Patents by Inventor Tomoyuki Ando

Tomoyuki Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230002182
    Abstract: A conveyance route switching mechanism and a paper sheet handling apparatus that includes the conveyance route switching mechanism include a driving source, a gate, a first gear, and an internal gear. The driving source includes a driving shaft. The gate includes a gate shaft, and a blade that is provided on the gate shaft, and switches conveyance routes of paper sheets. The first gear is provided on the gate shaft. The internal gear meshes with the first gear. According to rotation of the driving shaft, the gate shaft rotates on an axis of the gate shaft, and revolves with the driving shaft as a rotation center while the first gear meshes with the internal gear.
    Type: Application
    Filed: September 8, 2022
    Publication date: January 5, 2023
    Inventors: Takashi WADA, Tomoyuki TAMAHASHI, Satoshi HAYASHI, Atsushi ANDO, Shohei KOIZUMI, Shoichi DEGUCHI, Akira YAMADA
  • Publication number: 20220411214
    Abstract: In a centering mechanism and a paper sheet handling apparatus including the centering mechanism, a centering unit conveys a paper sheet in a pinched state, and centers a position of the paper sheet in a width direction orthogonal to a conveyance direction of the paper sheet by inclining with respect to the conveyance direction. In addition, the paper sheet is delivered to a downstream side conveyance unit from the centering unit in a state in which the centering unit pinches the paper sheet, and the downstream side conveyance unit conveys the paper sheet while pinching the paper sheet at pinch pressure stronger than pinch pressure at which the centering unit pinches the paper sheet.
    Type: Application
    Filed: September 7, 2022
    Publication date: December 29, 2022
    Inventors: Takashi WADA, Satoshi HAYASHI, Tomoyuki TAMAHASHI, Atsushi ANDO
  • Publication number: 20220392292
    Abstract: A paper sheet handling apparatus includes a support member that is disposed so as to face a taking-out port in a taking-out space in which a paper sheet is taken out from the taking-out port, and supports a lower end of the paper sheet. The support member moves toward the taking-out port at a time when the paper sheet is taken out.
    Type: Application
    Filed: August 16, 2022
    Publication date: December 8, 2022
    Inventors: Atsushi ANDO, Tomoyuki TAMAHASHI, Satoshi HAYASHI, Shohei KOIZUMI, Shoichi DEGUCHI, Takashi WADA, Akira YAMADA
  • Publication number: 20220392293
    Abstract: A paper sheet handling apparatus includes: a first facing section and a second facing section that are disposed to face each other across an insertion/take-out space; a partition section that is disposed between the first and second facing sections so as to be capable of moving in a facing direction in which the first and second facing sections face each other, forms, within the insertion/take-out space, an insertion space between the partition section and the first facing section, and forms, within the insertion/take-out space, a take-out space between the partition section and the second facing section. The partition section includes a movable member provided at a leading end portion of the partition section on an insertion/take-out port side and capable of moving toward each of the first facing section and the second facing section.
    Type: Application
    Filed: August 16, 2022
    Publication date: December 8, 2022
    Inventors: Akira YAMADA, Tomoyuki TAMAHASHI, Takashi WADA, Atsushi ANDO, Shohei KOIZUMI, Shoichi DEGUCHI, Satoshi HAYASHI
  • Publication number: 20220392291
    Abstract: A paper sheet handling apparatus includes: a first facing section and a second facing section which are arranged so as to face each other in a facing direction with an insertion space interposed therebetween; and a conveyance section that conveys a paper sheet. The first facing section includes a first shutter that openably closes a first opening portion, and is disposed so as to be movable, in the facing direction, to an insertion position at a time when the paper sheet is inserted and a conveyance position at a time when the paper sheet is conveyed. The first facing section and the conveyance section include first shutter opening/closing units which open the first opening portion by meshing with each other to open the first shutter when the first facing section moves from the insertion position to the conveyance position.
    Type: Application
    Filed: August 16, 2022
    Publication date: December 8, 2022
    Inventors: Shoichi DEGUCHI, Tomoyuki TAMAHASHI, Atsushi ANDO, Satoshi HAYASHI, Shohei KOIZUMI, Takashi WADA, Akira YAMADA
  • Patent number: 11491772
    Abstract: A substrate bonding method which enables forming a precision fine space using a method that is simpler and easier than conventional methods; and a laminated body production method that uses the substrate bonding method. This substrate bonding method includes disposing a first substrate on a photoresist pattern formed on a support film so as to bring the first substrate into contact with a surface of the photoresist pattern located on the side opposite to the support film, and pressure-bonding the support film, the photoresist pattern, and the first substrate; releasing the bonded support film after the pressure-bonding; and disposing a second substrate on the photoresist pattern so as to bring the second substrate into contact with the surface of the photoresist pattern located on the side opposite to the first substrate, and pressure-bonding the first substrate, the photoresist pattern, and the second substrate.
