Patents by Inventor Tomonori Ueno

Tomonori Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140294662
    Abstract: The present invention has the ultimate purpose of obtaining cutlery having marked characteristics such as high hardness and high toughness, and provides an intermediate material, an annealed material, and a cold-rolled steel strip for stainless steel for cutlery, and a method for manufacturing them to achieve the purpose. Provided is an intermediate material for stainless steel for cutlery, the intermediate material being a material after hot rolling but before annealing, having a composition, in terms of % by mass, of from 0.46 to 0.72% C, from 0.15 to 0.55% Si, from 0.45 to 1.00% Mn, from 12.5 to 13.9% Cr, from 0 to 1.5% Mo, from 0 to 0.
    Type: Application
    Filed: September 14, 2012
    Publication date: October 2, 2014
    Applicant: HITACHI METALS, LTD.
    Inventors: Tomonori Ueno, Goh Yoshiyama, Ichiro Kishigami
  • Patent number: 8012235
    Abstract: A process for producing a low-oxygen metal powder, comprising passing a raw metal powder coated by hot melting of a hydrocarbon organic compound through thermal plasma flame composed mainly of an inert gas so as to reduce the content of oxygen in the raw metal powder. Preferably, the obtained metal powder is subjected to heat treatment in vacuum or hydrogen atmosphere. Preferred example of the hydrocarbon organic compound is stearic acid.
    Type: Grant
    Filed: April 14, 2006
    Date of Patent: September 6, 2011
    Assignee: Hitachi Metals, Ltd.
    Inventors: Hiroshi Takashima, Gang Han, Shujiroh Uesaka, Tomonori Ueno
  • Publication number: 20110143168
    Abstract: Disclosed is a Co—Fe alloy for soft magnetic films used in perpendicular magnetic recording media, etc., which maintains high soft magnetic properties and has excellent weather resistance. Disclosed is a Co—Fe alloy for soft magnetic films, which is a Co—Fe alloy the composition formula of which is expressed at atomic ratio as ((Co100?X—FeX)100?Y—NiY)100?(a+b+c)-Mla-M2b-Tic, where 5?X?80, 0?Y?25, 2?a?6, 2?b?10, and 0.5?c?10, the remainder of which is composed of unavoidable impurities, and wherein the element M1 in the aforementioned composition formula is one or two or more elements selected from (Zr, Hf, Y), and the element M2 in the aforementioned composition formula is one or two or more elements selected from (Ta, Nb).
    Type: Application
    Filed: October 30, 2009
    Publication date: June 16, 2011
    Applicant: HITACHI METALS, LTD.
    Inventors: Tomonori Ueno, Jun Fukuoka, Hide Ueno, Mitsuharu Fujimoto
  • Publication number: 20090229412
    Abstract: A process for producing a low-oxygen metal powder, comprising passing a raw metal powder coated by hot melting of a hydrocarbon organic compound through thermal plasma flame composed mainly of an inert gas so as to reduce the content of oxygen in the raw metal powder. Preferably, the obtained metal powder is subjected to heat treatment in vacuum or hydrogen atmosphere. Preferred example of the hydrocarbon organic compound is stearic acid.
    Type: Application
    Filed: April 14, 2006
    Publication date: September 17, 2009
    Inventors: Hiroshi Takashima, Gang Han, Shujiroh Uesaka, Tomonori Ueno
  • Patent number: 7381282
    Abstract: A Co alloy target comprising 1 to 10 atomic % of Zr and 1 to 10 atomic % of Nb and/or Ta, the balance being unavoidable impurities and Co, is produced by rapidly solidifying a melt of the Co alloy to produce an alloy powder, classifying the alloy powder to maximum particle size of 500 ?m or less, and pressure-sintering the classified alloy powder.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: June 3, 2008
    Assignee: Hitachi Metals, Ltd.
