Patents by Inventor Tomoyuki Ando

Tomoyuki Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210283893
    Abstract: A substrate bonding method which enables forming a precision fine space using a method that is simpler and easier than conventional methods; and a laminated body production method that uses the substrate bonding method. This substrate bonding method includes disposing a first substrate on a photoresist pattern formed on a support film so as to bring the first substrate into contact with a surface of the photoresist pattern located on the side opposite to the support film, and pressure-bonding the support film, the photoresist pattern, and the first substrate; releasing the bonded support film after the pressure-bonding; and disposing a second substrate on the photoresist pattern so as to bring the second substrate into contact with the surface of the photoresist pattern located on the side opposite to the first substrate, and pressure-bonding the first substrate, the photoresist pattern, and the second substrate.
    Type: Application
    Filed: September 13, 2017
    Publication date: September 16, 2021
    Inventors: Ryuma MIZUSAWA, Tomoyuki ANDO
  • Patent number: 10472435
    Abstract: Provided is a polymerizable composition including an alkyne compound represented by the following general formula (1): wherein, in general formula (1), X1 and X2 represent a sulfur atom, an oxygen atom, or an NH group and may be the same or different from each other, Q represents an alkylene group having 1 or 2 carbon atoms, a carbonyl group, or a thiophenylene group in which one of carbon atoms is substituted by an antimony atom, R1 and R2 represent an alkylene group having 1 or 2 carbon atoms and may be the same or different from each other, and m and n each represent 0 or 1.
    Type: Grant
    Filed: February 8, 2016
    Date of Patent: November 12, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Masakazu Murakami, Tomoyuki Ando
  • Publication number: 20190235380
    Abstract: A negative type photosensitive resin composition containing an epoxy group-containing resin; a metal oxide; and a cationic polymerization initiator (I). The cationic polymerization initiator (I) contains one or more of a compound represented by Formula (I1) and a compound represented by Formula (I2). In Formula (I1), Rb01 to Rb04 represent an aryl group which may have a substituent or a fluorine atom. In Formula (I2), Rb05represents a fluorinated alkyl group which may have a substituent or a fluorine atom. A plurality of Rb05's may be the same as or different from one another. q represents an integer of 1 or greater, and Q1+'s each independently represent a q-valent organic cation.
    Type: Application
    Filed: August 28, 2017
    Publication date: August 1, 2019
    Inventors: Ryosuke NAKAMURA, Tomoyuki ANDO, Tokunori YAMADAYA
  • Patent number: 10241403
    Abstract: A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of ?3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: March 26, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hirofumi Imai, Tomoyuki Ando
  • Publication number: 20180095366
    Abstract: A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of ?3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.
    Type: Application
    Filed: March 25, 2016
    Publication date: April 5, 2018
    Inventors: Hirofumi IMAI, Tomoyuki ANDO
  • Publication number: 20180066082
    Abstract: Provided is a polymerizable composition including an alkyne compound represented by the following general formula (1): wherein, in general formula (1), X1 and X2 represent a sulfur atom, an oxygen atom, or an NH group and may be the same or different from each other, Q represents an alkylene group having 1 or 2 carbon atoms, a carbonyl group, or a thiophenylene group in which one of carbon atoms is substituted by an antimony atom, R1 and R2 represent an alkylene group having 1 or 2 carbon atoms and may be the same or different from each other, and m and n each represent 0 or 1.
    Type: Application
    Filed: February 8, 2016
    Publication date: March 8, 2018
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Masakazu MURAKAMI, Tomoyuki ANDO
  • Patent number: 9244354
    Abstract: A method for producing a thick film photoresist pattern including laminating a thick photoresist layer including a chemically amplified positive-type photoresist composition for thick film on a support; irradiating the thick photoresist layer; and developing the thick photoresist layer to obtain a thick film resist pattern; in which the composition includes an acid generator, a resin whose alkali solubility increases by the action of an acid, and an organic solvent having a boiling point of at least 150° C. and a contact angle on a silicon substrate of no greater than 18°, in an amount of at least 40% by mass with respect to total mass of the organic solvent.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: January 26, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Washio, Tomoyuki Ando, Eiichi Shimura, Toshiaki Tachi
  • Patent number: 8957341
    Abstract: A gas circuit breaker comprising: a sealed tank; two breaking sections disposed in the sealed tank; a bracket to support movable parts of the breaking sections while enabling switching operation of the movable parts; an insulation cylinder to support the bracket through an electric field relaxation shield; an insulated operating rod disposed in the insulation cylinder movably in the axial direction and an end thereof is connected to an actuator; and a link mechanism connected to other end of the insulated rod and transmits drive force from the actuator to the movable parts of the breaking sections, wherein the electric field relaxation shield is provided with out-side groove and in-side groove on the insulation cylinder respectively, and the out-side groove and in-side groove are formed openings at the link mechanism side respectively, and end of the in-side groove is extended to near the outer surrounding of the insulated operating rod.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: February 17, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Wei Zhang, Masanori Tsukushi, Tomoyuki Ando, Michiru Onodera
  • Patent number: 8815365
    Abstract: A carbon fiber structure and a manufacturing method of the same are provided. The carbon fiber structure includes a carbon fiber-reinforced carbon composite material having carbon fibers and a carbonaceous matrix. The carbon fibers are configured by a substantially linear fiber. The carbon fibers form thin piece bodies in which a longitudinal direction of the carbon fibers is oriented in parallel to a surface direction of the carbon fiber structure within the carbonaceous matrix. The carbon fiber structure is configured by a laminate having the thin piece bodies laminated therein.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: August 26, 2014
    Assignee: Ibiden Co., Ltd.
