Abstract: A disclosed drum-type washing machine having a softening apparatus comprises: a cylindrical water tank accommodating laundry and having a rotating drum; a case for accommodating the water tank; and a softening apparatus having a hardness component remover for removing hardness components from washing water, and a regeneration agent accommodation unit spaced apart from the hardness component remover on opposite sides from a center of the tub, and for accommodating a regeneration agent that regenerates a function of the hardness component remover.

Abstract: A conveyance route switching mechanism and a paper sheet handling apparatus that includes the conveyance route switching mechanism include a driving source, a gate, a first gear, and an internal gear. The driving source includes a driving shaft. The gate includes a gate shaft, and a blade that is provided on the gate shaft, and switches conveyance routes of paper sheets. The first gear is provided on the gate shaft. The internal gear meshes with the first gear. According to rotation of the driving shaft, the gate shaft rotates on an axis of the gate shaft, and revolves with the driving shaft as a rotation center while the first gear meshes with the internal gear.

Abstract: A substrate bonding method which enables forming a precision fine space using a method that is simpler and easier than conventional methods; and a laminated body production method that uses the substrate bonding method. This substrate bonding method includes disposing a first substrate on a photoresist pattern formed on a support film so as to bring the first substrate into contact with a surface of the photoresist pattern located on the side opposite to the support film, and pressure-bonding the support film, the photoresist pattern, and the first substrate; releasing the bonded support film after the pressure-bonding; and disposing a second substrate on the photoresist pattern so as to bring the second substrate into contact with the surface of the photoresist pattern located on the side opposite to the first substrate, and pressure-bonding the first substrate, the photoresist pattern, and the second substrate.

Abstract: A negative type photosensitive resin composition containing an epoxy group-containing resin; a metal oxide; and a cationic polymerization initiator (I). The cationic polymerization initiator (I) contains one or more of a compound represented by Formula (I1) and a compound represented by Formula (I2). In Formula (I1), Rb01 to Rb04 represent an aryl group which may have a substituent or a fluorine atom. In Formula (I2), Rb05 represents a fluorinated alkyl group which may have a substituent or a fluorine atom. A plurality of Rb05's may be the same as or different from one another. q represents an integer of 1 or greater, and Qq+'s each independently represent a q-valent organic cation.

Abstract: A substrate bonding method which enables forming a precision fine space using a method that is simpler and easier than conventional methods; and a laminated body production method that uses the substrate bonding method. This substrate bonding method includes disposing a first substrate on a photoresist pattern formed on a support film so as to bring the first substrate into contact with a surface of the photoresist pattern located on the side opposite to the support film, and pressure-bonding the support film, the photoresist pattern, and the first substrate; releasing the bonded support film after the pressure-bonding; and disposing a second substrate on the photoresist pattern so as to bring the second substrate into contact with the surface of the photoresist pattern located on the side opposite to the first substrate, and pressure-bonding the first substrate, the photoresist pattern, and the second substrate.

Abstract: Provided is a polymerizable composition including an alkyne compound represented by the following general formula (1): wherein, in general formula (1), X1 and X2 represent a sulfur atom, an oxygen atom, or an NH group and may be the same or different from each other, Q represents an alkylene group having 1 or 2 carbon atoms, a carbonyl group, or a thiophenylene group in which one of carbon atoms is substituted by an antimony atom, R1 and R2 represent an alkylene group having 1 or 2 carbon atoms and may be the same or different from each other, and m and n each represent 0 or 1.

Abstract: A negative type photosensitive resin composition containing an epoxy group-containing resin; a metal oxide; and a cationic polymerization initiator (I). The cationic polymerization initiator (I) contains one or more of a compound represented by Formula (I1) and a compound represented by Formula (I2). In Formula (I1), Rb01 to Rb04 represent an aryl group which may have a substituent or a fluorine atom. In Formula (I2), Rb05represents a fluorinated alkyl group which may have a substituent or a fluorine atom. A plurality of Rb05's may be the same as or different from one another. q represents an integer of 1 or greater, and Q1+'s each independently represent a q-valent organic cation.

Abstract: A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of ?3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.

Abstract: A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of ?3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.