    Inventors: Tomonori Ueno, Hide Ueno, Hiroshi Takashima, Mitsuharu Fujimoto
  • Publication number: 20080083616
    Abstract: The present invention relates to a Co—Fe—Zr based alloy target material for forming a soft magnetic film of the Co—Fe—Zr based alloy used in a perpendicular magnetic recording medium, and provides a Co—Fe—Zr based alloy target material having a low magnetic permeability and good sputtering characteristics and a process for producing this target material. A Co—Fe—Zr based alloy sputtering target material represented by the compositional formula based on the atomic ratio: (Cox—Fe100-X)100-(Y+Z)—ZrY-MZ (20?X?70, 2?Y?15 and 2?Z?10) in which the element(s) M is one or more elements selected from the group consisting of Ti, V, Nb, Ta, Cr, Mo, W, Si, Al and Mg, wherein a phase composed of HCP-Co and an alloy phase composed mainly of Fe are finely dispersed in the microstructure of the target material.
    Type: Application
    Filed: October 9, 2007
    Publication date: April 10, 2008
    Applicant: HITACHI METALS, LTD.
    Inventors: Jun Fukuoka, Hiroshi Takashima, Tomonori Ueno, Mitsuharu Fujimoto, Hide Ueno
  • Patent number: 7141208
    Abstract: An Fe—Co—B alloy target, in which the largest inscribed circle depictable in regions containing no boride phases in its cross-sectional microstructure has a diameter of 30 ?m or less. Its composition is represented by (FeXCo100?X)100?YBY (by atomic percentage), wherein 5?X?95, and 5?Y?30.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: November 28, 2006
    Assignee: Hitachi Metals, Ltd.
    Inventors: Hide Ueno, Tomonori Ueno, Shinichiro Yokoyama
  • Patent number: 7135141
    Abstract: A method of manufacturing a sintered body, in which a material powder composed of metallic powder or alloy powder, a getter material having a higher oxidation potential than that of the material powder, and a hydride, which constitutes a hydrogen source, are sealed under reduced pressure in a metallic container, and subjected to pressurized sintering while being heated. The pressurized sintering is performed by keeping the metallic container at pressure not higher than 50 MPa and at temperature not lower than 500° C. for 1 to 50 hours, and then sintering the metallic powder and the alloy powder at pressure higher than 50 MPa and at temperature not higher than 1340° C.
    Type: Grant
    Filed: March 29, 2004
    Date of Patent: November 14, 2006
    Assignee: Hitachi Metals, Ltd.
    Inventors: Gang Han, Tomonori Ueno, Eiji Hirakawa, Shujiro Uesaka
  • Publication number: 20050223848
    Abstract: A Co alloy target comprising 1 to 10 atomic % of Zr and 1 to 10 atomic % of Nb and/or Ta, the balance being unavoidable impurities and Co, is produced by rapidly solidifying a melt of the Co alloy to produce an alloy powder, classifying the alloy powder to maximum particle size of 500 ?m or less, and pressure-sintering the classified alloy powder.
    Type: Application
    Filed: April 5, 2005
    Publication date: October 13, 2005
    Inventors: Tomonori Ueno, Hide Ueno, Hiroshi Takashima, Mitsuharu Fujimoto
  • Publication number: 20050011308
    Abstract: An Fe—Co—B alloy target, in which the largest inscribed circle depictable in regions containing no boride phases in its cross-sectional microstructure has a diameter of 30 ?m or less. Its composition is represented by (FeXCo100?X)100?YBY (by atomic percentage), wherein 5?X?95, and 5?Y?30.
    Type: Application
    Filed: April 28, 2004
    Publication date: January 20, 2005
    Inventors: Hide Ueno, Tomonori Ueno, Shinichiro Yokoyama
  • Publication number: 20040191108
    Abstract: A method of manufacturing a sintered body, in which a material powder composed of metallic powder or alloy powder, a getter material having a higher oxidation potential than that of the material powder, and a hydride, which constitutes a hydrogen source, are sealed under reduced pressure in a metallic container, and subjected to pressurized sintering while being heated. The pressurized sintering is performed by keeping the metallic container at pressure not higher than 50 MPa and at temperature not lower than 500° C. for 1 to 50 hours, and then sintering the metallic powder and the alloy powder at pressure higher than 50 MPa and at temperature not higher than 1340° C.