    Inventors: Hideki Kato, Haruhide Shikano, Tomoyuki Ando
  • Patent number: 8697889
    Abstract: Disclosed is a metal compound represented by the following formula (0): in the formula (0), A represents a thietane ring, or a monovalent group containing a thiol group; B represents a divalent group containing a heteroatom; R2 represents a divalent organic group; n represents the valence of M; p represents an integer of 1 ton; M represents a lanthanoid atom or a barium (Ba) atom when A is a thietane ring, and represents a lanthanoid atom when A is a monovalent group containing a thiol group; or more than Y represents a monovalent inorganic or organic group; when n?p is not less than 2, a plurality of Y's each independently represent a monovalent inorganic or organic group; and when n?p is not less than 2, the plurality of Y's may be bonded with each other to form a ring containing M.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: April 15, 2014
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Mamoru Takashina, Tomoyuki Ando, Seiichi Kobayashi
  • Patent number: 8680295
    Abstract: A process for producing bis(thietanylthio)dithiastannolane of the following formula: involving the reaction of tetrakis(thietanylthio)tin having the following formula: with 1,2-ethandiethiol.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: March 25, 2014
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Seiichi Kobayashi
  • Patent number: 8426551
    Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: April 23, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
  • Patent number: 8420718
    Abstract: The composition of the present invention contains a product having a thiol group obtained by reacting an Sb or Bi oxide or an Sb or Bi halide with at least one kind of polythiol compounds selected from compounds having at least two thiol groups in a molecule.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: April 16, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Tomoyuki Ando, Masakazu Murakami, Mamoru Takashina, Seiichi Kobayashi
  • Patent number: 8394891
    Abstract: The additive for a polymerizable composition according to the present invention contains a compound represented by the general formula (a). In the general formula (a), R represents a saturated hydrocarbon group having 1 to 3 carbon atoms. M represents Sn, Sb, Bi, or Ge. m represents 0 or 1. R and M are not directly bonded when m is 0. n represents an integer of 1 to 3. X represents a monovalent linking group, and a plurality of X may be the same as or different from each other. When two or more linking groups X are bonded with the metal atom M, the linking groups X may combine together to form a ring.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: March 12, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Tomoyuki Ando, Seiichi Kobayashi
  • Publication number: 20130018169
    Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 17, 2013
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
  • Patent number: 8349996
    Abstract: Disclosed is a compound represented by the following general formula (1), wherein, in the formula, M1 represents Sb or Bi; X1 and X2 each independently represent a sulfur atom or an oxygen atom; R1 represents a divalent organic group; Y1 represents a monovalent inorganic or organic group; a represents a number of 1 or 2; b represents a number of 0 or an integer of not less than 1; c represents an integer of not less than 1 and not more than d; d represents a valence of M1; when d?c is not less than 2, a plurality of Y1s each independently represent a monovalent inorganic or organic group and may be bonded to each other to form an M1-containing ring; and e represents a number of 0 or an integer of not less than 1.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: January 8, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Seiichi Kobayashi
  • Patent number: 8329838
    Abstract: Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
    Type: Grant
    Filed: September 17, 2010
    Date of Patent: December 11, 2012
    Assignee: Promerus LLC
    Inventors: Larry F. Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence D. Seger, Keita Ishiduka, Kotaro Endo, Tomoyuki Ando
  • Patent number: 8293864
    Abstract: Disclosed is a metal thietane compound represented by the following general formula (120), (wherein, in the above general formula (120), M is a member selected from the group consisting of Bi, Sb, Ti, Zr and Ta; X1 and X2 are each independently a sulfur atom or an oxygen atom; R1 is a divalent organic group; the bond between M and T shown by a dotted line and a solid line represents a single or double bond; m is an integer of 0 or 1 or more; n is the number of valence of M; and p is an integer of equal to or more than 1 and equal to or less than n, provided that when r is 1, q is 0 and Y is a monovalent inorganic or organic group; when r is 1 and n-p-q is 2 or more, a plurality of Ys contained are each independently selected from monovalent inorganic or organic groups; when r is 1 and n-p-q is 2 or more, a plurality of Ys may be bonded to each other to form a ring containing M; when r is 2, n-p-q is 1 or 2 and Y is a divalent group; when r is 2 and n-p-q is 2, two Ys may form a ring together with two Ms;
    Type: Grant
    Filed: February 19, 2008
    Date of Patent: October 23, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
  • Patent number: 8263322
    Abstract: A method of forming a resist pattern that includes: applying a positive chemically amplified resist composition to a support to form a first resist film, exposing a region on a portion of the first resist film, performing a post exposure bake treatment and then performing developing to form a first resist pattern, and applying a negative chemically amplified resist composition to the support having the first resist pattern formed thereon, thereby forming a second resist film, exposing a region of the second resist film that includes the positions in which the first resist pattern has been formed, performing a post exposure bake treatment at a bake temperature that increases the solubility of the first resist film in an alkali developing solution and decreases the solubility of the second resist film in an alkali developing solution, and then performing developing to form a resist pattern.
    Type: Grant
    Filed: September 29, 2009
    Date of Patent: September 11, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventor: Tomoyuki Ando
  • Patent number: RE45499
    Abstract: The crystalline Polymorph B of N-(2-aminophenyl)-4-[N-(pyridine-3-yl)methoxy-carbonyaminomethyl]benzamide (MS-275) of formula I is described, as well as the process for the production of said compound, and its use as a medicament for the treatment of selected diseases.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: April 28, 2015
    Assignee: Bayer Intellectual Property GmbH
    Inventors: Matthias Schneider, Michael Gottfried, Jens Geisler, Gabriele Winter, Joji Suzuki, Tomoyuki Ando, Masaru Honjo