Abstract: Provided is a polymerizable composition including an alkyne compound represented by the following general formula (1): wherein, in general formula (1), X1 and X2 represent a sulfur atom, an oxygen atom, or an NH group and may be the same or different from each other, Q represents an alkylene group having 1 or 2 carbon atoms, a carbonyl group, or a thiophenylene group in which one of carbon atoms is substituted by an antimony atom, R1 and R2 represent an alkylene group having 1 or 2 carbon atoms and may be the same or different from each other, and m and n each represent 0 or 1.

Abstract: A method for producing a thick film photoresist pattern including laminating a thick photoresist layer including a chemically amplified positive-type photoresist composition for thick film on a support; irradiating the thick photoresist layer; and developing the thick photoresist layer to obtain a thick film resist pattern; in which the composition includes an acid generator, a resin whose alkali solubility increases by the action of an acid, and an organic solvent having a boiling point of at least 150° C. and a contact angle on a silicon substrate of no greater than 18°, in an amount of at least 40% by mass with respect to total mass of the organic solvent.

Abstract: A gas circuit breaker comprising: a sealed tank; two breaking sections disposed in the sealed tank; a bracket to support movable parts of the breaking sections while enabling switching operation of the movable parts; an insulation cylinder to support the bracket through an electric field relaxation shield; an insulated operating rod disposed in the insulation cylinder movably in the axial direction and an end thereof is connected to an actuator; and a link mechanism connected to other end of the insulated rod and transmits drive force from the actuator to the movable parts of the breaking sections, wherein the electric field relaxation shield is provided with out-side groove and in-side groove on the insulation cylinder respectively, and the out-side groove and in-side groove are formed openings at the link mechanism side respectively, and end of the in-side groove is extended to near the outer surrounding of the insulated operating rod.

Abstract: A carbon fiber structure and a manufacturing method of the same are provided. The carbon fiber structure includes a carbon fiber-reinforced carbon composite material having carbon fibers and a carbonaceous matrix. The carbon fibers are configured by a substantially linear fiber. The carbon fibers form thin piece bodies in which a longitudinal direction of the carbon fibers is oriented in parallel to a surface direction of the carbon fiber structure within the carbonaceous matrix. The carbon fiber structure is configured by a laminate having the thin piece bodies laminated therein.

Abstract: Disclosed is a metal compound represented by the following formula (0): in the formula (0), A represents a thietane ring, or a monovalent group containing a thiol group; B represents a divalent group containing a heteroatom; R2 represents a divalent organic group; n represents the valence of M; p represents an integer of 1 ton; M represents a lanthanoid atom or a barium (Ba) atom when A is a thietane ring, and represents a lanthanoid atom when A is a monovalent group containing a thiol group; or more than Y represents a monovalent inorganic or organic group; when n?p is not less than 2, a plurality of Y's each independently represent a monovalent inorganic or organic group; and when n?p is not less than 2, the plurality of Y's may be bonded with each other to form a ring containing M.

Abstract: A process for producing bis(thietanylthio)dithiastannolane of the following formula: involving the reaction of tetrakis(thietanylthio)tin having the following formula: with 1,2-ethandiethiol.

Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.

Abstract: The composition of the present invention contains a product having a thiol group obtained by reacting an Sb or Bi oxide or an Sb or Bi halide with at least one kind of polythiol compounds selected from compounds having at least two thiol groups in a molecule.

Abstract: The additive for a polymerizable composition according to the present invention contains a compound represented by the general formula (a). In the general formula (a), R represents a saturated hydrocarbon group having 1 to 3 carbon atoms. M represents Sn, Sb, Bi, or Ge. m represents 0 or 1. R and M are not directly bonded when m is 0. n represents an integer of 1 to 3. X represents a monovalent linking group, and a plurality of X may be the same as or different from each other. When two or more linking groups X are bonded with the metal atom M, the linking groups X may combine together to form a ring.

Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.

Abstract: The crystalline Polymorph B of N-(2-aminophenyl)-4-[N-(pyridine-3-yl)methoxy-carbonyaminomethyl]benzamide (MS-275) of formula I is described, as well as the process for the production of said compound, and its use as a medicament for the treatment of selected diseases.