    Type: Application
    Filed: March 29, 2004
    Publication date: September 30, 2004
    Applicant: HITACHI METALS, LTD.
    Inventors: Gang Han, Tomonori Ueno, Eiji Hirakawa, Shujiro Uesaka
  • Patent number: 6728178
    Abstract: Playback signal amplitude drops and continuity of the signal track amplitude is lost at the beginning the data recording area when data is incrementally written to optical discs such as DVD-R or DVD-RW media. Feed-forward control quickly settles semiconductor laser recording power to the target power level immediately after an incremental recording starts. While recording continues, feedback control maintains laser power at a desired recording power level even when the required current supply varies due to the temperature characteristics of the semiconductor laser when recording lasts for an extended period of time. A semiconductor laser control method and semiconductor laser control device thereby maintain laser power at a stable target recording power level quickly and for as long as recording continues.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: April 27, 2004
    Assignees: Matsushita Electric Industrial Co., Ltd., Victor Company of Japan Limited
    Inventors: Kenji Koishi, Yoshiyuki Miyabata, Makoto Usui, Kohjyu Konno, Yasuhiro Ueki, Tomonori Ueno, Yutaka Osada, Toru Fujimoto
  • Publication number: 20020106297
    Abstract: The invention relates to a Co-base target made of a sintered powder, having a restrained amount of oxygen, and a producing method thereof. The target contains from more than 10 to not more than 25 at % of B and not more than 100 ppm of oxygen. It may contain 30≧Pt≧5 at%, 30≧Cr≧10 at%, 10≧Ta>0 at% and/or 30≧Ni>0 at%. It may contain also from more than 0 (zero) to not more than 15 at% in total of one or more elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and rare earth elements. The target is produced by melting a Co-base alloy together with an additive B in an amount of from more than 10 to not more than 25 at% whereby deoxidizing, rapidly cooling the molten metal to produce an alloy powder and sintering the alloy powder.
    Type: Application
    Filed: November 29, 2001
    Publication date: August 8, 2002
    Applicant: HITACHI METALS, LTD.
    Inventors: Tomonori Ueno, Hideo Murata, Shigeru Taniguchi, Hide Ueno
  • Publication number: 20020070329
    Abstract: Playback signal amplitude drops and continuity of the signal track amplitude is lost at the beginning the data recording area when data is incrementally written to optical discs such as DVD-R or DVD-RW media. Feed-forward control quickly settles semiconductor laser recording power to the target power level immediately after an incremental recording starts. While recording continues, feedback control maintains laser power at a desired recording power level even when the required current supply varies due to the temperature characteristics of the semiconductor laser when recording lasts for an extended period of time. A semiconductor laser control method and semiconductor laser control device thereby maintain laser power at a stable target recording power level quickly and for as long as recording continues.
    Type: Application
    Filed: October 24, 2001
    Publication date: June 13, 2002
    Inventors: Kenji Koishi, Yoshiyuki Miyabata, Makoto Usui, Kohjyu Konno, Yasuhiro Ueki, Tomonori Ueno, Yutaka Osada, Toru Fujimoto
  • Patent number: 6159625
    Abstract: A target for sputter-depositing a B2-structured thin film for an underlayer of a magnetic recording medium. Since the target is made of a sintered body of an intermetallic compound being substantially a B2-ordered lattice structure, the target has a uniform small grain size and a high bending strength. The target produces a thin film with a small grain size and a minimized particle deposition.
    Type: Grant
    Filed: August 6, 1998
    Date of Patent: December 12, 2000
    Assignee: Hitachi Metals Ltd.
    Inventor: Tomonori Ueno