrical connector including a first electrical connection part provided at one end of the housing and receiving a voltage to drive the light emitting device. The host apparatus includes a host optical connector including a second optical connection part which faces the first optical connection part and is optically coupled thereto, a host electrical connector including a second electrical connection part facing the first electrical connection part and being electrically connected to the first electrical connection part, and a host board mounting the host optical connector and the host electrical connector thereon.

Abstract: An optical apparatus includes a light emitting apparatus and a host apparatus. The light emitting apparatus includes a housing extending in a first direction, a light emitting device mounted in the housing, an optical connector including a first optical connection part provided at one end of the housing, and an electrical connector including a first electrical connection part provided at one end of the housing and receiving a voltage to drive the light emitting device. The host apparatus includes a host optical connector including a second optical connection part which faces the first optical connection part and is optically coupled thereto, a host electrical connector including a second electrical connection part facing the first electrical connection part and being electrically connected to the first electrical connection part, and a host board mounting the host optical connector and the host electrical connector thereon.

Abstract: The resist composition exhibits higher sensitivity and improved LWR or CDU. The resist composition comprises a base polymer containing repeat units (a) containing a substituted or unsubstituted arylsulfonic acid anion bonded to a polymer backbone having a group containing an iodine atom or a bromine atom and an onium cation.

Abstract: The resist composition has high sensitivity, improved LWR and CDU, high contrast, excellent resolution. A wide process margin can be obtained by using a sulfonium salt or an iodonium salt containing an arylsulfonic acid anion having an aromatic group substituted with a bromine atom or an iodine atom as an acid generator. The resist composition comprising an acid generator containing an onium salt having the following formula (1).

Abstract: A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

Abstract: The present invention is a resist material containing: a repeating unit-a containing at least one iodine atom between a polymer main chain and a carboxylate; and a repeating unit-b, being a sulfonium salt or iodonium salt of a sulfonic acid bonded to a polymer main chain. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a resist composition containing the resist material; and a patterning process.

Abstract: The present invention is a resist material containing a repeating unit-a containing a sulfonium salt or iodonium salt of a monovalent aromatic carboxylic acid that is iodinated, is substituted or unsubstituted, and is bonded to a polymer main chain via an ester bond. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a resist composition containing the resist material; a patterning process; and a monomer to be an ingredient for the resist material.

Abstract: The present invention is a monomer represented by the following general formula (a)-1M or (a)-2M. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a monomer to be an ingredient for the resist material; a resist composition containing the resist material; and a patterning process.

Abstract: A resist composition includes a base polymer and a quencher containing a salt compound having the formula (A): wherein m1 is an integer of 1 or 2, m2 is an integer of 1 to 3, n is an integer of 1 to 3, j is an integer of 1 to 3, k is an integer of 1 or 2, XBI is iodine or bromine, and Ak? is a carboxylic acid anion, a sulfonimide anion free of fluorine, or a sulfonamide anion.

Abstract: A chemically amplified resist composition comprising a quencher in the form of an amine compound of specific structure is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition contains an acid generator which is a sulfonium or iodonium salt containing a sulfonic acid anion having a cyclic structure and a fluorosulfonic acid site which are linked by a linker. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a polymer or polymer-bound photoacid generator is provided, the polymer comprising repeat units derived from a sulfonium or iodonium salt having a urethane, thiourethane or urea bond in a linker between a polymerizable unsaturated bond and a fluorosulfonic acid site. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a polymer is provided, the polymer comprising photo-decomposable repeat units derived from a sulfonium salt having a polymerizable unsaturated bond, a sulfonium cation site, and a link therebetween, the link having a urethane bond, thiourethane bond or urea bond. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has advantages including solvent solubility and improved lithography properties such as high sensitivity, high contrast, EL, and LWR when processed by photolithography using high-energy radiation.

Abstract: Provided is a novel onium salt used for a resist composition that has high sensitivity and excellent resolution, improved LWR and CDU, and that can inhibit collapse of a resist pattern for both of positive-type and negative-type resists in lithography: an onium salt represented by the following general formula (1), wherein RALU represents any one of a tertiary ether, tertiary carbonate, or acetal formed together with the adjacent oxygen atom and having a cyclic structure; RF represents any one of a fluorine atom, a fluorine-containing alkyl group having 1 to 6 carbon atoms, and a nitro group; Ra represents a hydrocarbyl group having 1 to 20 carbon atoms; n1 represents an integer of 0 or 1; n2 and n3 represent an integer of 1 or 2; one of RF and one of —O—RALU are bonded to carbon atoms adjacent to each other; n4 represents an integer of 0 to 3; and Z+ represents an onium cation.

Abstract: A resist composition comprising a sulfonium salt of carboxylic acid having a chromone structure as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a sulfonium salt of carboxylic acid having a coumarin or thiocoumarin structure as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: An onium salt compound consisting of a sulfonate anion having the structure that a polymerizable unsaturated bond is linked to an iodized aromatic group via a carbon chain of two or more carbon atoms and a sulfonium or iodonium cation is provided. A resist composition comprising a polymer comprising repeat units derived from the onium salt has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a base polymer and a quencher containing a compound having the formula (A) is provided.