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: November 8, 2022
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Ryuma Mizusawa, Tomoyuki Ando
  • Patent number: 11415888
    Abstract: A negative type photosensitive resin composition containing an epoxy group-containing resin; a metal oxide; and a cationic polymerization initiator (I). The cationic polymerization initiator (I) contains one or more of a compound represented by Formula (I1) and a compound represented by Formula (I2). In Formula (I1), Rb01 to Rb04 represent an aryl group which may have a substituent or a fluorine atom. In Formula (I2), Rb05 represents a fluorinated alkyl group which may have a substituent or a fluorine atom. A plurality of Rb05's may be the same as or different from one another. q represents an integer of 1 or greater, and Qq+'s each independently represent a q-valent organic cation.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: August 16, 2022
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Ryosuke Nakamura, Tomoyuki Ando, Tokunori Yamadaya
  • Publication number: 20210283893
    Abstract: A substrate bonding method which enables forming a precision fine space using a method that is simpler and easier than conventional methods; and a laminated body production method that uses the substrate bonding method. This substrate bonding method includes disposing a first substrate on a photoresist pattern formed on a support film so as to bring the first substrate into contact with a surface of the photoresist pattern located on the side opposite to the support film, and pressure-bonding the support film, the photoresist pattern, and the first substrate; releasing the bonded support film after the pressure-bonding; and disposing a second substrate on the photoresist pattern so as to bring the second substrate into contact with the surface of the photoresist pattern located on the side opposite to the first substrate, and pressure-bonding the first substrate, the photoresist pattern, and the second substrate.
    Type: Application
    Filed: September 13, 2017
    Publication date: September 16, 2021
    Inventors: Ryuma MIZUSAWA, Tomoyuki ANDO
  • Patent number: 10472435
    Abstract: Provided is a polymerizable composition including an alkyne compound represented by the following general formula (1): wherein, in general formula (1), X1 and X2 represent a sulfur atom, an oxygen atom, or an NH group and may be the same or different from each other, Q represents an alkylene group having 1 or 2 carbon atoms, a carbonyl group, or a thiophenylene group in which one of carbon atoms is substituted by an antimony atom, R1 and R2 represent an alkylene group having 1 or 2 carbon atoms and may be the same or different from each other, and m and n each represent 0 or 1.
    Type: Grant
    Filed: February 8, 2016
    Date of Patent: November 12, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Masakazu Murakami, Tomoyuki Ando
  • Publication number: 20190235380
    Abstract: A negative type photosensitive resin composition containing an epoxy group-containing resin; a metal oxide; and a cationic polymerization initiator (I). The cationic polymerization initiator (I) contains one or more of a compound represented by Formula (I1) and a compound represented by Formula (I2). In Formula (I1), Rb01 to Rb04 represent an aryl group which may have a substituent or a fluorine atom. In Formula (I2), Rb05represents a fluorinated alkyl group which may have a substituent or a fluorine atom. A plurality of Rb05's may be the same as or different from one another. q represents an integer of 1 or greater, and Q1+'s each independently represent a q-valent organic cation.
    Type: Application
    Filed: August 28, 2017
    Publication date: August 1, 2019
    Inventors: Ryosuke NAKAMURA, Tomoyuki ANDO, Tokunori YAMADAYA
  • Patent number: 10241403
    Abstract: A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of ?3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: March 26, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hirofumi Imai, Tomoyuki Ando
  • Publication number: 20180095366
    Abstract: A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of ?3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.
    Type: Application
    Filed: March 25, 2016
    Publication date: April 5, 2018
    Inventors: Hirofumi IMAI, Tomoyuki ANDO
  • Publication number: 20180066082
    Abstract: Provided is a polymerizable composition including an alkyne compound represented by the following general formula (1): wherein, in general formula (1), X1 and X2 represent a sulfur atom, an oxygen atom, or an NH group and may be the same or different from each other, Q represents an alkylene group having 1 or 2 carbon atoms, a carbonyl group, or a thiophenylene group in which one of carbon atoms is substituted by an antimony atom, R1 and R2 represent an alkylene group having 1 or 2 carbon atoms and may be the same or different from each other, and m and n each represent 0 or 1.
    Type: Application
    Filed: February 8, 2016
    Publication date: March 8, 2018
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Masakazu MURAKAMI, Tomoyuki ANDO
  • Patent number: 9244354
    Abstract: A method for producing a thick film photoresist pattern including laminating a thick photoresist layer including a chemically amplified positive-type photoresist composition for thick film on a support; irradiating the thick photoresist layer; and developing the thick photoresist layer to obtain a thick film resist pattern; in which the composition includes an acid generator, a resin whose alkali solubility increases by the action of an acid, and an organic solvent having a boiling point of at least 150° C. and a contact angle on a silicon substrate of no greater than 18°, in an amount of at least 40% by mass with respect to total mass of the organic solvent.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: January 26, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Washio, Tomoyuki Ando, Eiichi Shimura, Toshiaki Tachi
  • Patent number: 8957341
    Abstract: A gas circuit breaker comprising: a sealed tank; two breaking sections disposed in the sealed tank; a bracket to support movable parts of the breaking sections while enabling switching operation of the movable parts; an insulation cylinder to support the bracket through an electric field relaxation shield; an insulated operating rod disposed in the insulation cylinder movably in the axial direction and an end thereof is connected to an actuator; and a link mechanism connected to other end of the insulated rod and transmits drive force from the actuator to the movable parts of the breaking sections, wherein the electric field relaxation shield is provided with out-side groove and in-side groove on the insulation cylinder respectively, and the out-side groove and in-side groove are formed openings at the link mechanism side respectively, and end of the in-side groove is extended to near the outer surrounding of the insulated operating rod.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: February 17, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Wei Zhang, Masanori Tsukushi, Tomoyuki Ando, Michiru Onodera
  • Patent number: 8815365
    Abstract: A carbon fiber structure and a manufacturing method of the same are provided. The carbon fiber structure includes a carbon fiber-reinforced carbon composite material having carbon fibers and a carbonaceous matrix. The carbon fibers are configured by a substantially linear fiber. The carbon fibers form thin piece bodies in which a longitudinal direction of the carbon fibers is oriented in parallel to a surface direction of the carbon fiber structure within the carbonaceous matrix. The carbon fiber structure is configured by a laminate having the thin piece bodies laminated therein.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: August 26, 2014
    Assignee: Ibiden Co., Ltd.
    Inventors: Hideki Kato, Haruhide Shikano, Tomoyuki Ando
  • Patent number: 8697889
    Abstract: Disclosed is a metal compound represented by the following formula (0): in the formula (0), A represents a thietane ring, or a monovalent group containing a thiol group; B represents a divalent group containing a heteroatom; R2 represents a divalent organic group; n represents the valence of M; p represents an integer of 1 ton; M represents a lanthanoid atom or a barium (Ba) atom when A is a thietane ring, and represents a lanthanoid atom when A is a monovalent group containing a thiol group; or more than Y represents a monovalent inorganic or organic group; when n?p is not less than 2, a plurality of Y's each independently represent a monovalent inorganic or organic group; and when n?p is not less than 2, the plurality of Y's may be bonded with each other to form a ring containing M.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: April 15, 2014
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Mamoru Takashina, Tomoyuki Ando, Seiichi Kobayashi
  • Patent number: 8680295
    Abstract: A process for producing bis(thietanylthio)dithiastannolane of the following formula: involving the reaction of tetrakis(thietanylthio)tin having the following formula: with 1,2-ethandiethiol.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: March 25, 2014
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Seiichi Kobayashi
  • Patent number: 8426551
    Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: April 23, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
  • Patent number: RE45499
    Abstract: The crystalline Polymorph B of N-(2-aminophenyl)-4-[N-(pyridine-3-yl)methoxy-carbonyaminomethyl]benzamide (MS-275) of formula I is described, as well as the process for the production of said compound, and its use as a medicament for the treatment of selected diseases.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: April 28, 2015
    Assignee: Bayer Intellectual Property GmbH
    Inventors: Matthias Schneider, Michael Gottfried, Jens Geisler, Gabriele Winter, Joji Suzuki, Tomoyuki Ando, Masaru Honjo